Patents by Inventor Takashi Ohshima
Takashi Ohshima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20130063029Abstract: Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1×10?8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1×10?2sr or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam.Type: ApplicationFiled: November 1, 2012Publication date: March 14, 2013Inventors: Keigo KASUYA, Takashi OHSHIMA, Souichi KATAGIRI, Shigeru KOKUBO, Hideo TODOKORO
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Publication number: 20130043388Abstract: Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined.Type: ApplicationFiled: August 11, 2010Publication date: February 21, 2013Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Michio Hatano, Tetsuya Sawahata, Yasuko Watanabe, Mitsugu Sato, Sukehiro Ito, Takashi Ohshima, Hiroyuki Honda
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Publication number: 20130015646Abstract: An airbag in which no choking occurs and which can be rapidly deployed. A cushion section of the airbag internally accommodates a cylinder-type inflator that includes an insertion hole for inserting the inflator from an outside to an inside, and a diffuser into which the inflator is inserted, and a diffuser having a tubular portion obtained by folding back a section of cloth to form symmetrical portions with an upper base formed by the folded back part and a lower base formed by adjacent ends of the symmetrical portions. The cushion section is folded back at both lateral sides of the along first folding lines that are substantially orthogonal to a longitudinal direction of the diffuser.Type: ApplicationFiled: February 2, 2011Publication date: January 17, 2013Inventors: Masakazu Okamoto, Akifumi Hanawa, Takashi Ohshima
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Publication number: 20120313358Abstract: An airbag having a cushion part defining an insertion hole that is positioned between first and second sewing lines provided to a base fabric and that is provided for the insertion of the inflator from an outside to an inside. A diffuser positioned within the cushion part and in which the inflator is inserted from the insertion hole. The diffuser has a tubular portion with a portion formed by folding layers of fabrics and being sewn to the base fabric along the first sewing line. The diffuser fabric of the tubular portion on a side adjacent to the base fabric being additionally sewn to the base fabric along a second sewing line. The diffuser includes a guide member 1 that extends and covers the insertion hole with a surface that continues from an inner surface of the diffuser. The guide member being sewn to the base fabric along the first sewing line.Type: ApplicationFiled: February 2, 2011Publication date: December 13, 2012Inventors: Masakazu Okamoto, Akifumi Hanawa, Takashi Ohshima
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Publication number: 20120298864Abstract: In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector.Type: ApplicationFiled: January 12, 2011Publication date: November 29, 2012Inventors: Hideo Morishita, Michio Hatano, Takashi Ohshima, Mitsugu Sato, Tetsuya Sawahata, Sukehiro Ito, Yasuko Aoki
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Patent number: 8319193Abstract: Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1 10?8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1×10?2sr or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam.Type: GrantFiled: June 10, 2009Date of Patent: November 27, 2012Assignee: Hitachi High-Technologies CorporationInventors: Keigo Kasuya, Takashi Ohshima, Souichi Katagiri, Shigeru Kokubo, Hideo Todokoro
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Patent number: 8232712Abstract: To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10?10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.Type: GrantFiled: August 4, 2009Date of Patent: July 31, 2012Assignee: Hitachi I High-Technologies CorporationInventors: Soichi Katagiri, Takashi Ohshima
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Patent number: 8217363Abstract: A scanning electron microscope can discriminate secondary particles in a desired energy region by band-pass and detect the secondary particles with a high yield point. Even when a lens 23 is disposed on an electron source side of an objective lens 18, and a primary electron beam forms any optical system on the electron gun side of the lens, the lens operates the primary electron beam to be converged to a convergent point 24 that is a specific position. A detection ExB 16 that supplies a field that affects the locus of the secondary particles that are generated from a specimen 2 is disposed at the convergent point 24 of the primary electron beam so as to lead only the secondary particles in a specific energy range to a detection unit 13.Type: GrantFiled: March 12, 2008Date of Patent: July 10, 2012Assignee: Hitachi High-Technologies CorporationInventors: Michio Hatano, Takashi Ohshima, Mitsugu Sato
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Publication number: 20120119086Abstract: A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.Type: ApplicationFiled: January 20, 2012Publication date: May 17, 2012Applicant: Hitachi High-Technologies CorporationInventors: Hiroyasu Shichi, Shinichi Matsubara, Takashi Ohshima, Satoshi Tomimatsu, Tomihiro Hashizume, Tohru Ishitani
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Publication number: 20120085925Abstract: An electron gun that serves to reduce the quantity of electron stimulated desorption and accomplishes vacuum evacuation efficiently with a sufficient degree of vacuum. An electron source 1 and an extraction electrode 6 are provided for emitting an electron beam 7 from the electron source 1. A first vacuum chamber 16 containing the electron source 1 is connected to a second vacuum chamber 9 via an aperture 8 provided in the extraction electrode 6. Each vacuum chamber is differentially evacuated with an independent vacuum evacuation means, and the generation of electron stimulated desorption gas 11 is reduced by securing a wide route of vacuum evacuation around the electron source 1 and intercepting the procession of back scattered electrons 12 emitted from the area with the electron beam 7 on the extraction electrode 6 by using a shielding electrode 22 given a prescribed potential.Type: ApplicationFiled: June 15, 2010Publication date: April 12, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Keigo Kasuya, Takashi Ohshima, Souichi Katagiri, Masashi Kimura
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Patent number: 8115184Abstract: A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.Type: GrantFiled: December 31, 2008Date of Patent: February 14, 2012Assignee: Hitachi High-Technologies CorporationInventors: Hiroyasu Shichi, Shinichi Matsubara, Takashi Ohshima, Satoshi Tomimatsu, Tomihiro Hashizume, Tohru Ishitani
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Publication number: 20110240855Abstract: To obtain a SEM capable of both providing high resolution at low acceleration voltage and allowing high-speed elemental distribution measurement, a SE electron source including Zr—O as a diffusion source is shaped so that the radius r of curvature of the tip is more than 0.5 ?m and less than 1 ?m, and the cone angle ? of a conical portion at a portion in the vicinity of the tip at a distance of 3r to 8r from the tip, is more than 5° and less than (8/r)°. Another SE electron source uses Ba—O and includes a barium diffusion supply means composed of a sintered metal and a barium diffusion source containing barium oxide.Type: ApplicationFiled: December 4, 2009Publication date: October 6, 2011Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Takashi Ohshima, Satoshi Tomimatsu
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Publication number: 20110186735Abstract: An electron source is implemented which has a lower work function of an electron emission surface, yields emitted electrons of a narrower energy bandwidth and higher current density, and lasts longer than existing Zr/O/W electron sources. Further, an electron microscope which yields an image of higher-resolution in a shorter time and an electron beam lithography device which yields higher throughput are also provided. The electron source comprises a needle-shaped electrode made of metal having its tip in a needle shape, a heating body which heats up the needle-shaped electrode, and a diffusion source capable of being heated up by the heating body and made of a mixture of barium composite containing oxygen and carbon particles.Type: ApplicationFiled: February 3, 2011Publication date: August 4, 2011Inventors: Tadashi FUJIEDA, Makoto Okai, Takashi Ohshima, Boklae Cho
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Publication number: 20110098479Abstract: The invention relates to a method for producing an azoline compound represented by the general formula (3): wherein R1 represents an optionally substituted hydrocarbon group, an optionally substituted alkoxy group, an optionally substituted alkoxycarbonyl group, a halogen atom, a substituted amino group, a substituted carbamoyl group or an optionally substituted heterocyclic group; R3, R4, R5 and R6 may be the same or different and each represents a hydrogen atom, an optionally substituted hydrocarbon group, an optionally substituted alkoxy group, an optionally substituted alkoxycarbonyl group, a halogen atom, a substituted amino group, a substituted carbamoyl group or an optionally substituted heterocyclic group; two arbitrary groups selected from R3, R4, R5 and R6 may bond to each other to form a ring; and Z1 represents an oxygen atom, a sulfur atom or a selenium atom; comprising reacting a carboxylic acid or a carboxylic acid derivative represented by the general formula (1): R1CO2R2 ??(1) wherein RType: ApplicationFiled: December 29, 2010Publication date: April 28, 2011Inventors: KAZUSHI MASHIMA, Takashi Ohshima, Takanori Iwasaki, Hironori Maeda, Kenya Ishida
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Publication number: 20110089336Abstract: Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vaccume exhaust unit for keeping the pressure around the field emission electron source at 1 10?8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1 10?2 str or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam.Type: ApplicationFiled: June 10, 2009Publication date: April 21, 2011Inventors: Keigo Kasuya, Takashi Ohshima, Souichi Katagiri, Shigeru Kokubo, Hideo Todokoro
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Patent number: 7888513Abstract: The invention relates to a method for producing an azoline compound represented by the general formula (3): wherein R1 represents an optionally substituted hydrocarbon group, an optionally substituted alkoxy group, an optionally substituted alkoxycarbonyl group, a halogen atom, a substituted amino group, a substituted carbamoyl group or an optionally substituted heterocyclic group; R3, R4, R5 and R6 may be the same or different and each represents a hydrogen atom, an optionally substituted hydrocarbon group, an optionally substituted alkoxy group, an optionally substituted alkoxycarbonyl group, a halogen atom, a substituted amino group, a substituted carbamoyl group or an optionally substituted heterocyclic group; two arbitrary groups selected from R3, R4, R5 and R6 may bond to each other to form a ring; and Z1 represents an oxygen atom, a sulfur atom or a selenium atom; comprising reacting a carboxylic acid or a carboxylic acid derivative represented by the general formula (1): R1CO2R2??(1) wherein R1Type: GrantFiled: December 4, 2006Date of Patent: February 15, 2011Assignee: Takasago International CorporationInventors: Kazushi Mashima, Takashi Ohshima, Takanori Iwasaki, Hironori Maeda, Kenya Ishida
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Publication number: 20100249422Abstract: Disclosed is a selective ester production process of an alcoholic hydroxyl group, which proceeds under chemically mild conditions, while having adequate environmental suitability, operability and economical efficiency. Specifically disclosed is a process for producing an ester compound, which is characterized in that an alcohol and a carboxylic acid ester compound are reacted in the presence of a compound containing zinc element, thereby selectively acylating a hydroxyl group of the alcohol.Type: ApplicationFiled: October 10, 2008Publication date: September 30, 2010Applicant: Takasago International CorporationInventors: Kazushi Mashima, Takashi Ohshima, Takanori Iwasaki, Noboru Sayo
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Patent number: 7781743Abstract: The present invention provides a charged particle beam system which can perform evacuation on an electron gun chamber or an ion-gun chamber having a non-evaporable getter pump in a short time and can maintain the ultra-high vacuum for a long time, and a technology of evacuation therefor.Type: GrantFiled: May 27, 2008Date of Patent: August 24, 2010Assignee: Hitachi High-Technologies CorporationInventors: Souichi Katagiri, Takashi Ohshima
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Patent number: 7759652Abstract: The present invention provides a compact electron lens causing little aberration, and a charged particle beam apparatus such as a scanning electron microscope that is super compact and offers a high resolution. An upper magnetic pole and a sample-side magnetic pole are magnetically coupled to the respective poles of a permanent magnet that is made of a highly strong magnetic material such as a rare-earth cobalt system or a neodymium-iron-boron system, that is axially symmetrical, and that has a hole in the center thereof. An inner gap is created on the side of a center axis. Thus, a magnetic lens is formed axially. Moreover, a semi-stationary magnetic path that shields an outside magnetic field and has the magnetic reluctance thereof regulated is disposed outside. The sample-side magnetic pole and magnetic path defines a region where magnetic reluctance is the highest outside the permanent magnet.Type: GrantFiled: May 16, 2007Date of Patent: July 20, 2010Assignee: Hitachi High-Technologies CorporationInventors: Takashi Ohshima, Mitsugu Sato, Yutaka Kaneko, Souichi Katagiri, Koichiro Takeuchi
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Patent number: 7755046Abstract: Chirality distribution in the molecular structure of protein or the like and magnetic domain structure are analyzed with high resolution less than 10 nm. A transmission electron microscope equipped with a spin-polarized electron source is used for holography observation. The phase of transmission spin-polarized electrons changes due to the existence of chirality structure or magnetization in a sample, which is observed as an interference pattern phase shift in holography measurement.Type: GrantFiled: January 29, 2008Date of Patent: July 13, 2010Assignee: Hitachi, Ltd.Inventors: Teruo Kohashi, Takashi Ohshima, Takao Matsumoto, Hirokazu Nishida