Abstract: Embodiments of mechanisms of forming a semiconductor device structure are provided. The method includes providing a substrate, forming a first material layer on the substrate, forming a second material layer on the first material layer and forming a first PR layer on the second material layer. The method includes exposing a portion of the first PR layer to a first radiation beam and forming a second PR layer on the first PR layer. The method includes exposing a portion of the second PR layer to a second radiation beam and developing the first PR layer and the second PR layer to form a patterned first PR layer and a patterned second PR layer. The method includes etching a portion of the first material layer and the second material layer by using the patterned first PR layer and the patterned second PR layer as a mask.

Abstract: A defect inspection apparatus is disclosed that includes a stage, a photosensitive element, and a controller. The stage can support a semiconductor element that has a plurality of complete dies and partial dies surrounding the complete dies. The photosensitive element is located above the stage. The controller is electrically connected to the photosensitive element to drive the photosensitive element to inspect the defects of the complete dies and the partial dies.

Abstract: A magnetic device including a first magnetic core is disclosed. The first magnetic core includes a base having a first edge; a first contacting structure disposed on the base; and a second contacting structure disposed on the base, wherein a distance between an inner surface of the first contacting structure and the first edge is larger than a distance between an inner surface of the second contacting structure and the first edge.

Abstract: A method of generating a set of defect candidates for a wafer includes generating a filtration area according to a graph operation of one or more of a plurality of layout areas. The wafer includes at least one die manufactured according to a mask, and the mask is prepared by combining the plurality of layout areas. The method further includes generating the set of defect candidates by omitting a subset of initial defect candidates having positions within the filtration area.

Abstract: A magnetic device including a first magnetic core is disclosed. The first magnetic core includes a base having a first edge; a first contacting structure disposed on the base; and a second contacting structure disposed on the base, wherein a distance between an inner surface of the first contacting structure and the first edge is larger than a distance between an inner surface of the second contacting structure and the first edge.

Abstract: A flash memory apparatus including a command analysis unit, a first flash memory and a second flash memory is provided. The command analysis unit with a plurality of command buffers receives a plurality of command elements and queues the command elements in the command buffers in sequence. The command analysis unit transmits the command elements simultaneously to the first flash memory and the second flash memory through a command bus, and the flash memory device writes/reads the first flash memory and the second flash memory simultaneously through a first data bus and a second data bus different from the first data bus respectively to execute an operation. The flash memory device queues the command elements so as to enhance the command throughput, and the flash memories share the same command bus for dual channel operation.

Abstract: The present invention provides a splitter including a seat, a first inner core, a second inner core, a first coil, an outer core and a second coil. The seat has a bobbin, and the first coil is wound on the bobbin. The first inner core and the second inner core, disposed on the bobbin, are assembled with each other to cover the bobbin. The outer core and the first inner core are assembled with each other. The second coil is disposed between the outer core and the first inner core.

Abstract: The present invention provides a splitter including a seat, a first inner core, a second inner core, a first coil, an outer core and a second coil. The seat has a bobbin, and the first coil is wound on the bobbin. The first inner core and the second inner core, disposed on the bobbin, are assembled with each other to cover the bobbin. The outer core and the first inner core are assembled with each other. The second coil is disposed between the outer core and the first inner core.

Abstract: A method for etching a dielectric material in a semiconductor device is disclosed. After providing a conductive region, a dielectric layer is formed over the conductive region. A dielectric antireflective coating (DARC) layer is further formed on the dielectric layer. Then, a moisture-removal step is performed that removes moisture from the DARC layer and from an interface region between the dielectric and the DARC layer. A masking pattern is transferred into the DARC layer and the dielectric layer.