Abstract: Methods and systems for treating pygas are disclosed. Methods include depentanizing the pygas to produce a C5 stream and a C6+ stream before hydrotreating the C6+ stream, to integrate the processing of pygas with the production of isoprene, piperylene, and dicyclopentadiene. Systems include a depentanizer added before a pygas hydrotreatment unit.

Abstract: An apparatus includes a base having first and second inlets. Inner and outer cylinders are disposed on the base, with the outer cylinder being concentric with the inner cylinder. An inner surface of the inner cylinder defines an internal volume. An outer surface of the inner cylinder and an inner surface of the outer cylinder define a chamber space. An ultraviolet lamp is disposed within the internal volume. A top cover is positioned over the inner and outer cylinders and in a sealing relationship with the cylinders. The top cover has a first passageway in flow communication with the chamber space, and a second passageway in flow communication with the internal volume. The first inlet is in flow communication with the chamber space and the second inlet is in flow communication with the internal volume. A system including a process chamber and an ammonia radical generator also is described.

Abstract: A process for extracting isoprene from a pyrolysis gas mixture or a C5 fraction wherein isoprene is purified by plural extractive distillations in the presence of a polar solvent and cyclopentadiene is effectively removed and recycled as a feedstock without being converted into its dimer, dicyclopentadiene. The isoprene recovered from the process described is more than 99.5% pure.

Abstract: A vapor delivery system includes an ampoule to store liquid precursor and a heater to partially vaporize the liquid precursor. A first valve communicates with a push gas source and the ampoule. A second valve supplies vaporized precursor to a heated injection manifold. A valve manifold includes a first node in fluid communication with an outlet of the heated injection manifold, a third valve having an inlet in fluid communication with the first node and an outlet in fluid communication with vacuum, a fourth valve having an inlet in fluid communication with the first node and an outlet in fluid communication with a second node, a fifth valve having an outlet in fluid communication with the second node, and a sixth valve having an outlet in fluid communication with the second node. A gas distribution device is in fluid communication with the second node.

Abstract: The present invention provides improved methods of preparing a low-k dielectric material on a substrate. The methods involve multiple operation ultraviolet curing processes in which UV intensity, wafer substrate temperature, UV spectral distribution, and other conditions may be independently modulated in each operation. Operations may be pulsed or even be concurrently applied to the same wafer. In certain embodiments, a film containing a structure former and a porogen is exposed to UV radiation in a first operation to facilitate removal of the porogen and create a porous dielectric film. In a second operation, the film is exposed to UV radiation to increase cross-linking within the porous film.

Abstract: A substrate processing system for depositing film on a substrate includes a processing chamber defining a reaction volume and including a substrate support for supporting the substrate. A gas delivery system is configured to introduce process gas into the reaction volume of the processing chamber. A plasma generator is configured to selectively generate RF plasma in the reaction volume. A clamping system is configured to clamp the substrate to the substrate support during deposition of the film. A backside purging system is configured to supply a reactant gas to a backside edge of the substrate to purge the backside edge during the deposition of the film.

Abstract: A process for extracting isoprene from a pyrolysis gas mixture or a C5 fraction wherein isoprene is purified by plural extractive distillations in the presence of a polar solvent and cyclopentadiene is effectively removed and recycled as a feedstock without being converted into its dimer, dicyclopentadiene. The isoprene recovered from the process described is more than 99.5% pure.

Abstract: Systems and processes for generating polyethylene are provided. A process includes performing a first reaction with methane and oxygen to produce a first product; performing a second reaction with the first product to produce a second product; separating components from the second product; returning ethane from the second product and performing a reaction simultaneous to the first reaction; performing a third reaction to produce a third product including polyethylene and vented methane; and returning the vented methane to a feed to the first reaction.

Abstract: The invention relates to a reactor comprising a plasma source and a catalyst comprising a mesoporous support. The invention also relates to a process comprising feeding methane to said reactor in order to obtain one or more of ethene, hydrogen and carbon as well as downstream products derived from ethene thus obtained. The invention relates to a reactor comprising as reactor parts: a. a housing and in said housing; b. a plasma source; and c. a catalyst, wherein said catalyst comprises as catalyst parts: i) a mesoporous support; ii) a metal selected from the group Pd, Ni, Ag or at least two thereof, wherein the metal is carried by said mesoporous support; wherein at least a part of said plasma source is located in said housing upstream of said catalyst.

Abstract: Co-extraction techniques for separating and purifying butadiene and isoprene from a C4 hydrocarbon mixture including butadiene and a C5 hydrocarbon mixture including isoprene are provided. In an exemplary embodiment, a system includes a dimerization heat exchanger, a C5 purification column; an extraction zone including a mainwasher column, a rectifier column and an afterwasher column; a distillation zone; a degassing zone; and an isoprene finishing column. The system can further include a C5 washer column, an absorption column, and a distillation column.

Abstract: A method for supplying vapor to a chamber includes providing a first diverter valve that, when open, diverts vapor away from the chamber, and a second diverter valve that, when open, supplies the vapor to the chamber; supplying a carrier gas to the chamber; after supplying the carrier gas, creating plasma in the chamber while a substrate is in the chamber; opening the first diverter valve and closing the second diverter valve; supplying the vapor by vaporizing at least one liquid precursor in a carrier gas; after a first predetermined period sufficient for the vapor to reach steady-state flow, closing the first diverter valve and opening the second diverter valve to supply the vapor to the chamber; and after a second predetermined period following the first predetermined period, opening the first diverter valve and closing the second diverter valve to stop supplying the vapor to the chamber.

Abstract: An apparatus includes a base having first and second inlets. Inner and outer cylinders are disposed on the base, with the outer cylinder being concentric with the inner cylinder. An inner surface of the inner cylinder defines an internal volume. An outer surface of the inner cylinder and an inner surface of the outer cylinder define a chamber space. An ultraviolet lamp is disposed within the internal volume. A top cover is positioned over the inner and outer cylinders and in a sealing relationship with the cylinders. The top cover has a first passageway in flow communication with the chamber space, and a second passageway in flow communication with the internal volume. The first inlet is in flow communication with the chamber space and the second inlet is in flow communication with the internal volume. A system including a process chamber and an ammonia radical generator also is described.

Abstract: A substrate processing system for depositing film on a substrate includes a processing chamber defining a reaction volume and including a substrate support for supporting the substrate. A gas delivery system is configured to introduce process gas into the reaction volume of the processing chamber. A plasma generator is configured to selectively generate RF plasma in the reaction volume. A clamping system is configured to clamp the substrate to the substrate support during deposition of the film. A backside purging system is configured to supply a reactant gas to a backside edge of the substrate to purge the backside edge during the deposition of the film.

Abstract: Various implementations of hybrid ceramic faceplates for substrate processing showerheads are provided. The hybrid ceramic showerhead faceplates may include an electrode embedded within the ceramic material of the faceplate, as well as a pattern of through-holes. The electrode may be fully encapsulated within the ceramic material with respect to the through-holes. In some implementations, a heater element may also be embedded within the hybrid ceramic showerhead faceplate. A DC voltage source may be electrically connected with the hybrid ceramic showerhead faceplate during use. The hybrid ceramic faceplates may be easily removable from the substrate processing showerheads for easy cleaning and faceplate replacement.

Abstract: A substrate processing system for depositing film on a substrate includes a processing chamber defining a reaction volume and including a substrate support for supporting the substrate. A gas delivery system is configured to introduce process gas into the reaction volume of the processing chamber. A plasma generator is configured to selectively generate RF plasma in the reaction volume. A clamping system is configured to clamp the substrate to the substrate support during deposition of the film. A backside purging system is configured to supply a reactant gas to a backside edge of the substrate to purge the backside edge during the deposition of the film.

Abstract: A showerhead assembly for a substrate processing system includes a back plate connected to a gas channel. A face plate is connected adjacent to a first surface of the back plate and includes a gas diffusion surface. An electrode is arranged in one of the back plate and the face plate and is connected to one or more conductors. A gas plenum is defined between the back plate and the face plate and is in fluid communication with the gas channel. The back plate and the face plate are made of a non-metallic material.

Abstract: Various implementations of hybrid ceramic faceplates for substrate processing showerheads are provided. The hybrid ceramic showerhead faceplates may include an electrode embedded within the ceramic material of the faceplate, as well as a pattern of through-holes. The electrode may be fully encapsulated within the ceramic material with respect to the through-holes. In some implementations, a heater element may also be embedded within the hybrid ceramic showerhead faceplate. A DC voltage source may be electrically connected with the hybrid ceramic showerhead faceplate during use. The hybrid ceramic faceplates may be easily removable from the substrate processing showerheads for easy cleaning and faceplate replacement.

Abstract: Systems and processes for generating polyethylene are provided. A process includes performing a first reaction with methane and oxygen to produce a first product; performing a second reaction with the first product to produce a second product; separating components from the second product; returning ethane from the second product and performing a reaction simultaneous to the first reaction; performing a third reaction to produce a third product including polyethylene and vented methane; and returning the vented methane to a feed to the first reaction.

Abstract: A distillation system and process for separating a multi-component feed mixture in a distillation system comprising a first distillation column having a first fired reboiler, and at least a second distillation column having a second heat-exchange reboiler, comprising the steps of a) introducing the feed mixture to the first column, and separating into at least a first top and a first bottom product; b) taking part of the first bottom product for providing heat to the second reboiler as a utility stream; and c) feeding part of said utility stream after heat-exchange as main feed to the second column for further separation. This process allows significant energy savings, by reduction of the amount of external heat required for the fired reboiler and omission of a conventionally used heat-exchanger.

Abstract: The invention relates to a reactor comprising a plasma source and a catalyst comprising a mesoporous support. The invention also relates to a process comprising feeding methane to said reactor in order to obtain one or more of ethene, hydrogen and carbon as well as downstream products derived from ethene thus obtained. The invention relates to a reactor comprising as reactor parts: a. a housing and in said housing; b. a plasma source; and c. a catalyst, wherein said catalyst comprises as catalyst parts: i) a mesoporous support; ii) a metal selected from the group Pd, Ni, Ag or at least two thereof, wherein the metal is carried by said mesoporous support; wherein at least a part of said plasma source is located in said housing upstream of said catalyst.