Patents by Inventor Seung-nam Cha

Seung-nam Cha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040027052
    Abstract: A field emission device (FED) and a method for fabricating the FED are provided. The FED includes micro-tips with nano-sized surface features, and a focus gate electrode over a gate electrode, wherein one or more gates of the gate electrode is exposed through a single opening of the focus gate electrode. In the FED, occurrence of arcing is suppressed. Although an arcing occurs in the FED, damage of a cathode and a resistor layer is prevented, so that a higher working voltage can be applied to the anode. Also, due to the micro-tips with nano-sized surface features, the emission current density of the FED increases, so that a high-brightness display can be achieved with the FED. The gate turn-on voltage can be lowered due to the micro-tip as a collection of nano-sized tips, thereby reducing power consumption.
    Type: Application
    Filed: August 7, 2003
    Publication date: February 12, 2004
    Applicant: Samsung SDI Co., Ltd.
    Inventors: Jun-hee Choi, Seung-nam Cha, Hang-woo Lee
  • Patent number: 6632114
    Abstract: A field emission device (FED) and a method for fabricating the FED are provided. The FED includes micro-tips with nano-sized surface features, and a focus gate electrode over a gate electrode, wherein one or more gates of the gate electrode is exposed through a single opening of the focus gate electrode. In the FED, occurrence of arcing is suppressed. Although an arcing occurs in the FED, damage of a cathode and a resistor layer is prevented, so that a higher working voltage can be applied to the anode. Also, due to the micro-tips with nano-sized surface features, the emission current density of the FED increases, so that a high-brightness display can be achieved with the FED. The gate turn-on voltage can be lowered due to the micro-tip as a collection of nano-sized tips, thereby reducing power consumption.
    Type: Grant
    Filed: January 5, 2001
    Date of Patent: October 14, 2003
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jun-hee Choi, Seung-nam Cha, Hang-woo Lee
  • Publication number: 20020187709
    Abstract: A forming method of spacers in a flat panel display is provided. The method includes the steps of preparing a plurality of spacers in a predetermined shape, preparing a substrate on which the spacers are to be attached in the flat panel display, applying a photosensitive adhesive material on an upper surface of the substrate to a predetermined thickness, aligning the spacers on the substrate to attach the spacers by using the photosensitive adhesive material, radiating light onto the substrate from above the substrate to expose portions of the photosensitive adhesive material without the spacers, and removing the exposed portions of the photosensitive adhesive material. Therefore, the spacers are fixed on the substrate by the photosensitive adhesive material located under the spacers. According to the provided method of forming spacers, the spacers are fixed on the substrate by a mounting process using a jig, a temporary exposing process, and a developing process.
    Type: Application
    Filed: June 11, 2002
    Publication date: December 12, 2002
    Applicant: Samsung SDI Co., Ltd.
    Inventors: Kyung-Won Min, Seung-Nam Cha
  • Patent number: 6468916
    Abstract: A method of forming a micro structure having nano-sized surface features is provided. The method includes the steps of forming a micro structure having predetermined size and shape on a substrate, coating a carbon polymer layer on the substrate including the micro structure to a predetermined thickness, performing a first etch on the carbon polymer layer by means of plasma etching using a reactive gas in which O2 gas for etching the carbon polymer layer and a gas for etching the micro structure are mixed and forming a mask layer by the residual carbon polymer layer on the surface of the micro structure, and performing a second etch by means of plasma etching using the mixed reactive gas to remove the mask layer and etch the surface of the micro structure not covered by the mask layer so that the micro structure has nano-sized surface features.
    Type: Grant
    Filed: January 5, 2001
    Date of Patent: October 22, 2002
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jun-hee Choi, Seung-nam Cha, Hang-woo Lee
  • Patent number: 6317170
    Abstract: A video image projection apparatus is disclosed. The apparatus uses a laser as a light source and modulates the light beam using a modulator according to an image signal. The apparatus projects the modulated light to a screen using a light scanning system. The laser display system includes three primary color laser light sources, an optical system needed for three-color light combining/separation, a light modulator loading the image signal into the three-color laser, and a driving circuit driving the system by processing the video signal electronically. A hybrid video laser color mixer has a structure that combines very small-sized hybrid light beam combining/separation optical elements and a 3-channel light modulator. It allows the size of the image projection apparatus to be about 6 by 5 by 3 centimeters. Additionally, the light alignment of the elements is close to self-alignment.
    Type: Grant
    Filed: June 30, 1998
    Date of Patent: November 13, 2001
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young Mo Hwang, Seung Nam Cha, Jin Ho Lee
  • Publication number: 20010006851
    Abstract: A method of forming a micro structure having nano-sized surface features is provided. The method includes the steps of forming a micro structure having predetermined size and shape on a substrate, coating a carbon polymer layer on the substrate including the micro structure to a predetermined thickness, performing a first etch on the carbon polymer layer by means of plasma etching using a reactive gas in which O2 gas for etching the carbon polymer layer and a gas for etching the micro structure are mixed and forming a mask layer by the residual carbon polymer layer on the surface of the micro structure, and performing a second etch by means of plasma etching using the mixed reactive gas to remove the mask layer and etch the surface of the micro structure not covered by the mask layer so that the micro structure has nano-sized surface features.
    Type: Application
    Filed: January 5, 2001
    Publication date: July 5, 2001
    Inventors: Jun-hee Choi, Seung-nam Cha, Hang-woo Lee
  • Publication number: 20010006325
    Abstract: A field emission device (FED) and a method for fabricating the FED are provided. The FED includes micro-tips with nano-sized surface features, and a focus gate electrode over a gate electrode, wherein one or more gates of the gate electrode is exposed through a single opening of the focus gate electrode. In the FED, occurrence of arcing is suppressed. Although an arcing occurs in the FED, damage of a cathode and a resistor layer is prevented, so that a higher working voltage can be applied to the anode. Also, due to the micro-tips with nano-sized surface features, the emission current density of the FED increases, so that a high-brightness display can be achieved with the FED. The gate turn-on voltage can be lowered due to the micro-tip as a collection of nano-sized tips, thereby reducing power consumption.
    Type: Application
    Filed: January 5, 2001
    Publication date: July 5, 2001
    Inventors: Jun-hee Choi, Seung-nam Cha, Hang-woo Lee
  • Publication number: 20010006321
    Abstract: A field emission device (FED) and a method for fabricating the FED are provided. The FED includes micro-tips with nano-sized surface features. Due to the micro-tips as a collection of a large number of nano-tips, the FED is operable at low gate turn-on voltages with high emission current densities, thereby lowering power consumption.
    Type: Application
    Filed: January 5, 2001
    Publication date: July 5, 2001
    Inventors: Jun-hee Choi, Seung-nam Cha, Hang-woo Lee
  • Patent number: 6088150
    Abstract: A 3-channel modulation system for a high power laser and a modulation method for a high power laser are disclosed herein. In a preferred implementation, the modulation system includes a laser light source, a light modulator modulating the light generated from the laser light source and including a pair of electrodes having a predetermined area disposed on one side of the light modulator, an image signal generating sub-system, a drive circuit sub-system for operating the electrodes so that the image signal being generated from the image signal generating sub-system is provided through the electrodes to the light modulator, a first cylindrical lens positioned between the laser light source and the light modulator so that the area and form of the light generated from the laser light source are modified and the modified light enters the light modulator, and a second cylindrical lens positioned at an output side of the light modulator to modify the area and form of the light modulated by the light modulator.
    Type: Grant
    Filed: April 15, 1998
    Date of Patent: July 11, 2000
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yong Hoon Kim, Seung Nam Cha, Hang Woo Lee