Abstract: The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.

Abstract: The thickness of an antiferromagnetic layer (IrMn) and the thickness of a nonmagnetic interlayer (Cu) are adjusted so as to be within the area surrounded by boundaries a to f on the graph of FIG. 6 in which the horizontal axis represents the IrMn film thickness and the vertical axis represents the Cu film thickness. Consequently, the interlayer coupling magnetic field Hin can be made to be 10 Oe or more, and the variation in the interlayer coupling magnetic field Hin can be made to be 2 Oe or less. In addition, in the area surrounded by boundaries a to f, at any IrMn film thickness, the Cu film thickness range in which the variation can be made to be 2 Oe or less can be set over a wide range, as compared with a known structure.

Abstract: An image correction method having a small number of setting parameters achieved by integrating shift (alignment) in unit of a sub-pixel and image correction. A relationship between an inspection reference pattern image and a pattern image under test is identified, a mathematical expression model which fits a pixel error, expansion and contraction/distortion noise, and sensing noise of the image is constructed, and the model is simulated to generate an estimation model image.

Abstract: A magnetic detecting device includes a first and a second magnetoresistive element, and a first and a second fixed resistor connected in series to the first and the second magnetoresistive element, respectively. The first and the second magnetoresistive element each include a pinned magnetic layer and a free magnetic layer with a nonmagnetic conductive layer in between. The first and the second magnetoresistive element have the same layer structure except that the nonmagnetic conductive layers have different thicknesses. The thicknesses of the nonmagnetic conductive layers are set so that a positive interlayer coupling magnetic field acts between the free magnetic layer and the pinned magnetic layer of the first magnetoresistive element and a negative interlayer coupling magnetic field acts between the free magnetic layer and the pinned magnetic layer of the second magnetoresistive element. The first and the second fixed resistor have the same layer structure.

Abstract: An image correction device for use in a pattern inspection apparatus is disclosed, which has automatic adaptability to variations in density of a pattern image of a workpiece being tested. The device is operable to identify a two-dimensional (2D) linear predictive model from the pattern image of interest and determine the amount of eccentricity of a centroid position of this model. This amount is then used to switch between a corrected pattern image due to the 2D linear prediction modeling and a corrected image that is interpolated by bicubic interpolation techniques. A pattern inspection method using the image correction technique is also disclosed.

Abstract: The present invention relates to a stimuli-responsive composition that comprises a polymer, a solvent and a substance having a predetermined function. One embodiment of the present invention is a composition comprising a block polymer, a solvent and a substance having a predetermined function. The present invention also relates to an ink composition containing the composition, an image-forming method and an image-forming apparatus using the composition, and a recording medium applying the composition. Further, the present invention relates to an ABC type block polymer compound wherein the polymer is an ABC type triblock polymer, and wherein at least one of the blocks in the triblock polymer changes in nature from solvophilic to solvophobic or from solvophobic to solvophilic in response to stimuli, and more preferably, the A component, then the B component, and finally the C component respond to the stimuli.

Abstract: The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.

Abstract: The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.

Abstract: A defect inspection method comprises irradiating a sample including a pattern under inspection with light, acquiring measurement pattern data of the pattern based on intensity of light reflected by the sample, generating conversion data including pixel data corresponding to the measurement pattern data from design data of the sample, applying FIR filter process to the conversion data, reconstructing the conversion data by replacing pixel data having value not larger than first reference value with first pixel data, replacing pixel data having value larger than second reference value larger than first reference value with second pixel data having value larger than first pixel data, replacing pixel data having value larger than first reference value and less than second reference value with third pixel data having value between the value of first and second pixel data, the pixel data having larger value being replaced with third pixel data having higher value.

Abstract: A pattern inspection apparatus determines a difference of the measured dislocation of respective alignment marks of an opaque pattern and a phase shifting pattern (measurement difference), in addition to a difference between the both alignment mark positions in design (design difference). A difference between the measurement difference and the design difference is set as a difference in alignment mark position between the opaque pattern and the phase shifting pattern in a reference pattern which is later used in inspection. In this manner, by correcting one pattern data with respect to the other pattern data in the reference pattern, the displacement generated in the both patterns can be reflected, and the reference pattern data regarding an image of a sample which is actually observed can be created.

Abstract: An image correction device for use in a pattern inspection apparatus is disclosed, which has automatic adaptability to variations in density of a pattern image of a workpiece being tested. The device is operable to identify a two-dimensional (2D) linear predictive model from the pattern image of interest and determine the amount of eccentricity of a centroid position of this model. This amount is then used to switch between a corrected pattern image due to the 2D linear prediction modeling and a corrected image that is interpolated by bicubic interpolation techniques. A pattern inspection method using the image correction technique is also disclosed.

Abstract: An image correction device for use in a pattern inspection apparatus is disclosed, which has automatic adaptability to variations in density of a pattern image of a workpiece being tested. The device is operable to identify a two-dimensional (2D) linear predictive model parameters from the pattern image of interest and determine the value of a total sum of these identified parameters. This value is then used to switch between a corrected pattern image due to the 2D linear prediction modeling and a corrected image that is interpolated by bicubic interpolation techniques. A pattern inspection method using the image correction technique is also disclosed.

Abstract: An image correction device for use in pattern inspection apparatus is disclosed. This device includes a pattern extraction unit for extracting a pattern, as a cut-and-paste pattern, from a pattern existence region of an inspection reference pattern image and a pattern image of a workpiece being tested. The device also includes a pattern pasting unit for pasting the cut-and-paste pattern in blank regions of the reference and under-test pattern images to thereby create a pasted reference pattern image and a pasted test pattern image. The device further includes an equation generator for generating by linear predictive modeling a set of simultaneous equations relative to the pasted reference and test pattern images, a parameter generator for solving these equations to obtain a model parameter(s), and a unit for creating a corrected pattern image by the linear predictive modeling using the model parameter(s).

Abstract: An automatic focusing apparatus comprises a stage holding a substrate, an objective lens disposed facing the substrate surface, an illumination optics illuminating the substrate surface with a spotted light beam from an oblique direction, a photodetector detecting reflected light from the substrate surface, a position detection circuit detecting a vertical position of the substrate surface from an electric signal obtained from the photodetector to output a position signal, a correction circuit monitoring the position signal in real time and subtracting a surplus exceeding a signal change corresponding to a surface shape change of the substrate from the position signal, when a change amount per unit time of the position signal exceeds a predetermined level and outputting a corrected position signal, and a stage control circuit controlling the vertical position of the stage based on the corrected position signal.

Abstract: An image correction method employable in a pattern inspection method for emitting light falling onto a workpiece with a pattern formed thereon and for inspecting a pattern image resulting from the pickup of an optical image of the workpiece by comparing it to a corresponding fiducial pattern image is disclosed. The method includes the step of generating a system of equations describing therein an input/output relation using a 2D linear prediction model(s) with respect to the pattern image being tested and the fiducial pattern image. Then, estimate the equation system by least-squares methods to thereby obtain a parameter of the equation system. Next obtain a centroid of the parameter. Then perform interpolation using the value of the centroid, thereby to generate a corrected image. A pattern defect inspection method using the image correction method is also disclosed.

Abstract: An image correction method having a small number of setting parameters achieved by integrating shift (alignment) in unit of a sub-pixel and image correction. A relationship between an inspection reference pattern image and a pattern image under test is identified, a mathematical expression model which fits a pixel error, expansion and contraction/distortion noise, and sensing noise of the image is constructed, and the model is simulated to generate an estimation model image.

Abstract: The present invention relates to a stimuli-responsive composition that comprises a polymer, a solvent and a substance having a predetermined function. One embodiment of the present invention is a composition comprising a block polymer, a solvent and a substance having a predetermined function. The present invention also relates to an ink composition containing the composition, an image-forming method and an image-forming apparatus using the composition, and a recording medium applying the composition. Further, the present invention relates to an ABC type block polymer compound wherein the polymer is an ABC type triblock polymer, and wherein at least one of the blocks in the triblock polymer changes in nature from solvophilic to solvophobic or from solvophobic to solvophilic in response to stimuli, and more preferably, the A component, then the B component, and finally the C component respond to the stimuli.

Abstract: The present invention relates to a stimuli-responsive composition that comprises a polymer, a solvent and a substance having a predetermined function. One embodiment of the present invention is a composition comprising a block polymer, a solvent and a substance having a predetermined function. The present invention also relates to an ink composition containing the composition, an image-forming method and an image-forming apparatus using the composition, and a recording medium applying the composition. Further, the present invention relates to an ABC type block polymer compound wherein the polymer is an ABC type triblock polymer, and wherein at least one of the blocks in the triblock polymer changes in nature from solvophilic to solvophobic or from solvophobic to solvophilic in response to stimuli, and more preferably, the A component, then the B component, and finally the C component respond to the stimuli.

Abstract: A pattern inspection apparatus includes a light source irradiating a plate having a pattern, a photoelectric device photoelectrically converting the image of the pattern, a generator generating detected pattern data based on a photoelectrically converted signal, a generator generating reference pattern data from designed data, a comparator comparing the detected pattern data with the reference pattern data, a sensor detecting a light intensity of the light source, a barometric pressure sensor detecting a barometric pressure in the apparatus, a detector detecting at least one of the light intensity and barometric pressure deviating from predetermined ranges, a memory storing the detected and reference pattern data at a point of time when the abnormal status is generated in synchronization with position data and detected values of the light intensity and barometric pressure and an output device which outputs these.

Abstract: The present invention is to allow rapid detection of such a defect as buried in a pixel positional deviation, expansion/contraction noise or sensing noise on an image. A relationship between an inspection reference pattern image and a pattern image to be inspected is identified during inspection to construct a mathematical model obtained by absorbing (applying fitting on) a pixel positional deviation, expansion/contraction noise or sensing noise on an image, and a defect is detected by comparing a new inspection reference pattern image (model image) obtained by simulating the mathematical model and a pattern image to be inspected.