Patents by Inventor Masami Aihara

Masami Aihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5609737
    Abstract: A method for manufacturing thin films in which a first film is formed on a substrate using chemical-vapor deposition (CVD), and a second film is formed on the substrate using sputtering, wherein the processes are sequentially performed in the same deposition chamber without exposing the substrate to an oxidative atmosphere. The deposition chamber includes a first electrode, and a second electrode located under the first electrode. During the CVD process, a dummy target is mounted on the first electrode and the substrate is mounted on the second electrode, a reactive gas is introduced into the chamber, and high frequency electrical power is applied to both the first and second electrodes, thereby causing the constituents of the reactive gas to deposit on the substrate to form the first film. Subsequently, any remaining reactive gas is removed from the chamber and an automated mechanism removes the dummy target from the first electrode and stores the dummy target in a storage chamber.
    Type: Grant
    Filed: August 12, 1994
    Date of Patent: March 11, 1997
    Assignee: Frontec Incorporated
    Inventors: Hirofumi Fukui, Masanori Miyazaki, Masami Aihara, Chisato Iwasaki, Koichi Fukuda, Yasuhiko Kasama
  • Patent number: 5605576
    Abstract: An object of the present invention is to increase the energy efficiency of a plasma apparatus and provide a high-frequency magnetron plasma apparatus which can precisely control plasma. The plasma apparatus has a susceptor electrode, a plasma exciting electrode, magnets mounted on the plasma exciting electrode, and a magnetic shield provided around the plasma exciting electrode, all of which are arranged in a vacuum chamber. The magnetic shield has a high impedance for a high frequency. The magnetic shield is preferably earthed with a direct current, more preferably earthed through an inductance.
    Type: Grant
    Filed: November 9, 1994
    Date of Patent: February 25, 1997
    Assignees: Frontec Incorporated, Tadahiro Ohmi
    Inventors: Makoto Sasaki, Hirofumi Fukui, Masami Aihara, Tadahiro Ohmi
  • Patent number: 5570031
    Abstract: There is provided a surface potential measuring apparatus cable of accurately measuring the potential of a substrate regardless of the material of the substrate, and a plasma equipment capable of accurately measuring and controlling ion energy. The substrate surface potential measuring apparatus measures the surface potential of a substrate in a plasma processing apparatus and includes a terminal electrically connected to a suscepter electrode for holding the substrate, a first condenser disposed between the terminal and the ground and a potential measuring device for measuring the potential of the terminal. The surface potential of the substrate is found from the potential of the suscepter electrode measured by the potential measuring means.
    Type: Grant
    Filed: November 10, 1994
    Date of Patent: October 29, 1996
    Assignees: Frontec Incorporated, Tadahiro Ohmi
    Inventors: Makoto Sasaki, Hirofumi Fukui, Masami Aihara, Koichi Fukuda, Yasuhiko Kasama, Tadahiro Ohmi
  • Patent number: 5282146
    Abstract: Disclosed is a test assistant system for a logical design process comprising a description storage data base for storing statements expressing logical functions of circuit components to be tested, a compiler for compiling the statements to output object data, a data base for storing the object data, a test pattern generator for generating test patterns by using the object data stored in the data base, a test pattern data base for storing the test patterns, each having a level number, a simulator for executing a simulation for the logical function by using the test patterns stored in the test pattern data base, and a display for displaying the object data, the test patterns, the information used in the simulation, and relationships among them.
    Type: Grant
    Filed: May 1, 1991
    Date of Patent: January 25, 1994
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masami Aihara, Masatoshi Sekine, Tsutomu Takei, Hiroaki Nishi, Kazuyoshi Kohno, Takeshi Kitahara, Atsushi Masuda
  • Patent number: 5211763
    Abstract: A soldering flux composition comprising, as a flux base resin, a modified amine compound obtained by reacting (i) at least one member selected from the group consisting of vinyl group-containing compounds, carboxyl group-containing compounds and epoxy group-containing compounds (ii) with an amine compound having an active hydrogen.
    Type: Grant
    Filed: November 29, 1991
    Date of Patent: May 18, 1993
    Assignees: Nippondenso Co., Ltd., Harima Chemicals, Inc.
    Inventors: Masanori Takemoto, Tatsushi Onishi, Masami Aihara
  • Patent number: 5167729
    Abstract: Disclosed is a soldering flux which prevents a release of an active ion contained in an activator when exposed to a high-temperature atmosphere maintaining at a temperature higher than 80.degree. C., for example, an atmosphere of an engine room of an automobile, and thus makes washing unnecessary. This soldering flux comprises, together with an activator, (1) a thermoplastic resin having a softening point not lower than 80.degree. C., and/or (2) an epoxy group-containing compound, a radical-polymerizable unsaturated double bond-containing compound or a blocked isocyanate group-containing compound, or (3) a thermosetting resin composed of a carboxyl group-containing resin and an epoxy resin and/or a thermosetting resin containing carboxy and epoxy groups.
    Type: Grant
    Filed: May 15, 1991
    Date of Patent: December 1, 1992
    Assignees: Nippondenso Co., Ltd., Harima Chemicals, Inc.
    Inventors: Masanori Takemoto, Tatsushi Onishi, Masami Aihara