Patents by Inventor Ryu Komatsu
Ryu Komatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11931923Abstract: A method of manufacturing a template, has: preparing a substrate containing quartz and having a surface, the surface including a protrusion and a depression; and processing the depression. The processing of the depression includes: a first step of forming a film on the surface, the film including a first region and a second region, the first region being provided on the protrusion, and the second region being provided on a bottom of the depression and being thinner than the first region; a second step of removing the second region with the first region partly remaining to expose the bottom of the depression; and a third step of processing the exposed part of the depression using a mask made of the remainder of the first region.Type: GrantFiled: December 9, 2020Date of Patent: March 19, 2024Assignee: Kioxia CorporationInventors: Takeharu Motokawa, Hideaki Sakurai, Noriko Sakurai, Ryu Komatsu
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Publication number: 20230363233Abstract: A display device with improved viewing angle characteristics is provided. A display device with suppressed mixture of colors between adjacent pixels is provided. The display device includes a first coloring layer, a second coloring layer, and a structure body therebetween. The structure body has a portion closer to a display surface side than a bottom surface of the first coloring layer or a bottom surface of the second coloring layer.Type: ApplicationFiled: June 20, 2023Publication date: November 9, 2023Inventors: Tomoya AOYAMA, Ryu KOMATSU, Daiki NAKAMURA
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Patent number: 11789365Abstract: A method for processing a substrate includes forming a pattern on a substrate, supplying water to cover the pattern, and after the supplying the water, irradiating the pattern with light having a wavelength longer that which causes dissociation of water. A substrate processing apparatus of an embodiment includes a transfer chamber to receive a patterned substrate, a water supplying chamber to cover the pattern with water, and an irradiating chamber to irradiate a portion of the pattern with near-field light.Type: GrantFiled: February 28, 2020Date of Patent: October 17, 2023Assignee: Kioxia CorporationInventors: Ryu Komatsu, Takeharu Motokawa, Noriko Sakurai, Hideaki Sakurai
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Patent number: 11493846Abstract: According to one embodiment, a pattern forming method includes forming a resist film including a first core material pattern and a second core material pattern, on a first film laminated on a substrate; forming a second film at least on sidewalls of the first and second core material patterns; removing the first core material pattern while not removing the second core material pattern and the second film; and processing the first film by using, as a mask, the second core material pattern and the second film.Type: GrantFiled: March 13, 2020Date of Patent: November 8, 2022Assignee: Kioxia CorporationInventors: Takeharu Motokawa, Noriko Sakurai, Ryu Komatsu, Hideaki Sakurai
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Publication number: 20220206382Abstract: According to one embodiment, a pattern formation method includes patterning a first film on a substate to have a plurality of lines extending in a first direction and a second pattern portion extending in a second direction intersecting the first direction. Each line having at least a first width and being spaced from an adjacent line in the second direction by a least three times the first width and spaced from ends of the lines in the first direction by twice or less the first width. A conformal film is then formed on the patterned first film. The conformal film having a thickness equal to the first width. The patterned first film is then removed while leaving portions of the conformal film that were previously on sidewalls of the plurality of lines behind.Type: ApplicationFiled: August 31, 2021Publication date: June 30, 2022Inventors: Noriko SAKURAI, Takeharu MOTOKAWA, Ryu KOMATSU, Hideaki SAKURAI
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Patent number: 11133420Abstract: A semiconductor device with high on-state current is provided.Type: GrantFiled: December 19, 2018Date of Patent: September 28, 2021Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Yuta Iida, Ryota Hodo, Kentaro Sugaya, Ryu Komatsu, Toshiya Endo, Shunpei Yamazaki
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Publication number: 20210291408Abstract: A method of manufacturing a template, has: preparing a substrate containing quartz and having a surface, the surface including a protrusion and a depression; and processing the depression. The processing of the depression includes: a first step of forming a film on the surface, the film including a first region and a second region, the first region being provided on the protrusion, and the second region being provided on a bottom of the depression and being thinner than the first region; a second step of removing the second region with the first region partly remaining to expose the bottom of the depression; and a third step of processing the exposed part of the depression using a mask made of the remainder of the first region.Type: ApplicationFiled: December 9, 2020Publication date: September 23, 2021Applicant: Kioxia CorporationInventors: Takeharu MOTOKAWA, Hideaki SAKURAI, Noriko SAKURAI, Ryu KOMATSU
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Publication number: 20210238739Abstract: According to one embodiment, a processing apparatus includes a chamber, a first gas introduction port that introduces a first gas into the chamber, a first gas discharge port that discharges the first gas from the chamber, and a stage that supports a processing object in the chamber. The processing apparatus has a plasma generating section with an electrode to generate a plasma in the chamber. The processing apparatus includes a shield at a first position that is between the plasma generating section and the stage. The shield is light transmissive, but blocks radicals and ions generated with plasma. In some examples, the shield may be moveable from the first position to another position that is not between the plasma generating section and the stage.Type: ApplicationFiled: September 1, 2020Publication date: August 5, 2021Inventors: Ryu KOMATSU, Takeharu MOTOKAWA, Noriko SAKURAI, Hideaki SAKURAI
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Patent number: 11018201Abstract: A display device with improved viewing angle characteristics is provided. A display device with suppressed mixture of colors between adjacent pixels is provided. The display device includes a first coloring layer, a second coloring layer, and a structure body therebetween. The structure body has a portion closer to a display surface side than a bottom surface of the first coloring layer or a bottom surface of the second coloring layer.Type: GrantFiled: July 11, 2019Date of Patent: May 25, 2021Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Tomoya Aoyama, Ryu Komatsu, Daiki Nakamura
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Publication number: 20210088906Abstract: According to one embodiment, a pattern forming method includes forming a resist film including a first core material pattern and a second core material pattern, on a first film laminated on a substrate; forming a second film at least on sidewalls of the first and second core material patterns; removing the first core material pattern while not removing the second core material pattern and the second film; and processing the first film by using, as a mask, the second core material pattern and the second film.Type: ApplicationFiled: March 13, 2020Publication date: March 25, 2021Applicant: Kioxia CorporationInventors: Takeharu MOTOKAWA, Noriko SAKURAI, Ryu KOMATSU, Hideaki SAKURAI
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Publication number: 20210080831Abstract: A method for processing a substrate includes forming a pattern on a substrate, supplying water to cover the pattern, and after the supplying the water, irradiating the pattern with light having a wavelength longer that which causes dissociation of water. A substrate processing apparatus of an embodiment includes a transfer chamber to receive a patterned substrate, a water supplying chamber to cover the pattern with water, and an irradiating chamber to irradiate a portion of the pattern with near-field light.Type: ApplicationFiled: February 28, 2020Publication date: March 18, 2021Inventors: Ryu KOMATSU, Takeharu MOTOKAWA, Noriko SAKURAI, Hideaki SAKURAI
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Publication number: 20200335630Abstract: A semiconductor device with high on-state current is provided.Type: ApplicationFiled: December 19, 2018Publication date: October 22, 2020Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.Inventors: Yuta IIDA, Ryota HODO, Kentaro SUGAYA, Ryu KOMATSU, Toshiya ENDO, Shunpei YAMAZAKI
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Patent number: 10510992Abstract: A method for exposing an electrode terminal covered with an organic film in a light-emitting device without damaging the electrode terminal is provided. In a region of the electrode terminal to which electric power from an external power supply or an external signal is input, an island-shaped organic compound-containing layer is formed and the organic film is formed thereover. The organic film is removed by utilizing low adhesion of an interface between the organic compound-containing layer and the electrode terminal, whereby the electrode terminal can be exposed without damage to the electrode terminal.Type: GrantFiled: March 15, 2018Date of Patent: December 17, 2019Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Akihiro Chida, Kaoru Hatano, Tomoya Aoyama, Ryu Komatsu, Masatoshi Kataniwa
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Publication number: 20190333969Abstract: A display device with improved viewing angle characteristics is provided. A display device with suppressed mixture of colors between adjacent pixels is provided. The display device includes a first coloring layer, a second coloring layer, and a structure body therebetween. The structure body has a portion closer to a display surface side than a bottom surface of the first coloring layer or a bottom surface of the second coloring layer.Type: ApplicationFiled: July 11, 2019Publication date: October 31, 2019Inventors: Tomoya AOYAMA, Ryu KOMATSU, Daiki NAKAMURA
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Patent number: 10379634Abstract: An information processing apparatus includes: a touchpad module; a cover including a touch operation portion configured to cover a face of the touchpad module and a button opening formed along a horizontal side portion of the touch operation portion; an operation button arranged in the button opening; and a base member, arranged on an opposite side of the cover with respect to the touchpad module and the operation button, configured to support the touchpad module and the operation button, an end portion of the base member on the touchpad module side being arranged closer to the operation button than a central portion in a vertical side direction of the touchpad module when viewed from a thickness direction of the touchpad module.Type: GrantFiled: August 12, 2016Date of Patent: August 13, 2019Assignee: Fujitsu Client Computing LimitedInventors: Ryu Komatsu, Takashi Abe
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Patent number: 10374018Abstract: A display device with improved viewing angle characteristics is provided. A display device with suppressed mixture of colors between adjacent pixels is provided. The display device includes a first coloring layer, a second coloring layer, and a structure body therebetween. The structure body has a portion closer to a display surface side than a bottom surface of the first coloring layer or a bottom surface of the second coloring layer.Type: GrantFiled: August 25, 2016Date of Patent: August 6, 2019Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Tomoya Aoyama, Ryu Komatsu, Daiki Nakamura
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Patent number: 10263221Abstract: A method for exposing an electrode terminal covered with an organic film in a light-emitting device without damaging the electrode terminal is provided. In a region of the electrode terminal to which electric power from an external power supply or an external signal is input, an island-shaped organic compound-containing layer is formed and the organic film is formed thereover. The organic film is removed by utilizing low adhesion of an interface between the organic compound-containing layer and the electrode terminal, whereby the electrode terminal can be exposed without damage to the electrode terminal.Type: GrantFiled: March 15, 2018Date of Patent: April 16, 2019Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Akihiro Chida, Kaoru Hatano, Tomoya Aoyama, Ryu Komatsu, Masatoshi Kataniwa
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Patent number: 10170662Abstract: A method for manufacturing a circuit board includes a first process, a second process, a third process, and a fourth process. The first process includes a step of providing a circuit and an electrode over a first surface of a first substrate. The second process includes a step of providing a reflective layer on the first surface side of the first substrate or a second surface side of a second substrate. The third process includes a step of attaching the first surface and the second surface to each other with a bonding layer therebetween to face each other so that the reflective layer overlaps with the electrode and the reflective layer surrounds part of the electrode. The fourth process includes a step of irradiating at least part of the reflective layer with laser light from a side opposite to the electrode.Type: GrantFiled: July 16, 2015Date of Patent: January 1, 2019Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Tomoya Aoyama, Ryu Komatsu, Takayuki Ohide
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Patent number: 10164219Abstract: To improve the yield in a peeling process and improve the yield in a manufacturing process of a flexible light-emitting device or the like, a peeling method includes a first step of forming a peeling layer over a first substrate, a second step of forming a layer to be peeled including a first layer in contact with the peeling layer over the peeling layer, a third step of curing a bonding layer in an overlapping manner with the peeling layer and the layer to be peeled, a fourth step of removing part of the first layer overlapping with the peeled layer and the bonding layer to form a peeling starting point, and a fifth step of separating the peeling layer and the layer to be peeled. The peeling starting point is preferably formed by laser light irradiation.Type: GrantFiled: August 8, 2017Date of Patent: December 25, 2018Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Tomoya Aoyama, Akihiro Chida, Ryu Komatsu
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Publication number: 20180205042Abstract: A method for exposing an electrode terminal covered with an organic film in a light-emitting device without damaging the electrode terminal is provided. In a region of the electrode terminal to which electric power from an external power supply or an external signal is input, an island-shaped organic compound-containing layer is formed and the organic film is formed thereover. The organic film is removed by utilizing low adhesion of an interface between the organic compound-containing layer and the electrode terminal, whereby the electrode terminal can be exposed without damage to the electrode terminal.Type: ApplicationFiled: March 15, 2018Publication date: July 19, 2018Applicant: Semiconductor Energy Laboratory Co., Ltd.Inventors: Akihiro Chida, Kaoru HATANO, Tomoya AOYAMA, Ryu KOMATSU, Masatoshi KATANIWA