Patents by Inventor Masahiko Ogino

Masahiko Ogino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8916476
    Abstract: Provided are a method for forming a microfine structure and a microfine structure forming body prepared by the method. The method allows a remaining film part to be formed thinner and more uniform on a substrate than the conventional techniques. The method comprises the steps of: forming an oxide layer on a metallic thin film; a photocurable resin layer via first and second adhesive layers over the oxide layer; and transferring a microfine structure formed on a mold by pressing the mold onto the photocurable resin layer. The first adhesive layer includes a compound having at least two hydrolysable functional groups, and the second adhesive layer includes a compound having at least a hydrolysable functional group and a reactive functional group.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: December 23, 2014
    Assignee: Hitachi-LG Data Storage, Inc.
    Inventors: Ryuta Washiya, Masahiko Ogino, Shiro Nagashima, Akio Yabe, Masaki Sugita, Akihiro Miyauchi
  • Publication number: 20140334937
    Abstract: Mechanical strength of a composite material is enhanced by a simple process. In a composite material comprising a resin or a rubber and an oxide glass, the resin or the rubber is dispersed in the oxide glass, or the oxide glass is dispersed in the resin or the rubber, and the oxide glass is softened and fluidized by heating at or lower than a heat decomposition temperature of the resin or the rubber.
    Type: Application
    Filed: November 1, 2012
    Publication date: November 13, 2014
    Applicant: HITACHI, LTD.
    Inventors: Tadashi Fujieda, Takashi Naito, Takuya Aoyagi, Yuichi Sawai, Hajime Murakami, Hiroshi Yoshida, Akihiro Miyauchi, Masahiko Ogino
  • Publication number: 20140292864
    Abstract: An ink jet recording apparatus receives an output signal of a printing object detecting sensor, counts a pulse signal of an encoder based on a predetermined number of character scans, and controls the operation start of an ink curing device.
    Type: Application
    Filed: January 14, 2014
    Publication date: October 2, 2014
    Applicant: Hitachi Industrial Equipment Systems Co., Ltd.
    Inventors: Ryuta MOTOYANAGI, Nobuhiro HARADA, Hiroshi SASAKI, Masahiko OGINO
  • Publication number: 20140231965
    Abstract: Provided are a method for forming a microfine structure and a microfine structure forming body prepared by the method. The method allows a remaining film part to be formed thinner and more uniform on a substrate than the conventional techniques. The method comprises the steps of: forming an oxide layer on a metallic thin film; a photocurable resin layer via first and second adhesive layers over the oxide layer; and transferring a microfine structure formed on a mold by pressing the mold onto the photocurable resin layer. The first adhesive layer includes a compound having at least two hydrolysable functional groups, and the second adhesive layer includes a compound having at least a hydrolysable functional group and a reactive functional group.
    Type: Application
    Filed: November 20, 2013
    Publication date: August 21, 2014
    Applicant: Hitachi Media Electronics Co., Ltd.
    Inventors: Ryuta WASHIYA, Masahiko OGINO, Shiro NAGASHIMA, Akio YABE, Masaki SUGITA, Akihiro MIYAUCHI
  • Patent number: 8770965
    Abstract: A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: July 8, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Ryuta Washiya, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
  • Patent number: 8741380
    Abstract: A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1.
    Type: Grant
    Filed: August 20, 2010
    Date of Patent: June 3, 2014
    Assignee: Hitachi, Ltd.
    Inventors: Hiroshi Yoshida, Haruo Akahoshi, Akihiro Miyauchi, Masahiko Ogino
  • Patent number: 8690559
    Abstract: The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.
    Type: Grant
    Filed: July 29, 2011
    Date of Patent: April 8, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
  • Patent number: 8668487
    Abstract: A micro-pattern transferring stamper includes a supporting base material and a microstructure layer formed on the supporting base material, the microstructure layer is a polymer of a resin composition that mainly contains a silsesquioxane derivative containing a plurality of polymerizable functional groups, and one or plural kinds of monomer elements containing a plurality of polymerizable functional groups.
    Type: Grant
    Filed: February 16, 2011
    Date of Patent: March 11, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
  • Patent number: 8632714
    Abstract: A mold and a pattern transfer method using the same for a nanoprinting technology. The mold can be released from a substrate accurately and easily. The mold, which is used for forming a fine pattern on a substrate using a press machine, comprises a release mechanism.
    Type: Grant
    Filed: June 19, 2012
    Date of Patent: January 21, 2014
    Assignee: Hitachi, Ltd.
    Inventors: Masahiko Ogino, Akihiro Miyauchi, Sigehisa Motowaki, Kosuke Kuwabara
  • Patent number: 8603380
    Abstract: An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: December 10, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
  • Patent number: 8562896
    Abstract: An object of the present invention is to provide a micropattern transfer method and a micropattern transfer device in which the small amount of resin is applied to a substrate, and the nonuniformity in thickness is prevented to arise on the obtained pattern forming layer. In order to achieve the above object, the present invention provides a micropattern transfer method in which a micropattern is transferred to a resin by pressing a stamper having the micropattern onto the resin applied to a substrate, including the steps of: applying the resin to a surface of the substrate discretely in order to obtain a plurality of resin islands so that a center portion of each of the resin islands forms a planar thin-film, and a peripheral portion of the resin island rises higher than the center portion.
    Type: Grant
    Filed: April 22, 2010
    Date of Patent: October 22, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
  • Publication number: 20130260095
    Abstract: A glass substrate having a fine structure on the surface thereof, wherein said glass substrate is made of vanadium-containing glass and said vanadium-containing glass has a resistivity no higher than 109 ?·cm, with the content of vanadium (in the form of V2O5) being no less than 10 wt % and no more than 60 wt %. The glass substrate prevents dust attraction and retains its antifouling properties over a long period of time.
    Type: Application
    Filed: February 19, 2013
    Publication date: October 3, 2013
    Applicant: HITACHI, LTD.
    Inventors: Yuzuru SHIMAZAKI, Takashi NAITO, Takuya AOYAGI, Yuichi SAWAI, Tadashi FUJIEDA, Akihiro MIYAUCHI, Masahiko OGINO
  • Patent number: 8491291
    Abstract: In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
    Type: Grant
    Filed: February 6, 2012
    Date of Patent: July 23, 2013
    Assignee: Hitachi, Ltd.
    Inventors: Takashi Ando, Susumu Komoriya, Masahiko Ogino, Akihiro Miyauchi
  • Publication number: 20130082029
    Abstract: The object of the present invention is to provide a stamper or an imprint device which can reduce a variation of a base film thickness, a product processed and having a precise fine pattern, and a device for manufacturing a product processed or a method for manufacturing a product processed which can form a precise fine pattern. According to the present invention, in a stamper, an imprint device performing an imprint using the stamper, a device for manufacturing a product processed by the imprint device, a method for manufacturing a product processed by the imprint, and a product processed and manufactured, the stamper has a dummy pattern which is unnecessary for fulfilling a function of the product processed which is formed of a substrate for the product.
    Type: Application
    Filed: August 2, 2012
    Publication date: April 4, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Tetsuhiro HATOGAI, Kyoichi MORI, Makoto MARUYAMA, Akihiro MIYAUCHI, Masahiko OGINO
  • Patent number: 8387255
    Abstract: The fine pattern mold that includes a roll, a buffer tube with inner peripheral surface is in contact with an outer peripheral surface of the roll, and a stamper tube in which its inner peripheral surface is in contact with an outer peripheral surface of the buffer tube and a fine concave/convex pattern is formed on its outer peripheral surface, wherein the buffer tube has a larger coefficient of linear expansion and a smaller elastic modulus than those of the stamper tube.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: March 5, 2013
    Assignee: Hitachi Industrial Equipment Systems Co., Ltd.
    Inventors: Masahiko Ogino, Mitsuru Hasegawa, Kenya Ohashi, Akihiro Miyauchi, Hitoshi Suzuki, Toshio Haba, Haruo Akahoshi
  • Patent number: 8366991
    Abstract: An apparatus for recovering platinum group elements comprises a furnace body having an interior space substantially shot off from external air, a material charging port and an exhaust port provided in an upper half of the furnace body, at least two fluid discharge ports provided in a lower half of the furnace body at different height levels. a material charging chute connected to the material charging port. an exhaust unit connected to the exhaust port; and electrodes for passing electric current through and heating material charged into the furnace. The material charging chute is equipped with a vertical two stage shutter so as to maintain airtightness when material is charged into the interior space of the furnace.
    Type: Grant
    Filed: September 16, 2010
    Date of Patent: February 5, 2013
    Assignees: Dowa Metals & Mining Co., Ltd., Tanaka Kikinzoku Kogyo K.K., Kosaka Smelting & Refining Co., Ltd., Nippon PGM Co., Ltd.
    Inventors: Koji Yamada, Masahiko Ogino, Nobuyasu Ezawa, Hiroshi Inoue
  • Publication number: 20130011632
    Abstract: Provided is a method for producing a microfine structure comprising the steps of: forming a resin film by applying a liquid polymerizable resin composition containing a high molecular weight component, a low molecular weight component and a reactive dilution component to an adhesion promoting layer formed on a substrate; imprinting a mold with an extremely fine convex concave pattern onto the resin film; and transferring the convex concave pattern to the resin film. Herein, components of the adhesion promoting layer, the high molecular weight component, the low molecular weight component and the reactive dilution component respectively have cross-linking reactive functional groups which react with each other.
    Type: Application
    Filed: December 22, 2010
    Publication date: January 10, 2013
    Inventors: Masahiko Ogino, Susumu Komoriya, Akihiro Miyauchi, Ryuta Washiya, Kyoichi Mori, Noritake Shizawa
  • Publication number: 20130001835
    Abstract: An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.
    Type: Application
    Filed: September 5, 2012
    Publication date: January 3, 2013
    Inventors: Satoshi ISHII, Masahiko OGINO, Noritake SHIZAWA, Kyoichi MORI, Akihiro MIYAUCHI
  • Publication number: 20120319326
    Abstract: The fine structure transfer apparatus is provided with a pattern transfer mechanism having a resin applying mechanism, a substrate handling mechanism, an aligning mechanism, a pressurizing mechanism, and a peeling mechanism, and the pressurizing mechanism is configured of an upper head section and a lower stage section, the molding die having the fine pattern formed thereon is fixed on the lower surface of the upper head section, and after pressurization and transfer, the lower stage section retracts from a position below the substrate in the state wherein the substrate is adhered to the molding die, then, after the peeling mechanism is moved to a position below the substrate, the substrate adhered to the molding die is peeled.
    Type: Application
    Filed: March 10, 2011
    Publication date: December 20, 2012
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Toshimitsu Shiraishi, Kyoichi Mori, Noritake Shizawa, Naoaki Yamashita, Masahiko Ogino, Akihiro Miyauchi
  • Publication number: 20120321738
    Abstract: A micro-pattern transferring stamper includes a supporting base material and a microstructure layer formed on the supporting base material, the microstructure layer is a polymer of a resin composition that mainly contains a silsesquioxane derivative containing a plurality of polymerizable functional groups, and one or plural kinds of monomer elements containing a plurality of polymerizable functional groups.
    Type: Application
    Filed: February 16, 2011
    Publication date: December 20, 2012
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi