Abstract: A polysilane-polysilazane copolymer contains a polysilane unit of formula (I), and a polysilazane unit of formula (II), where each R1 and each R2 are each independently selected from H, Si, and N atoms, R3 is selected from H, Si, or C atoms, a?1, b?1, and a quantity (a+b)?2. The polysilane-polysilazane copolymer may be formulated in a composition with a solvent. The polysilane-polysilazane copolymer may be used in PMD and STI applications for trench filling, where the trenches have widths of 100 nm or less and aspect ratios of at least (6). The polysilane-polysilazane copolymer can be prepared by amination of a perchloro polysilane having (2) or more silicon atoms per molecule with a primary amine.

Abstract: Polysilanesiloxane copolymers or resins and method of making are provided. The present disclosure further provides a method of applying the polysilanesiloxane copolymers onto a substrate to form a polysilanesiloxane film for use in photolithography (193 nm).

Abstract: Inorganic polysilanesiloxane (PSSX) copolymers and method of making and applying the same to the surface of a substrate is provided. These PSSX copolymers are beneficial in forming a dense silicon dioxide layer on a substrate under mild oxidative conditions. The PSSX copolymers comprise SixOy(OH)z units, wherein y and z are defined by the relationship (2y+z)?(2x+2) and x is either 4 or 5. More specifically, the PSSX copolymers do not contain Si—C covalent bonds.

Abstract: A method for preparing a bis(alkoxysilylorgano)dicarboxylate includes reacting a haloorganoalkoxysilane, a dimetal salt of a dicarboxyl functional compound, and a phase transfer catalyst. A quaternary iminium compound of a polyaza, polycycloalkene is useful as the phase transfer catalyst. The product may be a bis(alkoxysilylalkyl)fumarate, which is useful as a coupling agent in rubber compositions for tire applications.

Abstract: A process for preparing an acryloyloxysilane, the process comprising reacting a metal salt of a carboxylic acid having the formula [CR22?CR1COO?]aMa+ (I), with a haloorganoalkoxysilane having the formula XR3Si(OR4)nR53—n (II) in the presence of mineral spirits and a phase transfer catalyst at a temperature of from 50 to 160° C. to form a mixture comprising an acryloyloxysilane and a metal halide having the formula Ma+X?a (III), wherein R1 is H or C1-C6 hydrocarbyl, each R2 is independently R1 or [COO?]aMa+, Ma+ is an alkali metal cation or alkaline earth metal cation, a is 1 or 2, X is halo, R3 is C1-C6 hydrocarbylene, each R4 is independently C1-C10 Q hydrocarbyl, each R5 is independently R1 and n is an integer from 1 to 3.

Abstract: A method for preparing a bis(alkoxysilylorgano)dicarboxylate includes reacting a haloorganoalkoxysilane, a dimetal salt of a dicarboxyl functional compound, and a phase transfer catalyst. A quaternary iminium compound of a polyaza, polycycloalkene is useful as the phase transfer catalyst. The product may be a bis(alkoxysilylalkyl)fumarate, which is useful as a coupling agent in rubber compositions for tire applications.

Abstract: A method of preparing a polymeric methylene diphenyl diisocyanate-polydialkylsiloxane resin by mixing at a temperature between 25° C. and 100° C.: (i) a polymeric methylene diphenyl diisocyanate with (ii) a polydialkylsiloxane selected from hydroxyalkyl dialkyl terminated polydialkylsiloxane having a viscosity of from 5 to 500 000 cSt at 25° C. or (hydroxyalkoxy)alkyl dialkyl terminated polydialkylsiloxane having a viscosity of from 5 to 500 000 cSt at 25° C. in an amount such that from 1 to 99% by weight of the total weight of (i) and (ii) is component (ii), optionally in the presence of a solvent; and subsequently extracting the solvent, if present.

Abstract: A polysilane?polysilazane copolymer contains a polysilane unit of formula (I), and a polysilazane unit of formula (II), where each R1 and each R2 are each independently selected from H, Si, and N atoms, R3 is selected from H, Si, or C atoms, a?1, b?1, and a quantity (a+b)?2. The polysilane?polysilazane copolymer may be formulated in a composition with a solvent. The polysilane-polysilazane copolymer may be used in PMD and STI applications for trench filling, where the trenches have widths of 100 nm or less and aspect ratios of at least (6). The polysilane?polysilazane copolymer can be prepared by amination of a perchloro polysilane having (2) or more silicon atoms per molecule with a primary amine.

Abstract: A composition comprising at least 93% (w/w) neopentasilane; and a method of preparing neopentasilane, the method comprising treating a tetrakis-(trihalosilyl)silane with diisobutylaluminum hydride.

Abstract: A method of producing silicon containing thin films by the thermal polymerization of a reactive gas mixture bisaminosilacyclobutane and source gas selected from a nitrogen providing gas, an oxygen providing gas and mixtures thereof. The films deposited may be silicon nitride, silicon carbonitride, silicon dioxide or carbon doped silicon dioxide. These films are useful as dielectrics, passivation coatings, barrier coatings, spacers, liners and/or stressors in semiconductor devices.

Abstract: A composition comprising at lest 93% (w/w) neopentasilane; and a method of preparing neopentasilane, the method comprising treating a tetrakis-(trihalosilyl)silane with diisobutylaluminum hydride.

Abstract: A colloid composition can be used to form a thin film on a substrate. The colloid can be colloidal silica. The thin film can be a dielectric layer. The substrate can be a semiconductor substrate having gaps thereon.