Abstract: A bead member for a tire, including: a bead wire; a first bead filler that is in contact with the bead wire directly or via another layer and is arranged in a region including at least a region at an outer side of the bead wire in a tire radial direction; and a second bead filler that is in contact with the first bead filler directly or via another layer and is arranged in a region including at least a region at an outer side of the first bead filler in the tire radial direction, the first bead filler including a resin A, the second bead filler including a resin B, and the resin B having a melting point higher than that of the resin A.

Abstract: To suppress static leakage in a seal device, a seal lip is configured for sliding contact with a seal flange that includes a thread groove exerting a fluid pumping action at a time of shaft rotation. The seal device prevents sealing fluid on the inner-machine side from leaking to the outer-machine side between a housing and a rotating shaft inserted into a shaft hole on the housing. The seal lip is attached to the inner periphery of the shaft hole and the seal flange is attached to the outer periphery of the rotating shaft. A sliding area in the seal flange in sliding contact with the seal lip is a flat surface with no thread grooves, and has an outer peripheral side area and an inner peripheral side area, which each have a thread groove exerting a fluid pumping action when the rotating shaft rotates.

Abstract: An automatic analysis device is provided with: a sample disk for holding a sample container that accommodates a sample; a reagent disk for holding a reagent container that accommodates a reagent; at least two different measuring units that respectively perform different types of analyses; a control part that controls the measuring units; and a display part that displays: a work flow area in which the flow of operation of the two or more measuring units is displayed; and an overview area in which the usable or unusable states of the respective measuring units are displayed, wherein the overview area has a unit necessity-of-use selection part that can select whether using each of the measuring units is necessary, and the control part controls the display part so as to change the display of the work flow area on the basis of the information set in the unit necessity-of-use selection part.

Abstract: A bead member for a tire, including: a bead wire; a first bead filler that is in contact with the bead wire directly or via another layer and is arranged in a region including at least a region at an outer side of the bead wire in a tire radial direction; and a second bead filler that is in contact with the first bead filler directly or via another layer and is arranged in a region including at least a region at an outer side of the first bead filler in the tire radial direction, the first bead filler including a resin A, the second bead filler including a resin B, and the resin A having a melting point higher than that of the resin B.

Abstract: A shower head according to an embodiment includes: a mixing chamber mixing a plurality of process gases; a shower plate provided below the mixing chamber, the shower plate including a plurality of longitudinal flow paths and a lateral cooling flow path provided between the longitudinal flow paths, a mixed gas of the process gases flowing through the longitudinal flow paths, a cooling medium flowing through the lateral cooling flow path; and an outer circumferential portion cooling flow path provided around the shower plate.

Abstract: A vapor phase growth apparatus according to an embodiment includes a reaction chamber, a ring-shaped holder provided in the reaction chamber, the ring-shaped holder configured to hold a substrate, the ring-shaped holder including an outer portion, and an inner portion on which a ring-shaped protrusion is provided and surrounded by the outer portion, the ring-shaped protrusion being separated from the outer portion, an upper surface of the outer portion being higher than an upper surface of the ring-shaped protrusion, and a heater provided below the ring-shaped holder.

Abstract: A shower head according to an embodiment includes: a mixing chamber mixing a plurality of process gases; a shower plate provided below the mixing chamber, the shower plate including a plurality of longitudinal flow paths and a lateral cooling flow path provided between the longitudinal flow paths, a mixed gas of the process gases flowing through the longitudinal flow paths, a cooling medium flowing through the lateral cooling flow path; and an outer circumferential portion cooling flow path provided around the shower plate.

Abstract: A vapor phase growth apparatus according to an embodiment includes a reaction chamber, a ring-shaped holder provided in the reaction chamber, the ring-shaped holder configured to hold a substrate, the ring-shaped holder including an outer portion, and an inner portion on which a ring-shaped protrusion is provided and surrounded by the outer portion, the ring-shaped protrusion being separated from the outer portion, an upper surface of the outer portion being higher than an upper surface of the ring-shaped protrusion, and a heater provided below the ring-shaped holder.

Abstract: A shower head according to an embodiment includes: a mixing chamber mixing a plurality of process gases; a shower plate provided below the mixing chamber, the shower plate including a plurality of longitudinal flow paths and a lateral cooling flow path provided between the longitudinal flow paths, a mixed gas of the process gases flowing through the longitudinal flow paths, a cooling medium flowing through the lateral cooling flow path; and an outer circumferential portion cooling flow path provided around the shower plate.

Abstract: A tire includes a tire frame having an annular shape and containing a resin, and a resin layer that is provided on at least a part of an inner circumferential surface of the tire frame and that contains a urethane resin, the resin layer having a tensile modulus of elasticity of from 2 MPa to 50 MPa, the tensile modulus of elasticity of the resin layer being from 0.01 times to 0.50 times a tensile modulus of elasticity of the tire frame, and the resin layer having a softening point of 80° C. or higher.

Abstract: A shower head according to an embodiment includes: a mixing chamber mixing a plurality of process gases; a shower plate provided below the mixing chamber, the shower plate including a plurality of longitudinal flow paths and a lateral cooling flow path provided between the longitudinal flow paths, a mixed gas of the process gases flowing through the longitudinal flow paths, a cooling medium flowing through the lateral cooling flow path; and an outer circumferential portion cooling flow path provided around the shower plate.

Abstract: To suppress static leakage in a seal device, a seal lip is configured for sliding contact with a seal flange that includes a thread groove exerting a fluid pumping action at a time of shaft rotation. The seal device prevents sealing fluid on the inner-machine side from leaking to the outer-machine side between a housing and a rotating shaft inserted into a shaft hole on the housing. The seal lip is attached to the inner periphery of the shaft hole and the seal flange is attached to the outer periphery of the rotating shaft. A sliding area in the seal flange in sliding contact with the seal lip is a flat surface with no thread grooves, and has an outer peripheral side area and an inner peripheral side area, which each have a thread groove exerting a fluid pumping action when the rotating shaft rotates.

Abstract: A vapor phase growth method of growing a film on a substrate by supplying material gases to the substrate while heating the substrate with a heating unit according to an embodiment, the method includes: measuring a temperature of the substrate with a radiation thermometer; executing a temperature feedback control to control an output of the heating unit to cause a measurement value of the radiation thermometer to have a set value when a film is not grown on the substrate; and executing a constant output control to maintain an output of the heating unit constant when a film causing thin-film interference in a wavelength measured by the radiation thermometer is grown on the substrate.

Abstract: A vapor phase growth apparatus according to an embodiment includes a reaction chamber, a ring-shaped holder provided in the reaction chamber, the ring-shaped holder configured to hold a substrate, the ring-shaped holder including an outer portion, and an inner portion on which a ring-shaped protrusion is provided and surrounded by the outer portion, the ring-shaped protrusion being separated from the outer portion, an upper surface of the outer portion being higher than an upper surface of the ring-shaped protrusion, and a heater provided below the ring-shaped holder.

Abstract: A pair of electrode lugs clamp a bar at side surfaces of the bar so as to be electrically connected to the bar. The electrode lugs respectively include a first contact portion and a second contact portion having different front-back lengths. The bar is clamped such that the first contact portion having a short front-back length L1 opposes a back end portion of the bar within a range of the second contact portion having a front-back length L2. The back end surface of the bar is brought into contact with and welded to a front end surface of a metal shell by resistance butt welding. Since the first contact portion of one lug is short and is close to the abutting surfaces, heat dissipation can be reduced and heat concentration can be increased.

Abstract: A vapor phase growth apparatus includes: a reaction chamber; a lower region provided below the reaction chamber; a rotating body provided in the reaction chamber; a rotating shaft connected to the rotating body and having a lower end provided in the lower region; a support portion provided in an upper portion of the rotating body and supporting a substrate; a reaction gas supply port provided on the reaction chamber and supplying a reaction gas for forming a film on the substrate into the reaction chamber; a rotating mechanism including a rotor, the rotating mechanism provided in the lower region and configured to rotate the rotating shaft; a first bearing provided in the lower region and rotatably supporting the rotating shaft; a second bearing provided below the first bearing in the lower region, the second bearing rotatably supporting the rotating shaft; a first air supply port provided above the rotating mechanism and the first bearing in the lower region, the first air supply port supplying a first gas i

Abstract: There is provided a method of filling a recess of a workpiece, which includes: forming a first thin film made of a semiconductor material along a wall surface defining a recess in a semiconductor substrate; annealing the workpiece within a vessel whose internal process is set to a first pressure, and forming an epitaxial region which is generated by crystallizing the semiconductor material of the first thin film, along a surface defining the recess, without moving the first thin film; forming a second thin film made of the semiconductor material along the wall surface defining the recess; and annealing the workpiece within the vessel whose internal pressure is set to a second pressure lower than the first pressure, and forming a further epitaxial region which is generated by crystallizing the semiconductor material of the second thin film which is moved toward a bottom of the recess.

Abstract: A pair of electrode lugs clamp a bar at side surfaces of the bar so as to be electrically connected to the bar. The electrode lugs respectively include a first contact portion and a second contact portion having different front-back lengths. The bar is clamped such that the first contact portion having a short front-back length L1 opposes a back end portion of the bar within a range of the second contact portion having a front-back length L2. The back end surface of the bar is brought into contact with and welded to a front end surface of a metal shell by resistance butt welding. Since the first contact portion of one lug is short and is close to the abutting surfaces, heat dissipation can be reduced and heat concentration can be increased.

Abstract: A vapor phase growth apparatus of an embodiment includes: a reaction chamber; a shower plate disposed in the upper portion of the reaction chamber to supply a gas into the reaction chamber; and a support portion disposed below the shower plate inside the reaction chamber to place a substrate thereon. Then, the shower plate includes a plurality of first and second lateral gas passages disposed within different horizontal planes and first and second gas ejection holes connected to the first and second lateral gas passages. Further, the shower plate includes a center lateral gas passage that passes through a position directly above the rotation center of the support portion and third gas ejection holes connected to the center lateral gas passage. Then, the gases ejected from the first and second gas ejection holes and the center gas ejection holes are independently controllable.

Abstract: A shower head according to an embodiment includes: a mixing chamber to which process gas is supplied; a plurality of cooling portions provided below the mixing chamber with a gap therebetween, the cooling portion having a cooling hole provided in a horizontal direction, the process gas being introduced from the mixing chamber to the gaps; a plurality of buffer regions provided below the gaps, the process gas being introduced from the gaps to the buffer regions; and a shower plate provided below the buffer regions, the shower plate having a plurality of through holes disposed at a predetermined interval, the process gas being introduced from the buffer regions to the through holes.