Patents by Inventor Tsukasa Azuma
Tsukasa Azuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240092303Abstract: An airbag device (1100) includes: an inflator (1110); a first panel (1130) that has a first fixing portion (1132) and a second fixing portion (1133) that are different parts from an edge portion (1131) and that face each other; a second panel (1140) that makes up a sack-like airbag along with the first panel (1130); and a regulating member (1150) provided within the airbag. The length from the first fixing portion (1132) to the second fixing portion (1133) of the first panel (1130) is longer than a length from a first part (1151) to a second part (1152) of the regulating member (1150). The airbag has a main bag (1121) and a sub-inflating portion (1122), and when inflated and deployed, gas from the inflator (1110) in introduced to the main bag (1121), the first panel (1130) faces a passenger, and the sub-inflating portion (1122) catches the passenger.Type: ApplicationFiled: March 25, 2022Publication date: March 21, 2024Applicant: ASHIMORI INDUSTRY CO., LTD.Inventors: Hidetaka AZUMA, Tsukasa INABA, Tetsuro HAMADA
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Patent number: 10950439Abstract: According to one embodiment, a pattern forming method is disclosed. The method includes forming a guide pattern, forming a block copolymer film that covers the guide pattern and includes first and second polymers, and forming a microphase-separation pattern including first portions of the first polymer and second portions of the second polymer which are alternately arranged by subjecting the block copolymer film to microphase separation. The method further includes measuring a position of the guide pattern, the first portions or the second portions by using a scanning probe microscope, determining whether a misalignment amount of the first portions with respect to the guide pattern is within a first range, based on the measured position of the first and the guide pattern, and removing the first portions, when the misalignment amount is within the first range.Type: GrantFiled: September 11, 2019Date of Patent: March 16, 2021Assignee: Toshiba Memory CorporationInventor: Tsukasa Azuma
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Publication number: 20200294796Abstract: According to one embodiment, a pattern forming method is disclosed. The method includes forming a guide pattern, forming a block copolymer film that covers the guide pattern and includes first and second polymers, and forming a microphase-separation pattern including first portions of the first polymer and second portions of the second polymer which are alternately arranged by subjecting the block copolymer film to microphase separation. The method further includes measuring a position of the guide pattern, the first portions or the second portions by using a scanning probe microscope, determining whether a misalignment amount of the first portions with respect to the guide pattern is within a first range, based on the measured position of the first and the guide pattern, and removing the first portions, when the misalignment amount is within the first range.Type: ApplicationFiled: September 11, 2019Publication date: September 17, 2020Applicant: TOSHIBA MEMORY CORPORATIONInventor: Tsukasa AZUMA
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Patent number: 9797034Abstract: A high strength and high toughness cast steel material of the invention has a composition comprising 0.10 to 0.20% by mass of C, 0.10 to 0.50% by mass of Si, 0.40 to 1.20% by mass of Mn, 2.00 to 3.00% by mass of Ni, 0.20 to 0.70% by mass of Cr, and 0.10 to 0.50% by mass of Mo, and further comprising Fe and unavoidable impurities. The high strength and high toughness cast steel material of the invention is produced by subjecting an ingot having the above composition to annealing at 1,000 to 1,100° C., quenching at 850 to 950° C., tempering at 610 to 670° C., and then, if desired, stress-relief annealing at less than 610° C.Type: GrantFiled: September 24, 2010Date of Patent: October 24, 2017Assignee: THE JAPAN STEEL WORKS, LTD.Inventors: Yoshihiro Gotoh, Shinji Tanaka, Tsukasa Azuma
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Patent number: 9291908Abstract: According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.Type: GrantFiled: June 1, 2015Date of Patent: March 22, 2016Assignee: KABUSHIKI KAISHA TOSHIBAInventors: Atsushi Hieno, Shigeki Hattori, Hiroko Nakamura, Satoshi Mikoshiba, Koji Asakawa, Masahiro Kanno, Yuriko Seino, Tsukasa Azuma
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Publication number: 20150261092Abstract: According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.Type: ApplicationFiled: June 1, 2015Publication date: September 17, 2015Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Atsushi HIENO, Shigeki HATTORI, Hiroko NAKAMURA, Satoshi MlKOSHIBA, Koji ASAKAWA, Masahiro KANNO, Yuriko SEINO, Tsukasa AZUMA
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Patent number: 9108342Abstract: According to an embodiment, a method of forming a film is provided. In the method of forming a film, a reversed pattern which is the reverse of a desired layout pattern is formed on a first substrate. Subsequently, a pattern material of the desired layout pattern is supplied to a second substrate as a reversal material. Thereafter, the reversed pattern is brought into contact with the reversal material such that the reversed pattern faces the reversal material, so that the reversed pattern is filled with the reversal material by a capillary phenomenon.Type: GrantFiled: March 8, 2012Date of Patent: August 18, 2015Assignee: Kabushiki Kaisha ToshibaInventor: Tsukasa Azuma
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Patent number: 9073284Abstract: According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.Type: GrantFiled: September 25, 2012Date of Patent: July 7, 2015Assignee: KABUSHIKI KAISHA TOSHIBAInventors: Atsushi Hieno, Shigeki Hattori, Hiroko Nakamura, Satoshi Mikoshiba, Koji Asakawa, Masahiro Kanno, Yuriko Seino, Tsukasa Azuma
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Patent number: 9040123Abstract: According to the embodiments, a pattern formation method includes a process of formation of a self-assembly material layer containing at least a first segment and a second segment on a substrate having a guide layer, a process of formation of a neutralization coating on the self-assembly material layer, and a process of formation of a self-assembly pattern including a first region containing the first segment and a second region containing the second segment following phase separation of the self-assembly material layer.Type: GrantFiled: March 4, 2013Date of Patent: May 26, 2015Assignee: KABUSHIKI KAISHA TOSHIBAInventors: Ayako Kawanishi, Tsukasa Azuma
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Patent number: 9034121Abstract: A low alloy steel ingot contains from 0.15 to 0.30% of C, from 0.03 to 0.2% of Si, from 0.5 to 2.0% of Mn, from 0.1 to 1.3% of Ni, from 1.5 to 3.5% of Cr, from 0.1 to 1.0% of Mo, and more than 0.15 to 0.35% of V, and optionally Ni, with a balance being Fe and unavoidable impurities. Performing quality heat treatment including a quenching step and a tempering step to the low alloy steel ingot to obtain a material, which has a grain size number of from 3 to 7 and is free from pro-eutectoid ferrite in a metallographic structure thereof, and which has a tensile strength of from 760 to 860 MPa and a fracture appearance transition temperature of not higher than 40° C.Type: GrantFiled: April 17, 2012Date of Patent: May 19, 2015Assignees: THE JAPAN STEEL WORKS,LTD., KABUSHIKI KAISHA TOSHIBAInventors: Satoru Ohsaki, Kazuhiro Miki, Tsukasa Azuma, Koji Kajikawa, Shigeru Suzuki, Masayuki Yamada, Itaru Murakami, Kenichi Okuno, Liang Yan, Reki Takaku, Akihiro Taniguchi, Tetsuya Yamanaka, Makoto Takahashi, Kenichi Imai, Osamu Watanabe, Joji Kaneko
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Patent number: 8999078Abstract: A forging heat resistant steel of an embodiment contains in percent by mass C: 0.05-0.2, Si: 0.01-0.1, Mn: 0.01-0.15, Ni: 0.05-1, Cr: 8 or more and less than 10, Mo: 0.05-1, V: 0.05-0.3, Co: 1-5, W: 1-2.2, N: 0.01 or more and less than 0.015, Nb: 0.01-0.15, B: 0.003-0.03, and a remainder comprising Fe and unavoidable impurities.Type: GrantFiled: December 23, 2011Date of Patent: April 7, 2015Assignees: Kabushiki Kaisha Toshiba, The Japan Steel Works, Ltd.Inventors: Masayuki Yamada, Reki Takaku, Haruki Ohnishi, Kenichi Okuno, Kenichi Imai, Kazuhiro Miki, Tsukasa Azuma, Satoru Ohsaki
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Patent number: 8980755Abstract: According to the embodiments, a method for pattern formation includes: creating a first self-assembly material layer which contains a first segment and a second segment, on a substrate on which a guide layer is installed; creating a first self-assembled pattern in which the first self-assembly material layer is phase-separated, the pattern including a first area containing the first segment and a second area containing the second segment; creating a second self-assembly material layer which includes a third segment and a fourth segment, in the first self-assembled pattern; creating a second self-assembled pattern in which the second self-assembly material layer is phase-separated, and which includes a third area containing the third segment and a fourth area containing the fourth segment.Type: GrantFiled: March 4, 2013Date of Patent: March 17, 2015Assignee: Kabushiki Kaisha ToshibaInventors: Ayako Kawanishi, Tsukasa Azuma
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Patent number: 8808973Abstract: According to one embodiment, there is provided a method of forming a pattern including forming a polymer layer on a substrate, the polymer layer including a first and second regions, selectively irradiating either of the first and second regions with energy rays or irradiating the first and second regions with energy rays under different conditions to cause a difference in surface free energy between the first and second regions, thereafter, forming a block copolymer layer on the polymer layer, and causing microphase separation in the block copolymer layer to simultaneously form first and second microphase-separated structures on the first and second regions, respectively.Type: GrantFiled: February 22, 2012Date of Patent: August 19, 2014Assignee: Kabushiki Kaisha ToshibaInventors: Satoshi Mikoshiba, Koji Asakawa, Hiroko Nakamura, Shigeki Hattori, Atsushi Hieno, Tsukasa Azuma, Yuriko Seino, Masahiro Kanno
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Publication number: 20140072722Abstract: According to the embodiments, a pattern formation method includes a process of formation of a self-assembly material layer containing at least a first segment and a second segment on a substrate having a guide layer, a process of formation of a neutralization coating on the self-assembly material layer, and a process of formation of a self-assembly pattern including a first region containing the first segment and a second region containing the second segment following phase separation of the self-assembly material layer.Type: ApplicationFiled: March 4, 2013Publication date: March 13, 2014Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Ayako KAWANISHI, Tsukasa AZUMA
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Publication number: 20140065839Abstract: According to the embodiments, a method for pattern formation includes: creating a first self-assembly material layer which contains a first segment and a second segment, on a substrate on which a guide layer is installed; creating a first self-assembled pattern in which the first self-assembly material layer is phase-separated, the pattern including a first area containing the first segment and a second area containing the second segment; creating a second self-assembly material layer which includes a third segment and a fourth segment, in the first self-assembled pattern; creating a second self-assembled pattern in which the second self-assembly material layer is phase-separated, and which includes a third area containing the third segment and a fourth area containing the fourth segment.Type: ApplicationFiled: March 4, 2013Publication date: March 6, 2014Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Ayako KAWANISHI, Tsukasa AZUMA
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Patent number: 8609014Abstract: According to one embodiment, a template manufacturing method is a method for manufacturing a template for use in an imprint processing in which a pattern having irregularities are formed on a principal surface, and the pattern is brought into contact with a resist member formed on a substrate to be processed, to transfer the pattern to the resist member, the method including implanting charged particles at least into the bottoms of concave portions of the template.Type: GrantFiled: June 1, 2011Date of Patent: December 17, 2013Assignee: Kabushiki Kaisha ToshibaInventors: Tsukasa Azuma, Tatsuhiko Higashiki, Kyoichi Suguro
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Patent number: 8512488Abstract: An Ni—Fe based superalloy forging material including 30 to 40 wt % of Fe, 14 to 16 wt % of Cr, 1.2 to 1.7 wt % of Ti, 1.1 to 1.5 wt % of Al, 1.9 to 2.2 wt % of Nb, 0.05 wt % or less of C and the remainder of Ni and inevitable impurities is solution-treated and aged, and thereby ?? phase (Ni3Al) having an initial mean particle size of about 50 to about 100 nm is precipitated. This superalloy is excellent in high-temperature strength and high-temperature ductility and can produce a large forged product of 10 ton or more. Therefore, this material is suitable for use as the material of a steam turbine rotor having a main steam temperature of 650° C. or more.Type: GrantFiled: August 10, 2007Date of Patent: August 20, 2013Assignees: Hitachi, Ltd., The Japan Steel Works, Ltd.Inventors: Shinya Imano, Hirotsugu Kawanaka, Hiroyuki Doi, Tatsuya Takahashi, Tsukasa Azuma, Koji Kajikawa
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Publication number: 20130078570Abstract: According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.Type: ApplicationFiled: September 25, 2012Publication date: March 28, 2013Inventors: Atsushi HIENO, Shigeki HATTORI, Hiroko NAKAMURA, Satoshi MIKOSHIBA, Koji ASAKAWA, Masahiro KANNO, Yuriko SEINO, Tsukasa AZUMA
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Publication number: 20130078817Abstract: According to an embodiment, a method of forming a film is provided. In the method of forming a film, a reversed pattern which is the reverse of a desired layout pattern is formed on a first substrate. Subsequently, a pattern material of the desired layout pattern is supplied to a second substrate as a reversal material. Thereafter, the reversed pattern is brought into contact with the reversal material such that the reversed pattern faces the reversal material, so that the reversed pattern is filled with the reversal material by a capillary phenomenon.Type: ApplicationFiled: March 8, 2012Publication date: March 28, 2013Inventor: Tsukasa AZUMA
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Publication number: 20120261038Abstract: A low alloy steel ingot contains from 0.15 to 0.30% of C, from 0.03 to 0.2% of Si, from 0.5 to 2.0% of Mn, from 0.1 to 1.3% of Ni, from 1.5 to 3.5% of Cr, from 0.1 to 1.0% of Mo, and more than 0.15 to 0.35% of V, and optionally Ni, with a balance being Fe and unavoidable impurities. Performing quality heat treatment including a quenching step and a tempering step to the low alloy steel ingot to obtain a material, which has a grain size number of from 3 to 7 and is free from pro-eutectoid ferrite in a metallographic structure thereof, and which has a tensile strength of from 760 to 860 MPa and a fracture appearance transition temperature of not higher than 40 ° C.Type: ApplicationFiled: April 17, 2012Publication date: October 18, 2012Applicants: KABUSHIKI KAISHA TOSHIBA, THE JAPAN STEEL WORKS, LTD.Inventors: Satoru OHSAKI, Kazuhiro MIKI, Tsukasa AZUMA, Koji KAJIKAWA, Shigeru SUZUKI, Masayuki YAMADA, Itaru MURAKAMI, Kenichi OKUNO, Liang YAN, Reki TAKAKU, Akihiro TANIGUCHI, Tetsuya YAMANAKA, Makoto TAKAHASHI, Kenichi IMAI, Osamu WATANABE, Joji KANEKO