Abstract: Methods of fabricating dimensional silica-based substrates or structures comprising a porous silicon layers are contemplated. According to one embodiment, oxygen is extracted from the atomic elemental composition of a silica glass substrate by reacting a metallic gas with the substrate in a heated inert atmosphere to form a metal-oxygen complex along a surface of the substrate. The metal-oxygen complex is removed from the surface of the silica glass substrate to yield a crystalline porous silicon surface portion and one or more additional layers are formed over the crystalline porous silicon surface portion of the silica glass substrate to yield a dimensional silica-based substrate or structure comprising the porous silicon layer. Embodiments are also contemplated where the substrate is glass-based, but is not necessarily a silica-based glass substrate. Additional embodiments are disclosed and claimed.

Abstract: Methods of fabricating dimensional silica-based substrates or structures comprising a porous silicon layers are contemplated. According to one embodiment, oxygen is extracted from the atomic elemental composition of a silica glass substrate by reacting a metallic gas with the substrate in a heated inert atmosphere to form a metal-oxygen complex along a surface of the substrate. The metal-oxygen complex is removed from the surface of the silica glass substrate to yield a crystalline porous silicon surface portion and one or more additional layers are formed over the crystalline porous silicon surface portion of the silica glass substrate to yield a dimensional silica-based substrate or structure comprising the porous silicon layer. Embodiments are also contemplated where the substrate is glass-based, but is not necessarily a silica-based glass substrate. Additional embodiments are disclosed and claimed.

Abstract: An ultra-thin polarizing glass article having two polarizing glass layers separated by a non-polarizing central region. The polarizing glass layers contain stretched or elongated metal particles and the non-polarizing central region contains elongated or stretched metal halide particle. The polarizing article has a thickness less than 200 micrometers.

Abstract: The present invention provides an optical element including a silver halide-containing glass material having a concentration of less than 0.001 wt % cerium; and a refractive index pattern formed in the silver halide-containing glass material, the refractive index pattern including regions of high refractive index and regions of low refractive index, the difference between the refractive indices of the high refractive index regions and the low refractive index regions being at least 4×10?5 at a wavelength of 633 nm. The present invention also provides methods for making optical elements from silver halide-containing glass materials.

Abstract: The present invention provides methods of generating short wavelength radiation, methods of transporting short wavelength radiation, and apparati used in these methods. One embodiment of the invention provides a method of transporting short wavelength radiation using a photonic band gap fiber. Another embodiment of the invention provides a method of transporting short wavelength radiation using a bundle of photonic band gap fibers. Another embodiment of the invention provides a method of generating ultraviolet radiation using high harmonic generation by pumping a noble gas-filled photonic band gap fiber with a pulsed laser source.

Abstract: A porous phosphorous glass composition, as calculated in weight percent on an oxide basis, including, for example: about 30-60 SiO2; about 2-25 P2O5; about 0-5 B2O3; about 20-50 Al2O3; about 0.01-20 Na2O; and about 0-20 K2O, the composition having porosity and pore size properties as defined herein. The disclosure also provides a method for making porous phosphorous glass compositions.

Abstract: The present invention provides an alkali alumino-silicate Na—F-containing glass material and a method of making the alkali alumino-silicate Na—F-containing glass material, with the glass material capable of being made photosensitive and thus formed into optical elements at wavelengths ranging between about 240 to 350 nm, and more particularly at the standard 248 nm wavelength of excimer lasers. Also disclosed is optical element wherein a refractive index pattern formed in the alumino-silicate Na—F containing glass material, the refractive index pattern including regions of high refractive index and regions of low refractive index, the difference between the refractive indices of the high refractive index regions and the low refractive index regions being at least 4×10?5 at a wavelength of 633 nm.

Abstract: A lens array and a method for fabricating the lens array are described herein. The lens array is made from a photosensitive glass plate containing a relatively small amount of a photosensitive agent (e.g., silver, gold or combination thereof) such that when the photosensitive glass plate is subjected to an exposure step, a heat treatment step and an optional ion exchange step it becomes a glass composite plate that includes glass regions which are lenses and also includes an opaque opal region located around each of the lenses. The lens array has clear, colorless lenses exhibiting greater sag heights than those yellow lenses found in a traditional lens array made from the traditional photosensitive glass plate which was subjected to similar exposure, heat treatment and ion exchange steps.

Abstract: Polarizing glass articles and methods of manufacturing polarizing glass articles are disclosed. The method involves forming a polarizing layer on the surface of the glass article by ion-exchanging silver or copper into the surface.

Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

Abstract: A birefringent glass composed of a phase-separated glass is provided. The phase-separated glass includes a borosilicate glass in which fluorine and a constituent that tends to crystallize into a high refractive index phase as a consequence of phase separation are included. In one embodiment, the constituent comprises TiO2.

Abstract: The invention relates to methods of writing a light-guiding structure in a bulk glass substrate. The bulk glass substrate is preferably made from a soft silica-based material having an annealing point less than about 1380° K. A pulsed laser beam is focused within the substrate while the focus is translated relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path. Substantially no laser-induced physical damage of the material is incurred along the scan path. Various optical devices can be made using this method.

Abstract: A waveguide structure includes a glass body and a waveguide pattern formed in the glass body by irradiating a predetermined track on the glass body with sufficient energy to grow a crystalline phase along the predetermined track.

Abstract: The invention provides an ultraviolet lithography method/system. The lithography method and system include providing a below 200 nm radiation source, providing a photolytically improved transmitting fused silica glass lithography optical element, transmitting below 200 nm photons through said photolytically improved transmitting fused silica glass lithography optical element to form a lithography pattern which is reduced and projected onto a radiation sensitive lithography printing medium to form a printed lithography pattern. Providing the photolytically improved transmitting fused silica glass lithography optical element includes providing a photolytically improved transmitting fused silica glass lithography optical element preform body and forming the photolytically improved transmitting fused silica glass lithography optical element preform into said lithography optical element.

Abstract: A lens array and a method for fabricating a lens array that is relatively flat and has useful lenses with relatively uniform sag heights are described herein. In one embodiment, the lens array includes a one-dimensional array of useful lens and two sacrificial lens each of which is formed next to an end of a row of the useful lenses. In another embodiment, the lens array includes a two-dimensional array of useful lens and a plurality of perimeter sacrificial lens each of which is formed next to an end of a row or a column of the useful lenses. In yet another embodiment, the lens array includes an array of useful lenses and a glass region (including possibly a glass matrix) located within a opal border and outside a opal region that surrounds the useful lenses.

Abstract: A method for making a polarizing glass article is provided. The method includes first providing a precursor glass containing metal-halide particles. The precursor glass may be encased in a gas-permeable medium. Then, form at least a first polarizing layer and a non-polarizing region in the precursor glass. Bond the polarizing layer to a substrate and removing the non-polarizing region to expose the polarizing layer. Then, separate the first polarizing layer from the substrate to produce an ultra-thin polarizing glass article measuring less than or equal to about 200 ?m in thickness. The method may further comprise cutting the polarizing layer into wafers.

Abstract: Methods and apparatus for depositing a high density biological or chemical array onto a solid support. Specifically, the apparatus is made up of a plurality of open ended channels collectively forming a matrix. The matrix has been redrawn and cut such that the pitch of the channels on the loading end is larger than the pitch of the channels on the liquid delivery end. The upper portion of each channel serves as a reservoir, while the opposing end, which has been formed by the redrawing process, is diametrically sized such that liquid in the reservoir is retained by capillary pressure at the delivery end. At any point along the height of the capillary reservoir device, all cross-sectional dimensions and areas are uniformly reduced. In other words, the on-center orientation of any two channels, also referred to as the pitch between 2 channels, measured as a function of the diameter of any cross section, is constant throughout the structure.

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 300 nm. The photosensitivity of the alkali boro-alumino-silicate bulk glass to UV wavelengths below 300 nm provide for the making of refractive index patterns in the glass. With a radiation source below 300 nm, such a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.

Abstract: The present invention provides methods of generating short wavelength radiation, methods of transporting short wavelength radiation, and apparati used in these methods. One embodiment of the invention provides a method of transporting short wavelength radiation using a photonic band gap fiber. Another embodiment of the invention provides a method of transporting short wavelength radiation using a bundle of photonic band gap fibers. Another embodiment of the invention provides a method of generating ultraviolet radiation using high harmonic generation by pumping a noble gas-filled photonic band gap fiber with a pulsed laser source.

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate and germanosilicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 300 nm. The photosensitivity of the alkali boro-alumino-silicate and germanosilicate bulk glasses to UV wavelengths below 300 nm provide for the making of refractive index patterns in the glass. With a radiation source below 300 nm, such a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.