Abstract: A semiconductor device includes a nitride-based transistor, a first metal layer, a second metal layer, a third metal layer, a source pad, and a drain pad. The first metal layer is disposed over the nitride-based transistor. The second metal layer is disposed over the first metal layer. The third metal layer is disposed over the second metal layer and includes a first pattern and a second pattern which are spaced apart from each other. The source pad is immediately above the first metal layer, the second metal layer, and the first pattern of the third metal layer and is electrically coupled with the nitride-based transistor. The drain pad is immediately above the first metal layer, the second metal layer, and the second pattern of the third metal layer and is electrically coupled with the nitride-based transistor.

Abstract: An apparatus for cleaning flip chip assemblies is provided. The apparatus comprises: a chuck assembly; a motor coupled to the chuck assembly by a spindle; at least one carrier for holding flip chips; at least one spray nozzle for directing DIW, a cleaning solution, a gas or a vapor. Embodiments of the invention further provide methods for cleaning flip chip assemblies. The method comprises: loading at least one flip chip to the flip chip carriers; rotating the chuck assembly at a rotation speed; flowing DIW for rinsing the flip chips; flowing a cleaning solution for removing the contaminants; applying ultrasonic/megasonic energy to the flip chips; blowing a gas or a vapor via the spray nozzles for drying the flip chips; bringing the flip chips out of the flip chip carriers.

Abstract: The present disclosure relates to a semiconductor device and a fabrication method thereof. The semiconductor device includes a substrate, a first nitride semiconductor layer disposed on the substrate, a second nitride semiconductor layer disposed on the first nitride semiconductor layer and having a bandgap greater than that of the first nitride semiconductor layer. The semiconductor device further includes a first gate conductor disposed on a first region of the second nitride semiconductor layer, a first source electrode disposed on a first side of the first gate conductor, a first field plate disposed on a second side of the first gate conductor; and a capacitor having a first conductive layer and a second conductive layer and disposed on a second region of the second nitride semiconductor layer. Wherein the first conductive layer of the capacitor and the first source electrode have a first material, and the second conductive layer of the capacitor and the first field plate have a second material.

Abstract: Disclosed is an artificial eyelash, comprising an artificial eyelash body. A cross section of the artificial eyelash body along a length direction is a polygon. The polygon comprises a triangle. The artificial eyelash body comprises an end portion close to an eyelid and a tip portion far away from the eyelid. The artificial eyelash body is converged to one point of the tip portion along a taper from the end portion to the tip portion. The polygonal artificial eyelash can better reflect light, so that the artificial eyelash has better luster under light, thus providing better eye decoration for a user.

Abstract: The present invention discloses a method for cleaning substrate without damaging patterned structure on the substrate using ultra/mega sonic device, comprising: applying liquid into a space between a substrate and an ultra/mega sonic device; setting an ultra/mega sonic power supply at frequency f1 and power P1 to drive said ultra/mega sonic device; after micro jet generated by bubble implosion and before said micro jet generated by bubble implosion damaging patterned structure on the substrate, setting said ultra/mega sonic power supply at frequency f2 and power P2 to drive said ultra/mega sonic device; after temperature inside bubble cooling down to a set temperature, setting said ultra/mega sonic power supply at frequency f1 and power P1 again; repeating above steps till the substrate being cleaned.

Abstract: A polyurethane composition including, on the basis of the total weight of the composition: A) 20-50 weight % of a polyurethane prepolymer PU, which is a reaction product of a polyether polyol with at least two aromatic polyisocyanates or mixture of the reaction products, wherein the polyether polyol includes a polyether diol and a polyether triol, and the weight ratio of the polyether triol to the polyether diol ranges from 4:1 to 13:1; and B) 12.5% to 17.5% of carbon black on the basis of the total weight of the composition. Also, the use of carbon black in polyurethane compositions for reducing blistering during curing and increasing matte effect.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has grounding electrodes and grounding pads located at edges, and a thin film covering the grounding electrodes but exposing the grounding pads. The workpiece carrier has carrier electrodes located around the workpiece and inside grounding ports at the bottom. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a Z-elevator to raise the workpiece carrier toward the poling source using the grounding ports, and grounding mechanisms including downwardly biased electrical contacts which, when the workpiece carrier is raised by the Z-elevator, connect the grounding pads of the workpiece with the carrier electrodes, to ground the workpiece. The poling apparatus additionally includes preparation platform and transfer platform with conveyer systems with rollers and Z-elevators to move the workpiece carrier in and out of the poling chamber.

Abstract: Disclosed is a gas insulated substation cabinet for precise air supply control, comprising: cabinet doors arranged at one side of a cabinet body, a sealing mechanism arranged between a frame of the cabinet doors and a frame of the cabinet body, a supporting mechanism arranged in the cabinet body, a plurality of guiding mechanisms fixedly connected with the cabinet body inside along a vertical direction at equal intervals, electronic components respectively arranged in the guiding mechanisms, an air inlet device including a communicated pipeline, an air inlet mechanism on a top of communicated pipeline, an external air conditioner, and a filter mechanism at a bottom of the communicated pipeline, an air collecting device arranged at a bottom of an inner cavity of the cabinet and two air outlet devices respectively arranged on both sides of a bottom of the cabinet body.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has grounding electrodes and grounding pads located at edges, and a thin film covering the grounding electrodes but exposing the grounding pads. The workpiece carrier has carrier electrodes located around the workpiece and inside grounding ports at the bottom. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a Z-elevator to raise the workpiece carrier toward the poling source using the grounding ports, and grounding mechanisms including downwardly biased electrical contacts which, when the workpiece carrier is raised by the Z-elevator, connect the grounding pads of the workpiece with the carrier electrodes, to ground the workpiece. The poling apparatus additionally includes preparation platform and transfer platform with conveyer systems with rollers and Z-elevators to move the workpiece carrier in and out of the poling chamber.

Abstract: Disclosed is a method for rapidly amplifying CD8+T cells and functional cell subpopulations thereof in vitro. A TLR1/2 agonist, a TLR2/6 agonist and a TLR5 agonist or a combination of above agonists is added to a conventional culture system for in-vitro amplification of CD8+T cells. Recombinant cytokines IL-2, IL-7 and IL-15 as well as magnetic beads coated with an anti-human CD3 antibody and an anti-human CD28 antibody can be further added to the culture system for continuous co-stimulation.

Abstract: Provided herein are compounds of Formula (I): and forms thereof, wherein w1, w2, w3, w4, w5, w6 and w7 are as defined herein, including compositions thereof and uses therewith for treating spinal muscular atrophy.

Abstract: A method for controlling damages in cleaning a semiconductor wafer comprising features of patterned structures, the method comprising: delivering a cleaning liquid over a surface of a semiconductor wafer during a cleaning process; and imparting sonic energy to the cleaning liquid from a sonic transducer during the cleaning process, wherein power is alternately supplied to the sonic transducer at a first frequency and a first power level for a first predetermined period of time and at a second frequency and a second power level for a second predetermined period of time, the first predetermined period of time and the second predetermined period of time consecutively following one another, wherein at least one of the cleaning parameters is determined such that a percentage of damaged features as a result of the imparting sonic energy is lower than a predetermined threshold.

Abstract: Embodiments of this application disclose a semiconductor device and a manufacturing method thereof. The semiconductor device includes a substrate, a first nitride semiconductor layer disposed on the substrate and having a first bandgap, and a second nitride semiconductor layer disposed on the first nitride semiconductor layer and having a second bandgap. The second bandgap is larger than the first bandgap. The semiconductor device further includes a gate contact disposed over the second nitride semiconductor layer and a first field plate disposed over the gate contact. The first field plate has a first surface facing the substrate, a second surface facing the substrate, and a protruded portion. The protruded portion has a bottom surface facing the substrate. The bottom surface is located between the first surface and the second surface.

Abstract: A system for controlling damages in cleaning a semiconductor wafer comprising features of patterned structures, the system comprising: a wafer holder for temporary restraining a semiconductor wafer during a cleaning process; an inlet for delivering a cleaning liquid over a surface of the semiconductor wafer; a sonic generator configured to alternately operate at a first frequency and a first power level for a first predetermined period of time and at a second frequency and a second power level for a second predetermined period of time, to impart sonic energy to the cleaning liquid, the first predetermined period of time and the second predetermined period of time consecutively following one another; and a controller programmed to provide the cleaning parameters, wherein at least one of the cleaning parameters is determined such that a percentage of damaged features as a result of the imparting sonic energy is lower than a predetermined threshold.

Abstract: A method for acquiring an object's attention information includes: displaying a three-dimensional (3D) virtual image in a virtual scene, the 3D virtual image being a 3D image corresponding to a virtual object in the virtual scene mapped from a physical object; determining a target object of the 3D virtual image displayed in a display area; and based on the target object, determining an attention focus object of the 3D virtual image, the attention focus object belonging to at least a part of the 3D virtual image.

Abstract: The present description relates to compounds of Formula (I), forms, and pharmaceutical compositions thereof and methods of using such compounds, forms, or compositions thereof for treating or ameliorating Huntington's disease.

Abstract: A heat pump system is provided. The heat pump system comprises a compressor, a first heat exchanger, a second heat exchanger, a third heat exchanger and a six-way valve. The compressor comprises an air suction port and an air discharge port. The first heat exchanger is arranged in a first circulation path, the second heat exchanger is arranged in a second circulation path, and the third heat exchanger is arranged in a third circulation path, wherein the first circulation path, the second circulation path and the third circulation path are parallel paths. A first end of the first circulation path, a first end of the second circulation path and a first end of the third circulation path are connected to the six-way valve and are in controllable communication with the air suction port and the air discharge port of the compressor by means of the six-way valve.

Abstract: Disclosed is a preparation technology for an artificial eyelash with a naturally arc-shaped stem, which automatically presses and sticks artificial eyelash by providing a transmission mechanism for transmitting a double-sided adhesive tape, a limiting mechanism for storing the artificial eyelash, a pressing mechanism for pressing the double-sided adhesive tape to the limiting mechanism to stick the artificial eyelash and a control mechanism; automatically synthesizes the artificial eyelash by providing a feeding roller assembly, a distributing roller assembly, a synthesis extrusion roller assembly, a recycling roller assembly and a collecting roller; and automatically glues and shears the artificial eyelash by eyelash thread rollers, front limiting rollers, glue injection mechanisms, rear limiting rollers, drying mechanisms and finished product rollers symmetrically arranged on two sides of a multi-layer eyelash sticker.

Abstract: A TFF2 protein and an IFN-? protein are combined to treat a novel coronavirus infection. A product comprises: (a) an IFN-? protein; (b) a TFF2 protein; and (c) an optional pharmaceutically acceptable carrier. Provided are an application of a combination of IFN-? protein and TFF2 protein in the preparation of a product for the treatment of a novel coronavirus infection and related diseases, and a method for using the product to treat a novel coronavirus infection and related diseases. The foregoing combination, application, and method have excellent therapeutic effects on novel coronavirus infections, and have application prospects and social benefits.