Patents by Inventor Stanislav Polonsky

Stanislav Polonsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8641879
    Abstract: A technique for controlling the motion of one or more charged entities linked to a polymer through a nanochannel is provided. A first reservoir and a second reservoir are connected by the nanochannel. An array of electrodes is positioned along the nanochannel, where fluid fills the first reservoir, the second reservoir, and the nanochannel. A first electrode is in the first reservoir and a second electrode is in the second reservoir. The first and second electrodes are configured to direct the one or more charged entities linked to the polymer into the nanochannel. An array of electrodes is configured to trap the one or more charged entities in the nanochannel responsive to being controlled for trapping. The array of electrodes is configured to move the one or more charged entities along the nanochannel responsive to being controlled for moving.
    Type: Grant
    Filed: September 12, 2012
    Date of Patent: February 4, 2014
    Assignee: International Business Machines Corporation
    Inventors: Stefan Harrer, Binquan Luan, Glenn J. Martyna, Hongbo Peng, Stanislav Polonsky, Stephen M. Rossnagel, Ajay K. Royyuru, Gustavo A. Stolovitzky, George F. Walker
  • Publication number: 20140001149
    Abstract: For a cross slit structure that contains a nanopore, a layer is produced including a first spacer that penetrates through the layer. A subsequent layer over, and in direct contact with, the layer is also produced. The subsequent layer includes a second spacer penetrating through the subsequent layer. The first spacer and the second spacer are selectively etched away, creating a first slit and a second slit. Respective projections of these slits are crossing one another at an angle. At such a crossing an opening is formed which provides for fluid connectivity through the two layers.
    Type: Application
    Filed: June 28, 2012
    Publication date: January 2, 2014
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Jingwei Bai, Stefan Harrer, Stanislav Polonsky, Stephen M. Rossnagel
  • Publication number: 20140004300
    Abstract: For a cross slit structure that contains a nanopore, a layer is produced including a first spacer that penetrates through the layer. A subsequent layer over, and in direct contact with, the layer is also produced. The subsequent layer includes a second spacer penetrating through the subsequent layer. The first spacer and the second spacer are selectively etched away, creating a first slit and a second slit. Respective projections of these slits are crossing one another at an angle. At such a crossing an opening is formed which provides for fluid connectivity through the two layers.
    Type: Application
    Filed: July 23, 2012
    Publication date: January 2, 2014
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Jingwei Bai, Stefan Harrer, Stanislav Polonsky, Stephen M. Rossnagel
  • Patent number: 8618581
    Abstract: A field effect transistor device includes: a reservoir bifurcated by a membrane of three layers: two electrically insulating layers; and an electrically conductive gate between the two insulating layers. The gate has a surface charge polarity different from at least one of the insulating layers. A nanochannel runs through the membrane, connecting both parts of the reservoir. The device further includes: an ionic solution filling the reservoir and the nanochannel; a drain electrode; a source electrode; and voltages applied to the electrodes (a voltage between the source and drain electrodes and a voltage on the gate) for turning on an ionic current through the ionic channel wherein the voltage on the gate gates the transportation of ions through the ionic channel.
    Type: Grant
    Filed: February 3, 2012
    Date of Patent: December 31, 2013
    Assignee: International Business Machines Corporation
    Inventors: Hongbo Peng, Stanislav Polonsky, Stephen M. Rossnagel, Gustavo Alejandro Stolovitzky
  • Patent number: 8598018
    Abstract: The present invention provides a method of forming an electrode having reduced corrosion and water decomposition on a surface thereof. A conductive layer is deposited on a substrate. The conductive layer is partially oxidized by an oxygen plasma process to convert a portion thereof to an oxide layer thereby forming the electrode. The oxide layer is free of surface defects and the thickness of the oxide layer is from about 0.09 nm to about 10 nm and ranges therebetween, controllable with 0.2 nm precision.
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: December 3, 2013
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Azdakani, Shafaat Ahmed, Hariklia Deligianni, Dario L. Goldfarb, Stefan Harrer, Hongbo Peng, Stanislav Polonsky, Stephen Rossnagel, Xiaoyan Shao, Gustavo A. Stolovitzky
  • Publication number: 20130288417
    Abstract: Semiconductor devices having integrated nanochannels confined by nanometer spaced electrodes, and VLSI (very large scale integration) planar fabrication methods for making the devices. A semiconductor device includes a bulk substrate and a first metal layer formed on the bulk substrate, wherein the first metal layer comprises a first electrode. A nanochannel is formed over the first metal layer, and extends in a longitudinal direction in parallel with a plane of the bulk substrate. A second metal layer is formed over the nanochannel, wherein the second metal layer comprises a second electrode. A top wall of the nanochannel is defined at least in part by a surface of the second electrode and a bottom wall of the nanochannel is defined by a surface of the first electrode.
    Type: Application
    Filed: June 27, 2013
    Publication date: October 31, 2013
    Inventors: Stefan Harrer, Stanislav Polonsky, Mark B. Ketchen, John A. Ott
  • Patent number: 8558326
    Abstract: Semiconductor devices having integrated nanochannels confined by nanometer spaced electrodes, and VLSI (very large scale integration) planar fabrication methods for making the devices. A semiconductor device includes a bulk substrate and a first metal layer formed on the bulk substrate, wherein the first metal layer comprises a first electrode. A nanochannel is formed over the first metal layer, and extends in a longitudinal direction in parallel with a plane of the bulk substrate. A second metal layer is formed over the nanochannel, wherein the second metal layer comprises a second electrode. A top wall of the nanochannel is defined at least in part by a surface of the second electrode and a bottom wall of the nanochannel is defined by a surface of the first electrode.
    Type: Grant
    Filed: March 27, 2012
    Date of Patent: October 15, 2013
    Assignee: International Business Machines Corporation
    Inventors: Stefan Harrer, Stanislav Polonsky, Mark B. Ketchen, John A. Ott
  • Patent number: 8557529
    Abstract: A nanopore capture system may include a material configured to pass through a nanopore device in a controlled manner based upon its interaction with the nanopore device. The system may also include a capture mechanism connected to one end of the material. The capture mechanism may be configured to catch a particular type of molecule while ignoring other types of molecules. The system may also include a controller to manipulate and/or detect the particular type of molecule.
    Type: Grant
    Filed: April 9, 2010
    Date of Patent: October 15, 2013
    Assignee: International Business Machines Corporation
    Inventors: Stanislav Polonsky, Ali Afzali-Ardakani, Hongbo Peng, Gustavo A. Stolovitzky, Ajay A. Royyuru, Mark N. Wegman
  • Patent number: 8438903
    Abstract: Semiconductor devices, chromatography devices and integrated circuits for detecting one or more molecules and methods for forming a semiconductor device for detecting one or more molecules are presented. For example, a semiconductor device for detecting one or more molecules includes a channel formed within a semiconductor structure, and at least one detector formed within the semiconductor structure. The at least one detector detects the one or more molecules in the channel. The semiconductor device may optionally comprise one or more additional channels formed within the semiconductor structure. The semiconductor device may, for example, be operative to detect a single molecule.
    Type: Grant
    Filed: January 27, 2010
    Date of Patent: May 14, 2013
    Assignee: International Business Machines Corporation
    Inventors: Stanislav Polonsky, Frank Suits
  • Patent number: 8407632
    Abstract: A method, system, and computer usable program product for detecting dose and focus variations during photolithography are provided in the illustrative embodiments. A test shape is formed on a wafer, the wafer being used to manufacture integrated circuits, the test shape being formed using a dose value and a focus value that are predetermined for the manufacturing. A capacitance of the test shape is measured. The capacitance is resolved to a second dosing value and a second focus value using an extraction model. A difference between the dosing value and the second dosing value is computed. A recommendation is made for dosing adjustment in the manufacturing based on the difference.
    Type: Grant
    Filed: September 14, 2010
    Date of Patent: March 26, 2013
    Assignee: International Business Machines Corporation
    Inventors: Ibrahim M. Elfadel, Ying Liu, Stanislav Polonsky, Amith Singhee
  • Publication number: 20130068618
    Abstract: A technique for controlling the motion of one or more charged entities linked to a polymer through a nanochannel is provided. A first reservoir and a second reservoir are connected by the nanochannel. An array of electrodes is positioned along the nanochannel, where fluid fills the first reservoir, the second reservoir, and the nanochannel. A first electrode is in the first reservoir and a second electrode is in the second reservoir. The first and second electrodes are configured to direct the one or more charged entities linked to the polymer into the nanochannel. An array of electrodes is configured to trap the one or more charged entities in the nanochannel responsive to being controlled for trapping. The array of electrodes is configured to move the one or more charged entities along the nanochannel responsive to being controlled for moving.
    Type: Application
    Filed: September 12, 2012
    Publication date: March 21, 2013
    Applicant: International Business Machines Corporation
    Inventors: Stefan Harrer, Binquan Luan, Glenn J. Martyna, Hongbo Peng, Stanislav Polonsky, Stephen M. Rossnagel, Ajay K. Royyuru, Gustavo A. Stolovitzky, George F. Walker
  • Publication number: 20130068617
    Abstract: A technique for controlling the motion of one or more charged entities linked to a polymer through a nanochannel is provided. A first reservoir and a second reservoir are connected by the nanochannel. An array of electrodes is positioned along the nanochannel, where fluid fills the first reservoir, the second reservoir, and the nanochannel. A first electrode is in the first reservoir and a second electrode is in the second reservoir. The first and second electrodes are configured to direct the one or more charged entities linked to the polymer into the nanochannel. An array of electrodes is configured to trap the one or more charged entities in the nanochannel responsive to being controlled for trapping. The array of electrodes is configured to move the one or more charged entities along the nanochannel responsive to being controlled for moving.
    Type: Application
    Filed: September 16, 2011
    Publication date: March 21, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Stefan Harrer, Binquan Luan, Glenn J. Martyna, Hongbo Peng, Stanislav Polonsky, Stephen M. Rossnagel, Ajay K. Royyuru, Gustavo A. Stolovitzky, George F. Walker
  • Publication number: 20130043131
    Abstract: A molecule trapping method includes forming a fluid bridge between a first reservoir and a second reservoir, translocating a molecule from the first reservoir to the second reservoir through the fluid bridge, detecting when a segment of the molecule is in the fluid bridge, breaking the fluid bridge and forming an a gap between the first and the second reservoirs, thereby trapping a segment of the molecule in the gap and making measurements on the segment of the molecule.
    Type: Application
    Filed: August 15, 2011
    Publication date: February 21, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Venkat S.K. Balagurusamy, Stanislav Polonsky
  • Patent number: 8354336
    Abstract: Accordingly, the present invention provides a method of forming an electrode having reduced corrosion and water decomposition on a surface thereof. A substrate which has a conductive layer disposed thereon is provided and the conductive layer has an oxide layer with an exposed surface. The exposed surface of the oxide layer contacts a solution of an organic surface active compound in an organic solvent to form a protective layer of the organic surface active compound over the oxide layer. The protective layer has a thickness of from about 0.5 nm to about 5 nm and ranges therebetween depending on a chemical structure of the surface active compound.
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: January 15, 2013
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Shafaat Ahmed, Hariklia Deligianni, Dario L. Goldfarb, Stefan Harrer, Binquan Luan, Glenn J. Martyna, Hongbo Peng, Stanislav Polonsky, Stephen Rossnagel, Xiaoyan Shao, Gustavo A. Stolovitzky
  • Publication number: 20120256281
    Abstract: Semiconductor devices having integrated nanochannels confined by nanometer spaced electrodes, and VLSI (very large scale integration) planar fabrication methods for making the devices. A semiconductor device includes a bulk substrate and a first metal layer formed on the bulk substrate, wherein the first metal layer comprises a first electrode. A nanochannel is formed over the first metal layer, and extends in a longitudinal direction in parallel with a plane of the bulk substrate. A second metal layer is formed over the nanochannel, wherein the second metal layer comprises a second electrode. A top wall of the nanochannel is defined at least in part by a surface of the second electrode and a bottom wall of the nanochannel is defined by a surface of the first electrode.
    Type: Application
    Filed: March 27, 2012
    Publication date: October 11, 2012
    Applicant: International Business Machines Corporation
    Inventors: Stefan Harrer, Stanislav Polonsky, Mark B. Ketchen, John A. Ott
  • Publication number: 20120199483
    Abstract: A nanopore capture system may include a material configured to pass through a nanopore device in a controlled manner based upon its interaction with the nanopore device. The system may also include a capture mechanism connected to one end of the material. The capture mechanism may be configured to catch a particular type of molecule while ignoring other types of molecules. The system may also include a controller to manipulate and/or detect the particular type of molecule.
    Type: Application
    Filed: April 21, 2012
    Publication date: August 9, 2012
    Applicant: International Business Machines Corporation
    Inventors: Stanislav Polonsky, Ali Afzali-Ardakani, Hongbo Peng, Gustavo A. Stolovitzky, Ajay A. Royyuru, Mark N. Wegman
  • Publication number: 20120132886
    Abstract: A field effect transistor device includes: a reservoir bifurcated by a membrane of three layers: two electrically insulating layers; and an electrically conductive gate between the two insulating layers. The gate has a surface charge polarity different from at least one of the insulating layers. A nanochannel runs through the membrane, connecting both parts of the reservoir. The device further includes: an ionic solution filling the reservoir and the nanochannel; a drain electrode; a source electrode; and voltages applied to the electrodes (a voltage between the source and drain electrodes and a voltage on the gate) for turning on an ionic current through the ionic channel wherein the voltage on the gate gates the transportation of ions through the ionic channel.
    Type: Application
    Filed: February 3, 2012
    Publication date: May 31, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Hongbo Peng, Stanislav Polonsky, Stephen Rossnagel, Gustavo Alejandro Stolovitzky
  • Patent number: 8189931
    Abstract: A method and system are disclosed for matching input character sequences in a set of input patterns. The method comprises the steps of analyzing the set of input patterns, creating a pattern cluster look-up table (PCLT) based on said input patterns, and defining an offset value k. The PCLT is used to find, for each sequence s and offset k, a set of candidate patterns that can possibly match s, the set of candidate patterns is searched for patterns that match s, and all found matching patterns and sequences are reported.
    Type: Grant
    Filed: January 4, 2008
    Date of Patent: May 29, 2012
    Assignee: International Business Machines Corporation
    Inventors: Tien Huynh, Stanislav Polonsky, Isidore Rigoutsos
  • Publication number: 20120065765
    Abstract: A method, system, and computer usable program product for detecting dose and focus variations during photolithography are provided in the illustrative embodiments. A test shape is formed on a wafer, the wafer being used to manufacture integrated circuits, the test shape being formed using a dose value and a focus value that are predetermined for the manufacturing. A capacitance of the test shape is measured. The capacitance is resolved to a second dosing value and a second focus value using an extraction model. A difference between the dosing value and the second dosing value is computed. A recommendation is made for dosing adjustment in the manufacturing based on the difference.
    Type: Application
    Filed: September 14, 2010
    Publication date: March 15, 2012
    Applicant: International Business Machines Corporation
    Inventors: IBRAHIM M. ELFADEL, Ying Liu, Stanislav Polonsky, Amith Singhee
  • Patent number: 8131056
    Abstract: Improved techniques are disclosed for monitoring or sensing process variations in integrated circuit designs. Such techniques provide such improvements by constructing variability maps correlating leakage emission images to layout information. By way of example, a method for monitoring one or more manufacturing process variations associated with a device under test (e.g., integrated circuit) comprises the following steps. An emission image representing an energy emission associated with a leakage current of the device under test is obtained. The emission image is correlated with a layout of the device under test to form a cross emission image. Common structures on the cross emission image are selected and identified as regions of interest. One or more variability measures (e.g., figures of merit) are calculated based on the energy emissions associated with the regions of interest.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: March 6, 2012
    Assignee: International Business Machines Corporation
    Inventors: Stanislav Polonsky, Peilin Song, Franco Stellari, Alan J. Weger