Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate and germanosilicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 300 nm.

Abstract: The present invention provides photonic devices utilized in optical telecommunications. The photonic devices include photosensitive bulk glass bodies which contain Bragg gratings, particularly with the ultraviolet photosensitive bulk glass bodies directing optical telecommunications wavelength range bands. Preferably the ultraviolet photosensitive bulk glass bodies are batch meltable alkali boro-alumino-silicate bulk glass bodies.

Abstract: The invention provides a method of making optical fiber devices.

Abstract: The invention relates to optical glass having improved initial transmittance, formed by subjecting the glass to a hydrogen and/or deuterium treatment at a temperature, and for a duration of time sufficient to diffuse the hydrogen and/or deuterium into the glass.

Abstract: A method for fabricating an integrated optical isolator includes depositing a wire grid material on a magneto-optical substrate and depositing a resist film on the wire grid material. The method further includes bringing a mold with a wire grid pattern on contact with the resist film and compressing the mold and resist film together so as to emboss the wire grid pattern in the resist film. The method further includes transferring the wire grid pattern in the resist film to the wire grid material on the magneto-optical substrate by etching.

Abstract: A waveguide structure includes a glass body and a waveguide pattern formed in the glass body by irradiating a predetermined track on the glass body with sufficient energy to grow a crystalline phase along the predetermined track.

Abstract: A projection LCD comprising a microfresnel lens array on a panel the microfresnel lens being composed of a photoresist having a linear response and being in a structural pattern of a Fresnel lens, and a method of increasing the amount of light transmitted through the LCD by using such microfresnel lens array.

Abstract: Disclosed is a photonic band-gap crystal waveguide having the physical dimension of the photonic crystal lattice and the size of the defect selected to provide for optimum mode power confinement to the defect. The defect has a boundary which has a characteristic numerical value associated with it. The ratio of this numerical value to the pitch of the photonic crystal is selected to avoid surface modes found to exist in certain configurations of the photonic band-gap crystal waveguide. Embodiments in accord with the invention having circular and hexagonal defect cross sections are disclosed and described. A method of making the photonic band-gap crystal waveguide is also disclosed and described.

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 300 nm. The photosensitivity of the alkali boro-alumino-silicate bulk glass to UV wavelengths below 300 nm provide for the making of refractive index patterns in the glass. With a radiation source below 300 nm, such a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.

Abstract: The invention relates to methods of writing a light-guiding structure in a bulk glass substrate. The bulk glass substrate is preferably made from a soft silica-based material having an annealing point less than about 1380°K. A pulsed laser beam is focused within the substrate while the focus is translated relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path. Substantially no laser-induced physical damage of the material is incurred along the scan path. Various optical devices can be made using this method.

Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

Abstract: Use of ultrashort, focused pulses to alter a detectable optical property in a specific region in a structure allows lower energy to be used in fabrication of a three-dimensional, periodic array of altered regions in a material. These properties may be, for example, an index of refraction, absorption or scattering. The typical spacing between altered regions may be larger than a wavelength of interest, to create diffractive optical elements, or may be roughly the same as a wavelength of interest, to create photonic crystal elements. The photonic crystal may have a photonic band gap, i.e., a frequency range in which no modes may propagate, or may simply have altered dispersion properties but no gap, as in a photonic crystal superprism.

Abstract: An optical member includes a fused silica glass having a concentration of ≡SiH moiety below detection limit as measured by Raman spectroscopy and a concentration of molecular hydrogen of at least 1×1017 molecules/cm3. The fused silica glass exhibits an induced absorption level which quickly attains an initial peak upon exposure to irradiation and rapidly decays to a low value. The induced absorption level after decaying to the low value remains substantially unchanged by further irradiation.

Abstract: Fused silica stepper lens for photolithographic application is disclosed which is resistant to laser-induced damage, specifically, compaction or densification which can lead to an increase in the optical path length of the lens.

Abstract: The invention provides an ultraviolet lithography method/system. The lithography method and system include providing a below 200 nm radiation source, providing a photolytically improved transmitting fused silica glass lithography optical element, transmitting below 200 nm photons through said photolytically improved transmitting fused silica glass lithography optical element to form a lithography pattern which is reduced and projected onto a radiation sensitive lithography printing medium to form a printed lithography pattern. Providing the photolytically improved transmitting fused silica glass lithography optical element includes providing a photolytically improved transmitting fused silica glass lithography optical element preform body and forming the photolytically improved transmitting fused silica glass lithography optical element preform into said lithography optical element.

Abstract: The present invention relates to a device for measuring a current in a magnetic field which includes a glass article wherein the glass may be an oxyfluoride glass or a bismuth oxide glass having a photoelastic coefficient of from about −0.2 to 0.2 at 546 nm. Further, the present invention relates to a method of measuring currents.

Abstract: The invention relates to fused silica having low compaction under high energy irradiation, particularly adaptable for use in photolithography applications.

Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 250 nm.

Abstract: Methods and apparatus for depositing a high density biological or chemical array onto a solid support. Specifically, the apparatus is made up of a plurality of open ended channels collectively forming a matrix. The matrix has been redrawn and cut such that the pitch of the channels on the loading end is larger than the pitch of the channels on the liquid delivery end. The upper portion of each channel serves as a reservoir, while the opposing end, which has been formed by the redrawing process, is diametrically sized such that liquid in the reservoir is retained by capillary pressure at the delivery end. At any point along the height of the capillary reservoir device, all cross-sectional dimensions and areas are uniformly reduced. In other words, the on-center orientation of any two channels, also referred to as the pitch between 2 channels, measured as a function of the diameter of any cross section, is constant throughout the structure.

Abstract: The present invention provides photonic devices utilized in optical telecommunications. The photonic devices include photosensitive bulk glass bodies which contain Bragg gratings, particularly with the ultraviolet photosensitive bulk glass bodies directing optical telecommunications wavelength range bands. Preferably the ultraviolet photosensitive bulk glass bodies are batch meltable alkali boro-alumino-silicate bulk glass bodies.