Abstract: A plasma processing system includes a first unit for plasma-processing a sample based on a recipe for plasma processing, and a second unit for modifying the recipe in accordance with a monitored value obtained during the plasma processing of the sample in the first unit. A next sample is plasma processed in the first unit based on the modified recipe.

Abstract: A driving force control device can set driving force characteristics which conform to tastes of drivers using one vehicle thus giving the easy-to-drive feeling to the drivers. An E/G13ECU possesses three modes 1 to 3 as control modes and selects one mode from these modes based on a manipulation input using a mode selection switch. Further, any one of the mode out of these modes 1 to 3 is preset in the E/G13ECU as a temporary changeover mode, and the E/G13ECU changes over a mode selected by the mode selection switch and the preset temporary changeover mode alternatively by the temporary changeover switch.

Abstract: A plasma processing apparatus includes a vacuum processing apparatus for performing a multi-step processing operation for a sample, a sensor for monitoring process parameters during at least a first step of the processing operation, a signal compression unit for compressing a signal from the sensor to generate an apparatus state signal, a worked result estimate model unit which estimates a processed result on the basis of the apparatus state signal and a set processed-result estimation equation, an optimum recipe calculation model unit which calculates corrections to processing conditions so that the processed result becomes a target value, a usable recipe selecting unit which judges validity of an optimum recipe. At a next step of the processing operation, sample processing is performed under optimum conditions on the basis of the usable recipe selected by the selected usable recipe.

Abstract: In a sliding door apparatus, a first entrance is opened and closed by a first door, and a second entrance that faces the first entrance is opened and closed by a second door. Imaging means that captures images across a space between the first entrance and the second entrance is disposed beside the space. An image processing and determining portion determines presence or absence of an obstruction inside the space based on image data from the imaging means.

Abstract: A portable imaging device has a memory which stores a device image. This device image shows a part of an outside of the portable image device itself including a plurality of selectable portions relating to the control members of the portable image device. The device image is read and is indicated on the LCD of the portable image device. With the portable image at least one of characters is indicated on the LCD. The characters correspond to selectable portions. One of the selectable portions is selected as a selected portion. The selected portion is distinguished from other selectable portion by the characters. The function relating to the selected portion is indicated on the LCD.

Abstract: In an oxide film etching process, a plasma having a suitable ratio of CF3, CF2, CF, and F is necessary, and there is a problem in that the etching characteristic fluctuates in accordance with a temperature fluctuation of the etching chamber. Using a UHF type ECR plasma etching apparatus having a low electron temperature, a suitable dissociation can be obtained, and by maintaining the temperature of a side wall of the etching chamber in a range from 10° C. and 120° C., a stable etching characteristic can be obtained. Since oxide film etching using a low electron temperature and a high density plasma can be obtained, an etching result having a superior characteristic can be obtained, and, also, since the side wall temperature adjustment range is low, a simplified apparatus structure and a heat resistant performance countermeasure can be obtained easily.

Abstract: The driving force control unit for vehicle comprises a driving condition detecting unit for detecting the vehicle driving condition, a selector for selecting one of driving modes by manipulation, the driving modes including a first mode having a driving force characteristic suitable for normal driving and a second mode having a suppressed driving force, and driving force setting unit for setting a driving force indication value based on the selected mode and the vehicle driving conditions. The selector being formed by a multiple switch having a push switch which turns to ON state when a pressing force direction manipulation is applied, and other switch which turns to ON state when manipulation other than the pressing force direction is applied, the second mode is selected by the ON manipulation of the push switch.

Abstract: The present invention provides a driving force control unit for a vehicle having an accelerator opening degree detecting unit for detecting accelerator opening degree, a driving condition detecting unit for detecting engine driving condition, a driving force setting unit for setting a driving force indication value according to a plurality of different driving force characteristics based on the accelerator opening degree and the engine driving condition, a selector for selecting a driving force characteristic from the plural of different driving force characteristics by manipulation. The driving force setting unit setting the driving force indication value according to the selected driving force characteristic.

Abstract: A semiconductor processing apparatus for processing a semiconductor wafer includes a plurality of sensors for monitoring a processing state, a processing result input unit, a model equation generation unit to generate a model equation for predicting a processing result, a processing result prediction unit which predicts a processing result, and a process recipe control unit. Further, a system is provided which comprises the model equation generation unit is provided at a remote location, and transmits the generated prediction model equation to the semiconductor processing apparatus through a network to control the processing condition of the semiconductor processing apparatus by the process recipe control unit.

Abstract: The driving force control unit comprises a plurality of control modes for controlling a driving force, each of control modes having each driving force characteristic; a vehicle driving condition detecting unit for detecting a vehicle driving condition; a selector for selecting one control mode from the plurality of control modes; a driving force setting unit for setting a driving force indication value according to the driving force characteristic selected by the selector based on the vehicle driving condition; and a shift lever position detector for detecting a shift lever position of a transmission. The control mode includes a reverse control mode having a reverse driving force characteristic suitable for traveling the vehicle in reverse direction. The driving force setting unit changes the control mode to the reverse control mode when the shift lever is detected in a position of a reverse range, and sets the driving force indication value according to the reverse driving force characteristic.

Abstract: The driving force control unit for a vehicle comprises a plurality of control modes for controlling a driving force, each of control modes having each driving force characteristic, a vehicle driving condition detecting unit for detecting a vehicle driving condition, a selector for selecting one control mode from the control modes, a temporary selector for changing the current mode to other mode, and a driving force indication value setting unit for setting a driving force indication value according to the vehicle driving condition and the driving force characteristic corresponding to the selected mode by the selector or the temporary selector.

Abstract: A plasma processing apparatus includes a vacuum vessel with a sample stage having a mounting surface disposed in a process chamber, and a plate having substantially uniform thickness and electric power applied thereto constituting a ceiling of the chamber. The plate is disposed opposite to and substantially parallel with the sample stage so as to cover the whole area of the stage mounting surface and has a through-hole therein. An optical transmitter with a diameter larger than a diameter of the though-hole is disposed inside of the vacuum vessel and has an end face at a position above and spaced a small distance a back surface of the plate so as to receive light from the chamber via the through-hole. The optical transmitter is independently detachable with respect to the back surface of the plate.

Abstract: The driving force control unit for vehicle comprises a driving condition detecting unit for detecting the vehicle driving condition, a selector for selecting one of driving modes by manipulation, the driving modes including a first mode having a driving force characteristic suitable for normal driving and a second mode having a suppressed driving force, and driving force setting unit for setting a driving force indication value based on the selected mode and the vehicle driving conditions. The selector being formed by a multiple switch having a push switch which turns to ON state when a pressing force direction manipulation is applied, and other switch which turns to ON state when manipulation other than the pressing force direction is applied, the second mode is selected by the ON manipulation of the push switch.

Abstract: The present invention provides a driving force control device which can set driving force characteristics which conform to tastes of drivers using one vehicle thus giving the easy-to-drive feeling to the drivers. An E/G_ECU possesses three modes 1 to 3 as control modes and selects one mode from these modes based on a manipulation input using a mode selection switch. Further, any one of the mode out of these modes 1 to 3 is preset in the E/G_ECU as a temporary changeover mode, and the E/G_ECU changes over a mode selected by the mode selection switch and the preset temporary changeover mode alternatively by means of the temporary changeover switch.

Abstract: The present invention provides a vehicle display device which can display fuel consumption information of a vehicle in a useful and optimum mode for a driver. A meter_EUC calculates an instantaneous fuel consumption of a vehicle based on a mileage and a fuel injection quantity within a set time, calculates an average fuel consumption of the vehicle based on respective cumulative values of the mileage and the fuel injection quantity repeatedly calculated for every set time, and displays the deviation of the instantaneous fuel consumption with respect to the average fuel consumption as fuel consumption information on a fuel consumption meter. The display on the fuel consumption meter is performed by swinging a pointer with respect to a neutral position.

Abstract: The present invention provides a vehicle display device which allows a driver to instantaneously grasp driving force information. A meter_ECU displays a driving force display image which displays driving force information of a vehicle on an MID, displays an acceleration-torque line (driving force characteristic line) L corresponding to the currently selected mode M and, at the same time, changes a power level which is indicated in a power display region P set within the acceleration-torque line L interlockingly with an accelerator operation of a driver. Due to such a constitution, the vehicle display device allows the driver to instantaneously grasp the driving force information.

Abstract: The invention provides a semiconductor fabrication method comprising a deposition step for depositing a laminated film on a semiconductor substrate having a region in which a mask pattern is formed sparsely and a region in which the mask pattern is formed densely, a lithography step s1 for forming a mask pattern, a cleaning step S11C for removing deposits in the apparatus, a trimming step S3 for trimming the mask pattern, and dry etching steps S4 and S5 for transferring the mask pattern on the laminated film, wherein a seasoning step S11S followed by a deposition step S2 is introduced either before or after the trimming step S3.

Abstract: A plasma processing control system includes a plasma processing apparatus for generating plasma within a vacuum processing chamber and performing a processing operation over a sample accommodated within the vacuum processing chamber using radicals and ions within the plasma, a pre-measuring instrument which measures a shape of the sample before processing, a post-measuring instrument which measures a shape of the sample after the processing, a parameter changer provided with at least one optimum recipe model for calculating a target process parameter, and a model changer for modifying the optimum recipe model, thereby updating a recipe parameter for each etching.

Abstract: A plasma processing apparatus includes: a processing chamber; a state detector for detecting a state of plasma in the processing chamber; an input unit for inputting process result data of a specimen processed in the plasma processing chamber; and a controller including a prediction equation forming unit for forming a prediction equation of a process result in accordance with plasma state data detected with the state detector for the plasma process simulating a specimen existing state in the processing chamber in a specimen non-placed state and process result data of the specimen input with the input unit and processed by the plasma process in a specimen placed state, and storing the prediction equation, wherein the controller predicts the process result of a succeeding plasma process in accordance with plasma state data newly acquired via the state detector in the specimen non-placed state and the stored prediction equation.

Abstract: The invention provides a plasma processing apparatus aimed at suppressing the corrosion caused by reactive gas and heavy-metal contamination caused by plasma damage of components constituting the high-frequency electrode and gas supply unit. The plasma processing apparatus comprises a processing chamber 1 for subjecting a processing substrate 4 to plasma processing, gas supply means 17, 16 and 11 for feeding gas to the processing chamber 1, and an antenna electrode 10 for supplying high-frequency radiation for discharging the gas to generate plasma, wherein the gas supply means includes a gas shower plate 11 having gas discharge holes on the surface exposed to plasma, and a portion of or a whole surface of the conductor 10 exposed to gas constituting the antenna-electrode side of the gas supply means is subjected to ceramic spraying containing no heavy metal to form a protecting film 12.