Patents by Inventor Ryu Komatsu

Ryu Komatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11931923
    Abstract: A method of manufacturing a template, has: preparing a substrate containing quartz and having a surface, the surface including a protrusion and a depression; and processing the depression. The processing of the depression includes: a first step of forming a film on the surface, the film including a first region and a second region, the first region being provided on the protrusion, and the second region being provided on a bottom of the depression and being thinner than the first region; a second step of removing the second region with the first region partly remaining to expose the bottom of the depression; and a third step of processing the exposed part of the depression using a mask made of the remainder of the first region.
    Type: Grant
    Filed: December 9, 2020
    Date of Patent: March 19, 2024
    Assignee: Kioxia Corporation
    Inventors: Takeharu Motokawa, Hideaki Sakurai, Noriko Sakurai, Ryu Komatsu
  • Publication number: 20230363233
    Abstract: A display device with improved viewing angle characteristics is provided. A display device with suppressed mixture of colors between adjacent pixels is provided. The display device includes a first coloring layer, a second coloring layer, and a structure body therebetween. The structure body has a portion closer to a display surface side than a bottom surface of the first coloring layer or a bottom surface of the second coloring layer.
    Type: Application
    Filed: June 20, 2023
    Publication date: November 9, 2023
    Inventors: Tomoya AOYAMA, Ryu KOMATSU, Daiki NAKAMURA
  • Patent number: 11789365
    Abstract: A method for processing a substrate includes forming a pattern on a substrate, supplying water to cover the pattern, and after the supplying the water, irradiating the pattern with light having a wavelength longer that which causes dissociation of water. A substrate processing apparatus of an embodiment includes a transfer chamber to receive a patterned substrate, a water supplying chamber to cover the pattern with water, and an irradiating chamber to irradiate a portion of the pattern with near-field light.
    Type: Grant
    Filed: February 28, 2020
    Date of Patent: October 17, 2023
    Assignee: Kioxia Corporation
    Inventors: Ryu Komatsu, Takeharu Motokawa, Noriko Sakurai, Hideaki Sakurai
  • Patent number: 11493846
    Abstract: According to one embodiment, a pattern forming method includes forming a resist film including a first core material pattern and a second core material pattern, on a first film laminated on a substrate; forming a second film at least on sidewalls of the first and second core material patterns; removing the first core material pattern while not removing the second core material pattern and the second film; and processing the first film by using, as a mask, the second core material pattern and the second film.
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: November 8, 2022
    Assignee: Kioxia Corporation
    Inventors: Takeharu Motokawa, Noriko Sakurai, Ryu Komatsu, Hideaki Sakurai
  • Publication number: 20220206382
    Abstract: According to one embodiment, a pattern formation method includes patterning a first film on a substate to have a plurality of lines extending in a first direction and a second pattern portion extending in a second direction intersecting the first direction. Each line having at least a first width and being spaced from an adjacent line in the second direction by a least three times the first width and spaced from ends of the lines in the first direction by twice or less the first width. A conformal film is then formed on the patterned first film. The conformal film having a thickness equal to the first width. The patterned first film is then removed while leaving portions of the conformal film that were previously on sidewalls of the plurality of lines behind.
    Type: Application
    Filed: August 31, 2021
    Publication date: June 30, 2022
    Inventors: Noriko SAKURAI, Takeharu MOTOKAWA, Ryu KOMATSU, Hideaki SAKURAI
  • Patent number: 11133420
    Abstract: A semiconductor device with high on-state current is provided.
    Type: Grant
    Filed: December 19, 2018
    Date of Patent: September 28, 2021
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Yuta Iida, Ryota Hodo, Kentaro Sugaya, Ryu Komatsu, Toshiya Endo, Shunpei Yamazaki
  • Publication number: 20210291408
    Abstract: A method of manufacturing a template, has: preparing a substrate containing quartz and having a surface, the surface including a protrusion and a depression; and processing the depression. The processing of the depression includes: a first step of forming a film on the surface, the film including a first region and a second region, the first region being provided on the protrusion, and the second region being provided on a bottom of the depression and being thinner than the first region; a second step of removing the second region with the first region partly remaining to expose the bottom of the depression; and a third step of processing the exposed part of the depression using a mask made of the remainder of the first region.
    Type: Application
    Filed: December 9, 2020
    Publication date: September 23, 2021
    Applicant: Kioxia Corporation
    Inventors: Takeharu MOTOKAWA, Hideaki SAKURAI, Noriko SAKURAI, Ryu KOMATSU
  • Publication number: 20210238739
    Abstract: According to one embodiment, a processing apparatus includes a chamber, a first gas introduction port that introduces a first gas into the chamber, a first gas discharge port that discharges the first gas from the chamber, and a stage that supports a processing object in the chamber. The processing apparatus has a plasma generating section with an electrode to generate a plasma in the chamber. The processing apparatus includes a shield at a first position that is between the plasma generating section and the stage. The shield is light transmissive, but blocks radicals and ions generated with plasma. In some examples, the shield may be moveable from the first position to another position that is not between the plasma generating section and the stage.
    Type: Application
    Filed: September 1, 2020
    Publication date: August 5, 2021
    Inventors: Ryu KOMATSU, Takeharu MOTOKAWA, Noriko SAKURAI, Hideaki SAKURAI
  • Patent number: 11018201
    Abstract: A display device with improved viewing angle characteristics is provided. A display device with suppressed mixture of colors between adjacent pixels is provided. The display device includes a first coloring layer, a second coloring layer, and a structure body therebetween. The structure body has a portion closer to a display surface side than a bottom surface of the first coloring layer or a bottom surface of the second coloring layer.
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: May 25, 2021
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Tomoya Aoyama, Ryu Komatsu, Daiki Nakamura
  • Publication number: 20210088906
    Abstract: According to one embodiment, a pattern forming method includes forming a resist film including a first core material pattern and a second core material pattern, on a first film laminated on a substrate; forming a second film at least on sidewalls of the first and second core material patterns; removing the first core material pattern while not removing the second core material pattern and the second film; and processing the first film by using, as a mask, the second core material pattern and the second film.
    Type: Application
    Filed: March 13, 2020
    Publication date: March 25, 2021
    Applicant: Kioxia Corporation
    Inventors: Takeharu MOTOKAWA, Noriko SAKURAI, Ryu KOMATSU, Hideaki SAKURAI
  • Publication number: 20210080831
    Abstract: A method for processing a substrate includes forming a pattern on a substrate, supplying water to cover the pattern, and after the supplying the water, irradiating the pattern with light having a wavelength longer that which causes dissociation of water. A substrate processing apparatus of an embodiment includes a transfer chamber to receive a patterned substrate, a water supplying chamber to cover the pattern with water, and an irradiating chamber to irradiate a portion of the pattern with near-field light.
    Type: Application
    Filed: February 28, 2020
    Publication date: March 18, 2021
    Inventors: Ryu KOMATSU, Takeharu MOTOKAWA, Noriko SAKURAI, Hideaki SAKURAI
  • Publication number: 20200335630
    Abstract: A semiconductor device with high on-state current is provided.
    Type: Application
    Filed: December 19, 2018
    Publication date: October 22, 2020
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Yuta IIDA, Ryota HODO, Kentaro SUGAYA, Ryu KOMATSU, Toshiya ENDO, Shunpei YAMAZAKI
  • Patent number: 10510992
    Abstract: A method for exposing an electrode terminal covered with an organic film in a light-emitting device without damaging the electrode terminal is provided. In a region of the electrode terminal to which electric power from an external power supply or an external signal is input, an island-shaped organic compound-containing layer is formed and the organic film is formed thereover. The organic film is removed by utilizing low adhesion of an interface between the organic compound-containing layer and the electrode terminal, whereby the electrode terminal can be exposed without damage to the electrode terminal.
    Type: Grant
    Filed: March 15, 2018
    Date of Patent: December 17, 2019
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Akihiro Chida, Kaoru Hatano, Tomoya Aoyama, Ryu Komatsu, Masatoshi Kataniwa
  • Publication number: 20190333969
    Abstract: A display device with improved viewing angle characteristics is provided. A display device with suppressed mixture of colors between adjacent pixels is provided. The display device includes a first coloring layer, a second coloring layer, and a structure body therebetween. The structure body has a portion closer to a display surface side than a bottom surface of the first coloring layer or a bottom surface of the second coloring layer.
    Type: Application
    Filed: July 11, 2019
    Publication date: October 31, 2019
    Inventors: Tomoya AOYAMA, Ryu KOMATSU, Daiki NAKAMURA
  • Patent number: 10379634
    Abstract: An information processing apparatus includes: a touchpad module; a cover including a touch operation portion configured to cover a face of the touchpad module and a button opening formed along a horizontal side portion of the touch operation portion; an operation button arranged in the button opening; and a base member, arranged on an opposite side of the cover with respect to the touchpad module and the operation button, configured to support the touchpad module and the operation button, an end portion of the base member on the touchpad module side being arranged closer to the operation button than a central portion in a vertical side direction of the touchpad module when viewed from a thickness direction of the touchpad module.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: August 13, 2019
    Assignee: Fujitsu Client Computing Limited
    Inventors: Ryu Komatsu, Takashi Abe
  • Patent number: 10374018
    Abstract: A display device with improved viewing angle characteristics is provided. A display device with suppressed mixture of colors between adjacent pixels is provided. The display device includes a first coloring layer, a second coloring layer, and a structure body therebetween. The structure body has a portion closer to a display surface side than a bottom surface of the first coloring layer or a bottom surface of the second coloring layer.
    Type: Grant
    Filed: August 25, 2016
    Date of Patent: August 6, 2019
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Tomoya Aoyama, Ryu Komatsu, Daiki Nakamura
  • Patent number: 10263221
    Abstract: A method for exposing an electrode terminal covered with an organic film in a light-emitting device without damaging the electrode terminal is provided. In a region of the electrode terminal to which electric power from an external power supply or an external signal is input, an island-shaped organic compound-containing layer is formed and the organic film is formed thereover. The organic film is removed by utilizing low adhesion of an interface between the organic compound-containing layer and the electrode terminal, whereby the electrode terminal can be exposed without damage to the electrode terminal.
    Type: Grant
    Filed: March 15, 2018
    Date of Patent: April 16, 2019
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Akihiro Chida, Kaoru Hatano, Tomoya Aoyama, Ryu Komatsu, Masatoshi Kataniwa
  • Patent number: 10170662
    Abstract: A method for manufacturing a circuit board includes a first process, a second process, a third process, and a fourth process. The first process includes a step of providing a circuit and an electrode over a first surface of a first substrate. The second process includes a step of providing a reflective layer on the first surface side of the first substrate or a second surface side of a second substrate. The third process includes a step of attaching the first surface and the second surface to each other with a bonding layer therebetween to face each other so that the reflective layer overlaps with the electrode and the reflective layer surrounds part of the electrode. The fourth process includes a step of irradiating at least part of the reflective layer with laser light from a side opposite to the electrode.
    Type: Grant
    Filed: July 16, 2015
    Date of Patent: January 1, 2019
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Tomoya Aoyama, Ryu Komatsu, Takayuki Ohide
  • Patent number: 10164219
    Abstract: To improve the yield in a peeling process and improve the yield in a manufacturing process of a flexible light-emitting device or the like, a peeling method includes a first step of forming a peeling layer over a first substrate, a second step of forming a layer to be peeled including a first layer in contact with the peeling layer over the peeling layer, a third step of curing a bonding layer in an overlapping manner with the peeling layer and the layer to be peeled, a fourth step of removing part of the first layer overlapping with the peeled layer and the bonding layer to form a peeling starting point, and a fifth step of separating the peeling layer and the layer to be peeled. The peeling starting point is preferably formed by laser light irradiation.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: December 25, 2018
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Tomoya Aoyama, Akihiro Chida, Ryu Komatsu
  • Publication number: 20180205042
    Abstract: A method for exposing an electrode terminal covered with an organic film in a light-emitting device without damaging the electrode terminal is provided. In a region of the electrode terminal to which electric power from an external power supply or an external signal is input, an island-shaped organic compound-containing layer is formed and the organic film is formed thereover. The organic film is removed by utilizing low adhesion of an interface between the organic compound-containing layer and the electrode terminal, whereby the electrode terminal can be exposed without damage to the electrode terminal.
    Type: Application
    Filed: March 15, 2018
    Publication date: July 19, 2018
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Akihiro Chida, Kaoru HATANO, Tomoya AOYAMA, Ryu KOMATSU, Masatoshi KATANIWA