Patents by Inventor Takayoshi Tanabe

Takayoshi Tanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5808708
    Abstract: A lighting apparatus for irradiating a liquid crystal display panel from the back includes a light guiding plate having at least an end which is bent in a direction opposite to the liquid crystal display panel, and a light source disposed on the back surface of the light guiding plate with respect to the liquid crystal display panel. Light from the light source is incident on the bent section of the light guiding plate, reflected by a reflector covering the outside surface of the bent section, and then falls on a section corresponding to a data display space of the liquid crystal display panel. This structure enables an increase in the ratio of the area of a light emitting section to the area of the entire lighting apparatus.
    Type: Grant
    Filed: December 14, 1995
    Date of Patent: September 15, 1998
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Hisashi Oyama, Youko Ohta, Kenichi Ukai, Nobuyuki Takahashi, Takayoshi Tanabe, Hirohide Terasaki
  • Patent number: 5736298
    Abstract: A photo-sensitive resin composition is provided which contains (1) a particulate polymer of a carboxy-group-containing-diene having a cross-linked structure; (2) a polymer having two or more photo-polymerizable unsaturated groups at its molecular chain terminals, and, optionally, a photo-polymerizable unsaturated group, carboxyl group, hydroxy group, amino group, or epoxy group in side chains, or (2') a non-diene-type polymer having a photo-polymerizable unsaturated group, carboxyl group, hydroxy group, amino group, or epoxy group in side chains, or a low molecular weight linear diene-type polymer; (3) a photo-polymerizable unsaturated monomer; (4) a polymer containing an amino group; and (5) a photo-polymerization initiator. The photo-sensitive resin composition has excellent water-developing capability and shows almost no swelling in water, causing minimal reduction in strength and only minimal dimensional changes during development.
    Type: Grant
    Filed: October 2, 1995
    Date of Patent: April 7, 1998
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Katsuo Koshimura, Takayoshi Tanabe, Hozumi Sato, Noboru Ohshima, Takashi Nishioka
  • Patent number: 5731129
    Abstract: A water-developable photosensitive resin composition which exhibits a small swelling, small reduction in strength and small dimension change when developed with water and which has an excellent balance of characteristics. Said composition comprises (1) a oarboxyl group-containing diene polymer, (2) a hydrogenated diene block polymer in which at least 80% of the double bonds in the recurring unit consisting of conjugated diene has been hydrogenated, (3) a photopolymerizable ethylenically unsaturated monomer, (4) an amino group-containing compound and (5) a photopolymerization initiator.
    Type: Grant
    Filed: February 12, 1996
    Date of Patent: March 24, 1998
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Katsuo Koshimura, Takayoshi Tanabe, Hozumi Sato, Noboru Oshima, Takashi Nishioka, Yoshiharu Hashiguchi
  • Patent number: 5410005
    Abstract: A reflection preventing film comprising a copolymer, its salt or both of them, the copolymer having at least one recurring unit selected from the group consisting of recurring units represented by formulas (1) and (2) and at least one recurring unit represented by formula (3): ##STR1## wherein R.sup.1 -R.sup.4 which may be the same as or different from one another, represent hydrogen atoms or organic groups and X represents a carboxyl group or a sulfo group, ##STR2## wherein R.sup.5 represents a hydrogen atom or an organic group, A represents a fluoroalkyl group and Y represents an alkylene group or a fluoroalkylene group. The reflection preventing film is formed on a resist film before irradiation in the formation of a resist pattern, thereby preventing the radiation reflected on the substrate from re-reflecting at the upper interface of the resist film to provide a resist pattern excellent in resolution, developability and pattern form.
    Type: Grant
    Filed: August 13, 1993
    Date of Patent: April 25, 1995
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Hiroaki Nemoto, Takayoshi Tanabe, Yoshiji Yumoto, Takao Miura
  • Patent number: 5304422
    Abstract: A polyamide resin composition comprising: (a) 100 parts by weight of a polyamide; (b) from about 1 part to about 80 parts by weight of an aromatic polyamide fiber; (c) from about 3 parts to about 80 parts by weight of a polytetrafluoroethylene; and (d) from about 1 part to about 20 parts by weight of high-density polyethylene is disclosed. The polyamide resin composition can be molded into sliding members, like bearings, bushings and slide rails, that demonstrate excellent mechanical and physical properties, like low frictional force, low self-abrasion, and low abrasion to metals.
    Type: Grant
    Filed: September 19, 1990
    Date of Patent: April 19, 1994
    Assignee: Bando Chemical Industries, Ltd.
    Inventors: Takayoshi Tanabe, Takatoshi Ishigaki, Shuji Tsuchikawa, Shinichi Kimura