Patents by Inventor Takayoshi Tanabe

Takayoshi Tanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070155882
    Abstract: To provide a curable liquid composition excelling in storage stability and curability and capable of forming a coat (film) which excels in antistatic properties, hardness, scratch resistance, and transparency on the surface of various substrates, a cured film of the composition, and an antistatic laminate. A curable liquid composition comprising (A) particles including an oxide of at least one element selected from the group consisting of indium, antimony, zinc, and tin as a major component, (B) a compound having at least two polymerizable unsaturated groups in the molecule, (C) a solvent in which solubility of the component (B) is less than 10 wt %, and (D) a solvent in which solubility of the component (B) is 10 wt % or more, the components (A) and (B) being uniformly dispersed or dissolved in the composition.
    Type: Application
    Filed: April 5, 2004
    Publication date: July 5, 2007
    Inventors: Yoshikazu Yamaguchi, Shingo Itai, Jiro Ueda, Takayoshi Tanabe, John Southwell
  • Publication number: 20070096355
    Abstract: The invention relates to a photocurable resin composition comprising: (A) 20-65 wt % of a cationically polymerizable component, (B) 0.1-10 wt % of a cationic-polymerization initiator, (C) 5-45 wt % of a component having a structure shown by the following formula (1), wherein R?, R2, and R3 individually represent organic groups, provided that at least two of R1, R2, and R3 have a polymerizable carbon-carbon double bond, (D) 0.1-10 wt % of a radical-polymerization initiator, and (E) 0-20 wt % of a component having at least one radically polymerizable group in the molecule; The invention also relates to a method of making three dimensional articles and the use of the articles.
    Type: Application
    Filed: June 25, 2004
    Publication date: May 3, 2007
    Inventors: Takao Yashiro, Ryoji Tatara, Takayoshi Tanabe
  • Publication number: 20070069744
    Abstract: A photo-fabrication apparatus (1) has a stage (2) for holding a base board (9) thereon, a feeding part (3) for feeding photosensitive material onto the base board (9), a layer forming part (4) for smoothly spreading the fed photosensitive material to form a material layer and a light emitting part (5) for emitting a spatially-modulated light beam onto the material layer. The photo-fabrication apparatus (1) forms a lot of elastic microstructures for fine probe and arranges the microstructures at microscopic intervals in a very small range with high positional accuracy on the base board (9) by repeating formation of a material layer and light emission. The microstructures become elastic probes through plating in a later process.
    Type: Application
    Filed: May 10, 2004
    Publication date: March 29, 2007
    Inventors: Yasuyuki Koyagi, Hiroko Shimozuma, Takayoshi Tanabe, Takao Yashiro
  • Publication number: 20070066703
    Abstract: The present invention relates to a radiation-curable resin composition which produces a cured film having low surface resistivity and high transparency, a cured film of the composition, and a laminate including a layer of the cured film. The laminate of the present invention is suitably used as a hard coat material for preventing scratches or stains on a plastic optical part, touch panel, film-type liquid crystal element, plastic container, or flooring material, wall material, or artificial marble as an architectural interior finish; adhesive and sealing material for various substrates; vehicle for printing ink; or the like.
    Type: Application
    Filed: July 23, 2004
    Publication date: March 22, 2007
    Inventors: Noriyasu Shinohara, Hiroyuki Mano, Takayoshi Tanabe, John Southwell, Christopher Tronche
  • Publication number: 20070043138
    Abstract: Photocurable resin composition for photofabrication of three-dimensional objects comprising (A) 5-80 parts by weight of an oxetane compound, (B) 5-80 parts by weight of an epoxy compound, (C) 0, 1 10 parts by weight of a photoacid generator, (D) 1-35 parts by weight of elastomer particles with an average particle diameter of 10-700 nm, (E) 0-35 parts by weight of a polyol compound, (F) 0-45 parts by weight of an ethylenically unsaturated monomer, and (G) 0-10 parts by weight of a radical photopolymerization initiator.
    Type: Application
    Filed: February 21, 2006
    Publication date: February 22, 2007
    Inventors: Tetsuya Yamamura, Yukitoshi Kato, Takayoshi Tanabe, Takashi Ukachi
  • Patent number: 7173072
    Abstract: To provide a UV-curable resin composition useful for forming optical parts such as optical lenses. A radiation-curable resin composition for optical parts, comprising (A) 5–70 wt % of urethane (meth)acrylate, (B) 0.1–70 wt % of benzyl (meth)acrylate, and (C) 10–70 wt % of an ethylenically unsaturated group-containing compound other than the components (A) and (B).
    Type: Grant
    Filed: May 7, 2004
    Date of Patent: February 6, 2007
    Assignee: JSR Corporation
    Inventors: Shingo Itai, Satoshi Futami, Yoshikazu Yamaguchi, Takayoshi Tanabe
  • Publication number: 20070004816
    Abstract: The invention relates to a radiation curable composition comprising (A) a component comprising a carboxyl group that may dissociate in the presence of an acid, (B) a cationically polymerizable compound, and (C) a cationic photoinitiator.
    Type: Application
    Filed: June 14, 2004
    Publication date: January 4, 2007
    Inventors: Takao Yashiro, Ryoji Tatara, Takayoshi Tanabe
  • Publication number: 20060247353
    Abstract: A curable composition comprising: (A) reactive particles prepared by bonding oxide particles of at least one element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium to an organic compound having a polymerizable unsaturated group and a hydrolyzable silyl group, (B) an organic compound having two or more polymerizable unsaturated groups, and (C) a both terminal reactive polysiloxane compound other than the component (B).
    Type: Application
    Filed: May 18, 2004
    Publication date: November 2, 2006
    Inventors: Jiro Ueda, Noriyasu Shinohara, Isao Nishiwaki, Takayoshi Tanabe
  • Patent number: 7084187
    Abstract: To provide a radiation-sensitive curable liquid resin composition having excellent applicability and capable of producing a film excelling in hardness, scratch resistance, adhesion, transparency, and appearance of the surface of the film. A curable liquid resin composition comprising: (A) particles prepared by bonding at least one oxide of an element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium to a specific organic compound which comprises a polymerizable unsaturated group and a group shown by —X—C(?Y)—NH— (wherein X is NH, O, or S, and Y is O or S), and preferably a silanol group, (B) a compound having two or more polymerizable unsaturated groups in the molecule, (C) a specific alkylene glycol organic solvent, and preferably (D) a polymerization initiator.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: August 1, 2006
    Assignees: DSM IP Assets B.V., JSR Corporation, Japan Fine Coatings Co., Ltd.
    Inventors: Hideaki Takase, Yoshikazu Yamaguchi, Takayoshi Tanabe
  • Publication number: 20060155016
    Abstract: The invention relates to a curable composition comprising (A) particles prepared by bonding at least one oxide of an element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium, and an organic compound which comprises a polymerizable group, (B) a compound having a melamine group and no polymerizable unsaturated groups and (C) a compound having at least two polymerizable groups in the molecule other than the component (B); and to cured products and laminates with a with low reflectance and superior chemical resistance.
    Type: Application
    Filed: March 21, 2003
    Publication date: July 13, 2006
    Inventors: Noriyasu Shinohara, Yasunobu Suzuki, Yoshikazu Yamaguchi, Takayoshi Tanabe
  • Publication number: 20060128836
    Abstract: A curing composition including: 100 parts by weight of (1) titanium oxide particles coated with oxide of one or more metal elements selected from the group consisting of silicon, aluminum, titanium, zirconium, tin, antimony and zinc, 1 to 150 parts by weight of (2) a curing compound, and 0.1 to 100 parts by weight of (3) acuring catalyst. An antireflective multilayer body (16) which successively includes, on a substrate layer (12), a high-refractive-index film (10) which is formed by curing this curing composition and has a refractive index of 1.60 or more and a low-refractive-index film (14) having a lower refractive index than that thereof exhibits excellent antireflection effect in the field in which an antireflection film is used.
    Type: Application
    Filed: October 29, 2003
    Publication date: June 15, 2006
    Inventors: Miwa Honda, Hiroomi Shimomura, Tetsuya Yamamura, Naoki Sugiyama, Yuichi Eriyama, Takayoshi Tanabe
  • Patent number: 7060737
    Abstract: The invention relates to a curable resin composition, cured products thereof, and laminated materials. The curable composition comprises: (A-1) acicular oxide particles, the oxide being an oxide of at least one element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium, (B) a compound having two or more polymerizable unsaturated groups, (C) a photopolymerization initiator is provided. After cure, the composition has excellent scratch resistance. In addition, it may have excellent antistatic characteristics and transparency. In a preferred embodiment the composition also comprises (A-2) particles other than the acicular particles (A-1), being oxide of at least one element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium.
    Type: Grant
    Filed: March 29, 2002
    Date of Patent: June 13, 2006
    Assignees: DSM IP Assets B.V., JSR Corporation, Japan Fine Coatings Co., Ltd.
    Inventors: Yoshikazu Yamaguchi, Takayoshi Tanabe, Hiroki Nakajima, Hideaki Takase
  • Publication number: 20060115669
    Abstract: To provide a curable composition having excellent applicability and capable of forming a coat (film) having high hardness and high refractive index, excelling in scratch resistance and adhesion to a substrate and a low-refractive-index layer, and excelling in scratch resistance even in the case where the cured product is allowed to stand in a high pH environment or the composition is cured under anaerobic conditions on the surface of various types of substrates, a cured product of the curable composition, and a laminate having low reflectance and excelling in chemical resistance. Means for the Solution.
    Type: Application
    Filed: February 18, 2004
    Publication date: June 1, 2006
    Inventors: Noriyasu Shinohara, Yasunobu Suzuki, Takayoshi Tanabe
  • Publication number: 20050261392
    Abstract: To provide a photocurable liquid resin composition that can produce cured products exhibiting a high refractive index, good shape restorability, and superior adhesion to substrates. The photocurable resin composition comprises (A) 20-80 wt % of a urethane (meth) acrylate obtained by reacting a polyether polyol having an alkyleneoxy structure in the molecule, an organic polyisocyanate compound, and a (meth) acrylate containing a hydroxyl group, (B) 10-70 wt % of a monofunctional ethylenically unsaturated compound, (C) 5-25 wt % of a (meth) acrylate monomer having four or more functional groups, and (D) 0.1-10 wt % of a photoinitiator. Cured products are useful for forming an optical part such as a lens of a lens sheet or a back light using the lens sheet.
    Type: Application
    Filed: October 3, 2003
    Publication date: November 24, 2005
    Applicant: DSM IP ASSETS B.V.
    Inventors: Satochi Futami, Shingo Itai, Hideaki Takase, Takayoshi Tanabe
  • Patent number: 6967224
    Abstract: A photocurable resin composition suitable for use in three-dimensional photofabrication comprising (A) a cationically polymerizable organic compound, (B) a cationic photoinitiator, and (C) a (co)polymer obtainable by (co)polymerization of monomers comprising at least one (meth)acrylate-group comprising monomer. A process for producing a three-dimensional object which comprises the use of a washing agent having a Hansen-solubility between 27-35 (Mpa)1/2.
    Type: Grant
    Filed: October 3, 2003
    Date of Patent: November 22, 2005
    Assignee: DSM IP Assets B.V.
    Inventors: Tetsuya Yamamura, Takayoshi Tanabe, Takashi Ukachi
  • Publication number: 20050256219
    Abstract: The invention relates to a photocurable resin composition comprising: (A) (A1) a (meth)acrylate having a structure shown by the formula (1) or (2), or (A2) an epoxy compound having a structure shown by the formula (1) or (2); (B) a (meth)acrylate having three or more functional groups other than (A1); (C) a radical photoinitiator; (D) a compound having three or more cyclic ether linkages in the molecule other than (A2) and (E) a cationic photoinitiator; the invention also relates to optical parts made from the resins of the invention and use of the resin in other applications.
    Type: Application
    Filed: March 6, 2003
    Publication date: November 17, 2005
    Inventors: Hideaki Takase, Atsuya Takahashi, Takayoshi Tanabe, Shingo Itai, Satoshi Futami
  • Publication number: 20050171255
    Abstract: Photocurable resin composition for photofabrication of three-dimensional objects comprising (A) 5-80 parts by weight of an exetane compound, (B) 5-80 parts by weight of an epoxy compound, (C) 0.1 10 parts by weight of a photoacid generator, (D) 1-35 parts by weight of elastomer particles with an average particle diameter of 10-700 nm, (E) 0-35 parts by weight of a polyol compound, (F) 0-45 parts by weight of an ethylenically unsaturated monomer, end (G) 0-10 parts by weight of a radical photopolymerization initiator.
    Type: Application
    Filed: July 26, 2004
    Publication date: August 4, 2005
    Inventors: Tetsuya Yamamura, Yukitoshi Kato, Takayoshi Tanabe, Takashi Ukachi
  • Publication number: 20050070623
    Abstract: To provide a radiation-sensitive curable liquid resin composition having excellent applicability and capable of producing a film excelling in hardness, scratch resistance, adhesion, transparency, and appearance of the surface of the film. A curable liquid resin composition comprising: (A) particles prepared by bonding at least one oxide of an element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium to a specific organic compound which comprises a polymerizable unsaturated group and a group shown by —X—C(?Y)—NH— (wherein X is NH, O, or S, and Y is O or S), and preferably a silanol group, (B) a compound having two or more polymerizable unsaturated groups in the molecule, (C) a specific alkylene glycol organic solvent, and preferably (D) a polymerization initiator.
    Type: Application
    Filed: September 26, 2002
    Publication date: March 31, 2005
    Inventors: Hideaki Takase, Yoshikazu Yamaguchi, Takayoshi Tanabe
  • Publication number: 20050032927
    Abstract: To provide a UV-curable resin composition useful for forming optical parts such as optical lenses. A radiation-curable resin composition for optical parts, comprising (A) 5-70 wt % of urethane (meth)acrylate, (B) 0.1-70 wt % of benzyl (meth)acrylate, and (C) 10-70 wt % of an ethylenically unsaturated group-containing compound other than the components (A) and (B).
    Type: Application
    Filed: May 7, 2004
    Publication date: February 10, 2005
    Applicants: DSM IP Assets B. V., JSR Corporation, Japan Fine Coatings Co., Ltd.
    Inventors: Shingo Itai, Satoshi Futami, Yoshikazu Yamaguchi, Takayoshi Tanabe
  • Patent number: 6852773
    Abstract: The invention relates to a photocurable resin composition comprising: (A) a di or more functional urethane (meth)acrylate compound; (B) a monofunctional (meth)acrylate; (C) a photoinitiator; and (D) a polyoxyalkylene alkyl ether phosphate represented by the following formula (2): and to cured products obtained from the resins composition.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: February 8, 2005
    Assignee: DSM IP Assets B.V.
    Inventors: Takayoshi Tanabe, Jiro Ueda, Tetsuya Yamamura, Takashi Ukachi