Abstract: A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.

Abstract: A gas shower to condition at least one optical path in an optical apparatus, wherein the gas shower includes a gas distribution chamber having a shower outlet side to supply gas to the optical path, the gas distribution chamber being configured to distribute the gas to the optical path, wherein the gas distribution chamber includes a substantially sharp tapered tip.

Abstract: A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for holding a substrate the substrate holder provided with a device to provide a holding force for pressing the substrate against the substrate holder; a releasing structure constructed and arranged to eject the substrate from the holder against the holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus may include a controller for controlling the releasing structure so as to release the substrate from the holder with a release force that is reduced prior to final release.

Abstract: In a lithographic apparatus, a measurement of the position of an object in an ambient space by an object position measuring system which is influenced by pressure variations in the ambient space, is corrected by an accurate measurement of the pressure in the ambient space. A pressure difference is measured between a pressure in a reference pressure volume and an ambient pressure in an ambient space. An absolute pressure in the reference pressure volume is added to the pressure difference to determine a change of pressure in the ambient space. Alternatively, the pressure difference is integrated over time and a determined change of pressure in the reference pressure volume is added to the pressure difference to determine a change of pressure in the ambient space.

Abstract: A lithographic system includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. Feed forward correction of non-flatness induced wafer grid distortion is allowed during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.

Abstract: A lithographic apparatus includes a support constructed to support a patterning device that is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an interior space through which an interferometer beam propagates, and a first gas supply for supplying a purge gas to inhibit contamination of the projection system. The purge gas has a predetermined refractive index. The apparatus also includes a second gas supply for supplying a conditioning gas to the interior space for conditioning the interior space, and a refractive index matching system arranged to match the refractive index of the conditioning gas to the predetermined refractive index of the purge gas.

Abstract: A lithographic projection apparatus includes a radiation system for providing a beam of radiation, and a substrate holder. The substrate holder includes a plurality of protrusions for providing a substantially flat plane of support for supporting a substrate in a beam path of the beam of radiation, at least one clamping electrode for generating an electric field for clamping the substrate against the substrate holder, and a peripheral supporting edge arranged to contact the substrate. The electrode extends beyond the peripheral supporting edge for providing a torsion load to level the substrate near the edges of the substrate.

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in the beam of radiation. The article support includes a plurality of supporting protrusions for supporting the article, and at least one protective member located near a boundary of the supporting protrusions for protecting at least a boundary portion of the supporting protrusions during release of the article. The apparatus also includes a releasing device for releasing said article from said article support.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation, and at least one clamping electrode for generating an electrostatic clamping force for clamping the article against the article holder. The clamping electrode includes an electric field changer for locally changing the electrostatic clamping force for leveling local height variations of the substrate.

Abstract: A lithographic projection apparatus including a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder having a plurality of protrusions, the extremities thereof defining a substantially flat plane of support for supporting a substantially flat substrate, the substrate holder provided with the ability to provide a pressing force for pressing the substrate against the extremities of the protrusions, the protrusions in an edge zone of the substrate holder arranged to provide a substantially flat overhanging of the substrate in relation to the pressing force of the pressing means; and a projection system for projecting the patterned beam onto a target portion of the substrate.

Abstract: A lithographic projection apparatus includes a radiation system constructed and arranged to supply a projection beam of radiation, a support structure constructed and arranged to support a patterning structure, the patterning structure constructed and arranged to pattern the projection beam according to a desired pattern, a substrate support constructed and arranged to support a substrate, and a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate. The apparatus further includes a gas flushing system comprising radial gas flow outlets, said gas flushing system being constructed and arranged to generate a radial gas flow through said radial gas flow outlets in an intermediate space defined between said gas flushing system and said substrate, wherein the radial gas flow has a radial velocity directed outwards in said space with a magnitude larger than zero at every location in said space.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.

Abstract: In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. A variety of structures may be used to provide the laminar flow including a screen, a settling chamber, an angled inlet port and a flow path having increasing cross-sectional area.

Abstract: A lithographic projection apparatus including a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder having a plurality of protrusions, the extremities thereof defining a substantially flat plane of support for supporting a substantially flat substrate, the substrate holder provided with the ability to provide a pressing force for pressing the substrate against the extremities of the protrusions, the protrusions in an edge zone of the substrate holder arranged to provide a substantially flat overhanging of the substrate in relation to the pressing force of the pressing means; and a projection system for projecting the patterned beam onto a target portion of the substrate.

Abstract: A lithographic projection apparatus includes a radiation system constructed and arranged to supply a projection beam of radiation, a support structure constructed and arranged to support a patterning structure, the patterning structure constructed and arranged to pattern the projection beam according to a desired pattern, a substrate support constructed and arranged to support a substrate, and a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate. The apparatus further includes a gas flushing system comprising radial gas flow outlets, said gas flushing system being constructed and arranged to generate a radial gas flow through said radial gas flow outlets in an intermediate space defined between said gas flushing system and said substrate, wherein the radial gas flow has a radial velocity directed outwards in said space with a magnitude larger than zero at every location in said space.

Abstract: A lithographic apparatus has an inner purge compartment surrounding and moving with a moveable component such as a mask table or a substrate table and an outer purge compartment surrounding the inner purge compartment. Purge gas is supplied to the inner compartment and exhausted from the outer compartment so that the inner purge compartment is at an average pressure higher than ambient and the outer compartment is at a pressure lower than ambient. Even when acceleration of the moveable object and compartments cause local pressure variations, the inner compartment is at a higher pressure than the outer compartment so that any gas flow is outward and contamination is prevented from reaching the inner compartment.

Abstract: In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. A variety of structures may be used to provide the laminar flow including a screen, a settling chamber, an angled inlet port and a flow path having increasing cross-sectional area.

Abstract: A lithographic apparatus has an inner purge compartment surrounding and moving with a moveable component such as a mask table or a substrate table and an outer purge compartment surrounding the inner purge compartment. Purge gas is supplied to the inner compartment and exhausted from the outer compartment so that the inner purge compartment is at an average pressure higher than ambient and the outer compartment is at a pressure lower than ambient.