Abstract: A photopolymerizable resin composition for transferring a microstructure, which allows a thinner and uniform thin film to be formed, a transfer accuracy of extremely smaller microfine pattern to be excellent, and a curing time of the thin film to be shortened, is provided. The photopolymerizable resin composition for transferring a microstructure comprises the following component (A), component (B), component (C), component (D) and component (E) at the rate described below: (A) a 6 to 15-functional acrylate; in 0.5 to 10 mass % (B) an acrylate with a weight-average molecular weight (Mw) of 1000 to 10000; in 0.5 to 10 mass % (C) an acrylate having a benzene ring; in 0.5 to 10 mass % (D) a reactive diluent; in 80 to 98 mass % (E) a photopolymerization initiator; in 0.1 to 5 mass %.

Abstract: The fine pattern mold comprises: that includes a roll, a buffer tube with inner peripheral surface is in contact with an outer peripheral surface of the roll, and a stamper tube in which its inner peripheral surface is in contact with an outer peripheral surface of the buffer tube and a fine concave/convex pattern is formed on its outer peripheral surface, wherein the buffer tube has a larger coefficient of linear expansion and a smaller elastic modulus than those of the stamper tube.

Abstract: A stamper is used for the transfer of microscopic structures, the stamper including a base and a microscopic structure layer on a surface thereof, in which the microscopic structure layer has a surface layer including a polymer derived from a resin composition containing a polymerization initiator and a silsesquioxane derivative having two or more polymerizable functional groups, the microscopic structure layer has a modulus of elasticity of less than 2.0 GPa and has a thickness of 4 times or more the height of a microscopic structure formed on the surface of the microscopic structure layer.

Abstract: A method of transcribing a shape of a surface of a stamper on a transcription surface of a transcription object by pressing the stamper on the transcription object, which comprises steps of: having one of the stamper and the transcription object positioned opposite a plate surface and the other of the stamper and the transcription object placed on one surface of a pressure plate; and having the one of the stamper and the transcription object pressed onto the plate surface by applying a fluid on the other surface of the pressure plate, wherein an area of the one surface of the pressure plate is larger than a contact area in which the other of the stamper and the transcription object is in contact with the pressure plate.

Abstract: An imprint apparatus has a head unit with a fine structure. The head unit includes a fine imprint pattern layer including fine concavities and convexities, a resin layer on a face of the fine imprint pattern layer opposite to a face where the concavities and convexities are formed, a first pressurizing base member on a face of the resin layer opposite to a face contacting the fine imprint pattern layer, and a second pressurizing base member on a face of the first pressurizing base member opposite to a face contacting the resin layer. The resin layer has a modulus of elasticity smaller than that of the fine imprint pattern layer, and the first pressurizing base member has a modulus of elasticity smaller than that of the resin layer. A light source or a heat source may be further provided. The head unit may be light permeable. A replacement layer may be further provided for replacement.

Abstract: Embodiments of the invention provide ways to manufacture an inexpensive high-density magnetic recording medium. A high-density magnetic recording medium is composed of a flat substrate, a nonmagnetic intermediary body having a periodic recessed-relieved structure, and a magnetic film formed on the intermediary body.

Abstract: Provided is a fine structure which allows the formation of a highly accurate metallic replica mold. The structure is resistant to breakage even in the presence of foreign particles or bumps and causes a smaller transfer failure region even when applied to an undulating object to be transferred. Also provided is a stamper for imprinting, which conforms to local bumps of a substrate to be transferred, causes, if any, a smaller pattern transfer failure region, and has satisfactory durability. The fine structure includes a supporting member; and a pattern layer having a fine asperity pattern formed on a surface thereof. The pattern layer is made from a resin through curing of a resin composition containing a cationic-polymerization catalyst and two or more organic components having different functional groups, and the supporting member and the pattern layer each transmit light having a wavelength of 365 nm or longer.

Abstract: A functioning substrate with a group of columnar micro pillars characterized in that a first matrix of organic polymer and a group of columnar micro pillars of organic polymer extending from this matrix are provided. This group of columnar micro pillars has an equivalent diameter of 10 nm through 500 ?m and a height of 50 nm through 5000 ?m; and the ratio (H/D) of the equivalent diameter (D) to the height (H) of the group of columnar micro pillars is 4 or more.

Abstract: Provided is a new photo-curable resin composition which can be used in a photo nanoimprinting technology available for a photo nanoimprinting technology by which a substrate is processed with high accuracy. The photo-curable resin composition contains a photo-curable resin material essentially containing a (meth)acrylate, a reactive diluent, and a photo initiator. Preferably, the (meth)acrylate has a structure containing a benzene ring structure in its skeleton.

Abstract: It is an object of the present invention to provide a method which can easily and selectively modify specific sites on indentations or protrusions of indentation/protrusion structures fabricated by nano-imprinting. Pressing a mold having indentation/protrusion structures onto a polymer substrate comprising at least two layers of different chemical composition exposes the second layer, which has been covered by the outermost layer, in pillars formed as a result of the pressing. Site-specific chemical modification of the pillars can be achieved by formulating a desired chemical composition for the second layer beforehand, or by chemical modification of the exposed second layer cross-sections in the pillars.

Abstract: A method for recovering platinum group elements comprises charging into a closed electric furnace and melting, together with flux components and a reducing agent, a platinum group element-containing substance to be processed and a copper source material containing copper oxide, sinking molten metal of primarily metallic copper below a molten slag layer of primarily oxides, and enriching the platinum group elements in the molten metal sunk below, and is characterized in that molten slag whose copper content has decreased to 3.0 wt % or less is discharged from the electric furnace and that the copper source material charged into the electric furnace is a granular copper source material of a grain diameter of not less than 0.1 mm and not greater than 10 mm.

Abstract: A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1.

Abstract: An object of the present invention is to provide a micropattern transfer method and a micropattern transfer device in which the small amount of resin is applied to a substrate, and the nonuniformity in thickness is prevented to arise on the obtained pattern forming layer. In order to achieve the above object, the present invention provides a micropattern transfer method in which a micropattern is transferred to a resin by pressing a stamper having the micropattern onto the resin applied to a substrate, including the steps of: applying the resin to a surface of the substrate discretely in order to obtain a plurality of resin islands so that a center portion of each of the resin islands forms a planar thin-film, and a peripheral portion of the resin island rises higher than the center portion.

Abstract: A method for recovering platinum group elements comprises charging into a closed electric furnace and melting, together with flux components and a reducing agent, a platinum group element-containing substance to be processed and a copper source material containing copper oxide, sinking molten metal of primarily metallic copper below a molten slag layer of primarily oxides, and enriching the platinum group elements in the molten metal sunk below, and is characterized in that molten slag whose copper content has decreased to 3.0 wt % or less is discharged from the electric furnace and that the copper source material charged into the electric furnace is a granular copper source material of a grain diameter of not less than 0.1 mm and not greater than 10 mm.

Abstract: A micropattern transfer stamper has a space that hermetically contains fluid, on an opposite side of a surface with an indented pattern formed thereon of a pattern forming sheet member. The pattern forming sheet member is convexly bent by pressure of the fluid contained in the space. When the indented pattern is transferred onto the material to be transferred, the pattern forming sheet member deforms following the surface of the material to be transferred.

Abstract: In a micropattern transfer device, a stamper on which a fine indented pattern is formed is brought into contact with a material to be transferred, and the fine indented pattern on the stamper is transferred onto a surface of the material to be transferred. The micropattern transfer device includes a holding mechanism which holds an entire outer circumferential portion of the material to be transferred. The holding mechanism holds the material to be transferred such that a distance between the material to be transferred and the stamper is substantially equal to or shorter than a distance between the holding mechanism and the stamper.

Abstract: Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.

Abstract: An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.

Abstract: An imprint apparatus has a head unit with a fine structure. The head unit includes a fine imprint pattern layer including fine concavities and convexities, a resin layer on a face of the fine imprint pattern layer opposite to a face where the concavities and convexities are formed, a first pressurizing base member on a face of the resin layer opposite to a face contacting the fine imprint pattern layer, and a second pressurizing base member on a face of the first pressurizing base member opposite to a face contacting the resin layer. The resin layer has a modulus of elasticity smaller than that of the fine imprint pattern layer, and the first pressurizing base member has a modulus of elasticity smaller than that of the resin layer. A light source or a heat source may be further provided. The head unit may be light permeable. A replacement layer may be further provided for replacement.

Abstract: It is an object of this invention to provide a cell culture vessel which has a simple and convenient structure, can prevent the injury on the cells at the time of peeling, and accelerates the transportation of nutrients and discharge of waste materials. In order to solve the problem mentioned above, the cell culture vessel of this invention has protrusions having a corresponding diameter not smaller than 10 nm and not greater than 10 ?m and a height not smaller than 10 nm and not greater than 1 mm on the surface of the cell culture vessel. The protrusions make the culture fluid permeate into the under part of the cells, accelerate the supply of nutrients and discharge of waste materials, and makes the contact between the cells and the vessel as a point-contact and thereby prevents the cells from the injury which the cells undergo at the time of peeling.