Patents by Inventor Michiaki Kobayashi
Michiaki Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240149640Abstract: A vehicle air conditioning system includes a refrigerant circuit, a heat medium circuit, a vehicle-interior heat exchanger, a vehicle-exterior heat exchanger including a first heat exchanger and a second heat exchanger disposed in series with respect to a flow of air generated by an air blower, a switching unit, a detection unit for detecting a degree of frost formation, and a control device. The operation mode includes a defrosting mode in which the heat medium in the high-temperature medium circuit is supplied to a defrosting target to be selected as either the first or second heat exchanger by the operation of the switching unit. The control device selects, as the defrosting target, the first heat exchanger in preference to the second heat exchanger when determined that both the first and the second heat exchangers need to be defrosted.Type: ApplicationFiled: March 29, 2022Publication date: May 9, 2024Applicant: MITSUBISHI HEAVY INDUSTRIES THERMAL SYSTEMS, LTD.Inventors: Hirotaka TANABE, Takayuki KOBAYASHI, Yasutaka AOKI, Tomoki HASE, Hideaki TATENOI, Masayuki SAKAI, Michiaki NAKANISHI
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Patent number: 8532818Abstract: A vacuum chamber includes: a vacuum vessel arranged at the backward side, where a wafer of a processing subject is processed inside an internal processing chamber; a transfer chamber arranged at the forward side, where said wafer is transferred at the inside thereof under atmospheric pressure; a cassette stage arranged at the forward of this transfer chamber, where a cassette storing said wafer is mounted; a lock chamber connected with said transfer chamber at the backward of said transfer chamber; a robot arranged inside said transfer chamber, where said wafer is transferred between said cassette and said lock chamber; and an aligning machine for making position of said wafer fit with the predetermined position, wherein the wafer is transferred to said lock chamber, after performing alignment of said wafer on said aligning machine, in the case where displacement amount of position of this wafer is larger than the predetermined value.Type: GrantFiled: February 25, 2010Date of Patent: September 10, 2013Assignee: Hitachi High-Technologies CorporationInventors: Tomohiro Ohashi, Tsutomu Nakamura, Hidenobu Tanimura, Michiaki Kobayashi
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Publication number: 20130183121Abstract: In a vacuum processing apparatus having a plurality of vacuum processing chambers at least one of which are coupled to each of a plurality of vacuum transfer chambers which are behind an atmospheric transfer chamber and have vacuum transfer robots in their interior to transfer a wafer, taking out a plurality of wafers in a cassette and transferring successively to the plurality of the vacuum processing chambers, and thereafter returning to the cassette, the wafers are controlled to be transferred to all of the vacuum processing chambers coupled to the backmost vacuum transfer chamber and thereafter a next wafer is transferred to a vacuum processing chamber which becomes possible for the next wafer to be transferred in before they are possible to be transferred out from the vacuum processing chambers coupled to the backmost vacuum transfer chamber and arranged backmost.Type: ApplicationFiled: March 1, 2012Publication date: July 18, 2013Inventors: Ryoichi Isomura, Susumu Tauchi, Hideaki Kondo, Michiaki Kobayashi
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Patent number: 8048259Abstract: A plasma processing apparatus which contributes to reducing required time for maintenance and thereby to enhancing the efficiency of processing and that of apparatus operation is to be provided. A vacuum processing apparatus comprises a vacuum vessel in which a substrate-shaped sample is arranged in an internally arranged processing chamber in which the pressure is reduced; a transfer chamber to which the vacuum vessel is linked and through whose inside reduced in pressure the sample is transferred; a passage which establishes communication between the transfer chamber and the vacuum vessel in a state in which the transfer chamber and the processing chamber are linked to each other and through whose inside the sample not yet processed or already processed is transferred; and a covering member which is removably coupled to cover the internal wall face of the passage, wherein the sample is processed within the processing chamber with a plasma formed in the processing chamber.Type: GrantFiled: August 30, 2006Date of Patent: November 1, 2011Assignee: Hitachi High-Technologies CorporationInventors: Michiaki Kobayashi, Tsutomu Nakamura, Takeo Uchino, Akitaka Makino, Masashi Nakagome
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Publication number: 20110137454Abstract: A vacuum chamber includes: a vacuum vessel arranged at the backward side, where a wafer of a processing subject is processed inside an internal processing chamber; a transfer chamber arranged at the forward side, where said wafer is transferred at the inside thereof under atmospheric pressure; a cassette stage arranged at the forward of this transfer chamber, where a cassette storing said wafer is mounted; a lock chamber connected with said transfer chamber at the backward of said transfer chamber; a robot arranged inside said transfer chamber, where said wafer is transferred between said cassette and said lock chamber; and an aligning machine for making position of said wafer fit with the predetermined position, wherein the wafer is transferred to said lock chamber, after performing alignment of said wafer on said aligning machine, in the case where displacement amount of position of this wafer is larger than the predetermined value.Type: ApplicationFiled: February 25, 2010Publication date: June 9, 2011Inventors: Tomohiro OHASHI, Tsutomu Nakamura, Hidenobu Tanimura, Michiaki Kobayashi
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Publication number: 20100186672Abstract: A plasma processing apparatus composed of a processing chamber in a vacuum vessel to which a gas is fed to form a plasma, a sample stage in which a channel for a heat exchange medium is formed, beams for supporting the sample stage in the horizontal direction, a cylindrical space at atmospheric pressure formed below the channel in the sample stage, coupling paths for communicating the inner wall of the cylindrical space with the exterior of the vacuum vessel, a piping conduit for medium formed in the coupling path, a drive mechanism to drive pins for a wafer, and metal blocks covering junctions between the piping conduits for medium and the sample stage, whereby a gas at high temperature is supplied to between the metal blocks and is exhausted through the coupling path.Type: ApplicationFiled: February 26, 2009Publication date: July 29, 2010Inventors: Koji Okuda, Tsutomu Nakamura, Michiaki Kobayashi, Masakazu Isozaki, Hidenobu Tanimura
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Publication number: 20100163185Abstract: A vacuum processing apparatus which includes a vacuum vessel having a processing chamber provided therein into which a processing gas is supplied to form a plasma and which processes a wafer located in the processing chamber, and a vacuum transfer vessel having a vacuumed transfer chamber coupled with the vacuum vessel provided therein into which the wafer is transferred. A resin-made film having a plasma resistance is bonded onto a surface of a lid of the vacuum transfer vessel on the side of the transfer chamber.Type: ApplicationFiled: February 26, 2009Publication date: July 1, 2010Inventors: Michiaki Kobayashi, Tsutomu Nakamura, Koji Okuda, Masakazu Isozaki
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Publication number: 20090078372Abstract: A vacuum processing apparatus having an improved wafer processing efficiency and an improved working efficiency is provided. The vacuum processing apparatus includes a vacuum container in which a specimen is processed with plasma generated from a processing gas supplied to the vacuum container; a transfer container through which the specimen processed in the vacuum container is transferred, the transfer container being coupled to the vacuum container under ambient pressure; a blower for generating an ambient gas flow in the transfer container and an outlet disposed on the transfer container; a storage container for storing the specimen processed in the vacuum container, the storage container being disposed in the ambient gas flow in the transfer container; and an exhauster for exhausting a gas in the storage container.Type: ApplicationFiled: November 24, 2008Publication date: March 26, 2009Inventors: Takeo UCHINO, Tsutomu Nakamura, Michiaki Kobayashi
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Publication number: 20080066859Abstract: A vacuum pump exhausts gas within the processing chamber from a lower portion of a sample so as to reduce pressure within a processing chamber. The vacuum pump includes a rotary vane and a fixed vane which are arranged within a case of the vacuum pump and have a plurality of impeller blades in a coaxial manner; an exhausting port for exhausting the gas exhausted from the rotary vane outside the case; and a conducting port arranged along a lower direction of the rotary vane, into which inert gas is conducted, which are provided on a circumference thereof. An MFC (flow rate adjusting device) is arranged between a gas storage unit of the inert gas and the conducting port, for adjusting an amount of the inert gas.Type: ApplicationFiled: August 30, 2006Publication date: March 20, 2008Inventors: Michiaki Kobayashi, Tsutomu Nakamura, Akitaka Makino
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Publication number: 20070068626Abstract: A plasma processing apparatus which contributes to reducing required time for maintenance and thereby to enhancing the efficiency of processing and that of apparatus operation is to be provided. A vacuum processing apparatus comprises a vacuum vessel in which a substrate-shaped sample is arranged in an internally arranged processing chamber in which the pressure is reduced; a transfer chamber to which the vacuum vessel is linked and through whose inside reduced in pressure the sample is transferred; a passage which establishes communication between the transfer chamber and the vacuum vessel in a state in which the transfer chamber and the processing chamber are linked to each other and through whose inside the sample not yet processed or already processed is transferred; and a covering member which is removably coupled to cover the internal wall face of the passage, wherein the sample is processed within the processing chamber with a plasma formed in the processing chamber.Type: ApplicationFiled: August 30, 2006Publication date: March 29, 2007Inventors: Michiaki Kobayashi, Tsutomu Nakamura, Takeo Uchino, Akitaka Makino, Masashi Nakagome
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Publication number: 20070068628Abstract: A vacuum processing apparatus having an improved wafer processing efficiency and an improved working efficiency is provided. The vacuum processing apparatus includes a vacuum container in which a specimen is processed with plasma generated from a processing gas supplied to the vacuum container; a transfer container through which the specimen processed in the vacuum container is transferred, the transfer container being coupled to the vacuum container under ambient pressure; a blower for generating an ambient gas flow in the transfer container and an outlet disposed on the transfer container; a storage container for storing the specimen processed in the vacuum container, the storage container being disposed in the ambient gas flow in the transfer container; and an exhauster for exhausting a gas in the storage container.Type: ApplicationFiled: February 28, 2006Publication date: March 29, 2007Inventors: Takeo Uchino, Tsutomu Nakamura, Michiaki Kobayashi
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Patent number: 4745953Abstract: The invention discloses a device for measuring the concentration of alcohol contained in the dampening water used in printing. Part of the dampening water pumped up from a dampening water tank (1) and delivered to a water fountain (3) is sampled through a bypass passage and the dampening water is returned to the dampening water tank (1) after the measurement of the concentration of the sampled dampening water. A measuring unit (8) for detecting the concentration of alcohol has a shielding plate (13) disposed adjacent to the dampening water inlet so that the disturbance of the surface of the dampening water introduced into the measuring unit is prevented. The dampening water discharge outlet consists of a pipe whose upper end is in coplanar relationship with a predetermined surface level of the aqueous solution in the measuring unit so that the excessive dampening water overflows into the pipe (10) to return to the dampening water tank.Type: GrantFiled: November 25, 1986Date of Patent: May 24, 1988Assignee: Dai Nippon Insatsu Kabushiki KaishaInventors: Michiaki Kobayashi, Daiji Suzuki, Kenji Yamada
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Patent number: 4733360Abstract: A card-like article inspection device has an inclined table for placing articles thereon in an upright and aligned state, a camera for detecting the foremost article, and an article feed frame for transferring the article having been inspected along one side of the table in its upright posture. The articles having been inspected are pushed separately into two placing portions of the table. Thus, the articles can be classified into a group of non-defective articles or into a group of defective articles.Type: GrantFiled: June 11, 1985Date of Patent: March 22, 1988Assignee: Dai Nippon Insatsu Kabushiki KaishaInventors: Michiaki Kobayashi, Shigeo Hachiki, Makoto Shibasaki, Satoshi Sasaki
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Patent number: 4703691Abstract: An ink fountain has at least one position display means for displaying the position of each ductor blade piece to be preset before printing and at least one position indicating means for indicating an actual position of the blade piece. A gap between the distal end of the blade piece and the surface of an ink fountain roller is adjusted in such a manner that the actual position of the blade piece is registered with the position, to be preset, of the blade piece by operating an adjusting member.Type: GrantFiled: May 5, 1986Date of Patent: November 3, 1987Assignee: Dai Nippon Insatsu Kabushiki KaishaInventors: Hideo Takeuchi, Michiaki Kobayashi, Makoto Shibasaki
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Patent number: 4694749Abstract: An operation of presetting plate cylinder for automatic registration is carried out in a manner that rotational phase, lateral and twist errors of each plate cylinder are corrected by conventional means and then delamination errors are corrected on the basis of values calculated by using functional expressions concerning statistics. In order to carry out the operation, an apparatus for presetting plate cylinders has register error correcting means, control means for operating the delamination errors and a delamination error correcting means.Type: GrantFiled: November 1, 1985Date of Patent: September 22, 1987Assignees: Dai Nippon Insatsu Kabushiki Kaisha, Mitsubishi Jukogyo Kabushiki KaishaInventors: Hideo Takeuchi, Michiaki Kobayashi, Osamu Yoritsune, Takemasa Matsumoto
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Patent number: 4607571Abstract: An ink fountain has at least one position display means for displaying the position of each ductor blade piece to be preset before printing and at least one position indicating means for indicating an actual position of the blade piece. A gap between the distal end of the blade piece and the surface of an ink fountain roller is adjusted in such a manner that the actual position of the blade piece is registered with the position, to be preset, of the blade piece by operating an adjusting member.Type: GrantFiled: December 16, 1983Date of Patent: August 26, 1986Assignee: Dai Nippon Insatsu Kabushiki KaishaInventors: Hideo Takeuchi, Michiaki Kobayashi, Makoto Shibasaki
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Patent number: D864885Type: GrantFiled: February 27, 2018Date of Patent: October 29, 2019Assignee: Hitachi High-Technologies CorporationInventors: Michiaki Kobayashi, Kazuyuki Hirozane, Akio Harada, Nobuhide Nunomura, Yutaka Kouzuma
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Patent number: D900760Type: GrantFiled: January 23, 2019Date of Patent: November 3, 2020Assignee: Hitachi High-Tech CorporationInventors: Yutaka Kouzuma, Michiaki Kobayashi, Kazuyuki Hirozane, Kohei Kawamura, Nobuya Miyoshi, Hiroyuki Kobayashi
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Patent number: D901407Type: GrantFiled: January 23, 2019Date of Patent: November 10, 2020Assignee: Hitachi High-Tech CorporationInventors: Yutaka Kouzuma, Michiaki Kobayashi, Kazuyuki Hirozane, Nobuya Miyoshi, Kohei Kawamura, Hiroyuki Kobayashi
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Patent number: D924824Type: GrantFiled: January 23, 2019Date of Patent: July 13, 2021Assignee: Hitachi High-Tech CorporationInventors: Yutaka Kouzuma, Kazuyuki Hirozane, Michiaki Kobayashi, Yoshifumi Ogawa