Patents by Inventor Markus Franciscus Antonius Eurlings

Markus Franciscus Antonius Eurlings has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7316870
    Abstract: Isolated dark features, e.g. contact holes or lines, are exposed in a double exposure, using different illumination settings in the two exposures.
    Type: Grant
    Filed: April 1, 2004
    Date of Patent: January 8, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Jozef Maria Finders
  • Patent number: 7224440
    Abstract: A lithographic apparatus includes an illumination system configured to provide a radiation beam; a patterning device configured to pattern the radiation beam to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes.
    Type: Grant
    Filed: December 23, 2004
    Date of Patent: May 29, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Stefan Geerte Kruijswijk, Marcel Mathijs Theodore Marie Dierichs, Markus Franciscus Antonius Eurlings, Heine Melle Mulder
  • Patent number: 7177010
    Abstract: A lithographic apparatus comprises an illumination system for providing a projection beam of radiation, a support structure for supporting patterning device, the patterning device serving to transmit or reflect radiation in the projection beam and impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. A sensor is provided for measuring the spatial intensity distribution of the projection beam at the substrate. The spatial distribution of transmission or reflectance of the patterning device, together with the distribution of the projection beam incident on the patterning device, may be determined from the measured intensity distribution. By comparing the transmission or reflectance from regions having identical patterns the overall (macroscopic) distribution of the transmission or reflectance of the patterning device can be determined.
    Type: Grant
    Filed: November 3, 2004
    Date of Patent: February 13, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Van Der Laan, Uwe Mickan, Markus Franciscus Antonius Eurlings, Jan Bernard Plechelmus Van Schoot
  • Patent number: 7148952
    Abstract: The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.
    Type: Grant
    Filed: October 29, 2004
    Date of Patent: December 12, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Johannes Jacobus Matheus Baselmans, Hako Botma, Jan Bruining, Marcel Mathijs Theodore Marie Dierichs, Antonius Johannes Josephus Van Dijsseldonk, Judocus Marie Dominicus Stoeldraijer
  • Patent number: 7138212
    Abstract: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: November 21, 2006
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran
  • Patent number: 7113261
    Abstract: A radiation system includes a radiation generator to generate radiation, a source, and an illumination system configured to receive the radiation and provide a beam of radiation. The illumination system includes a beam measuring system configured measure at least one of position and tilt of the beam of radiation relative to the illumination system and a projecting device configured to redirect only a part of a cross section of the beam of radiation to the beam measuring system. The beam measuring system may include several position sensors, the readouts of which can be used to determine incorrect alignment of the radiation source with respect to the illumination system. Diaphragms are connected to the collector of the radiation generator, so that in addition to X, Y, and Z corrections, Rx, Ry and Rz corrections are possible.
    Type: Grant
    Filed: June 8, 2004
    Date of Patent: September 26, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Mathijs Theodore Marie Dierichs, Markus Franciscus Antonius Eurlings, Olav Waldemar Vladimir Frijns
  • Patent number: 7030958
    Abstract: An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.
    Type: Grant
    Filed: December 31, 2003
    Date of Patent: April 18, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Cornelis Petrus Andreas Marie Luijkx, Vadim Yevgenyevich Banine, Hako Botma, Martinus Van Duijnhoven, Markus Franciscus Antonius Eurlings, Heine Melle Mulder, Johannes Hendrik Everhardus Aldegonda Muijderman, Cornelis Jacobus Van Duijn, Jan Jaap Krikke
  • Patent number: 7026082
    Abstract: The method involves selecting features of a pattern to be imaged, notionally dividing the source into a plurality of source elements, for each source element, calculating the process window for each selected feature and then the OPC rules that optimize the overlap of the calculated process windows. Finally, those source elements are selected for which the overlapping of the process windows and the OPC rules satisfy specified criteria. The selected source elements define the source intensity distribution.
    Type: Grant
    Filed: December 4, 2003
    Date of Patent: April 11, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Armand Eugene Albert Koolen
  • Patent number: 7015491
    Abstract: A lithographic projection system has an illumination system. A plurality of directing elements direct different sub-beams of an incident beam into predetermined directions. By using re-directing optics any desired angular intensity distribution of the beam can be produced. The illumination system includes a setting device that includes a reflector plate that supports reflectors. The reflectors are resiliently supported on the reflector plate. At least one aperture in the reflector plate is associated with each reflector. A setting plate includes at least one pin associated with each reflector. The pins of the setting plate are insertable into the apertures of the reflector plate. Each pin or pins engages its associated reflector to control the orientation of the associated reflector by rotation about two axes substantially perpendicular to the optical axis of the associated reflector.
    Type: Grant
    Filed: October 8, 2003
    Date of Patent: March 21, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Noud Jan Gilissen
  • Patent number: 6927004
    Abstract: A reflective mask has a sub-resolution texture applied to absorbing areas to reduce the amount of power in the specular reflection. The texture may form a phase contrast grating or may be a diffuser. The same technique may be applied to the other absorbers in a lithographic apparatus.
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: August 9, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Antonius Johannes Josephus Van Dijsseldonk, Marcel Mathijs Theodore Marie Dierichs
  • Patent number: 6875545
    Abstract: A method of transferring a lithographic pattern onto a substrate by use of a lithographic apparatus. The method includes the steps of: (1) defining features to be printed on the substrate; (2) determining which of the features require assist features to be disposed adjacent thereto in order for the features to be printed within defined resolution limits; (3) generating a mask containing the features to be printed and the assist features; (4) performing a first illumination process so as to print the features on the substrate, the first illumination process resulting in the partial printing of the assist features on the substrate; and (5) performing a second illumination process so as to reduce the amount of the assist features printed on the substrate; the second illumination process entails the step of performing a quadrapole illumination.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: April 5, 2005
    Assignee: ASML Masktools B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Jang Fung Chen, Duan-Fu Stephen Hsu
  • Publication number: 20040142251
    Abstract: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process.
    Type: Application
    Filed: November 12, 2003
    Publication date: July 22, 2004
    Inventors: Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran
  • Publication number: 20040137343
    Abstract: The method involves selecting features of a pattern to be imaged, notionally dividing the source into a plurality of source elements, for each source element, calculating the process window for each selected feature and then the OPC rules that optimize the overlap of the calculated process windows. Finally, those source elements are selected for which the overlapping of the process windows and the OPC rules satisfy specified criteria. The selected source elements define the source intensity distribution.
    Type: Application
    Filed: December 4, 2003
    Publication date: July 15, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Armand Eugene Albert Koolen
  • Publication number: 20040108467
    Abstract: A lithographic projection system has an illumination system. A plurality of directing elements direct different sub-beams of an incident beam into predetermined directions. By using re-directing optics any desired angular intensity distribution of the projection beam can be produced. The illumination system includes a setting device that includes a reflector plate that supports reflectors. The reflectors are resiliently supported on the reflector plate. At least one aperture in the reflector plate is associated with each reflector. A setting plate includes at least one pin associated with each reflector. The pins of the setting plate are insertable into the apertures of the reflector plate. Each pin or pins engages its associated reflector to control the orientation of the associated reflector by rotation about two axes substantially perpendicular to the optical axis of the associated reflector.
    Type: Application
    Filed: October 8, 2003
    Publication date: June 10, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Noud Jan Gilissen
  • Patent number: 6741329
    Abstract: An illumination intensity adjustment device includes a plurality of blades disposed in the projection beam so as to cast half-shadows extending across the illumination field. The blades can be selectively rotated to increase their width perpendicular to the projection beam to control uniformity.
    Type: Grant
    Filed: September 6, 2002
    Date of Patent: May 25, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Johannes Hubertus Josephina Moors, Erik Roelof Loopstra, Noud Jan Gilissen, Markus Franciscus Antonius Eurlings
  • Patent number: 6737662
    Abstract: A lithographic projection system has an illumination system. A plurality of directing elements reflect different sub-beams of an incident projection beam into adjustable, individually controllable directions. By using of re-directing optics any desired spatial intensity distribution of the projection beam can be produced in its cross-sectional plane.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: May 18, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Heine Melle Mulder, Jan Bernard Plechelmus Van Schoot, Markus Franciscus Antonius Eurlings, Antonius Johannes Josephus Van Dijsseldonk, Marcel Dierichs
  • Patent number: 6710856
    Abstract: A method of operating a lithographic projection apparatus including forming a spot of radiation at the wafer level using a pinhole at reticle level. A sensor is defocused with respect to the spot such that it is spaced apart from the wafer level. The sensor is scanned beneath the spot to measure the angular intensity distribution of radiation at the spot and to determine the intensity distribution at the pupil plane of the projection lens system.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: March 23, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Van Der Laan, Marcel Dierichs, Hendrikus Robertus Marie Van Greevenbroek, Markus Franciscus Antonius Eurlings
  • Publication number: 20030180632
    Abstract: A reflective mask has a sub-resolution texture applied to absorbing areas to reduce the amount of power in the specular reflection. The texture may form a phase contrast grating or may be a diffuser. The same technique may be applied to the other absorbers in a lithographic apparatus.
    Type: Application
    Filed: March 6, 2003
    Publication date: September 25, 2003
    Applicant: ASML NETHERLANDS, B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Antonius Johannes Josephus Van Dijsseldonk, Marcel Mathijs Theodore Marie Dierichs
  • Publication number: 20030170565
    Abstract: A method of transferring a lithographic pattern onto a substrate by use of a lithographic apparatus. The method includes the steps of: (1) defining features to be printed on the substrate; (2) determining which of the features require assist features to be disposed adjacent thereto in order for the features to be printed within defined resolution limits; (3) generating a mask containing the features to be printed and the assist features; (4) performing a first illumination process so as to print the features on the substrate, the first illumination process resulting in the partial printing of the assist features on the substrate; and (5) performing a second illumination process so as to reduce the amount of the assist features printed on the substrate; the second illumination process entails the step of performing a quadrapole illumination.
    Type: Application
    Filed: November 27, 2002
    Publication date: September 11, 2003
    Inventors: Markus Franciscus Antonius Eurlings, Jang Fung Chen, Duan-Fu Stephen Hsu
  • Patent number: 6583855
    Abstract: A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus such that the change in intensity anomaly introduced by it counteracts an elliptically symmetric intensity anomaly present in the projection beam or introduced by another optical element traversed by the projection beam.
    Type: Grant
    Filed: July 3, 2001
    Date of Patent: June 24, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Jaap Krikke, Markus Franciscus Antonius Eurlings, Jan Hoegee, Paul van der Veen