Patents by Inventor Tjarko Adriaan Rudolf Van Empel
Tjarko Adriaan Rudolf Van Empel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9766558Abstract: A positioning apparatus includes a first object and a second object; a positioning system configured to position the first and the second objects with respect to each other; and a flexible transportation line that is connected to the first and the second objects, the flexible transportation line having a stiffness that varies along the flexible transportation line such that the flexible transportation line can be represented by a dynamic transfer function, the dynamic transfer function being adapted to a closed-loop transfer function of the positioning system.Type: GrantFiled: February 23, 2010Date of Patent: September 19, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Martijn Houkes, Norbert Erwin Therenzo Jansen
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Patent number: 9455172Abstract: An electrostatic clamp configured to, in use, hold an article, such as a reticle or a wafer in a lithographic apparatus. The clamp includes a lower portion; an upper portion formed of a dielectric material, and a plurality of electrodes disposed between the lower portion and the upper portion. The electrodes include a first electrode configured in use to be held at a first voltage, at least one intermediate electrode configured in use to be held at a second voltage, and a ground electrode. The at least one intermediate electrode is located between the first electrode and the ground electrode and the second voltage is between the first voltage and ground to reduce the voltage across a barrier between the electrodes and so reduce the risk of high-voltage breakdown.Type: GrantFiled: January 29, 2013Date of Patent: September 27, 2016Assignee: ASML NETHERLANDS B.V.Inventor: Tjarko Adriaan Rudolf Van Empel
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Patent number: 9363879Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.Type: GrantFiled: November 4, 2014Date of Patent: June 7, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van de Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Patent number: 9176398Abstract: A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.Type: GrantFiled: May 20, 2009Date of Patent: November 3, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Roger Wilhelmus Antonius Henricus Schmitz, Tjarko Adriaan Rudolf Van Empel, Marcel Johannus Elisabeth Hubertus Muitjens, Lun Cheng, Franciscus Johannes Joseph Janssen, Willem Arie Van Helden, Richard Versluis, Paulus Bartholomeus Johannes Schaareman, Axel Sebastiaan Lexmond, Evert Nieuwkoop, Charles William Barras Potts, Martinus Henricus Johannes Lemmen, Frederik Van Der Graaf, Mathilde Gertrudis Maria De Kroon, Johannes Fransiscus Maria Velthuis
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Publication number: 20150077729Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.Type: ApplicationFiled: November 4, 2014Publication date: March 19, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Tjarko Adriaan Rudolf VAN EMPEL, Vadim Yevgenyevich BANINE, Vladimir Vitalevich IVANOV, Erik Roelof LOOPSTRA, Johannes Hubertus Josephina MOORS, Jan Bernard Plechelmus VAN SCHOOT, Yuri Johannes Gabriël VAN DE VIJVER, Gerardus Hubertus Petrus Maria SWINKELS, Hendrikus Gijsbertus SCHIMMEL, Dzmitry LABETSKI
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Publication number: 20150036258Abstract: An electrostatic clamp configured to, in use, hold an article, such as a reticle or a wafer in a lithographic apparatus. The clamp includes a lower portion; an upper portion formed of a dielectric material, and a plurality of electrodes disposed between the lower portion and the upper portion. The electrodes include a first electrode configured in use to be held at a first voltage, at least one intermediate electrode configured in use to be held at a second voltage, and a ground electrode. The at least one intermediate electrode is located between the first electrode and the ground electrode and the second voltage is between the first voltage and ground to reduce the voltage across a barrier between the electrodes and so reduce the risk of high-voltage breakdown.Type: ApplicationFiled: January 29, 2013Publication date: February 5, 2015Inventor: Tjarko Adriaan Rudolf Van Empel
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Patent number: 8901521Abstract: A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.Type: GrantFiled: August 25, 2008Date of Patent: December 2, 2014Assignee: ASML Netherlands B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Patent number: 8749756Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: GrantFiled: January 30, 2012Date of Patent: June 10, 2014Assignee: ASML Netherlands B.V.Inventors: Yuri Johannes Gabrial Van De Vijver, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski, Tjarko Adriaan Rudolf Van Empel
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Patent number: 8711325Abstract: The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.Type: GrantFiled: November 6, 2008Date of Patent: April 29, 2014Assignee: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Tjarko Adriaan Rudolf Van Empel, Hans Johannes Maria Freriks, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Marc Antonius Maria Haast, Wendelin Johanna Maria Versteeg, Peter Gerardus Jonkers, Dzmitry Labetski
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Patent number: 8451429Abstract: A dichroic mirror configured to separate a first type of radiation in a first wavelength range having an upper boundary from a second type of radiation in a second wavelength range having a lower boundary greater than the upper boundary of the first wavelength. The mirror includes a substrate, and a stack having a reflective surface facing away from the substrate and a width that increases stepwise in a direction towards the substrate. The stack is formed by alternating layers of first and second materials on the substrate. The reflective surface has steps with a width greater than the upper boundary of the first wavelength and less than the lower boundary of the second wavelength.Type: GrantFiled: May 1, 2009Date of Patent: May 28, 2013Assignee: ASML Netherlands B.V.Inventor: Tjarko Adriaan Rudolf Van Empel
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Patent number: 8441610Abstract: An assembly including a conditioning system and an object moveable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.Type: GrantFiled: April 11, 2011Date of Patent: May 14, 2013Assignee: ASML Netherlands B.V.Inventors: Ronald Van Der Ham, Tjarko Adriaan Rudolf Van Empel, Herman Vogel, Niek Jacobus Johannes Roset
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Patent number: 8242471Abstract: A radiation source includes a radiation emitter configured to emit radiation, a collector configured to collect the radiation, and a contamination trap configured to trap contamination emitted by the radiation source. The contamination trap includes a plurality of foils that extend substantially radially, a first magnet ring configured to lie outside of an outer conical trajectory of radiation that is collected by the collector, and a second magnet ring configured to lie within the trajectory of radiation that is collected by the collector. The magnet rings are configured to provide a magnetic field that includes a component that is parallel to the foils.Type: GrantFiled: April 28, 2009Date of Patent: August 14, 2012Assignee: ASML Netherlands B.V.Inventors: Wouter Anthon Soer, Vadim Yevgenyevich Banine, Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Maarten Marinus Johannes Wilhelmus Van Herpen
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Patent number: 8228487Abstract: A lithographic apparatus is configured to transfer a pattern from a patterning structure, held by a patterning structure holder, onto a substrate that is held by a substrate holder. The apparatus includes a first object holder configured to hold an object, and an object temperature conditioner configured to condition a temperature of the object prior to and/or during transfer of the object to the first object holder. The object temperature conditioner includes a second object holder having a fluid duct system and an electrical temperature conditioner.Type: GrantFiled: February 19, 2009Date of Patent: July 24, 2012Assignee: ASML Netherlands B.V.Inventors: Albert Pieter Rijpma, Tjarko Adriaan Rudolf Van Empel
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Patent number: 8218128Abstract: A lithographic apparatus is disclosed that has a movable article support configured to hold and move an article, a radiation control system configured to control a beam of radiation to be targeted onto the article, the article support, or both, the article to be moved relatively to the radiation control system by the movable article support for measurement, exposure, or both purposes, and a pressure shield that is mechanically uncoupled from the radiation control system to shield against pressure waves induced by the article support so as to help prevent displacement of the radiation control system caused by the pressure waves.Type: GrantFiled: January 16, 2009Date of Patent: July 10, 2012Assignee: ASML Netherlands B.V.Inventor: Tjarko Adriaan Rudolf Van Empel
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Publication number: 20120147348Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: ApplicationFiled: January 30, 2012Publication date: June 14, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Yuri Johannes Gabriel VAN DE VIJVER, Tjarko Adriaan Rudolf VAN EMPEL, Jan Bernard Plechelmus VAN SCHOOT, Gerardus Hubertus Petrus Maria SWINKELS, Hendrikus Gijsbertus SCHIMMEL, Dzmitry LABETSKI
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Patent number: 8115900Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: GrantFiled: September 17, 2007Date of Patent: February 14, 2012Assignee: ASML Netherlands B.V.Inventors: Yuri Johannes Gabriël Van De Vijver, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski, Tjarko Adriaan Rudolf Van Empel
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Patent number: 8094287Abstract: A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.Type: GrantFiled: September 25, 2008Date of Patent: January 10, 2012Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Antonius Johannes Van Der Net, Yuri Johannes Gabriel Van De Vijver, Bernhard Gellrich, Bauke Jansen, Rens Sanderse
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Publication number: 20110310368Abstract: A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.Type: ApplicationFiled: May 20, 2009Publication date: December 22, 2011Applicant: ASML Netherlands B.V.Inventors: Roger Wilhelmus Antonius Henricus Schmitz, Tjarko Adriaan Rudolf Van Empel, Marcel Johannus Elisabeth Hubertus Muitjens, Lun Cheng, Franciscus Johannes Joseph Janssen, William Arie Van Helden, Richard Versluis, Paulus Bartholomeus Johannes Schaareman, Axel Sebastiaan Lexmond, Evert Nieuwkoop, Charles William Barras Potts, Martinus Henricus Johannes Lemmen, Frederik Van Der Graaf, Mathilde Gertrudis Maria De Kroon, Johannes Fransiscus Maria Velthuis
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Patent number: 8072575Abstract: In an embodiment, a lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, wherein the lithographic apparatus includes an air shower and a temperature sensor positioned near the air shower for measuring the temperature of an air stream in the air shower. The temperature sensor is a thermocouple sensor, e.g., of a thermopile arrangement type. The thermocouple sensor includes a plurality of thermocouples in series, wherein a cold junction and a hot junction are provided, the cold junction being connected to a heat sink, and the hot junction being positioned into the air stream of the air shower.Type: GrantFiled: February 20, 2009Date of Patent: December 6, 2011Assignee: ASML Netherlands B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Paulus Bartholomeus Johannes Schaareman
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Publication number: 20110261329Abstract: The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.Type: ApplicationFiled: November 6, 2008Publication date: October 27, 2011Applicant: ASML Netherlands B.V.Inventors: Hendrikus Gijsbertus Schimmel, Tjarko Adriaan Rudolf Van Empel, Hans Johannes Maria Freriks, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Marc Antonius Maria Haast, Wendelin Johanna Maria Versteeg, Peter Gerardus Jonkers, Dzmitry Labetski