Patents by Inventor Wenjie Li

Wenjie Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9187520
    Abstract: Disclosed is a method for preparing an insulin glargine (GlyA21-ArgB31-AryB32-human insulin) crystal, comprising crystallizing the insulin glargine at pH 7.0-9.0 and in a crystallization solution containing a recombinant insulin glargine, an organic solvent of a 10-30% concentration by volume, a zinc compound, a phenol derivative, a salt and an organic acid.
    Type: Grant
    Filed: April 19, 2012
    Date of Patent: November 17, 2015
    Assignee: Gan & Lee Pharmaceuticals
    Inventors: Damei Wang, Wenjie Li, Jinlei Zhang
  • Publication number: 20150284364
    Abstract: The present invention relates to substituted indole derivatives, to processes for their production, to new stable forms, their use as pharmaceuticals and to pharmaceutical compositions comprising them.
    Type: Application
    Filed: November 6, 2013
    Publication date: October 8, 2015
    Inventors: Nicole Bieri, Jörg Brozio, Wenjie Li, Michael Mutz, Rita Ramos, Lei Zhang
  • Patent number: 8975447
    Abstract: Disclosed are a process and catalysts useful for carrying out asymmetric methlyallylations. The catalysts used in the invention have the formula (IV): wherein X1, X2, R3 and R4 are as defined herein. Compounds made by the process of the invention can be used to prepare pharmaceutically active compounds such as 11-?-hydroxysteroid hydrogenase type 1 (11-?-HSD1) inhibitors including 1,3-disubstituted oxazinan-2-ones.
    Type: Grant
    Filed: March 6, 2012
    Date of Patent: March 10, 2015
    Assignee: Boehringer Ingelheim International GmbH
    Inventors: Wenjie Li, Zhi-Hui Lu, Chris Hugh Senanayake, Yongda Zhang
  • Publication number: 20140171692
    Abstract: Disclosed are a process and catalysts useful for carrying out asymmetric methlyallylations. The catalysts used in the invention have the formula (IV): wherein X1, X2, R3 and R4 are as defined herein. Compounds made by the process of the invention can be used to prepare pharmaceutically active compounds such as 11-?-hydroxysteroid hydrogenase type 1 (11-?-HSD1) inhibitors including 1,3-disubstituted oxazinan-2-ones.
    Type: Application
    Filed: March 6, 2012
    Publication date: June 19, 2014
    Applicant: BOEHRINGER INGELHEIM INTERNATIONAL GMBH
    Inventors: Wenjie Li, Zhi-Hui Lu, Chris Hugh Senanayake, Yongda Zhang
  • Publication number: 20140155574
    Abstract: Disclosed is a method for preparing an insulin glargine (GlyA21-ArgB31-AryB32-human insulin) crystal, comprising crystallizing the insulin glargine at pH 7.0-9.0 and in a crystallization solution containing a recombinant insulin glargine, an organic solvent of a 10-30% concentration by volume, a zinc compound, a phenol derivative, a salt and an organic acid.
    Type: Application
    Filed: April 19, 2012
    Publication date: June 5, 2014
    Applicant: GAN & LEE PHARMACEUTICALS
    Inventors: Damei Wang, Wenjie Li, Jinlei Zhang
  • Publication number: 20140094610
    Abstract: The present invention is directed to an improved process for the preparation of Compounds of Formula (I) or salts thereof which are useful in the treatment of HIV infection. In particular, the present invention is directed to an improved process for the preparation of (2S)-2-tert-butoxy-2-(4-(2,3-dihydropyrano[4,3,2-de]quinolin-7-yl)-2-methylquinolin-3-yl)acetic acid or salt thereof which is useful in the treatment of HIV infection.
    Type: Application
    Filed: October 3, 2013
    Publication date: April 3, 2014
    Inventors: Wenjie LI, Philomen DECROOS, Keith R. FANDRICK, Joe Ju GAO, Nizar HADDAD, Zhi-Hui LU, Bo QU, Sonia RODRIGUEZ, Chris H. SENANAYAKE, Yongda ZHANG, Wenjun TANG
  • Publication number: 20140094609
    Abstract: The present invention is directed to an improved process for the preparation of Compounds of Formula (I), which are useful in the treatment of HIV infection. In particular, the present invention is directed to an improved process for the preparation of (2S)-2-tert-butoxy-2-(4-(2,3-dihydropyrano[4,3,2-de]quinolin-7-yl)-2-methylquinolin-3-yl)acetic acid, which is useful in the treatment of HIV infection.
    Type: Application
    Filed: October 2, 2013
    Publication date: April 3, 2014
    Inventors: Brandon H. Brown, Xiang Wang, Keith R. Fandrick, Joe Ju Gao, Nizar Haddad, Serge R. Landry, Wenjie Li, Zhi-Hui Lu, Bo Qu, Diana C. Reeves, Carl Thibeault, Yongda Zhang
  • Patent number: 8676253
    Abstract: An arbitration method and device for arbitrating receiving conflict in a multi-mode multi-SIM multi-standby communication terminal is provided. The method includes: determining if there are at least two cards to receive messages in a time cycle while all of the cards are in standby states, the time cycle being a radio frame of one card; identifying types of messages to be received by the at least two cards after determining there are at least two cards to receive messages in the time cycle, and the types of messages comprising paging message and broadcast message; determining if a receiving conflict occurs; and arbitrating based on the types of receiving conflicts and obtaining arbitration results after determining there is a receiving conflict. The arbitration results include: receiving a paging message preferentially; receiving the paging message with the longest paging period; and receiving the broadcast message with the highest priority.
    Type: Grant
    Filed: May 24, 2011
    Date of Patent: March 18, 2014
    Assignee: Spreadtrum Communications (Shanghai) Co., Ltd.
    Inventor: Wenjie Li
  • Publication number: 20130203461
    Abstract: An arbitration method and device for arbitrating receiving conflict in a multi-mode multi-SIM multi-standby communication terminal is provided. The method includes: determining if there are at least two cards to receive messages in a time cycle while all of the cards are in standby states, the time cycle being a radio frame of one card; identifying types of messages to be received by the at least two cards after determining there are at least two cards to receive messages in the time cycle, and the types of messages comprising paging message and broadcast message; determining if a receiving conflict occurs; and arbitrating based on the types of receiving conflicts and obtaining arbitration results after determining there is a receiving conflict. The arbitration results include: receiving a paging message preferentially; receiving the paging message with the longest paging period; and receiving the broadcast message with the highest priority.
    Type: Application
    Filed: May 24, 2011
    Publication date: August 8, 2013
    Applicant: Spreadtrum Communications (Shanghai) Co., Ltd.
    Inventor: Wenjie Li
  • Patent number: 8487094
    Abstract: Disclosed are syntheses of 11?-HSD1 inhibitors and corresponding intermediates that are promising for the treatment of a variety of disease states including diabetes, metabolic syndrome, obesity, glucose intolerance, insulin resistance, hyperglycemia, hypertension, hypertension-related cardiovascular disorders, hyperlipidemia, deleterious gluco-corticoid effects on neuronal function (e.g. cognitive impairment, dementia, and/or depression), elevated intra-ocular pressure, various forms of bone disease (e.g., osteoporosis), tuberculosis, leprosy (Hansen's disease), psoriasis, and impaired wound healing (e.g., in patients that exhibit impaired glucose tolerance and/or type 2 diabetes).
    Type: Grant
    Filed: July 23, 2009
    Date of Patent: July 16, 2013
    Assignee: Boehringer Ingelheim International GmbH
    Inventors: Keith R. Fandrick, Joe Ju Gao, Wenjie Li, Zhi-Hui Lu, Yongda Zhang
  • Patent number: 8202678
    Abstract: The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
    Type: Grant
    Filed: June 4, 2009
    Date of Patent: June 19, 2012
    Assignee: International Business Machines Corporation
    Inventors: Kuang-Jung J. Chen, Mahmoud Khojasteh, Ranee Wai-Ling Kwong, Margaret C. Lawson, Wenjie Li, Kaushal S. Patel, Pushkara R. Varanasi
  • Publication number: 20110269957
    Abstract: Disclosed are syntheses of 11?-HSD1 inhibitors and corresponding intermediates that are promising for the treatment of a variety of disease states including diabetes, metabolic syndrome, obesity, glucose intolerance, insulin resistance, hyperglycemia, hypertension, hypertension-related cardiovascular disorders, hyperlipidemia, deleterious gluco-corticoid effects on neuronal function (e.g. cognitive impairment, dementia, and/or depression), elevated intra-ocular pressure, various forms of bone disease (e.g., osteoporosis), tuberculosis, leprosy (Hansen's disease), psoriasis, and impaired wound healing (e.g., in patients that exhibit impaired glucose tolerance and/or type 2 diabetes).
    Type: Application
    Filed: July 23, 2009
    Publication date: November 3, 2011
    Applicant: BOEHRINGER INGELHEIM INTERNATIONAL GMBH
    Inventors: Keith R. Fandrick, Joe Ju Gao, Wenjie Li, Zhi-Hui Lu, Yongda Zhang
  • Publication number: 20100297557
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
    Type: Application
    Filed: February 8, 2010
    Publication date: November 25, 2010
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: James F. Cameron, Jin Wuk Sung, John P. Amara, Greogory P. Prokopowicz, David A. Valeri, Libor Vyklicky, Wu-Song S. Huang, Wenjie Li, Pushkara R. Varanasi, Irene Y. Popova
  • Patent number: 7754820
    Abstract: The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for 193 nm lithography. The inventive composition is soluble in aqueous base solutions and has low refractive index at 193 nm. The inventive composition comprises an aqueous base-soluble polymer having a backbone and a fluorinated half ester moiety. The fluorinated half ester moiety is pendant from the backbone. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
    Type: Grant
    Filed: July 21, 2008
    Date of Patent: July 13, 2010
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song S. Huang, Wenjie Li, Pushkara R. Varanasi
  • Patent number: 7700262
    Abstract: A top coat material for applying on top of a photoresist material is disclosed. The top coat material includes a polymer, which includes at least one fluorosulfonamide monomer unit having one of the following two structures: wherein: M is a polymerizable backbone moiety; Z is a linking moiety selected from the group consisting of —C(O)O—, —C(O)—, —OC(O)—, and —O—C(O)—C(O)—O—; R1 is selected from the group consisting of an alkylene, an arylene, a semi- or perfluorinated alkylene, and a semi- or perfluorinated arylene; p and q are 0 or 1; R2 is selected from the group consisting of hydrogen, fluorine, an alkyl group of 1 to 6 carbons, and a semi- or perfluorinated alkyl group of 1 to 6 carbons; n is an integer from 1 to 6; and R3 is selected from the group consisting of hydrogen, an alkyl, an aryl, a semi- or perfluorinated alkyl, and a semi- or perfluorinated aryl. The top coat material may be used in lithography processes, wherein the top coat material is applied on a photoresist layer.
    Type: Grant
    Filed: March 7, 2008
    Date of Patent: April 20, 2010
    Assignee: International Business Machines Corporation
    Inventors: Wenjie Li, Margaret C. Lawson, Pushkara Rao Varanasi
  • Patent number: 7651831
    Abstract: A positive photoresist composition comprises a radiation sensitive acid generator, and a polymer that includes a first repeating unit derived from a sulfonamide monomer including a fluorosulfonamide functionality, a second repeating unit having a pendant acid-labile moiety, and a third repeating unit having a lactone functionality. The positive photoresist composition may be used to form patterned features on a substrate, such as those used in the manufacture of a semiconductor device.
    Type: Grant
    Filed: June 10, 2008
    Date of Patent: January 26, 2010
    Assignee: International Business Machines Corporation
    Inventors: Wenjie Li, Pushkara Rao Varanasi
  • Patent number: 7638264
    Abstract: A positive photoresist composition comprises a radiation sensitive acid generator, and a polymer that includes a first repeating unit derived from a sulfonamide monomer including a fluorosulfonamide functionality, a second repeating unit having a pendant acid-labile moiety, and a third repeating unit having a lactone functionality. The positive photoresist composition may be used to form patterned features on a substrate, such as those used in the manufacture of a semiconductor device.
    Type: Grant
    Filed: May 23, 2006
    Date of Patent: December 29, 2009
    Assignee: International Business Machines Corporation
    Inventors: Wenjie Li, Pushkara Rao Varanasi
  • Patent number: 7638266
    Abstract: A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material feature on a substrate.
    Type: Grant
    Filed: August 12, 2004
    Date of Patent: December 29, 2009
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Gregory Breyta, Wu-Song Huang, Robert Neal Lang, Wenjie Li, David R. Medeiros, Wayne Martin Moreau, Karen Elizabeth Petrillo
  • Patent number: 7639170
    Abstract: A system and method for the network operation of a universal remote controller (URC) and the URC for realizing said system have been disclosed in the invention, said system comprises: a user service subsystem, a data storing and exchanging device and a user operation subsystem. The network operation method for said URC comprises: collecting the parameters of an existing user's remote controller (RC) via a RC sampling device, analyzing and processing the parameter data as a code program, and transferring to the server device via the Internet in order to store and exchange the data; reading the required program from the server device by the URC via the user terminal device and the Internet to realize the function of the URC. In said URC, the URC is provided with a USB interface circuit for downloading the data on the network into the URC.
    Type: Grant
    Filed: August 25, 2006
    Date of Patent: December 29, 2009
    Assignees: Hangzhou Silan Microelectronics Co., Ltd., Hangzhou Bremax Technology Co., Ltd.
    Inventors: Xiangdong Chen, Wenjie Li, Bin Zhang
  • Publication number: 20090291392
    Abstract: The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
    Type: Application
    Filed: June 4, 2009
    Publication date: November 26, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Kuang-Jung J. Chen, Mahmoud Khojasteh, Ranee Wai-Ling Kwong, Margaret C. Lawson, Wenjie Li, Kaushal S. Patel, Pushkara R. Varanasi