Abstract: A projection lens distortion error map is created using overlay targets and a special numerical algorithm. A reticle including an array of overlay targets is exposed several times onto a photoresist coated silicon wafer using a photolithographic stepper. After exposure, the overlay targets are measured for placement error. The resulting overlay error data is then supplied to a software program that generates a lens distortion error map for the photolithographic projection system.

Abstract: Determining corrections for a mask used in photolithography includes assembling characteristics of a mask design and an as-drawn specification into a virtual reticle. Assembling characteristics of machine subsystem parameters into a virtual wafer. Emulating machine performance on the virtual reticle and virtual wafer and accumulating the results in an updated virtual wafer. Comparing metrics of the updated virtual wafer to the as-drawn specification and if the comparison meets or exceeds a desired threshold, then incorporating mask clips of the virtual reticle into a final mask design, if the comparison does not meet the desired threshold, then calculating mask corrections, updating the virtual reticle, and repeating emulating and comparing.

Abstract: An automatically adjustable locking pliers includes an upper jaw fixed to a handle and lower jaws that pivot about the handle. The lower jaws are connected to a lower tightening handle. A lever connects the tightening handle and upper body. This is the standard structure of locking pliers well known in the industry. The improvement includes a self-adjusting sizing and locking mechanism A thumb jaw sizing lever is located near the jaws and may be moved to open the jaws so that they can be sized around a workpiece. When the thumb jaw lever is released, the jaws automatically size and clamp lightly around the workpiece. The locking mechanism uses metal ball bearings to surround a metal plunger that rests in a tapered metal housing. A spring maintains constant pressure. Locking occurs when the balls wedge between the plunger and the tapered inner walls. A release cylinder is connected to the release paddle to unlock the mechanism.

Abstract: Exit pupil and source telecentricity of a projection imaging tool system is determined. The system contains a light source, an optical imager, a reticle, a substrate, and a positioner. The light source is optically coupled to the optical imager, the optical imager having an exit pupil. The combination of the light source and the optical imager define a projection imaging tool, are characterized by a partial coherence. The reticle has an array of patterns, each pattern having at least a first feature and a second feature. A substrate may be used to record at least a first image and a second image of the features. The positioner is used to dispose the first image and the second image such that the first image has a first defocus and the second image has a second defocus different from the first defocus.

Abstract: Benzimidazolyl-pyridine derivatives, which are useful as SGK-1 inhibitors are described herein. The described invention also includes methods of making such benzimidazolyl-pyridine derivatives as well as methods of using the same in the treatment of diseases mediated by inappropriate SGK-1 activity.

Abstract: A reticle stage grid and yaw in a projection imaging tool is determined by exposing a first portion of a reticle pattern onto a substrate with a recording media thereby producing a first exposure. The first portion of the reticle pattern includes at least two arrays of alignment attribute that have features complementary to each other. The reticle stage is then shifted and a second portion of the reticle pattern is exposed. The first and second exposures overlap and interlock to create completed alignment attributes. Measurements of positional offsets of the completed alignment attributes are used to determine the reticle stage grid and yaw.

Abstract: A method for creating hierarchical classifiers of software components in a learning system, each software component comprising an identifier and a rule for processing an input message, the method comprising the steps of: receiving an input message by a first software component; parsing the input message to identify an input value; seeking a second software component having an identifier matching the identified input value; in the event that the seeking step fails to locate a match, creating a second software component and assigning an identifier to the created second software component, the identifier matching the identified input value.

Abstract: A method and apparatus for front to back substrate registration is described. Alignment characteristics of features on surfaces of substrates can be used to physically align substrates with a multiplicity of integrated alignment optics. Measurement of offsets of the integral alignment optics are used to compute registration data for use in calibration of the substrate global alignment.

Abstract: A method and system for manufacturing laminated cartons, in which webs of carton materials are fed along paths of travel toward a laminating station. A sensor reads printed indicia along a first one of the webs and controls application of adhesive to the second web for attaching the webs to form laminated sheets of carton material.

Abstract: Techniques for determining wafer stage grid and yaw in a projection imaging tool are described. The techniques include exposing an overlay reticle onto a substrate having a recording media, thereby creating a plurality of printed fields on the substrate. The overlay reticle is then positioned such that when the reticle is exposed again completed alignment attributes are created in at least two sites in a first and a second printed field. The substrate is then rotated relative to the reticle by a desired amount. The overlay reticle is then positioned such that when the reticle is again exposed, completed alignment attributes are created in at least two sites in the first and a third printed field. Measurements of the complementary alignment attribute and a dynamic intra-field lens distortion are then used to reconstruct wafer stage grid and yaw error of the projection imaging system.

Abstract: A process for forming cartons in which one or more reinforcing strips are laminated or adhered to a carton material using an extruded foamed adhesive or folded carton. Typically, the foamed adhesive is a water-based emulsion and applied in strips in either a continuous or non-continuous manner onto strips or substrates.

Abstract: Methods and apparatus utilizing a posteriori adjustments to a projection imaging machine used in manufacturing of semiconductor integrated circuits are described. Measurements of degradation in a lithography processing of a projection imaging tool or machine are provided. The operation of the projection imaging tool is adjusted in response to the measurements. The projection imaging machine or tool can be adjusted in a single adjustment, or in a series of sub-adjustments. Likewise, only a single machine may be adjusted, or multiple machines used in the manufacture of semiconductor integrated circuits may be adjusted. The measurements may be made using in-situ metrology tests. A database including historical and current machine states may be utilized in determining degradation of the lithography processing.

Abstract: The present invention is related to oxindole derivatives, compositions containing the same, and methods of use and manufacture of the same. Such compounds generally are useful pharmacologically as agents in those disease states alleviated by the alteration of mitogen activated signaling pathways in general, and in particular in the inhibition or antagonism of protein kinases, which pathologically involve aberrant cellular proliferation. Such disease states include tumor growth, restenosis, atherosclerosis, pain and thrombosis. In particular, the present invention relates to a series of substituted oxindole compounds, which exhibit Trk family protein tyrosine kinase inhibition, and which are useful in cancer therapy and chronic pain indications.

Abstract: The present invention is directed to a polysaccharide-grafted polymer particle containing a lubricant wherein the polysaccharide is preferably a ?-1,4 linked polysaccharide.

Abstract: An in-situ interferometer includes an image modifying optic that produced light ray bundles. The light ray bundles are projected onto a reticle with a plurality of measurement fiducial encoded onto a face of the reticle. The measurement fiducial are exposed onto a sensing plane and their locations measured. Aberrations in the projection system are determined from the measurements of the exposed reticles.

Abstract: A process for the determination of focal plane deviation uniquely due to the lens field curvature associated with a photolithographic projection tool is described. A series of lithographic exposures is performed on a resist coated silicon wafer using a stepper or scanner running in static mode. The lithographic exposures produce an array of focusing fiducials that are displaced relative to each other in a unique way. The resulting measurements are fed into a computer algorithm that calculates the lens field curvature in an absolute sense in the presence of wafer height variation and varying stage performance.

Abstract: Scanning synchronization error in a projection imaging system is controlled by obtaining one or more scanning synchronization error maps comprising a plurality of error components, obtaining one or more focal plane deviation (FPD) error maps comprising a plurality of error components, separating the one or more synchronization error maps and one or more FPD error map error components into one or more repeatable and non-repeatable parts, converting the repeatable parts into one or more mathematical models that express the repeatable parts in mode correctable and uncorrectable terms, inputting lens distortion map data, scanning synchronization error map data, FPD error map data, and the one or more mathematical models into a database linked to a process controller that executes process control algorithms, and correcting scanner motion of the projection imaging system based on output from the process controller.

Abstract: A process for the determination of focal plane deviation uniquely due to the scanning dynamics associated with a photolithographic scanner is described. A series of lithographic exposures is performed on a resist coated silicon wafer using a photolithographic scanner. The lithographic exposures produce an array of focusing fiducials that are displaced relative to each other in a unique way. The resulting measurements are fed into a computer algorithm that calculates the dynamic scanning field curvature in an absolute sense in the presence of wafer height variation and other wafer/reticle stage irregularities. The dynamic scan field curvature can be used to improve lithographic modeling, overlay modeling, and advanced process control techniques related to scanner stage dynamics.

Abstract: A technique for the determination of dynamic lens field curvature uniquely associated with a photolithographic scanner is described. A series of lithographic exposures is performed on a resist coated silicon wafer using a photolithographic scanner. The lithographic exposures produce an array of focusing fiducials that are displaced relative to each other in a unique way. The resulting measurements are fed into a computer algorithm that determines the dynamic lens field curvature (ZDLC) perpendicular to the scanning direction in an absolute sense. Furthermore, the effects of wafer flatness, wafer surface non-uniformity, and stage error are considered. The ZDLC information can be used to improve lithographic modeling, overlay modeling, and advanced process control techniques related to scanner stage dynamics.

Abstract: An in-situ interferometer includes an image modifying optic that produced light ray bundles. The light ray bundles are projected onto a reticle with a plurality of measurement fiducial encoded onto a face of the reticle. The measurement fiducial are exposed onto a sensing plane and their locations measured. Aberrations in the projection system are determined from the measurements of the exposed reticles.