Patents by Inventor Markus Franciscus Antonius Eurlings
Markus Franciscus Antonius Eurlings has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11150563Abstract: A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.Type: GrantFiled: December 10, 2019Date of Patent: October 19, 2021Assignee: ASML Netherlands B.V.Inventors: Sergei Sokolov, Sergey Tarabrin, Su-Ting Cheng, Armand Eugene Albert Koolen, Markus Franciscus Antonius Eurlings, Koenraad Remi André Maria Schreel
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Patent number: 10754259Abstract: An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.Type: GrantFiled: June 16, 2017Date of Patent: August 25, 2020Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Yevgeniy Konstantinovich Shmarev, Markus Franciscus Antonius Eurlings
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Publication number: 20200192230Abstract: A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.Type: ApplicationFiled: December 10, 2019Publication date: June 18, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Sergei SOKOLOV, Sergey TARABRIN, Su-Ting CHENG, Armand Eugene Albert KOOLEN, Markus Franciscus Antonius EURLINGS, Koenraad Remi Andre Maria SCHREEL
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Patent number: 10495889Abstract: A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to homogenize the filtered beam. The filter system may be configured to homogenize the angular beam profile radially and said optical mixing element may be configured to homogenize the angular beam profile azimuthally.Type: GrantFiled: February 22, 2017Date of Patent: December 3, 2019Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Markus Franciscus Antonius Eurlings, Armand Eugene Albert Koolen, Teunis Willem Tukker, Johannes Matheus Marie De Wit, Stanislav Smirnov
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Publication number: 20190155172Abstract: An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.Type: ApplicationFiled: June 16, 2017Publication date: May 23, 2019Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Yevgeniy Konstantinovich SHMAREV, Markus Franciscus Antonius EURLINGS
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Patent number: 10289006Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.Type: GrantFiled: November 26, 2013Date of Patent: May 14, 2019Assignee: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Markus Franciscus Antonius Eurlings, Hermanus Johannes Maria Kreuwel
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Patent number: 10222702Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.Type: GrantFiled: January 21, 2016Date of Patent: March 5, 2019Assignee: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Ramon Mark Hofstra, Erik Petrus Buurman, Johannes Hubertus Josephina Moors, Alexander Matthijs Struycken, Harm-Jan Voorma, Sumant Sukdew Ramanujan Oemrawsingh, Markus Franciscus Antonius Eurlings, Peter Frans Maria Muys
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Patent number: 10222703Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.Type: GrantFiled: July 18, 2017Date of Patent: March 5, 2019Assignee: ASML Netherlands B.V.Inventors: Heine Melle Mulder, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Markus Franciscus Antonius Eurlings, Hendrikus Robertus Marie Van Greevenbroek, Paul Van Der Veen, Patricius Aloysius Jacobus Tinnemans, Wilfred Edward Endendijk
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Publication number: 20180031979Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.Type: ApplicationFiled: January 21, 2016Publication date: February 1, 2018Applicant: ASML Netherlands B.V.Inventors: Arno Jan BLEEKER, Ramon Mark HOFSTRA, Erik Petrus BUURMAN, Johannes Hubertus Josephina MOORS, Alexander Matthijs STRUYCKEN, Harm-Jan VOORMA, Sumant Sukdew Ramanujan OEMRAWSINGH, Markus Franciscus Antonius EURLINGS, Peter Frans Maria MUYS
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Patent number: 9835950Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.Type: GrantFiled: December 19, 2014Date of Patent: December 5, 2017Assignee: ASML Netherland B.V.Inventors: Markus Franciscus Antonius Eurlings, Niek Antonius Jacobus Maria Kleemans, Antonius Johannes Josephus Van Dijsseldonk, Ramon Mark Hofstra, Oscar Franciscus Jozephus Noordman, Tien Nang Pham, Jan Bernard Plechelmus Van Schoot, Jiun-Cheng Wang, Kevin Weimin Zhang
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Publication number: 20170315450Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.Type: ApplicationFiled: July 18, 2017Publication date: November 2, 2017Applicant: ASML NETHERLANDS B. V.Inventors: Heine Melle MULDER, Johannes Jacobus Matheus BASELMANS, Adrianus Franciscus Petrus ENGELEN, Markus Franciscus Antonius EURLINGS, Hendrikus Robertus Marie VAN GREEVENBROEK, Paul VAN DER VEEN, Patricius Aloysius Jacobus TINNEMANS, Wilfred Edward ENDENDIJK
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Patent number: 9778575Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.Type: GrantFiled: January 6, 2016Date of Patent: October 3, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Heine Melle Mulder, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Markus Franciscus Antonius Eurlings, Hendrikus Robertus Marie Van Greevenbroek, Paul Van Der Veen, Patricius Aloysius Jacobus Tinnemans, Wilfred Edward Endendijk
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Publication number: 20170248794Abstract: A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to homogenize the filtered beam. The filter system may be configured to homogenize the angular beam profile radially and said optical mixing element may be configured to homogenize the angular beam profile azimuthally.Type: ApplicationFiled: February 22, 2017Publication date: August 31, 2017Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Markus Franciscus Antonius EURLINGS, Armand Eugene Albert Koolen, Teunis Willem Tukker, Johannes Matheus Marie De Wit, Stanislav Smirnov
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Patent number: 9645500Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.Type: GrantFiled: July 24, 2014Date of Patent: May 9, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Oscar Franciscus Jozephus Noordman, Markus Franciscus Antonius Eurlings
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Publication number: 20160334711Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.Type: ApplicationFiled: December 19, 2014Publication date: November 17, 2016Applicant: ASML Netherlands B.V.Inventors: Markus Franciscus Antonius EURLINGS, Niek Antonius Jacobus Maria KLEEMANS, Antonius Johannes Josephus VAN DIJSSELDONK, Ramon Mark HOFSTRA, Oscar Franciscus Jozephus NOORDMAN, Tien Nang PHAM, Jan Bernard Plechelmus VAN SCHOOT, Jiun-Cheng WANG, Kevin Weimin ZHANG
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Publication number: 20160195819Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.Type: ApplicationFiled: July 24, 2014Publication date: July 7, 2016Applicant: ASML Netherlands B.V.Inventors: Oscar Franciscus Jozephus NOORDMAN, Markus Franciscus Antonius EURLINGS
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Publication number: 20160116848Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.Type: ApplicationFiled: January 6, 2016Publication date: April 28, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Heine Melle MULDER, Johannes Jacobus Matheus BASELMANS, Adrianus Franciscus Petrus ENGELEN, Markus Franciscus Antonius EURLINGS, Hendrikus Robertus Marie VAN GREEVENBROEK, Paul VAN DER VEEN, Patricius Aloysius Jacobus TINNEMANS, Wilfred Edward ENDENDIJK
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Patent number: 9250536Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.Type: GrantFiled: March 21, 2008Date of Patent: February 2, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Heine Melle Mulder, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Markus Franciscus Antonius Eurlings, Hendrikus Robertus Marie Greevenbroek, Patricius Aloysius Jacobus Tinnemans, Paul Van Der Veen, Wilfred Edward Endendijk
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Publication number: 20150334813Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.Type: ApplicationFiled: November 26, 2013Publication date: November 19, 2015Applicant: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus VAN SCHOOT, Markus Franciscus Antoniu EURLINGS, Hermanus Johannes Maria KREUWEL
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Patent number: 9188881Abstract: A lithographic apparatus includes an illumination system for providing a beam of extreme ultra-violet radiation, a masking device for controlling the illumination of a patterning device by the beam of radiation, a support for supporting the patterning device, the patterning device configured to impart a pattern to the beam of radiation, a substrate table for holding a substrate, and a projection system for projecting the patterned beam of radiation onto a target portion of the substrate. The masking device includes a masking blade including a masking edge configured to delimit a boundary of an illumination region on the patterning device. The masking blade is configured to reflect extreme ultra-violet radiation incident on the masking blade such that at least a portion of the reflected radiation is not captured by the projection system.Type: GrantFiled: May 4, 2010Date of Patent: November 17, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Marcel Mathijs Theodore Marie Dierichs, Markus Franciscus Antonius Eurlings, Hendrikus Robertus Marie Van Greevenbroek, Antonie Hendrik Verweij