Abstract: A processing system is disclosed which includes first and second chambers, each for accommodating a processing apparatus therein, each chamber being able to be kept gas tight, a coupling member for coupling the processing apparatuses accommodated in the first and second chambers with each other, and an elastic gas tightness holding member for gas tightly sealing portions between the coupling member and the first and second chambers.

Abstract: A differential pumping system includes a first chamber for storing a light source that emits light, a second chamber that receives light from the first chamber, and a vacuum pump, provided between the first and second chambers, which includes a hollow shaft through which the light passes, and exhausts the hollow shaft.

Abstract: A differential pumping system includes a first chamber for storing a light source that emits pulsed light, a first exhaust unit for exhausting said first chamber, a second chamber being connectible to the first chamber to receive the pulsed light, a second exhaust unit for exhausting said second chamber, and a connection control mechanism between the first and second chambers for connecting the first chamber to the second chamber when the pulsed light emits, and for disconnecting the first chamber from the second chamber when the pulsed light does not emit.

Abstract: A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.

Abstract: An oscillation mechanism includes a measuring device for measuring a position of an object, a movable stage being arranged so as to be positioned with respect to the object, a driving mechanism for moving the stage, a control unit for controlling the driving mechanism on the basis of an output of the measuring device, an oscillation element mounted on the stage, which is arranged to be oscillated with respect to the stage, and an intermediate element having a predetermined mass, which is disposed between the stage and the oscillation element. The intermediate element is (i) connected to the oscillation element through a first spring element having a predetermined spring constant, and (ii) connected to the stage through a second spring element having a predetermined spring constant. The oscillation mechanism also includes an oscillation unit for oscillating the oscillation element by oscillating the intermediate element at a predetermined frequency.

Abstract: A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient gas recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.

Abstract: In a belt-shaped body where plural coupling elements are fixed along a periphery of a long tape main body, when a width of the tape main body is W, dimension from a first coupling position center of said coupling elements up to an end face in the length direction of the tape main body near said is a′ and the number of tape windings except top/bottom faces thereof is N, a length L′ in the length direction of the tape main body is obtained according to the following expression (I): 1 L ′ = ( 1 + α 100 ) [ K ⁢ { a ′ βcos ⁡ ( tan - 1 ⁢ ωβ a ′ ) - AT } - 2 ⁢ NBW ]

Abstract: A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambience gas recirculating system which recirculates the ambience gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambience gas recirculated by the ambience. gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.

Abstract: A processing system is disclosed which includes first and second chambers, each for accommodating a processing apparatus therein, each chamber being able to be kept gas tight, a coupling member for coupling the processing apparatuses accommodated in the first and second chambers with each other, and an elastic gas tightness holding member for gas tightly sealing portions between the coupling member and the first and second chambers.

Abstract: A processing system is disclosed which includes first and second chambers, each for accommodating a processing apparatus therein, each chamber being able to be kept gas tight, a coupling member for coupling the processing apparatuses accommodated in the first and second chambers with each other, and an elastic gas tightness holding member for gas tightly sealing portions between the coupling member and the first and second chambers.

Abstract: The present invention provides a band body which is used for a strap of a cordless telephone, a pull tab of a slider, and the like, has a proper degree of rigidity and flexibility, and is easy to handle and use. Multifilaments of synthetic fiber are used as warp yarns at opposite longitudinal edge portions of the band body, hollow pipe wire rods molded from thermoplastic resin and having a diameter in a range of 0.5 to 2.0 mm are used as warp yarns at a center portion of the band body, and a monofilament which is synthetic fiber is used as a weft yarn so as to form thick, flexible, and resilient woven fabrics at the opposite longitudinal edge portions of the band body and a thin, rigid, and resilient woven fabric at the center portion of the band body.

Abstract: A processing system is disclosed which includes first and second chambers, each for accommodating a processing apparatus therein, each chamber being able to be kept gas tight, a coupling member for coupling the processing apparatuses accommodated in the first and second chambers with each other, and an elastic gas tightness holding member for gas tightly sealing portions between the coupling member and the first and second chambers.

Abstract: The present invention provides a slide fastener having a three-dimensional reflecting function on faces of fastener tapes by simple structure and means. Each of reflective tapes is provided separately from a fastener tape and has a band-shaped attaching portion, a bulging edge portion integrally formed on a longitudinal edge portion of the attaching portion, and a reflective portion formed by providing a retroreflective film or the like on the bulging edge portion. Each the reflective tape is attached to the fastener tape beside fastener elements such that at least a distance corresponding to a thickness of a flange of a slider is maintained between the bulging edge portion and the fastener elements, the reflective portion of the bulging edge portion appears and protrudes from a surface of the fastener tape, and that the bulging edge portion can swing. Each the reflective portion is not damaged by a sliding movement of the slider and can exhibit a three-dimensional reflecting function.

Abstract: An x-ray illumination device which illuminates an object by reflecting an x-ray irradiated from a SR emission point with at least one x-ray mirror comprises: first measuring means for measuring the position of the emission point; first control means for controlling the position of the emission point based on the measurements of the first measuring means; second measuring means for measuring the position of the x-ray near the x-ray mirror; and second control means for controlling the position or the attitude of the x-ray mirror based on the measurements of the second measuring means. The control frequency of the first control means of the x-ray illumination device here is of a frequency range higher than the control frequency of the second control means, and the ranges of the two control frequencies thereof partially overlap.

Abstract: An X-ray optical system includes an X-ray illumination system having at least two mirrors, a driving system for moving the at least two mirrors, a detecting system having at least one sensor, for detecting at least one of tilt and incidence position of X-rays in the X-ray illumination system, and a control system for controlling movements of the at least two mirrors by the driving system on the basis of detection by the detecting system.

Abstract: An exposure method including the steps of providing a wafer and a mask having a membrane and a pattern formed thereon, arranging the mask and the wafer opposite to each other, obtaining information corresponding to deformation of the membrane of the mask, reducing the influence of the deformation of the membrane, and transferring the pattern of the mask to the wafer by exposing the mask to radiant energy. Also disclosed is an exposure device for performing this exposure method.

Abstract: A pressure partition includes a thin film for dividing a predetermined space into two spatial zones and a supporting device for supporting the film at an outside peripheral portion thereof. The supporting device has a curved surface for producing curvature in the outside peripheral portion of the film. The curved surface is disposed at one of the two spatial zones having a lower pressure as compared with the other, and the curved surface has a convex shape with respect to a plane intersecting the film.

Abstract: An X-ray illumination system includes first and second X-ray mirrors for reflecting a synchrotron radiation beam, sequentially, a driving system for changing at least one of position and attitude of each of the first and second X-ray mirrors, a first measuring system for detecting a synchrotron radiation beam impinging on the first X-ray mirror, a second measuring system for measuring at least one of position and attitude of the first X-ray mirror with respect to a predetermined reference, or at least one of relative position and relative attitude between the first and second X-ray mirrors, a first control system for controlling drive of the first X-ray mirror on the basis of the measurement by the first measuring system, and a second control system for controlling drive of the second X-ray mirror on the basis of the measurement by the second measuring system.

Abstract: An exposure method and apparatus for lithographically transferring a pattern of a mask onto a substrate to be exposed, wherein a detecting system detects a relative positional relation between the mask and the substrate with respect to at least a predetermined direction, a stage member changes the relative positional relation between the mask and the substrate, on the basis of the detection by the detecting system, a magnification correcting mechanism corrects a transfer magnification of the mask pattern to the substrate, a control system for the stage member corrects one of a drive amount of the stage member and a detection result of the detecting system in accordance with a positional deviation of the mask pattern attributable to the correction operation of the magnification correcting mechanism.

Abstract: An X-ray system includes a radiation source for producing a radiation beam containing X-rays, a mirror device for reflecting X-rays, a beam duct for introducing the X-rays reflected by the mirror device, to an irradiation zone where an object to be irradiated can be exposed, and a shutter capable of blocking the radiation beam. A protection wall is disposed downstream of the mirror device with respect to the radiation source, for blocking the radiation beam. When the protection wall has a thickness t, the beam duct passing through the protection wall has an opening size a, and the beam duct has a tilt angle .theta., there is a relation (t-t.sub.0) sin .theta..gtoreq.a, where t.sub.0 is a minimum thickness of the protection wall required to substantially block the radiation beam from a radiation source.