Patents by Inventor Tsung-Yuan Yu

Tsung-Yuan Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10262964
    Abstract: Embodiments of the present disclosure include interconnect structures and methods of forming interconnect structures. An embodiment is an interconnect structure including a post-passivation interconnect (PPI) over a first substrate and a conductive connector on the PPI. The interconnect structure further includes a molding compound on a top surface of the PPI and surrounding a portion of the conductive connector, a top surface of the molding compound adjoining the conductive connector at an angle from about 10 degrees to about 60 degrees relative to a plane parallel with a major surface of the first substrate, the conductive connector having a first width at the adjoining top surface of the molding compound, and a second substrate over the conductive connector, the second substrate being mounted to the conductive connector.
    Type: Grant
    Filed: April 2, 2018
    Date of Patent: April 16, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wen-Hsiung Lu, Hsuan-Ting Kuo, Tsung-Yuan Yu, Hsien-Wei Chen, Ming-Da Cheng, Chung-Shi Liu
  • Publication number: 20190019765
    Abstract: Packaging devices and methods of manufacture thereof for semiconductor devices are disclosed. In some embodiments, a method of manufacturing a packaging device includes forming an interconnect wiring over a substrate, and forming conductive balls over portions of the interconnect wiring. A molding material is deposited over the conductive balls and the substrate, and a portion of the molding material is removed from over scribe line regions of the substrate.
    Type: Application
    Filed: September 17, 2018
    Publication date: January 17, 2019
    Inventors: Hsien-Wei Chen, Tsung-Yuan Yu, Ming-Da Cheng, Wen-Hsiung Lu
  • Publication number: 20180374807
    Abstract: Presented herein are an interconnect structure and method for forming the same. The interconnect structure includes a contact pad disposed over a substrate and a connector disposed over the substrate and spaced apart from the contact pad. A passivation layer is disposed over the contact pad and over connector, the passivation layer having a contact pad opening, a connector opening, and a mounting pad opening. A post passivation layer including a trace and a mounting pad is disposed over the passivation layer. The trace may be disposed in the contact pad opening and contacting the mounting pad, and further disposed in the connector opening and contacting the connector. The mounting pad may be disposed in the mounting pad opening and contacting the opening. The mounting pad may be separated from the trace by a trace gap, which may optionally be at least 10 ?m.
    Type: Application
    Filed: August 6, 2018
    Publication date: December 27, 2018
    Inventors: Hsien-Wei Chen, Hao-Yi Tsai, Mirng-Ji Lii, Chen-Hua Yu, Tsung-Yuan Yu
  • Patent number: 10079213
    Abstract: Packaging devices and methods of manufacture thereof for semiconductor devices are disclosed. In some embodiments, a method of manufacturing a packaging device includes forming an interconnect wiring over a substrate, and forming conductive balls over portions of the interconnect wiring. A molding material is deposited over the conductive balls and the substrate, and a portion of the molding material is removed from over scribe line regions of the substrate.
    Type: Grant
    Filed: May 31, 2016
    Date of Patent: September 18, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Hsien-Wei Chen, Tsung-Yuan Yu, Ming-Da Cheng, Wen-Hsiung Lu
  • Publication number: 20180226373
    Abstract: Embodiments of the present disclosure include interconnect structures and methods of forming interconnect structures. An embodiment is an interconnect structure including a post-passivation interconnect (PPI) over a first substrate and a conductive connector on the PPI. The interconnect structure further includes a molding compound on a top surface of the PPI and surrounding a portion of the conductive connector, a top surface of the molding compound adjoining the conductive connector at an angle from about 10 degrees to about 60 degrees relative to a plane parallel with a major surface of the first substrate, the conductive connector having a first width at the adjoining top surface of the molding compound, and a second substrate over the conductive connector, the second substrate being mounted to the conductive connector.
    Type: Application
    Filed: April 2, 2018
    Publication date: August 9, 2018
    Inventors: Wen-Hsiung Lu, Hsuan-Ting Kuo, Tsung-Yuan Yu, Hsien-Wei Chen, Ming-Da Cheng, Chung-Shi Liu
  • Patent number: 10043770
    Abstract: Presented herein are an interconnect structure and method for forming the same. The interconnect structure includes a contact pad disposed over a substrate and a connector disposed over the substrate and spaced apart from the contact pad. A passivation layer is disposed over the contact pad and over connector, the passivation layer having a contact pad opening, a connector opening, and a mounting pad opening. A post passivation layer including a trace and a mounting pad is disposed over the passivation layer. The trace may be disposed in the contact pad opening and contacting the mounting pad, and further disposed in the connector opening and contacting the connector. The mounting pad may be disposed in the mounting pad opening and contacting the opening. The mounting pad may be separated from the trace by a trace gap, which may optionally be at least 10 ?m.
    Type: Grant
    Filed: March 16, 2017
    Date of Patent: August 7, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsien-Wei Chen, Hao-Yi Tsai, Mirng-Ji Lii, Chen-Hua Yu, Tsung-Yuan Yu
  • Patent number: 10037962
    Abstract: A package includes a first package component, a second package component over the first package component, and a solder region bonding the first package component to the second package component. At least one ball-height control stud separates the first package component and the second package component from each other, and defines a standoff distance between the first package component and the second package component.
    Type: Grant
    Filed: May 2, 2017
    Date of Patent: July 31, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tsung-Yuan Yu, Hsien-Wei Chen, Jie Chen
  • Patent number: 9997480
    Abstract: A method of forming a device includes forming conductive pads on a semiconductor die. The conductive pads include a first conductive pad having a first width on a first region of the semiconductor die; and a second conductive pad having a second width on a second region of the semiconductor die. The method includes forming bonding pads on a substrate. The bonding pads include a third bonding pad having a third width on a third region of the substrate; and a fourth bonding pad having a fourth width on a fourth region of the substrate. The method further includes forming a conductive material coupled between the first conductive pad and the third bonding pad, and between the second conductive pad and the fourth bonding pad. A ratio A of the first width to the third width is different from a ratio B of the second width to the fourth width.
    Type: Grant
    Filed: October 26, 2017
    Date of Patent: June 12, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hsien-Wei Chen, Ying-Ju Chen, Tsung-Yuan Yu, Yu-Feng Chen, Tsung-Ding Wang
  • Patent number: 9997483
    Abstract: An integrated circuit structure includes a semiconductor substrate, a metal pad over the semiconductor substrate, a passivation layer including a portion over the metal pad, a polymer layer over the passivation layer, and a Post-Passivation Interconnect (PPI) over the polymer layer. The PPI is electrically connected to the metal pad. The PPI includes a PPI line have a first width, and a PPI pad having a second width greater than the first width. The PPI pad is connected to the PPI line. The PPI pad includes an inner portion having a first thickness, and an edge portion having a second thickness smaller than the first thickness.
    Type: Grant
    Filed: January 25, 2016
    Date of Patent: June 12, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsien-Wei Chen, Tsung-Yuan Yu, Wen-Hsiung Lu, Ming-Da Cheng
  • Patent number: 9984965
    Abstract: A system and method for providing and manufacturing an inductor is provided. In an embodiment similar masks are reutilized to form differently sized inductors. For example, a two turn inductor and a three turn inductor may share masks for interconnects and coils, while only masks necessary for connections between the interconnects and coils may need to be newly developed.
    Type: Grant
    Filed: November 6, 2017
    Date of Patent: May 29, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hao-Yi Tsai, Hsien-Wei Chen, Hung-Yi Kuo, Tsung-Yuan Yu
  • Patent number: 9978704
    Abstract: A semiconductor device includes a contact region over a substrate. The semiconductor device further includes a metal pad over the contact region. Additionally, the semiconductor device includes a post passivation interconnect (PPI) line over the metal pad, where the PPI line is in contact with the metal pad. Furthermore, the semiconductor device includes an under-bump-metallurgy (UBM) layer over the PPI line. Moreover, the semiconductor device includes a plurality of solder balls over the UBM layer, the plurality of solder balls being arranged at some, but not all, intersections of a number of columns and rows of a ball pattern.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: May 22, 2018
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tsung-Yuan Yu, Hsien-Wei Chen, Ying-Ju Chen, Shih-Wei Liang
  • Patent number: 9935070
    Abstract: Embodiments of the present disclosure include interconnect structures and methods of forming interconnect structures. An embodiment is an interconnect structure including a post-passivation interconnect (PPI) over a first substrate and a conductive connector on the PPI. The interconnect structure further includes a molding compound on a top surface of the PPI and surrounding a portion of the conductive connector, a top surface of the molding compound adjoining the conductive connector at an angle from about 10 degrees to about 60 degrees relative to a plane parallel with a major surface of the first substrate, the conductive connector having a first width at the adjoining top surface of the molding compound, and a second substrate over the conductive connector, the second substrate being mounted to the conductive connector.
    Type: Grant
    Filed: January 8, 2016
    Date of Patent: April 3, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wen-Hsiung Lu, Hsuan-Ting Kuo, Tsung-Yuan Yu, Hsien-Wei Chen, Ming-Da Cheng, Chung-Shi Liu
  • Publication number: 20180082970
    Abstract: A semiconductor device includes a substrate including a surface, a plurality of pads disposing on the surface of the substrate, the plurality of pads includes a non-solder mask defined (NSMD) pad and a solder mask defined (SMD) pad, and the NSMD pad is arranged at a predetermined location. Further, a method of manufacturing a semiconductor device includes providing a substrate, disposing a plurality of pads on a surface of the substrate, disposing a solder mask over the surface of the substrate and the plurality of pads, forming a first recess in the solder mask to surround one of the plurality of pads, and forming a second recess in the solder mask and above one of the plurality of pads.
    Type: Application
    Filed: November 27, 2017
    Publication date: March 22, 2018
    Inventors: JIE CHEN, YING-JU CHEN, HSIEN-WEI CHEN, TSUNG-YUAN YU
  • Publication number: 20180076135
    Abstract: A system and method for providing and manufacturing an inductor is provided. In an embodiment similar masks are reutilized to form differently sized inductors. For example, a two turn inductor and a three turn inductor may share masks for interconnects and coils, while only masks necessary for connections between the interconnects and coils may need to be newly developed.
    Type: Application
    Filed: November 6, 2017
    Publication date: March 15, 2018
    Inventors: Hao-Yi Tsai, Hsien-Wei Chen, Hung-Yi Kuo, Tsung-Yuan Yu
  • Publication number: 20180047664
    Abstract: A method of manufacturing a semiconductor device includes: receiving a first substrate with a surface; receiving a second substrate; determining a pad array on the surface of the first substrate, wherein the pad array includes a first type pad and a second type pad; forming a via pattern underlying the pad array in the first substrate according to the location of each via, wherein the first type pad in the pad array is directly contacting a via of the via pattern and the second type pad in the pad array is clear of any via of the via pattern; laterally connecting the second type pad with a conductive trace, wherein the conductive trace connects to another via that is same level with the via contacting the first type pad; and disposing a first conductive bump and a second conductive bump between the first substrate and the second substrate.
    Type: Application
    Filed: August 15, 2016
    Publication date: February 15, 2018
    Inventors: TSUNG-YUAN YU, HAO-YI TSAI, CHAO-WEN SHIH, HUNG-YI KUO, PI-LAN CHANG
  • Publication number: 20180047686
    Abstract: A method of forming a device includes forming conductive pads on a semiconductor die. The conductive pads include a first conductive pad having a first width on a first region of the semiconductor die; and a second conductive pad having a second width on a second region of the semiconductor die. The method includes forming bonding pads on a substrate. The bonding pads include a third bonding pad having a third width on a third region of the substrate; and a fourth bonding pad having a fourth width on a fourth region of the substrate. The method further includes forming a conductive material coupled between the first conductive pad and the third bonding pad, and between the second conductive pad and the fourth bonding pad. A ratio A of the first width to the third width is different from a ratio B of the second width to the fourth width.
    Type: Application
    Filed: October 26, 2017
    Publication date: February 15, 2018
    Inventors: Hsien-Wei CHEN, Ying-Ju CHEN, Tsung-Yuan YU, Yu-Feng CHEN, Tsung-Ding WANG
  • Patent number: 9831196
    Abstract: A method of forming a semiconductor device includes forming a passivation layer on top of a guard ring and an active area of a circuit device, forming a passivation contact within the passivation layer, the passivation contact being over and electrically connected to the guard ring, forming a post-passivation interconnect (PPI) guard ring over the passivation layer and electrically connected to the passivation contact, and forming a first polymer layer over the PPI guard ring, the first polymer layer extending along a sidewall of the PPI guard ring.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: November 28, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tsung-Yuan Yu, Hsien-Wei Chen
  • Patent number: 9831205
    Abstract: A semiconductor device includes a substrate including a surface, a plurality of pads disposing on the surface of the substrate, the plurality of pads includes a non-solder mask defined (NSMD) pad and a solder mask defined (SMD) pad, and the NSMD pad is arranged at a predetermined location. Further, a method of manufacturing a semiconductor device includes providing a substrate, disposing a plurality of pads on a surface of the substrate, disposing a solder mask over the surface of the substrate and the plurality of pads, forming a first recess in the solder mask to surround one of the plurality of pads, and forming a second recess in the solder mask and above one of the plurality of pads.
    Type: Grant
    Filed: November 18, 2013
    Date of Patent: November 28, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Jie Chen, Ying-Ju Chen, Hsien-Wei Chen, Tsung-Yuan Yu
  • Patent number: 9812392
    Abstract: A system and method for providing and manufacturing an inductor is provided. In an embodiment similar masks are reutilized to form differently sized inductors. For example, a two turn inductor and a three turn inductor may share masks for interconnects and coils, while only masks necessary for connections between the interconnects and coils may need to be newly developed.
    Type: Grant
    Filed: May 8, 2017
    Date of Patent: November 7, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsien-Wei Chen, Hung-Yi Kuo, Hao-Yi Tsai, Tsung-Yuan Yu
  • Patent number: 9806042
    Abstract: A semiconductor device includes a semiconductor die having first and second conductive pads, and a substrate having third and fourth bonding pads. A width ratio of the first conductive pad over the third bonding pad at an inner region is different from a width ratio of the second conductive pad over the fourth bonding pad at an outer region.
    Type: Grant
    Filed: April 16, 2012
    Date of Patent: October 31, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hsien-Wei Chen, Ying-Ju Chen, Tsung-Yuan Yu, Yu-Feng Chen, Tsung-Ding Wang