Abstract: The invention relates to a curable resin composition, cured products thereof, and laminated materials.

Abstract: A photocurable resin composition suitable for use in three-dimensional photofabrication comprising (A) a cationically polymerizable organic compound, (B) a cationic photoinitiator, and (C) a (co)polymer obtainable by (co)polymerization of monomers comprising at least one (meth)acrylate-group comprising monomer.

Abstract: The invention relates to a photocurable resin composition comprising: (A) a di or more functional urethane (meth)acrylate compound; (B) a monofunctional (meth)acrylate; (C) a photoinitiator; and (D) a polyoxyalkylene alkyl ether phosphate represented by the following formula (2): 1

Abstract: A photocurable resin composition comprising: (A) a urethane (meth)acrylate produced by reacting at least a polyether polyol with a number average molecular weight of 500 or more having an alkyleneoxy structure in the molecule, an organic polyisocyanate compound, and a (meth)acrylate containing a hydroxyl group; (B) a monofunctional (meth)acrylate shown by the following formula (1), wherein R1 represents a hydrogen atom or a methyl group, R2 represents —(CH2CH2O)p—, —(CH(CH3)CH2O)q—, or —CH2CH(OH)CH2O—, Y1, Y2, and Y3 individually represent a hydrogen atom, bromine atom, alkyl group having 1-10 carbon atoms, phenyl group, or —C(CH3)2C6H5—, and p and q represent integers from 0 to 10; and (C) a photoinitiator; its use and optical parts prepared from the photocurable resin composition.

Abstract: A photocurable resin composition suitable for use in three-dimensional photofabrication comprising (A) a cationically polymerizable organic compound, (B) a cationic photoinitiator, and (C) a (co)polymer obtainable by (co)polymerization of monomers comprising at least one (meth)acrylate-group comprising monomer. A process for producing a three-dimensional object which comprises the use of a washing agent having a Hansen-solubility between 27-35 (Mpa)½.

Abstract: The present invention provides an adhesive composition for optical disks comprising

Abstract: A photocurable resin composition suitable for use in three-dimensional photofabrication comprising (A) a cationically polymerizable organic compound, (B) a cationic photoinitiator, and (C) a (co)polymer obtainable by (co)polymerization of monomers comprising at least one (meth)acrylate-group comprising monomer.

Abstract: A photocurable resin composition comprising:

Abstract: Subject

Abstract: Photocurable resin composition for photofabrication of three-dimensional objects comprising

Abstract: To provide a photo curable resin composition comprising (A) a cationically polymerizable organic compound, (B) a cationic photopolymerization initiator, (C) a polyol having two or more hydroxyl groups in the molecule, and (D) an organotin compound.

Abstract: A surface illuminant device includes a surface illuminant having a light distribution characteristic with no directivity relative to specific directions, and a prism sheet having a plurality of prisms each having a predetermined apical angle. The prism sheet is placed on the light emission side of the surface illuminant. One side of the prism sheet on which a plurality of prisms are placed is opposite to the light emission side of the surface illuminant. Accordingly, light can be emitted in a plurality of specific directions in concentrative manner to enhance luminance in that plurality of directions. Further, the surface illuminant device includes an optical sheet which condenses the incident light. In the luminance distribution (light distribution characteristic) thus obtained, the luminance gently decreases in the vicinity of the directions in which light is emitted in concentrative manner.

Abstract: A method of coating a resin mold is provided. The method can produce a resin mold with excellent releasability and durability, even if the molded resin material comprises a functional group that is reactive with the functional group remaining near the molding surface of the resin mold.

Abstract: A radiation sensitive resin composition comprising (A) a copolymer possessing recurring units of the formulas (1), (2), and (3), which turns alkali soluble in the presence of acid and (B) a photosensitive acid generator. Because the composition can resolve line-and-space patterns, isolated patterns, and contact hole patterns with satisfactory appearance and high resolution, it is useful as a chemically amplified positive resist for use in the manufacture of semiconductor devices.

Abstract: Positive as well as negative radiation sensitive resin compositions that, in addition to being capable of providing excellent resolution and pattern profile, are particularly excellent in avoiding the problems of "nano-edge roughness" or "coating surface roughness". The positive type radiation sensitive resin composition comprises (A) (a) an acid-decomposable group-containing resin, or (b) an alkali-soluble resin and an alkali dissolution controller, and (B) a photoacid generator comprising "a compound that upon exposure to radiation generates a carboxylic acid having a boiling point of 150.degree. C. or higher", and "a compound that upon exposure to radiation generates an acid other than a carboxylic acid". The negative type radiation sensitive resin composition comprises (C) an alkali-soluble resin, (D) a cross-linking agent, and the component (B) as described above.

Abstract: A radiation-sensitive resin composition comprising (A) a copolymer which comprises (a) a repeating unit (I) formed by cleavage of a carbon--carbon double bond of a monomer having one polymerizable carbon--carbon double bond and (b) a repeating unit (II) formed by cleavage of a carbon--carbon double bond of a monomer having two or more polymerizable carbon--carbon double bonds and at least one divalent group decomposed by an acid of the following formulas (1) or (2), ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are an alkyl group having 1-5 carbon atoms or an aryl group having 6-14 carbon atoms individually, said monomer having a structure in which each carbon--carbon double bond combines via said divalent group, and (B) a photoacid generator.

Abstract: An illumination device includes a cold cathode fluorescent tube having a heat capacity of 0.035 Wsec/.degree. C. or less per unit length (1 cm) of a glass tube of a fluorescent section of the cold cathode fluorescent tube. The illumination device has a superior operation characteristic at a low temperature. The device is driven by a method and is implemented in a display device.

Abstract: A radiation sensitive resin composition useful as a chemically amplified positive tone resist is provided. The composition comprises (A) a copolymer which becomes soluble in an alkali developing solution by the action of an acid, the copolymer containing a recurring unit (I) having a structure which is decomposed by the action of an acid and increases the solubility in an alkaline developing solution and a recurring unit(II) obtained from a compound having at least two (meth)acryloyl groups in the molecule by the cleavage of the carbon-carbon double bond, and (B) a photoacid generator which produces an acid on being irradiated by a radiation. The composition exhibits high resolution, superb capability of producing superior pattern forms, and excellent resistance to PED, and high process stability, is affected by a standing wave only to a minimum extent, and possessed prominent heat resistance.

Abstract: A radiation sensitive composition comprising (A) a copolymer comprising recurring units of a p-hydroxystyrene unit and a styrene unit having an acetal group or a ketal group at the p-position, (B) a copolymer comprising recurring units of a t-butyl (meth)acrylate unit and a p-hydroxystyrene unit, and (C) a radiation sensitive acid-generating agent.

Abstract: A positive-tone or negative-tone radiation sensitive resin composition which allows easy preparation of a resist, exhibits superior storage stability, high sensitivity, and high resolution capability, and is capable of producing excellent resist patterns. The positive-tone type composition comprises (A) a disulfonylmethane derivative in which the main chain with two sulfonyl groups bonded forms a three to eleven member cyclic carbon structure and (B) (a) a resin protected by an acid decomposable group or (b) an alkali-soluble resin and an alkali-solubility control agent. The negative-tone type composition comprises the component (A), (C) an alkali-soluble resin, and (D) a cross-linking agent.