Abstract: A focus ring to be detachably attached to a top surface of an outer peripheral portion of a mounting table in a processing chamber, includes: an annular main body having a back surface to be attached to the top surface of the outer peripheral portion of the mounting table. And a thermally conductive sheet fixed to the annular main body, the thermally conductive sheet being interposed between the annular main body and the top surface of the outer peripheral portion of the mounting. The thermally conductive sheet is fixed as one unit to the annular main body by coating an unvulcanized rubber on one surface of the thermally conductive sheet, bringing said one surface into contact with the annular main body, and heating the thermally conductive sheet and the annular main body to vulcanize and to adhere the thermally conductive sheet to the annular main body.

Abstract: An electrode plate for a plasma etching is formed as a disc shape having a predetermined thickness, a plurality of gas holes penetrating a surface of the electrode plate perpendicularly to the surface are provided on different circumferences of a plurality of concentric circles, the electrode plate is divided in a radial direction of the electrode plate into two or more regions, types of gas holes provided in the two or more regions are different from each other by region.

Abstract: A heat transfer sheet affixing method where a focus ring is pressed by a pressing part to a heat transfer sheet placed on a heat transfer sheet mounting part of a plasma processing apparatus to affix the heat transfer sheet to the focus ring. The method includes reducing a pressure to place the heat transfer sheet in a reduced-pressure atmosphere, heating the heat transfer sheet, and pressing the focus ring by the pressing part to the heat transfer sheet. The reducing, the heating, and the pressing are performed concurrently at least for a predetermined period of time.

Abstract: A structure of a mounting table for mounting a substrate includes an electrostatic chuck for causing the substrate to be electrostatically attracted to the mounting table, the electrostatic chuck being disposed on the mounting table; a focus ring to be electrostatically attracted to the mounting table by the electrostatic chuck, the focus ring being disposed at an outer edge portion of the electrostatic chuck; a first elastic body having predetermined relative permittivity, the first elastic body being disposed at an outer peripheral portion of a boundary surface between the focus ring and the electrostatic chuck; and a second elastic body having the predetermined relative permittivity, the second elastic body being disposed at an inner peripheral portion of the boundary surface between the focus ring and the electrostatic chuck while being separated from the first elastic body by a predetermined distance.

Abstract: Disclosed is a plasma processing apparatus including a focus ring installed outside a substrate mounted on a mounting table including a temperature control mechanism. The focus ring is configured to be in contact with the mounting table via a heat transfer sheet. A heat insulating layer having a heat conductivity lower than that of the focus ring is provided on a surface of the focus ring at a side of the heat transfer sheet among surfaces of the focus ring.

Abstract: An electrode plate for a plasma etching is formed as a disc shape having a predetermined thickness, a plurality of gas holes penetrating a surface of the electrode plate perpendicularly to the surface are provided on different circumferences of a plurality of concentric circles, the electrode plate is divided in a radial direction of the electrode plate into two or more regions, types of gas holes provided in the two or more regions are different from each other by region.

Abstract: An electrode plate for a plasma etching is formed as a disc shape having a predetermined thickness, a plurality of gas holes penetrating a surface of the electrode plate perpendicularly to the surface are provided on different circumferences of a plurality of concentric circles, the electrode plate is divided in a radial direction of the electrode plate into two or more regions, types of gas holes provided in the two or more regions are different from each other by region.

Abstract: A focus ring to be detachably attached to a top surface of an outer peripheral portion of a mounting table in a processing chamber, includes: an annular main body having a back surface to be attached to the top surface of the outer peripheral portion of the mounting table. And a thermally conductive sheet fixed to the annular main body, the thermally conductive sheet being interposed between the annular main body and the top surface of the outer peripheral portion of the mounting. The thermally conductive sheet is fixed as one unit to the annular main body by coating an unvulcanized rubber on one surface of the thermally conductive sheet, bringing said one surface into contact with the annular main body, and heating the thermally conductive sheet and the annular main body to vulcanize and to adhere the thermally conductive sheet to the annular main body.

Abstract: A plasma processing apparatus includes a mounting stage on which a substrate is mounted, a focus ring arranged around a periphery of the mounting stage, a plurality of magnetic members arranged at a surface of the focus ring and a surface of the mounting stage facing opposite each other, and a temperature adjustment unit configured to adjust a temperature of the focus ring by introducing a heat transfer gas between the surface of the focus ring and the surface of the mounting stage facing opposite each other.

Abstract: A heat transfer sheet affixing method where a focus ring is pressed by a pressing part to a heat transfer sheet placed on a heat transfer sheet mounting part of a plasma processing apparatus to affix the heat transfer sheet to the focus ring. The method includes reducing a pressure to place the heat transfer sheet in a reduced-pressure atmosphere, heating the heat transfer sheet, and pressing the focus ring by the pressing part to the heat transfer sheet. The reducing, the heating, and the pressing are performed concurrently at least for a predetermined period of time.

Abstract: In a surface processing method for processing a surface of a member made of silicon carbide (SiC) and having a fragmental layer on a surface thereof, the surface of the member having the fragmental layer is modified into a dense layer to reduce the number of particles generated from the surface of the member when the member is applied to a plasma processing apparatus. Here, the SiC of the surface of the member is recrystallized by heating the fragmental layer.

Abstract: A method of reusing a consumable part for use in a plasma processing apparatus includes cleaning a surface of the consumable part made of SiC that has been eroded by a first plasma process performed for a specific period of time. The method further includes depositing SiC on the cleaned surface of the eroded consumable part by CVD. The method also includes remanufacturing a consumable part having a predetermined shape by machining the eroded consumable part on which the SiC is deposited for performing a second plasma process on a substrate by using the remanufactured consumable part.

Abstract: A method of reusing a consumable part for use in a plasma processing apparatus includes cleaning a surface of the consumable part made of SiC that has been eroded by a first plasma process performed for a specific period of time. The method further includes depositing SiC on the cleaned surface of the eroded consumable part by CVD. The method also includes remanufacturing a consumable part having a predetermined shape by machining the eroded consumable part on which the SiC is deposited for performing a second plasma process on a substrate by using the remanufactured consumable part.

Abstract: In a surface processing method for processing a surface of a member made of silicon carbide (SiC) and having a fragmental layer on a surface thereof, the surface of the member having the fragmental layer is modified into a dense layer to reduce the number of particles generated from the surface of the member when the member is applied to a plasma processing apparatus. Here, the SiC of the surface of the member is recrystallized by heating the fragmental layer.

Abstract: A method of reusing a consumable part for use in a plasma processing apparatus includes cleaning a surface of the consumable part made of SiC that has been eroded by a first plasma process performed for a specific period of time. The method further includes depositing SiC on the cleaned surface of the eroded consumable part by CVD. The method also includes remanufacturing a consumable part having a predetermined shape by machining the eroded consumable part on which the SiC is deposited for performing a second plasma process on a substrate by using the remanufactured consumable part.

Abstract: In a method of reusing a consumable part for use in a plasma processing apparatus, a silicon carbide (SiC) lump is formed by depositing SiC by chemical vapor deposition (CVD), and a consumable part for the plasma processing apparatus is manufactured by processing the SiC lump, the consumable part having a predetermined shape. A first plasma process is performed on a substrate by using the manufactured consumable part. A surface of the consumable part that has been eroded by the plasma process is subjected to a clean process for a specific period of time. SiC is deposited on the cleaned surface of the eroded consumable part by CVD. A consumable part having the predetermined shape is remanufactured by processing the eroded consumable part having the surface on which the SiC is deposited. A second plasma process is performed on a substrate by using the remanufactured consumable part.

Abstract: In an image search apparatus, a data manager responds to an instruction for a first search condition issued via a user interface to manage data of a target model acquired from a database and generates an image to be displayed on a user interface. A determination processor responds to an instruction for a second search condition issued by positioning a pointer on the whole model image to compare a closed area defined by the specified position with boundary information of each part image, retrieves candidate part images, and prioritizes the candidate part images in order of increasing area calculated based on the boundary information. A parts selection processor displays the retrieved candidate part images on the user interface according to the order of increasing area in response to an instruction for a third search condition for choosing a target part image from among the candidate part images.

Abstract: In an image processing apparatus, when an output image generator generates an output image in which an individual image of each part of a product model is arranged around a parts assembly image of the entire product model with a specific part highlighted, a boundary information calculator calculates boundary information for each part highlighted. An individual image arrangement calculator obtains a center position of the highlighted part on the parts assembly image based on the boundary information, obtains a straight line dividing the parts assembly image to equally distribute the parts into respective areas, and calculates a position of arrangement of the individual image of each part corresponding to the highlighted part distributed in each of the areas. The output image generated by the output image generator includes a leading line extending from the individual image of each part to the corresponding part on the parts assembly image.

Abstract: An electrode plate for a plasma etching is formed as a disc shape having a predetermined thickness, a plurality of gas holes penetrating a surface of the electrode plate perpendicularly to the surface are provided on different circumferences of a plurality of concentric circles, the electrode plate is divided in a radial direction of the electrode plate into two or more regions, types of gas holes provided in the two or more regions are different from each other by region.

Abstract: An image searching device including a database, a user interface, a search unit, and an output unit. The search unit includes a data management unit configured to manage data on a model to be searched and acquired from the database and create an image to be displayed on a screen of the user interface; a determination unit configured to determine and extract parts each having a boundary included in a closed region as candidate parts; a part selection unit configured to display single images of the candidate parts on the screen of the user interface to enable selection of a target part; and an image switching unit configured to create data on a part emphasis frame and switch the screen displayed on the user interface from the single images of the candidate parts to a full image in which the target part is highlighted with the part emphasis frame.