Abstract: An assembly including a conditioning system and an object moveable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.

Abstract: A lithographic apparatus includes a position measurement system to determine along a measurement path a position of a first part of the lithographic apparatus with respect to a position of a second part of the lithographic apparatus. The position determination system comprises a plurality of temperature sensors to measure a temperature of a medium along the measurement path. The position measurement system corrects the determined position making use of the temperature as measured by the temperature sensors.

Abstract: An assembly including a conditioning system and an object movable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.

Abstract: A radiation system configured to generate a radiation beam, the radiation system including a chamber including: a radiation source configured to generate radiation; a radiation beam emission aperture; a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture; and a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture, wherein the spectral purity filter is configured to divide the chamber into a high pressure region and a low pressure region.

Abstract: A positioning apparatus includes a first object and a second object; a positioning system configured to position the first and the second objects with respect to each other; and a flexible transportation line that is connected to the first and the second objects, the flexible transportation line having a stiffness that varies along the flexible transportation line such that the flexible transportation line can be represented by a dynamic transfer function, the dynamic transfer function being adapted to a closed-loop transfer function of the positioning system.

Abstract: A lithographic apparatus is disclosed that includes a first gas shower configured to supply a first gas flow to an interior space of the apparatus, and a second gas shower configured to supply a second gas flow to the interior space of the apparatus, the gas showers configured to direct the first gas flow and the second gas flow at least partly towards each other. Also, a method for conditioning an interior space of a device manufacturing apparatus is provided that includes supplying a first conditioned gas flow and a second conditioned gas flow to the interior space, such that the first conditioned gas flow and the second conditioned gas flow are at least partly directed to each other.

Abstract: A lithographic apparatus including a filter device is disclosed. The filter device has a plurality of foils attached to a holder which is able to rotate around a rotation axis. The foils are arranged substantially parallel to the rotation axis. The foils comprise a uni-directional carbon-fiber composite material selected from the group consisting of carbon-carbon composite (C-C composite) and carbon-silicon carbide composite (C—SiC composite). During operation, the filter device rotates and filters out debris from a radiation source, such as a Sn plasma source. Such a filter device per se may be provided.

Abstract: A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

Abstract: A dichroic mirror configured to separate a first type of radiation in a first wavelength range having an upper boundary from a second type of radiation in a second wavelength range having a lower boundary greater than the upper boundary of the first wavelength. The mirror includes a substrate, and a stack having a reflective surface facing away from the substrate and a width that increases stepwise in a direction towards the substrate. The stack is formed by alternating layers of first and second materials on the substrate. The reflective surface has steps with a width greater than the upper boundary of the first wavelength and less than the lower boundary of the second wavelength.

Abstract: A radiation source includes a radiation emitter configured to emit radiation, a collector configured to collect the radiation, and a contamination trap configured to trap contamination emitted by the radiation source. The contamination trap includes a plurality of foils that extend substantially radially, a first magnet ring configured to lie outside of an outer conical trajectory of radiation that is collected by the collector, and a second magnet ring configured to lie within the trajectory of radiation that is collected by the collector. The magnet rings are configured to provide a magnetic field that includes a component that is parallel to the foils.

Abstract: In an embodiment, a lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, wherein the lithographic apparatus includes an air shower and a temperature sensor positioned near the air shower for measuring the temperature of an air stream in the air shower. The temperature sensor is a thermocouple sensor, e.g., of a thermopile arrangement type. The thermocouple sensor includes a plurality of thermocouples in series, wherein a cold junction and a hot junction are provided, the cold junction being connected to a heat sink, and the hot junction being positioned into the air stream of the air shower.

Abstract: A lithographic apparatus is configured to transfer a pattern from a patterning structure, held by a patterning structure holder, onto a substrate that is held by a substrate holder. The apparatus includes a first object holder configured to hold an object, and an object temperature conditioner configured to condition a temperature of the object prior to and/or during transfer of the object to the first object holder. The object temperature conditioner includes a second object holder having a fluid duct system and an electrical temperature conditioner.

Abstract: A lithographic apparatus is disclosed that has a movable article support configured to hold and move an article, a radiation control system configured to control a beam of radiation to be targeted onto the article, the article support, or both, the article to be moved relatively to the radiation control system by the movable article support for measurement, exposure, or both purposes, and a pressure shield that is mechanically uncoupled from the radiation control system to shield against pressure waves induced by the article support so as to help prevent displacement of the radiation control system caused by the pressure waves.

Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.

Abstract: A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.

Abstract: A lithographic apparatus including a filter device is disclosed. The filter device has a plurality of foils attached to a holder which is able to rotate around a rotation axis. The foils are arranged substantially parallel to the rotation axis. The foils comprise a uni-directional carbon-fiber composite material selected from the group consisting of carbon-carbon composite (C-C composite) and carbon-silicon carbide composite (C—SiC composite). During operation, the filter device rotates and filters out debris from a radiation source, such as a Sn plasma source. Such a filter device per se may be provided.

Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.

Abstract: A lithographic apparatus is disclosed that has a movable article support configured to hold and move an article, a radiation control system configured to control a beam of radiation to be targeted onto the article, the article support, or both, the article to be moved relatively to the radiation control system by the movable article support for measurement, exposure, or both purposes, and a pressure shield that is mechanically uncoupled from the radiation control system to shield against pressure waves induced by the article support so as to help prevent displacement of the radiation control system caused by the pressure waves.

Abstract: A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.