Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: The present disclosure sets forth a marginal distillation approach to obtaining a unified name-entity recognition (NER) student model from a plurality of pre-trained teacher NER models with different tag sets. Knowledge from the teacher models is distilled into a student model without requiring access to the annotated training data used to train the teacher models. In particular, the system receives a tag hierarchy that combines the different teacher tag sets. The teacher models and the student model are applied to a set of input data sequence to obtain tag predictions for each of the models. A distillation loss is computed between the student and each of the teacher models. If teacher's predictions are less fine-grained than the student's with respect to a node in the tag hierarchy, the student's more fine-grained predictions for the node are marginalized in computing the distillation loss.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: A torque link assembly for a shock strut includes an upper torque link that is selectively retained in a stowed position when uncoupled from a lower torque link. The upper torque link includes first and second coaxial lugs that rotatably couple the upper torque link to an alignment feature. A latch mechanism includes a latch fitting rotatably coupled to either the upper torque link or the alignment feature. The latch mechanism further includes a stop fitting fixedly coupled to the other of the upper torque link and the alignment feature. The latch fitting engages the stop fitting to maintain the upper torque link in the stowed position. At least one of the latch fitting and stop fitting is positioned between the first and second lugs of the upper torque link.

Abstract: A three-dimensional stacking structure is described. The stacking structure includes at least a bottom die, a top die and a spacer protective structure. The bottom die includes contact pads in the non-bonding region. The top die is stacked on the bottom die without covering the contact pads of the bottom die and the bottom die is bonded with the top die through bonding structures there-between. The spacer protective structure is disposed on the bottom die and covers the top die to protect the top die. By forming an anti-bonding layer before stacking the top dies to the bottom dies, the top die can be partially removed to expose the contact pads of the bottom die for further connection.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: A technique for managing a Unified Extensible Firmware Interface (UEFI) Basic Input/Output System (BIOS)-controlled computing device from a separate mobile computing device is discussed.

Abstract: Examples of a multiple-mask multiple-exposure lithographic technique and suitable masks are provided herein. In some examples, a photomask includes a die area and a stitching region disposed adjacent to the die area and along a boundary of the photomask. The stitching region includes a mask feature for forming an integrated circuit feature and an alignment mark for in-chip overlay measurement.

Abstract: An expandable luggage container includes a first compartment; a side cover formed on a side of the first compartment, a first zipping mechanism formed around three sides of the side cover; a second compartment coupled to the first compartment; and a top cover formed on a top side of the second compartment, a second zipping mechanism formed around three sides of the top cover. In the luggage container, a first opening of the first compartment and a second opening of the second compartment are directed to different directions; the second compartment is collapsible by a third zipping mechanism formed between the first compartment and second compartment; and the luggage container is in a compact mode when the second compartment is collapsed and is in an expanded mode when the second compartment is expanded by unzipping of the third zipping mechanism.

Abstract: According to an embodiment of the invention, a pump motor controller for managing energy usage of a pump motor and for receiving signals from a signal sending device corresponding to the status of a climate control device is provided. The motor controller is adapted to receive the signal and to control the pump motor at least partially based on the signal.

Abstract: An expandable luggage container includes a first compartment; a side cover formed on a side of the first compartment, a first zipping mechanism formed around three sides of the side cover; a second compartment coupled to the first compartment; and a top cover formed on a top side of the second compartment, a second zipping mechanism formed around three sides of the top cover. In the luggage container, a first opening of the first compartment and a second opening of the second compartment are directed to different directions; the second compartment is collapsible by a third zipping mechanism formed between the first compartment and second compartment; and the luggage container is in a compact mode when the second compartment is collapsed and is in an expanded mode when the second compartment is expanded by unzipping of the third zipping mechanism.

Abstract: A luggage cover includes a front panel; a back panel; a top panel coupled to the front panel and the back panel; a first side panel coupled to the front panel and the back panel; a second side panel coupled to the front panel and the back panel; a zipping mechanism formed along at least one of the first and second side panels and the top panel; and a plurality of flexible loops, wherein an opening is formed at an opposite side of the top panel to receive a luggage container.

Abstract: A luggage container includes a first compartment and a second compartment detachably coupled to the first compartment, and each of the first compartment and the second compartment includes an outer shell, a pair of wheels, a telescopic pull handle, at least one carrying handle, at least one foot stand, and an inner shell. The inner shell is: sized to cover a first storage space formed by an inner layer covering an inner surface of the outer shell; concealed when the luggage container is closed in a single container configuration in which the first compartment and the second compartment are coupled via a fastener; and exposed in a dual container configuration in which the first compartment and the second compartment are completely detached from each other when the fastener is open, the inner shell serving as another outer shell for the first or second compartment in the dual container configuration.

Abstract: A torque link assembly for a shock strut includes an upper torque link that is selectively retained in a stowed position when uncoupled from a lower torque link. The upper torque link includes first and second coaxial lugs that rotatably couple the upper torque link to an alignment feature. A latch mechanism includes a latch fitting rotatably coupled to either the upper torque link or the alignment feature. The latch mechanism further includes a stop fitting fixedly coupled to the other of the upper torque link and the alignment feature. The latch fitting engages the stop fitting to maintain the upper torque link in the stowed position. At least one of the latch fitting and stop fitting is positioned between the first and second lugs of the upper torque link.