Abstract: A compound represented by the following formula (1). (in formula (1), each R1 independently represents a divalent group having 1 to 30 carbon atoms, each of R2 to R7 independently represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, a thiol group or a hydroxyl group, in which at least one R5 represents a hydroxyl group or a thiol group, each of m2, m3 and m6 is independently an integer of 0 to 9, each of m4 and m7 is independently an integer of 0 to 8, m5 is an integer of 1 to 9, n is an integer of 1 to 4, and each of p2 to p7 is independently an integer of 0 to 2.

Abstract: A compound represented by the following formula (1). (in formula (1), R1 represents a 2n-valent group having 1 to 30 carbon atoms, R2 to R5 each independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group or a hydroxyl group, provided that at least one R4 and/or at least one R5 represents an alkoxy group having 1 to 30 carbon atoms, m2 and m3 are each independently an integer of 0 to 8, m4 and m5 are each independently an integer of 0 to 9, provided that m4 and m5 are not 0 at the same time, n is an integer of 1 to 4, and p2 to p5 are each independently an integer of 0 to 2.

Abstract: A compound represented by the following formula (1): wherein each X independently represents an oxygen atom or a sulfur atom, or non-crosslinking, R1 represents a single bond or a 2n-valent group having 1 to 30 carbon atoms, the group may have an alicyclic hydrocarbon group, a double bond, a hetero atom, or an aryl group having 6 to 30 carbon atoms, each R2 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, an aryloxy group having 6 to 30 carbon atoms, or a hydroxyl group, in which at least one R2 represents an alkoxy group having 1 to 30 carbon atoms or an aryloxy group having 6 to 30 carbon atoms, each m is independently an integer of 1 to 6, each p is independently 0 or 1, and n is an integer of 1 to 4.

Abstract: The material for forming an underlayer film for lithography of the present invention contains a compound represented by the following general formula (1). (in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, and each R2 independently represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, provided that at least one R2 represents a hydroxyl group, each m is independently an integer of 1 to 4, n is an integer of 1 to 4, and p is 0 or 1.

Abstract: The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1). (in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R2 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.).

Abstract: The composition for forming an underlayer film for lithography according to the present invention contains a compound represented by a specific formula (1) and 20 to 99% by mass of a solvent component (S), in which 27 to 100% by mass of the compound represented by the formula (1) is included in a component (A) other than the solvent component (S).

Abstract: The material for forming a film for lithography according to the present invention contains a compound represented by the following formula (1): wherein, each R0 independently represents a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group or a halogen atom, and each p is independently an integer of 0 to 4.

Abstract: The compound according to the present invention is represented by a specific formula. The compound according to the present invention has a structure according to the specific formula, and therefore can be applied to a wet process and is excellent in heat resistance and etching resistance. In addition, the compound according to the present invention has such a specific structure, and therefore has a high heat resistance, a relatively high carbon concentration, a relatively low oxygen concentration and also a high solvent solubility. Therefore, the compound according to the present invention can be used to form an underlayer film whose degradation is suppressed at high-temperature baking and which is also excellent in etching resistance to oxygen plasma etching or the like. Furthermore, the compound is also excellent in adhesiveness with a resist layer and therefore can form an excellent resist pattern.

Abstract: The method according to the present invention is a method for purifying a compound represented by a specific formula (1) or a resin having a structure represented by a specific formula (2), the method including a step of bringing a solution (A) including an organic solvent optionally immiscible with water, and the compound or the resin into contact with an acidic aqueous solution.

Abstract: The material for forming an underlayer film for lithography of the present invention contains a compound represented by the following general formula (1). (in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, and each R2 independently represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, provided that at least one R2 represents a hydroxyl group, each m is independently an integer of 1 to 4, n is an integer of 1 to 4, and p is 0 or 1.

Abstract: The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1). (in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R2 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.

Abstract: The present invention relates to an alicyclic polyimide resin composition including 100 parts by mass of an alicyclic polyimide resin (A) having a specific structure and from 1 to 13 parts by mass of a cyano-modified cyclic phenoxy phosphazene compound (B), and a thin-wall molded article formed of the alicyclic polyimide resin composition which is produced by casting a solution of the resin composition and then heating the cast solution. The present invention aims at obtaining an alicyclic polyimide resin composition that is imparted with a good flame retardancy without adding a halogen-based flame retardant, an antimony-based flame retardant, an inorganic metal hydrate, a phosphoric acid salt, etc., thereto, and also is excellent in transparency, heat resistance and insulating property, and a thin-wall molded article obtained from the resin composition.

Abstract: The invention is directed to a process for producing polyimide film, including stretching, at 150° C. to 380° C. and a stretch ratio of 1.2 to 4.0, an unstretched polyimide film which is formed from a polyimide having a repeating unit represented by formula (1): (wherein R represents a tetravalent group derived from cyclohexane; and ? represents a divalent aliphatic, alicyclic, or aromatic group, or a combination thereof that has a total number of carbon atoms of 2 to 39 and may have at least one connecting group selected from the group consisting of —O—, —SO2—, —CO—, —CH2—, —C(CH3)2—, —OSi(CH3)2—, —C2H4O—, and —S—) and which has an organic solvent content of 0.5 wt. % or more and less than 30 wt. %. The produced polyimide film exhibits transparency, excellent heat resistance, and reduced dimensional changes.

Abstract: A polyimide resin is produced by the reaction of a compound selected from 1,2,4,5-cyclohexanetetracarboxylic acid, dianhydride thereof and reactive derivatives thereof and a compound selected from diamines and diisocyanates each containing at least one phenylene group and at least one isopropylidene group. The polyimide resin is colorless and exhibits a high heat resistance, a high transparency and a low water absorption.

Abstract: The invention is directed to a process for producing polyimide film, including stretching, at 150° C. to 380° C. and a stretch ratio of 1.2 to 4.0, an unstretched polyimide film which is formed from a polyimide having a repeating unit represented by formula (1): (wherein R represents a tetravalent group derived from cyclohexane; and ? represents a divalent aliphatic, alicyclic, or aromatic group, or a combination thereof that has a total number of carbon atoms of 2 to 39 and may have at least one connecting group selected from the group consisting of —O—, —SO2—, —CO—, —CH2—, —C(CH3)2—, —OSi(CH3)2—, —C2H4O—, and —S—) and which has an organic solvent content of 0.5 wt. % or more and less than 30 wt. %. The produced polyimide film exhibits transparency, excellent heat resistance, and reduced dimensional changes.

Abstract: A polyimide resin is produced by the reaction of a compound selected from 1,2,4,5-cyclohexanetetracarboxylic acid, dianhydride thereof and reactive derivatives thereof and a compound selected from diamines and diisocyanates each containing at least one phenylene group and at least one isopropylidene group. The polyimide resin is colorless and exhibits a high heat resistance, a high transparency and a low water absorption.

Abstract: The present invention provides a colorless, transparent polyimide composite film containing a polyimide (A) having a specific repeating unit, and an organic-treated layered silicate (B) obtained through treatment with an organic onium ion having a specific structure such that the organic-treated layered silicate (B) is dispersed in the polyimide (A); and as well a method for producing a colorless, transparent polyimide composite film, the method including forming a film-form mixture through extrusion or application, onto a support, of a three-component liquid mixture containing the polyimide (A), the organic-treated layered silicate (B), and an organic solvent (C) having a specific SP value; and subsequently removing the organic solvent (C) from the film-form mixture.