Patents by Inventor Masahiko Ogino

Masahiko Ogino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7654815
    Abstract: There is provided a fine pattern transfer, belt-shaped mold, with which a fine structure having a high aspect ratio can be formed rapidly and stably using nanoimprinting, and a fine pattern transfer system (a nanoimprint system) that employs this mold. According to the present invention, a nanoimprint mold includes: a belt-shaped support member; a plurality of stampers, for each of which a fine convex-and-concave pattern, to be transferred, is formed on one surface; and an adhesive member, to which the belt-shaped support member and the stampers are to be securely adhered, wherein the adhesive member includes a porous member and adhesive layers, which are deposited on either face of the porous member, for impregnating one part of the porous member, and wherein, for the porous member, a porous area that is not impregnated with the adhesive layers, is provided and positioned so as to sandwich the porous member between portions impregnated with the adhesive layers.
    Type: Grant
    Filed: August 14, 2008
    Date of Patent: February 2, 2010
    Assignee: Hitachi, Ltd.
    Inventors: Mitsuru Hasegawa, Masahiko Ogino
  • Publication number: 20090243126
    Abstract: A method of imprinting a microstructure comprising: contacting a stamper comprising a pattern layer with the microstructure of the order of from micrometers to nanometers in one face of the pattern layer and a substrate supporting the pattern layer with an imprinting member having a deformable layer to which the microstructure is imprinted, wherein the pattern layer is supported on a round surface having a prescribed radius of curvature of the substrate, the center of the round surface protruding towards the rear face of the pattern layer; causing the deformable layer on the imprinting member; and separating the stamper from the cured deformable layer.
    Type: Application
    Filed: February 19, 2009
    Publication date: October 1, 2009
    Inventors: Ryuta Washiya, Takashi Ando, Masahiko Ogino, Akihiro Miyauchi
  • Publication number: 20090246309
    Abstract: A fine structure imprinting machine is provided which can surely and easily eliminate static electricity in removing a stamper from an imprinting object. The fine structure imprinting machine is adapted to bring the stamper with a fine concavo-convex pattern formed thereon into contact with the imprinting object, thereby to imprint the fine concavo-convex pattern of the stamper onto a surface of the imprinting object. The stamper has a conductive film on at least a pattern formation surface thereof. The stamper is fixed by a conductive holding member, the conductive film is connected to the holding member via the conductor, and the holding member is connected to a ground within the machine.
    Type: Application
    Filed: February 19, 2009
    Publication date: October 1, 2009
    Inventors: Ryuta WASHIYA, Takashi Ando, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
  • Patent number: 7586755
    Abstract: Through an improvement of module size increase due to mounting a single passive element on a substrate and an increase in the mounting cost, to provide a highly reliable, high performance and small sized electronic circuit component which permits to integrate a variety of electronic parts such as capacitors, inductors and resistors in a high density with low cost. The electronic circuit component comprises an insulator substrate, a plurality of electrodes having different areas provided on the insulator substrate, one or more elements selected from a capacitor element of dielectric material sandwiched between the electrodes, an inductor element and resistor element, a metal wiring connecting the elements, a metal terminal part of a part of the metal wiring and an organic insulator material covering the elements and the circumference of the metal wiring portion excluding the metal terminal portion.
    Type: Grant
    Filed: August 6, 2007
    Date of Patent: September 8, 2009
    Assignee: Hitachi, Ltd.
    Inventors: Toshiya Satoh, Masahiko Ogino, Takao Miwa, Takashi Naitou, Takashi Namekawa, Toshihide Nabatame, Shigehisa Motowaki
  • Publication number: 20090166914
    Abstract: An imprint apparatus for forming fine structure lithography comprises: a belt-like mold having a fine structure for imprint lithography formed on a surface of the belt-like mold; a cylindrical pressurizing mechanism including a pair of opposed rolls for pressurizing the belt-like mold against the surface of the imprinting object; and a supporting member for supporting the imprinting object at a position between the rolls of the cylindrical pressurizing mechanism. The belt-like mold, the imprinting object and the supporting member are configured to move to the cylindrical pressurizing mechanism in a mutually non-contact state, and then at the position between the rolls, be pressurized by the cylindrical pressurizing mechanism in a state where the imprinting object is positioned between the belt-like mold and the supporting member.
    Type: Application
    Filed: December 24, 2008
    Publication date: July 2, 2009
    Inventors: Masahiko Ogino, Mitsuru Hasegawa, Akihiro Miyauchi
  • Patent number: 7520742
    Abstract: A pillar with a high aspect ratio is transferred by a nanoprinting method. In order to form a fine structure on a substrate, a nanoprinting apparatus heats and presses the substrate and a mold with a fine concave-convex pattern formed thereon, the mold having a mechanism for transferring and applying a mold-releasing agent. A method for transferring a fine structure using the aforementioned nanoprinting apparatus.
    Type: Grant
    Filed: March 17, 2004
    Date of Patent: April 21, 2009
    Assignee: Hitachi, Ltd.
    Inventors: Shigehisa Motowaki, Akihiro Miyauchi, Masahiko Ogino, Kosuke Kuwabara
  • Publication number: 20090087506
    Abstract: There is provided a fine pattern transfer, belt-shaped mold, with which a fine structure having a high aspect ratio can be formed rapidly and stably using nanoimprinting, and a fine pattern transfer system (a nanoimprint system) that employs this mold. According to the present invention, a nanoimprint mold includes: a belt-shaped support member; a plurality of stampers, for each of which a fine convex-and-concave pattern, to be transferred, is formed on one surface; and an adhesive member, to which the belt-shaped support member and the stampers are to be securely adhered, wherein the adhesive member includes a porous member and adhesive layers, which are deposited on either face of the porous member, for impregnating one part of the porous member, and wherein, for the porous member, a porous area that is not impregnated with the adhesive layers, is provided and positioned so as to sandwich the porous member between portions impregnated with the adhesive layers.
    Type: Application
    Filed: August 14, 2008
    Publication date: April 2, 2009
    Inventors: Mitsuru Hasegawa, Masahiko Ogino
  • Publication number: 20090004320
    Abstract: An imprinting stamper which can transfer a microscopic pattern to a medium bearing a convex area or local projection, with high accuracy. A convexo-concave pattern is formed on a surface of the imprinting stamper. It includes a pattern layer having the convexo-concave pattern; and a stamper backside layer arranged on a backside of the pattern layer. Young's modulus of the pattern layer is 500 MPa to 10 GPa; and Young's modulus of the stamper backside layer is smaller than Young's modulus of the pattern layer.
    Type: Application
    Filed: June 26, 2008
    Publication date: January 1, 2009
    Inventors: Kenya OHASHI, Masahiko Ogino, Akihiro Miyauchi
  • Publication number: 20080299247
    Abstract: There is provided a fine pattern mold capable of transferring a fine concave/convex pattern accurately without causing deformation of the fine concave/convex pattern itself. The fine patter mold comprises: a roll; a buffer tube whose inner peripheral surface is in contact with an outer peripheral surface of the roll; and a stamper tube in which its inner peripheral surface is in contact with an outer peripheral surface of the buffer tube and a fine concave/convex pattern is formed on its outer peripheral surface, wherein the buffer tube has a larger coefficient of linear expansion and a smaller elastic modulus than those of the stamper tube.
    Type: Application
    Filed: May 30, 2008
    Publication date: December 4, 2008
    Inventors: Masahiko Ogino, Mitsuru Hasegawa, Kenya Ohashi, Akihiro Miyauchi, Hitoshi Suzuki, Toshio Haba, Haruo Akahoshi
  • Publication number: 20080237931
    Abstract: A mold for forming a resin pattern using nanoimprint lithography according to the present invention comprises a main mold including a fine pattern of a protrusion and a depression intended to be transferred, and a spacer for forming a space between the protrusion of the fine pattern of the main mold and a transferred object during a transfer of the fine pattern, in which the spacer has a vent passage capable of flowing gas therethrough and has an elasticity against a pressing force during the transfer.
    Type: Application
    Filed: August 30, 2007
    Publication date: October 2, 2008
    Inventors: Kenya Ohashi, Masahiko Ogino, Akihiro Miyauchi
  • Publication number: 20080229948
    Abstract: An imprint device transfers a micropattern created on a stamper onto a material to be transferred, by bringing the stamper and the material to be transferred into contact with each other. The imprint device has a flow passage for discharging a fluid to a rear surface of the stamper or the material to be transferred, to thereby bend the stamper or the material to be transferred.
    Type: Application
    Filed: January 25, 2008
    Publication date: September 25, 2008
    Inventors: Ryuta Washiya, Takashi Ando, Masahiko Ogino, Hideaki Kataho, Akihiro Miyauchi, Kosuke Kuwabara
  • Publication number: 20080223237
    Abstract: An imprint device transfers a micropattern created on a stamper onto a material to be transferred, by bringing the stamper and the material to be transferred in contact with each other and separating the stamper from the material to be transferred. The stamper has a recessed part on a portion of an outer circumferential part thereof around a surface with the micropattern. An outer diameter of the stamper is larger than that of the material to be transferred. The outer diameter of the material to be transferred is larger than that of the surface with the micropattern.
    Type: Application
    Filed: January 25, 2008
    Publication date: September 18, 2008
    Inventors: Takashi ANDO, Masahiko Ogino, Hideaki Kataho
  • Publication number: 20080174976
    Abstract: Through an improvement of module size increase due to mounting a single passive element on a substrate and an increase in the mounting cost, to provide a highly reliable, high performance and small sized electronic circuit component which permits to integrate a variety of electronic parts such as capacitors, inductors and resistors in a high density with low cost. The electronic circuit component comprises an insulator substrate, a plurality of electrodes having different areas provided on the insulator substrate, one or more elements selected from a capacitor element of dielectric material sandwiched between the electrodes, an inductor element and resistor element, a metal wiring connecting the elements, a metal terminal part of a part of the metal wiring and an organic insulator material covering the elements and the circumference of the metal wiring portion excluding the metal terminal portion.
    Type: Application
    Filed: August 6, 2007
    Publication date: July 24, 2008
    Applicant: HITACHI, LTD.
    Inventors: Toshiya SATOH, Masahiko OGINO, Takao MIWA, Takashi NAITOU, Takashi NAMEKAWA, Toshihide NABATAME, Shigehisa MOTOWAKI
  • Patent number: 7378333
    Abstract: The present invention is a semiconductor device having the semiconductor element obtained by cutting a semiconductor wafer with the electrode pad formed on one side along a scribe line, a semiconductor element protective layer on the semiconductor element which has a opening on the pad, a stress cushioning layer on the layer which has the opening on the pad, a lead wire portion reaching the layer from the electrode pad via the openings, external electrodes on the lead wire portion, and the conductor protective layer on the layers, the layer and the conductor protective layer forming the respective end faces on the end surface of the semiconductor element inside the scribe line and exposing the range from the end face of the end surface to the inside of the scribe line.
    Type: Grant
    Filed: June 29, 2005
    Date of Patent: May 27, 2008
    Assignee: Renesas Technology Corp.
    Inventors: Toshiya Satoh, Masahiko Ogino, Tadanori Segawa, Yoshihide Yamaguchi, Hiroyuki Tenmei, Atsushi Kazama, Ichiro Anjo, Asao Nishimura
  • Patent number: 7374417
    Abstract: A stamper and a transfer apparatus that utilizes the stamper, which is capable of accurately transferring its own pattern onto an article, such as a substrate, without being affected by any distribution of convex portions on the stamper surface or any contour of the substrate. The stamper has a fine concave-convex pattern on a surface thereof for forming a fine structure on a substrate using a pressing machine. The stamper is flexible and includes a buffer formed on an opposite side to the side on which the concave-convex pattern is formed. The buffer has a longitudinal distribution of moduli of elasticity.
    Type: Grant
    Filed: March 18, 2004
    Date of Patent: May 20, 2008
    Assignee: Hitachi, Ltd.
    Inventors: Kosuke Kuwabara, Akihiro Miyauchi, Masahiko Ogino, Sigehisa Motowaki
  • Patent number: 7341441
    Abstract: Provided is a nanoprint apparatus in which a substrate and a mold formed on its surface with fine concavities and convexities are heated and pressed with each other through the intermediary of a buffer member interposed therebetwen, including a mechanism for successively replacing the buffer member with new one at each time which the mold and the substate are heated and pressed, thereby it is possible to form a fine structure on the substrate.
    Type: Grant
    Filed: March 19, 2004
    Date of Patent: March 11, 2008
    Assignee: Hitachi Industries Co., Ltd.
    Inventors: Masahiko Ogino, Akihiro Miyauchi, Shigehisa Motowaki, Kosuke Kuwabara
  • Publication number: 20080042319
    Abstract: There is provided an imprint device for transferring a fine pattern to a material to form a patterned material. The device comprises a stamper having the fine pattern thereon, and a pressure distribution mechanism. The stamper is pressed against the material, and the pressure distribution mechanism provides a nonuniform pressure distribution in a patterned region of the patterned material, while the stamper is in contact with the material. There are provided an imprint device and a microstructure transfer method, by which it is possible to sufficiently spread a resin or other material for forming a pattern layer between a stamper and a patterned material with a lower pressure so as not to damage the stamper or the patterned material, and to form a pattern formation layer having the uniform thickness on the patterned material.
    Type: Application
    Filed: July 6, 2007
    Publication date: February 21, 2008
    Inventors: TAKASHI ANDO, Susumu Komoriya, Masahiko Ogino, Akihiro Miyauchi
  • Publication number: 20080041248
    Abstract: The present invention provides an imprint apparatus transferring a surface structure of a stamper to material to be patterned by allowing the stamper come in contact with the material to be patterned. The imprint apparatus includes a holding means that holds the material to be patterned and the stamper with a distance therebetween, a pressure reduction means that reduces pressure of a chamber in which the material to be patterned and the stamper are placed, and an alignment means that aligns the stamper with the material to be patterned.
    Type: Application
    Filed: July 6, 2007
    Publication date: February 21, 2008
    Inventors: KOSUKE KUWABARA, Takashi Ando, Masahiko Ogino, Hiroshi Yoshida, Yasuhiko Tada
  • Publication number: 20080028953
    Abstract: In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
    Type: Application
    Filed: August 3, 2007
    Publication date: February 7, 2008
    Inventors: Takashi Ando, Susumu Komoriya, Masahiko Ogino, Akihiro Miyauchi
  • Publication number: 20080029931
    Abstract: An imprint device transfers a finely patterned structure created on a stamper onto a material to be patterned, by bringing the stamper and the material to be patterned in contact with each other. At least one chamfered edge portion is formed at least one of the stamper and the material to be patterned. The imprint device has a separating unit for holding the chamfered edge portion of at least one of the stamper and the material to be patterned, so as to separate the stamper from the material to be patterned.
    Type: Application
    Filed: July 6, 2007
    Publication date: February 7, 2008
    Inventors: Yasuhiko TADA, Masahiko OGINO, Hiroshi YOSHIDA, Takashi ANDO, Kosuke KUWABARA