Abstract: An apparatus for atomic layer deposition includes a film deposition chamber, a tubular exhaust pipe connecting section mounted to an outer side of an opening section provided in the film deposition chamber, and a tubular exhaust adhesion preventive member located inside the film deposition chamber and inserted into and mounted on the opening section. The exhaust pipe connecting section is provided with an inert-gas supply passage and an inert-gas supply port, both in the connecting section. The exhaust adhesion preventive member is provided with an inert-gas supply passage formed of a gap between each of an inner peripheral surface of the opening section and an inner wall of the film deposition chamber around the opening section, and the adhesion preventive member, and an inert-gas discharge port provided in the inert-gas supply passage, and from which the inert gas flows out into the film deposition chamber.

Abstract: A planar light source apparatus according to the present invention includes a light source, a holding substrate that holds the light source at a main surface, and a light-distribution control element that is disposed at the main surface of the holding substrate so as to cover the light source, and changes light distribution of light rays emitted from the light source. The light-distribution control element includes a diffusion part that is provided at at least at one surface of a plurality of surfaces that structure the outer shape of the light-distribution control element. The at least one surface where the diffusion part is provided is a surface different from an installation surface capable of abutting on the main surface of the holding substrate.

Abstract: In a film-forming technology using charged particles, a disturbance in film thickness distribution caused by leakage magnetic field is suppressed. A film-forming method embodies a technological idea of switching generation and stop of a magnetic field during a film-forming operation so as to stop the generation of the magnetic field during a period when plasma is generated and generate the magnetic field during a period when plasma is not generated.

Abstract: A method of manufacturing a display apparatus having an organic EL element includes: a step of forming the organic EL element over a substrate made of a flexible substrate; and a step of forming a protecting film 16 made of an inorganic insulating material so as to cover the organic EL element by using an ALD method. In the step of forming the protecting film 16, the protecting film 16 is formed by alternately performing a step of forming a high-density layer 16H by using an ALD method and a step of forming, by using an ALD method, a low-density layer 16L that has the same constituent element as the high-density layer 16H and has a lower density than the high-density layer 16H. The protecting film 16 has a layered structure made of one or more high-density layers 16H and one or more low-density layers 16L so that the low-density layer 16L and the high-density layer 16H are alternately layered so as to be in contact with each other.

Abstract: An apparatus for plasma atomic layer deposition includes a tubular, insulating injector adhesion preventive member mountable to a gas-introducing opening section from inside a film forming chamber, a tubular, insulating exhaust adhesion preventive member mountable to an exhaust opening section from inside the film forming chamber, and an insulating film forming chamber adhesion preventive member mountable to an inner wall side of the film forming chamber. The injector adhesion preventive member and the exhaust adhesion preventive member are separated from each of a plate electrode and a counter electrode side, and the film forming chamber adhesion preventive member is disposed on each side of the injector adhesion preventive member and the exhaust adhesion preventive member to be separated from each of the plate electrode and the counter electrode side. The apparatus further includes an upper and lower inert-gas supply port that purges inert gas toward inside the film forming chamber.

Abstract: A device for atomic layer deposition includes: an injector installed to an opening of a film deposition chamber; and an injector adhesion preventive member installed by insertion into the opening, wherein the injector includes an injector raw material gas supply path, an injector reactant gas supply path, and an injector inert gas supply path, the respective paths being partitioned from each other, the injector adhesion preventive member includes an adhesion preventive member raw material gas supply path, an adhesion preventive member reactant gas supply path, and an adhesion preventive member inert gas supply path, the respective paths being partitioned from each other, and the adhesion preventive member inert gas supply path is provided such that the inert gas flows in a clearance between an outer peripheral side of the injector adhesion preventive member and an inner peripheral side of the opening.

Abstract: A non-limiting example game system comprises a server and a plurality of game apparatuses, each game apparatus emulating a game program. If applying a predetermined instruction during a game, a game screen is captured and an image file is produced. Furthermore, at this time, emulator status information is uploaded to the server from a game apparatus. Then, the server transmits a URL indicative of a storing location of the emulator status information to the game apparatus. The game apparatus writes the URL as metadata of the image file, and uploads the image file to the server. Furthermore, the game apparatus downloads a desired image file from the server, and downloads the emulator status information according to the URL that is acquired from the downloaded image file. An emulator status of another game apparatus can be reproduced by reading this emulator state information.

Abstract: An atomic layer deposition apparatus includes: a film-forming container 11 in which a film-forming process is performed; a vertically movable stage 14 provided in the film-forming container 11 and being configured to hold a substrate 100; a stage stopper 17 configured to stop rising of the stage 14 and, when in contact with the stage 14, partitioning a film-forming space S in which the film-forming process is performed and a transporting space in which transport of the substrate 100 is performed; a peripheral stage deposition prevention member 15 covering a peripheral portion of the stage 14; and a stage stopper deposition prevention member 24 provided on the stage stopper 17.

Abstract: A plasma atomic layer deposition apparatus capable of improving a film quality of a film formed on a substrate is provided. The atomic layer deposition apparatus is a plasma atomic layer deposition apparatus configured to form the film on the substrate is in an atomic layer unit by generating plasma discharge between a lower electrode BE holding the substrate 15 and a facing upper electrode UE, and has a deposition prevention member CTM made of an insulator surrounding the upper electrode UE but being away therefrom in a plan view.

Abstract: An atomic layer deposition apparatus includes a film-forming container 11 in which a film-forming process is performed, a vertically movable stage 14 configured to hold a substrate 100, a susceptor 50 held on the stage 14 and being configured to hold the substrate 100, and a stage stopper 17 configured to stop rising of the stage 14 and, when in contact with the susceptor 50, partitioning a film-forming space S in which the film-forming process is performed and a transporting space in which transport of the substrate 100 is performed. Further, the susceptor 50 includes an upper susceptor substrate holding portion 52B configured to hold the substrate 100, and an upper susceptor peripheral portion 52A arranged in a periphery of the upper susceptor substrate holding portion 52B, wherein a susceptor deposition prevention member 15 is provided on the upper susceptor peripheral portion 52A.

Abstract: A planar light source apparatus according to the present invention includes a light source, a holding substrate that holds the light source at a main surface, and a light-distribution control element that is disposed at the main surface of the holding substrate so as to cover the light source, and changes light distribution of light rays emitted from the light source. The light-distribution control element includes a diffusion part that is provided at at least at one surface of a plurality of surfaces that structure the outer shape of the light-distribution control element. The at least one surface where the diffusion part is provided is a surface different from an installation surface capable of abutting on the main surface of the holding substrate.

Abstract: A device for atomic layer deposition includes: an injector installed to an opening of a film deposition chamber; and an injector adhesion preventive member installed by insertion into the opening, wherein the injector includes an injector raw material gas supply path, an injector reactant gas supply path, and an injector inert gas supply path, the respective paths being partitioned from each other, the injector adhesion preventive member includes an adhesion preventive member raw material gas supply path, an adhesion preventive member reactant gas supply path, and an adhesion preventive member inert gas supply path, the respective paths being partitioned from each other, and the adhesion preventive member inert gas supply path is provided such that the inert gas flows in a clearance between an outer peripheral side of the injector adhesion preventive member and an inner peripheral side of the opening.

Abstract: A device for atomic layer deposition includes: a film deposition chamber; a stage installed inside the film deposition chamber; a susceptor that holds, on the stage, a substrate; a mask disposed on the substrate, the mask being sized to encompass the substrate; a mask pin that supports the mask; and a mask pin hole bored through the stage and the susceptor vertically, and allows the mask pin to be inserted in a vertically movable manner, wherein the susceptor has a susceptor body having a holding surface of the substrate, and a susceptor peripheral edge located around the susceptor body and having a height lower than the holding surface, the mask pin hole is opened in the susceptor peripheral edge, and in the susceptor peripheral edge, an inert gas supply port that releases gas upward is provided around the holding surface in a surrounding area of the mask.

Abstract: An apparatus for atomic layer deposition includes a film deposition chamber, a tubular exhaust pipe connecting section mounted to an outer side of an opening section provided in the film deposition chamber, and a tubular exhaust adhesion preventive member located inside the film deposition chamber and inserted into and mounted on the opening section. The exhaust pipe connecting section is provided with an inert-gas supply passage and an inert-gas supply port, both in the connecting section. The exhaust adhesion preventive member is provided with an inert-gas supply passage formed of a gap between each of an inner peripheral surface of the opening section and an inner wall of the film deposition chamber around the opening section, and the adhesion preventive member, and an inert-gas discharge port provided in the inert-gas supply passage, and from which the inert gas flows out into the film deposition chamber.

Abstract: An apparatus for plasma atomic layer deposition includes a tubular, insulating injector adhesion preventive member mountable to a gas-introducing opening section from inside a film forming chamber, a tubular, insulating exhaust adhesion preventive member mountable to an exhaust opening section from inside the film forming chamber, and an insulating film forming chamber adhesion preventive member mountable to an inner wall side of the film forming chamber. The injector adhesion preventive member and the exhaust adhesion preventive member are separated from each of a plate electrode and a counter electrode side, and the film forming chamber adhesion preventive member is disposed on each side of the injector adhesion preventive member and the exhaust adhesion preventive member to be separated from each of the plate electrode and the counter electrode side. The apparatus further includes an upper and lower inert-gas supply port that purges inert gas toward inside the film forming chamber.

Abstract: A method of manufacturing a display device having an organic EL device includes the steps of : forming an organic EL device over a substrate; and forming a protection film so as to cover the organic EL device. The protection film is made of a laminated film of a first insulating film containing Si, a second insulating film containing Al and a third insulating film containing Si. The step of forming the protection film includes the steps of: forming the first insulating film by a plasma CVD method so as to cover the organic EL device; forming the second insulating film over the first insulating film by an ALD method; and forming the third insulating film over the second insulating film by a plasma CVD method.

Abstract: [Object] To provide a production method capable of producing a gallium nitride crystal at a lower pressure. [Solution] Provided is a method for producing a gallium nitride crystal, the method including a step of heating metal gallium and iron nitride in a nitrogen atmosphere at least to a reaction temperature at which the metal gallium and the iron nitride react.

Abstract: An automotive interior part includes a thermoplastic resin composition containing a prescribed acetone insoluble fraction (A) and a prescribed acetone soluble fraction (B), in which a content of the acetone insoluble fraction (A) is 5 to 18% by mass based on 100% by mass of a sum of the acetone insoluble fraction (A) and the acetone soluble fraction (B).

Abstract: A non-limiting example game system comprises a server and a plurality of game apparatuses, each game apparatus emulating a game program. If applying a predetermined instruction during a game, a game screen is captured and an image file is produced. Furthermore, at this time, emulator status information is uploaded to the server from a game apparatus. Then, the server transmits a URL indicative of a storing location of the emulator status information to the game apparatus. The game apparatus writes the URL as metadata of the image file, and uploads the image file to the server. Furthermore, the game apparatus downloads a desired image file from the server, and downloads the emulator status information according to the URL that is acquired from the downloaded image file. An emulator status of another game apparatus can be reproduced by reading this emulator state information.

Abstract: An automotive interior parts includes a thermoplastic resin composition containing a prescribed acetone insoluble fraction (A) and a prescribed acetone soluble fraction (B), in which a content of the acetone insoluble fraction (A) is 5 to 18% by mass based on 100% by mass of a sum of the acetone insoluble fraction (A) and the acetone soluble fraction (B).