Patents by Inventor Markus Franciscus Antonius Eurlings

Markus Franciscus Antonius Eurlings has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product
    Publication number: 20030038225
    Abstract: A lithographic projection system has an illumination system. A plurality of directing elements reflect different sub-beams of an incident projection beam into adjustable, individually controllable directions. By using of re-directing optics any desired spatial intensity distribution of the projection beam can be produced in its cross-sectional plane.
    Type: Application
    Filed: May 30, 2002
    Publication date: February 27, 2003
    Inventors: Heine Melle Mulder, Jan Bernard Plechelmus Van Schoot, Markus Franciscus Antonius Eurlings, Antonius Johannes Josephus Van Dijsseldonk, Marcel Dierichs
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20020036763
    Abstract: A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus such that the change in intensity anomaly introduced by it counteracts an elliptically symmetric intensity anomaly present in the projection beam or introduced by another optical element traversed by the projection beam.
    Type: Application
    Filed: July 3, 2001
    Publication date: March 28, 2002
    Inventors: Jan Jaap Krikke, Markus Franciscus Antonius Eurlings, Jan Hoegee, Paul van der Veen
  • Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby
    Publication number: 20020027648
    Abstract: A method of operating a lithographic projection apparatus comprises forming a spot of radiation at the wafer level using a pinhole at reticle level. A sensor is defocused with respect to said spot such that it is spaced apart from said wafer level. The sensor is scanned beneath the spot to measure the angular intensity distribution of radiation at the spot and to determine the intensity distribution at the pupil plane of the projection lens system.
    Type: Application
    Filed: August 31, 2001
    Publication date: March 7, 2002
    Inventors: Hans Van Der Laan, Marcel Dierichs, Hendrikus Robertus Marie Van Greevenbroek, Markus Franciscus Antonius Eurlings