Patents by Inventor Mei-Ling Chen

Mei-Ling Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120261751
    Abstract: A method for manufacturing a rectifier with a vertical MOS structure is provided. A first trench structure and a first mask layer are formed at a first side of the semiconductor substrate. A second trench structure is formed in the second side of the semiconductor substrate. A gate oxide layer, a polysilicon structure and a metal sputtering layer are sequentially formed on the second trench structure. The rectifier further includes a wet oxide layer and a plurality of doped regions. The wet oxide layer is formed on a surface of the first multi-trench structure and in the semiconductor substrate. The doping regions are formed on a region between the semiconductor substrate and the second trench structure, and located beside the mask layer. The metal sputtering layer is formed on the first mask layer corresponding to the first trench structure.
    Type: Application
    Filed: April 13, 2012
    Publication date: October 18, 2012
    Applicant: PFC DEVICE CORP.
    Inventors: Kou-Liang Chao, Mei-Ling Chen, Hung-Hsin Kuo
  • Publication number: 20120099085
    Abstract: A light emitting diode package including a carrier, at least one LED chip, and a light guide element. The LED chip is disposed on the carrier. The light guide element including a light transmissive body, a light integration part, a reflective film, and a support part is disposed on the carrier and located above the LED chip. The light integration part connected to the light transmissive body and disposed between the light transmissive body and the LED chip has a light incident surface facing the LED chip and at least one side surface. The side surface connects the light transmissive body and the light incident surface. The reflective film is disposed on the side surface. The support part leaning on the carrier is connected to the light transmissive body and surrounds the light integration part. The light transmissive body, the light integration part, and the support part are integrally formed.
    Type: Application
    Filed: December 30, 2011
    Publication date: April 26, 2012
    Applicant: YOUNG OPTICS INC.
    Inventors: Mei-Ling Chen, Wen-Chieh Wen, Haw-Woei Pan, Chao-Shun Chen
  • Publication number: 20120077339
    Abstract: A method of and apparatus for forming interconnects on a substrate includes etching patterns in ultra-low k dielectric and removing moisture from the ultra-low k dielectric using active energy assist baking. During active energy assist baking, the ultra-low k dielectric is heated and exposed to light having only wavelengths greater than 400 nm for about 1 to about 20 minutes at a temperature of about 300 to about 400 degrees Celsius. The active energy assist baking is performed after wet-cleaning or after chemical mechanical polishing, or both.
    Type: Application
    Filed: September 29, 2010
    Publication date: March 29, 2012
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chung-Chi KO, Chia Cheng CHOU, Keng-Chu LIN, Joung-Wei LIOU, Shwang-Ming JENG, Mei-Ling CHEN
  • Publication number: 20120049287
    Abstract: A trench isolation metal-oxide-semiconductor (MOS) P-N junction diode device and a manufacturing method thereof are provided. The trench isolation MOS P-N junction diode device is a combination of an N-channel MOS structure and a lateral P-N junction diode, wherein a polysilicon-filled trench oxide layer is buried in the P-type structure to replace the majority of the P-type structure. As a consequence, the trench isolation MOS P-N junction diode device of the present invention has the benefits of the Schottky diode and the P-N junction diode. That is, the trench isolation MOS P-N junction diode device has rapid switching speed, low forward voltage drop, low reverse leakage current and short reverse recovery time.
    Type: Application
    Filed: July 26, 2011
    Publication date: March 1, 2012
    Applicant: PFC DEVICE CORPORATION
    Inventors: Mei-Ling Chen, Hung-Hsin Kuo, Kou-Liang Chao
  • Patent number: 8092861
    Abstract: A fabrication method of an ultra low-k dielectric layer is provided. A deposition process is performed, under the control of a temperature varying program or a pressure varying program, by reacting a dielectric matrix to form porous low-k dielectric layers with a gradient density on a barrier layer over a substrate.
    Type: Grant
    Filed: September 5, 2007
    Date of Patent: January 10, 2012
    Assignee: United Microelectronics Corp.
    Inventors: Mei-Ling Chen, Su-Jen Sung, Chien-Chung Huang
  • Patent number: 8084357
    Abstract: A method for manufacturing a multi cap layer includes providing a substrate, forming a multi cap layer comprising a first cap layer and a second cap layer formed thereon on the substrate, forming a patterned metal hard mask layer on the multi cap layer, and performing an etching process to etch the multi cap layer through the patterned hard mask layer and to form an opening in the second cap layer.
    Type: Grant
    Filed: April 11, 2007
    Date of Patent: December 27, 2011
    Assignee: United Microelectronics Corp.
    Inventors: Wei-Chih Chen, Su-Jen Sung, Feng-Yu Hsu, Chun-Chieh Huang, Mei-Ling Chen, Jiann-Jen Chiou
  • Publication number: 20110306725
    Abstract: A varnish composition includes (1) a benzoxazine resin having highly symmetric molecular structure; (2) at least one of naphthol type novolac resins, aniline type novolac resins and phenolic type novolac resins; (3) fillers. The benzoxazine resin having highly symmetric molecular structure, and the at least one of naphthol type novolac resins, aniline type novolac resins and phenolic type novolac resins contribute to increase the temperature of glass transition of the varnish composition, while decrease the coefficient of thermal expansion and moisture absorbability due to their small and highly symmetric molecular structures. A copper substrate can meet the requirement of high temperature of glass transition (TMA?200° C.) and low coefficient of thermal expansion (?1/??30/1350(?m/(m° C.). Therefore, the composition of the invention can be widely used as high-performance electronic material.
    Type: Application
    Filed: February 25, 2011
    Publication date: December 15, 2011
    Applicant: NAN YA PLASTICS CORPORATION
    Inventors: MING-JEN TZOU, CHI-CHENG CHEN, MEI-LING CHEN
  • Patent number: 8029143
    Abstract: An illumination system for providing an illumination beam to a light valve is provided. The illumination system includes a light source, a light integration rod, a color wheel, a first focusing unit and a second focusing unit. The light source is capable of generating the illumination beam, and the light integration rod is disposed on the transmission path of the illumination beam. The first focusing unit is disposed between the integration rod and the color wheel and is capable of focusing the illumination beam onto the color wheel. The second focusing unit is disposed between the color wheel and the light valve and is capable of focusing the illumination beam onto the light valve.
    Type: Grant
    Filed: December 12, 2007
    Date of Patent: October 4, 2011
    Assignee: Young Optics Inc.
    Inventors: Mei-Ling Chen, S-Wei Chen, Chao-Shun Chen, Hung-Cheng Lung, Chun-Fa Hsu, Cheng-Shun Liao
  • Patent number: 8011642
    Abstract: A cruising aerator includes a raft, a motor mounted on the raft, a shaft driven by the motor, a first impeller mounted on the shaft, a second impeller mounted on the shaft, and a common chamber. The cruising aerator further includes a sequential controller connected to the motor for controlling the motor to rotate clockwise or counterclockwise. The motor, the shaft and impellers are installed inside of the common chamber. The common chamber has a common inlet disposed under a water surface. A first outlet and a second outlet of the common chamber are arranged to face in opposite directions. The first impeller and second impeller are assembled to have opposite normal rotating directions to each other according to a rotating direction of the motor.
    Type: Grant
    Filed: June 4, 2009
    Date of Patent: September 6, 2011
    Inventors: Ming-Chin Tsai, Mei-Ling Chen
  • Publication number: 20110147948
    Abstract: A structure of a porous low-k layer is described, comprising a bottom portion and a body portion of the same atomic composition, wherein the body portion is located on the bottom portion, and the bottom portion has a density higher than the density of the body portion. An interconnect structure is also described, including the above porous low-k layer, and a conductive layer filling up a damascene opening in the porous low-k layer.
    Type: Application
    Filed: March 2, 2011
    Publication date: June 23, 2011
    Applicant: United Microelectronics Corp.
    Inventors: Mei-Ling Chen, Kuo-Chih Lai, Su-Jen Sung, Chien-Chung Huang, Yu-Tsung Lai
  • Patent number: 7947565
    Abstract: A method of forming a porous low-k layer is described. A CVD process is conducted to a substrate, wherein a framework precursor and a porogen precursor are supplied. In an end period of the supply of the framework precursor, the value of at least one deposition parameter negatively correlated with the density of the product of the CVD process is decreased.
    Type: Grant
    Filed: February 7, 2007
    Date of Patent: May 24, 2011
    Assignee: United Microelectronics Corp.
    Inventors: Mei-Ling Chen, Kuo-Chih Lai, Su-Jen Sung, Chien-Chung Huang, Yu-Tsung Lai
  • Publication number: 20110084353
    Abstract: A trench Schottky rectifier device includes a substrate having a first conductivity type, a plurality of trenches formed in the substrate, and an insulating layer formed on sidewalls of the trenches. The trenches are filled with conductive structure. There is an electrode overlying the conductive structure and the substrate, and thus a Schottky contact forms between the electrode and the substrate. A plurality of embedded doped regions having a second conductivity type are formed in the substrate and located under the trenches. Each doped region and the substrate form a PN junction to pinch off current flowing toward the Schottky contact so as to suppress current leakage.
    Type: Application
    Filed: October 12, 2010
    Publication date: April 14, 2011
    Applicant: PFC DEVICE CORPORATION
    Inventors: Kou-Liang CHAO, Mei-Ling Chen, Tse-Chuan Su, Hung-Hsin Kuo
  • Patent number: 7905601
    Abstract: A color filtering device including a color filter, a plurality of polarization beam splitting units, a plurality of reflecting units, and a plurality of wave plates is provided. The color filter has a plurality of filtering parts and a plurality of light shielding parts alternately arranged thereon. Each of the polarization beam splitting units is disposed in front of one of the filtering parts and makes an angle with a corresponding filtering part. Each of the reflecting units is disposed in front of one of the light shielding parts and makes an angle with a corresponding light shielding part. Each of the wave plates is substantially parallel to one of the filtering parts. Each of the polarization beam splitting units is disposed between a pair of a wave plate and a filtering part. The color filtering device has both color filtering function and polarization conversion function.
    Type: Grant
    Filed: September 20, 2007
    Date of Patent: March 15, 2011
    Assignee: Young Optics Inc.
    Inventors: Mei-Ling Chen, S-Wei Chen, Chao-Shun Chen, Hung-Cheng Lung, Chun-Fa Hsu, Cheng-Shun Liao
  • Publication number: 20100327288
    Abstract: A trench Schottky diode and its manufacturing method are provided. The trench Schottky diode includes a semiconductor substrate having therein a plurality of trenches, a gate oxide layer, a polysilicon structure, a guard ring and an electrode. At first, the trenches are formed in the semiconductor substrate by an etching step. Then, the gate oxide layer and the polysilicon structure are formed in the trenches and protrude above a surface of the semiconductor substrate. The guard ring is formed to cover a portion of the resultant structure. At last, the electrode is formed above the guard ring and the other portion not covered by the guard ring. The protruding gate oxide layer and the protruding polysilicon structure can avoid cracks occurring in the trench structure.
    Type: Application
    Filed: June 28, 2010
    Publication date: December 30, 2010
    Applicant: PFC DEVICE CORPORATION
    Inventors: Kou-Liang CHAO, Hung-Hsin Kuo, Tse-Chuan Su, Mei-Ling Chen
  • Patent number: 7851030
    Abstract: A method of reducing the number of particles on a low-k material layer is described. The low-k material layer is formed by a plasma enhanced chemical vapor deposition process, wherein a reaction gas, a cleaning gas, a high-frequency power and a low-frequency power are used. The method includes turning off the reaction gas and the low-frequency power after the low-k material layer is formed, and continuing to provide the cleaning gas during a delay time.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: December 14, 2010
    Assignee: United Microelectronics Corp.
    Inventors: Mei-Ling Chen, Chih-Chien Liu
  • Publication number: 20100308478
    Abstract: A cruising aerator includes a raft, a motor mounted on the raft, a shaft driven by the motor, a first impeller mounted on the shaft, a second impeller mounted on the shaft, and a common chamber. The cruising aerator further includes a sequential controller connected to the motor for controlling the motor to rotate clockwise or counterclockwise. The motor, the shaft and impellers are installed inside of the common chamber. The common chamber has a common inlet disposed under a water surface. A first outlet and a second outlet of the common chamber are arranged to face in opposite directions. The first impeller and second impeller are assembled to have opposite normal rotating directions to each other according to a rotating direction of the motor.
    Type: Application
    Filed: June 4, 2009
    Publication date: December 9, 2010
    Inventors: Mei-Ling Chen, Ming-Chin Tsai
  • Publication number: 20100155756
    Abstract: A light emitting diode (LED) package including a carrier, at least one LED chip, and a light guide element is provided. The LED chip is disposed on the carrier. The light guide element including a light transmissive body, a light integration part, a reflective film, and a support part is disposed on the carrier and above the LED chip. The light integration part connected to the light transmissive body and disposed between the light transmissive body and the LED chip has a light incident surface facing the LED chip and at least one side. The side connects the light transmissive body and the light incident surface. The reflective film is disposed on the side. The support part leaning on the carrier is connected to the light transmissive body and surrounds the light integration part. The light transmissive body, the light integration part, and the support part are integrally formed.
    Type: Application
    Filed: September 15, 2009
    Publication date: June 24, 2010
    Applicant: YOUNG OPTICS INC.
    Inventors: Mei-Ling Chen, Wen-Chieh Wen, Haw-Woei Pan, Chao-Shun Chen
  • Publication number: 20100153006
    Abstract: Route planning methods and systems are provided. First, an input corresponding to a specific region is received via an input unit of a personal navigation device. Then, a first predefined location located in the specific region is determined. A first route from a first current position of the device to the first predefined location is planned.
    Type: Application
    Filed: September 5, 2009
    Publication date: June 17, 2010
    Applicant: MITAC INTERNATIONAL CORP.
    Inventor: Mei-Ling CHEN
  • Patent number: 7641212
    Abstract: A bicycle frame includes an axle, a hub and freewheel assembly, two fork end members, two axle pegs, and two locking nuts. Thus, the first ramp of each of the axle pegs is rested on the second ramp of the respective fork end member to prevent each of the axle pegs from being rotatable relative to the respective fork end member, so that the first end of each of the axle pegs is clamped exactly between the respective fork end member and the respective locking nut to prevent each of the axle pegs from being rotatable freely on the axle to ensure the safety of a user who treads the axle pegs.
    Type: Grant
    Filed: May 22, 2007
    Date of Patent: January 5, 2010
    Inventors: Wu-Hsiung Liao, Mei-Ling Chen
  • Publication number: 20090275211
    Abstract: A method for fabricating a porous low-k dielectric film includes providing a substrate, performing a first CVD process by providing a back-bone precursor to form an interface dielectric layer, performing a second CVD process by providing a porogen precursor to form a back-bone layer, and removing the porogen material in the back-bone layer so that the back-bone layer becomes an ultra low-k dielectric layer. The interface dielectric layer and the ultra low-k dielectric layer compose a porous low-k dielectric film.
    Type: Application
    Filed: July 15, 2009
    Publication date: November 5, 2009
    Inventors: Mei-Ling Chen, Su-Jen Sung, Kuo-Chih Lai, Jei-Ming Chen