Patents by Inventor Takashi Ohshima

Takashi Ohshima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9208995
    Abstract: Provided is a charged particle beam apparatus (111) to and from which a diaphragm (101) can be easily attached and detached, and in which a sample (6) can be arranged under vacuum and under high pressure. The charged particle beam apparatus includes: a lens barrel (3) holding a charged particle source (110) and an electron optical system (1,2,7); a first housing (4) connected to the lens barrel (3); a second housing (100) recessed to inside the first housing (4); a first diaphragm (10) separating the space inside the lens barrel (3) and the space inside the first housing (4), and through which the charged particle beam passes; a second diaphragm (101) separating the spaces inside and outside the recessed section (100a) in the second housing (100), and through which the charged particle beam passes; and a pipe (23) connected to a third housing (22) accommodating the charged particle source (110).
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: December 8, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Ominami, Takashi Ohshima, Hiroyuki Ito, Mitsugu Sato, Sukehiro Ito
  • Patent number: 9202667
    Abstract: Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined.
    Type: Grant
    Filed: August 11, 2010
    Date of Patent: December 1, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Michio Hatano, Tetsuya Sawahata, Yasuko Watanabe, Mitsugu Sato, Sukehiro Ito, Takashi Ohshima, Hiroyuki Honda
  • Publication number: 20150318143
    Abstract: This charged particle beam device irradiates a primary charged particle beam generated from a charged particle microscope onto a sample arranged on a light-emitting member that makes up at least a part of a sample base, and, in addition to obtaining charged particle microscope images by the light-emitting member detecting charged particles transmitted through or scattered inside the sample, obtains optical microscope images by means of an optical microscope while the sample is still arranged on the sample platform.
    Type: Application
    Filed: November 26, 2013
    Publication date: November 5, 2015
    Inventors: Yusuke OMINAMI, Takashi OHSHIMA, Sukehiro ITO
  • Publication number: 20150214002
    Abstract: An electron microscope is provided with a scintillator (7) and a light guide (8). The scintillator (7) has an index of refraction greater than the index of refraction of the light guide (8), and an end surface (72) joined to the light guide (8) is formed from a curved surface with a convex shape on the outside. The scintillator (7) is formed by a Y—Al—O based ceramic sintered body represented by the compositional formula (Ln1-xCex)3M5O12 (wherein Ln represents at least one element selected from the group consisting of Y, Gd, La, and Lu, and M represents either or both of Al and Ga).
    Type: Application
    Filed: August 9, 2013
    Publication date: July 30, 2015
    Inventors: Shin Imamura, Takashi Ohshima, Yoichi Ose, Kenichi Hirane
  • Patent number: 9029766
    Abstract: To provide a low acceleration scanning electron microscope that can discriminate and detect reflected electrons and secondary electrons even with a low probe current, this scanning electron microscope is provided with an electron gun (29), an aperture (26), a sample table (3), an electron optical system (4-1) for making an electron beam (31) converge on a sample (2), a deflection means (10), a secondary electron detector (8), a reflected electron detector (9), and a cylindrical electron transport means (5) in a position between the electron gun (29) and sample (2). The reflected electron detector (9) is provided within the electron transport means (5) and on a side further away from the electron gun (29) than the secondary electron detector (8) and the deflection means (10). The reception surface (9-1) of the reflected electron detector (9) is electrically wired so as to have the same potential as the electron transport means (5).
    Type: Grant
    Filed: May 28, 2012
    Date of Patent: May 12, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hideo Morishita, Takashi Ohshima, Michio Hatano, Sukehiro Ito
  • Publication number: 20150105559
    Abstract: Disclosed is a method for producing a compound having an amino group and/or a hydroxyl group from a substrate compound having an atomic group containing CO or CS by eliminating such atomic group. The substrate compound, having an atomic group containing CO or CS (for example, an amide, a carbamate, or the like), is allowed to react with a compound expressed by formula (I) below, at a temperature of 120° C. or lower, preferably in the presence of an ammonium salt, to eliminate such atomic group containing CO or CS. In formula (I) A may not be present, and in a case where A is present, A represents an alkyl group having 1 to 6 carbon atoms. H2N-A—NH2 (I) - - -.
    Type: Application
    Filed: March 4, 2013
    Publication date: April 16, 2015
    Applicant: Kyushu University, National University Corporation
    Inventors: Takashi Ohshima, Hiroyuki Morimoto, Yuhei Shimizu
  • Publication number: 20150014530
    Abstract: Provided is a charged particle beam apparatus (111) to and from which a diaphragm (101) can be easily attached and detached, and in which a sample (6) can be arranged under vacuum and under high pressure. The charged particle beam apparatus includes: a lens barrel (3) holding a charged particle source (110) and an electron optical system (1,2,7); a first housing (4) connected to the lens barrel (3); a second housing (100) recessed to inside the first housing (4); a first diaphragm (10) separating the space inside the lens barrel (3) and the space inside the first housing (4), and through which the charged particle beam passes; a second diaphragm (101) separating the spaces inside and outside the recessed section (100a) in the second housing (100), and through which the charged particle beam passes; and a pipe (23) connected to a third housing (22) accommodating the charged particle source (110).
    Type: Application
    Filed: February 15, 2013
    Publication date: January 15, 2015
    Applicant: Hitachi High-TEchnologies Corporation
    Inventors: Yusuke Ominami, Takashi Ohshima, Hiroyuki Ito, Mitsugu Sato, Sukehiro Ito
  • Publication number: 20140361167
    Abstract: To provide a low acceleration scanning electron microscope that can discriminate and detect reflected electrons and secondary electrons even with a low probe current, this scanning electron microscope is provided with an electron gun (29), an aperture (26), a sample table (3), an electron optical system (4-1) for making an electron beam (31) converge on a sample (2), a deflection means (10), a secondary electron detector (8), a reflected electron detector (9), and a cylindrical electron transport means (5) in a position between the electron gun (29) and sample (2). The reflected electron detector (9) is provided within the electron transport means (5) and on a side further away from the electron gun (29) than the secondary electron detector (8) and the deflection means (10). The reception surface (9-1) of the reflected electron detector (9) is electrically wired so as to have the same potential as the electron transport means (5).
    Type: Application
    Filed: May 28, 2012
    Publication date: December 11, 2014
    Inventors: Hideo Morishita, Takashi Ohshima, Micho Hatano, Sukehiro Ito
  • Patent number: 8866371
    Abstract: Increasing the volume or weight of zirconia which is a diffusion and supply source, to extend the life of a field-emission type electron source causes a problem that the diffusion and supply source itself or a tungsten needle is easily subjected to damage. As another problem, although it is considered to form the diffusion and supply source using a thin film to avoid the above-described problem, it is difficult to stably obtain practical life exceeding 8,000 hours. It has been found that practical life exceeding 8,000 hours is stably obtained by providing a field-emission type electron source that has no chips or cracks in a diffusion and supply source and that can extend life with a little bit of an increase in the amount of the diffusion and supply source.
    Type: Grant
    Filed: September 24, 2012
    Date of Patent: October 21, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Souichi Katagiri, Takashi Ohshima, Sukehiro Ito
  • Publication number: 20140197725
    Abstract: Increasing the volume or weight of zirconia which is a diffusion and supply source, to extend the life of a field-emission type electron source causes a problem that the diffusion and supply source itself or a tungsten needle is easily subjected to damage. As another problem, although it is considered to form the diffusion and supply source using a thin film to avoid the above-described problem, it is difficult to stably obtain practical life exceeding 8,000 hours. It has been found that practical life exceeding 8,000 hours is stably obtained by providing a field-emission type electron source that has no chips or cracks in a diffusion and supply source and that can extend life with a little bit of an increase in the amount of the diffusion and supply source.
    Type: Application
    Filed: September 24, 2012
    Publication date: July 17, 2014
    Inventors: Souichi Katagiri, Takashi Ohshima, Sukehiro Ito
  • Patent number: 8772735
    Abstract: A charged particle beam apparatus includes a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1×10?8 Pa or less. The apparatus uses electron beams emitted to have an electron-beam-center radiation angle of 1×10?2 sr or less, and uses the electric current thereof, the second order differentiation of which is negative or zero with respect to time, and which reduces at a rate of 10% or less per hour. A heating unit is provided for the field emission electron source, and a detection unit is provided for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.
    Type: Grant
    Filed: November 1, 2012
    Date of Patent: July 8, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Keigo Kasuya, Takashi Ohshima, Souichi Katagiri, Shigeru Kokubo, Hideo Todokoro
  • Patent number: 8714585
    Abstract: An airbag in which no choking occurs and which can be rapidly deployed. A cushion section of the airbag internally accommodates a cylinder-type inflator that includes an insertion hole for inserting the inflator from an outside to an inside, and a diffuser into which the inflator is inserted, and a diffuser having a tubular portion obtained by folding back a section of cloth to form symmetrical portions with an upper base formed by the folded back part and a lower base formed by adjacent ends of the symmetrical portions. The cushion section is folded back at both lateral sides of the along first folding lines that are substantially orthogonal to a longitudinal direction of the diffuser.
    Type: Grant
    Filed: February 2, 2011
    Date of Patent: May 6, 2014
    Assignee: Autoliv Development AB
    Inventors: Masakazu Okamoto, Akifumi Hanawa, Takashi Ohshima
  • Patent number: 8686380
    Abstract: The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10?8 to 10?9 Pa even in the state where electron beams are emitted using a non-evaporable getter pump and is not affected by dropout foreign particles. The present invention includes a vacuum vessel in which a charged particle source (electron source, ion source, etc.) is disposed and a non-evaporable getter pump disposed at a position that does not directly face electron beams and includes a structure that makes the non-evaporable getter pump upward with respect to a horizontal direction to drop out foreign particles into a bottom in a groove, so that the foreign particles dropped out from the non-evaporable getter pump do not face an electron optical system.
    Type: Grant
    Filed: May 28, 2009
    Date of Patent: April 1, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Souichi Katagiri, Takashi Ohshima, Sho Takami, Makoto Ezumi, Takashi Doi, Yuji Kasai
  • Patent number: 8651513
    Abstract: An airbag having a cushion part defining an insertion hole that is positioned between first and second sewing lines provided to a base fabric and that is provided for the insertion of the inflator from an outside to an inside. A diffuser positioned within the cushion part and in which the inflator is inserted from the insertion hole. The diffuser has a tubular portion with a portion formed by folding layers of fabrics and being sewn to the base fabric along the first sewing line. The diffuser fabric of the tubular portion on a side adjacent to the base fabric being additionally sewn to the base fabric along a second sewing line. The diffuser includes a guide member 1 that extends and covers the insertion hole with a surface that continues from an inner surface of the diffuser. The guide member being sewn to the base fabric along the first sewing line.
    Type: Grant
    Filed: February 2, 2011
    Date of Patent: February 18, 2014
    Assignee: Autoliv Development AB
    Inventors: Masakazu Okamoto, Akifumi Hanawa, Takashi Ohshima
  • Patent number: 8629395
    Abstract: In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector.
    Type: Grant
    Filed: January 12, 2011
    Date of Patent: January 14, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hideo Morishita, Michio Hatano, Takashi Ohshima, Mitsugu Sato, Tetsuya Sawahata, Sukehiro Ito, Yasuko Aoki
  • Patent number: 8530865
    Abstract: A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.
    Type: Grant
    Filed: January 20, 2012
    Date of Patent: September 10, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyasu Shichi, Shinichi Matsubara, Takashi Ohshima, Satoshi Tomimatsu, Tomihiro Hashizume, Tohru Ishitani
  • Publication number: 20130146766
    Abstract: The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2,3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.
    Type: Application
    Filed: July 7, 2011
    Publication date: June 13, 2013
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Takashi Ohshima, Michio Hatano, Hideo Morishita
  • Patent number: 8450699
    Abstract: To obtain a SEM capable of both providing high resolution at low acceleration voltage and allowing high-speed elemental distribution measurement, a SE electron source including Zr—O as a diffusion source is shaped so that the radius r of curvature of the tip is more than 0.5 ?m and less than 1 ?m, and the cone angle ? of a conical portion at a portion in the vicinity of the tip at a distance of 3r to 8r from the tip, is more than 5° and less than (8/r)°. Another SE electron source uses Ba—O and includes a barium diffusion supply means composed of a sintered metal and a barium diffusion source containing barium oxide.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: May 28, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takashi Ohshima, Satoshi Tomimatsu
  • Patent number: 8431709
    Abstract: Disclosed is a selective ester production process of an alcoholic hydroxyl group, which proceeds under chemically mild conditions, while having adequate environmental suitability, operability and economical efficiency. Specifically disclosed is a process for producing an ester compound, which is characterized in that an alcohol and a carboxylic acid ester compound are reacted in the presence of a compound containing zinc element, thereby selectively acylating a hydroxyl group of the alcohol.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: April 30, 2013
    Assignee: Takasago International Corporation
    Inventors: Kazushi Mashima, Takashi Ohshima, Takanori Iwasaki, Noboru Sayo
  • Patent number: 8426835
    Abstract: An electron gun that serves to reduce the quantity of electron stimulated desorption and accomplishes vacuum evacuation efficiently with a sufficient degree of vacuum. An electron source 1 and an extraction electrode 6 are provided for emitting an electron beam 7 from the electron source 1. A first vacuum chamber 16 containing the electron source 1 is connected to a second vacuum chamber 9 via an aperture 8 provided in the extraction electrode 6. Each vacuum chamber is differentially evacuated with an independent vacuum evacuation means, and the generation of electron stimulated desorption gas 11 is reduced by securing a wide route of vacuum evacuation around the electron source 1 and intercepting the procession of back scattered electrons 12 emitted from the area with the electron beam 7 on the extraction electrode 6 by using a shielding electrode 22 given a prescribed potential.
    Type: Grant
    Filed: June 15, 2010
    Date of Patent: April 23, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Keigo Kasuya, Takashi Ohshima, Souichi Katagiri, Masashi Kimura