Patents by Inventor Yun-sheng Chen

Yun-sheng Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9623400
    Abstract: The present invention provides a catalyst for producing hydrogen and a preparing method thereof. The method includes the steps of adding a first metal source, a second metal source, a third metal source and a cerium source into a first organic solvent containing a surfactant to form a colloidal mixture, wherein a metal of the first metal source is a Group IIIB metal; a metal of the second metal source is selected from the group consisting of alkali metals, alkaline earth metals and Group IIIB metals, and a metal of the third metal source is a transition metal; calcining the colloidal mixture to form a metal solid solution; and allowing the metal solid solution to be carried on a carrier to obtain the catalyst. When the catalyst of the present invention is used for an ethanol oxidation reformation, the reaction temperature of the ethanol oxidation reformation can be significantly decreased.
    Type: Grant
    Filed: September 11, 2015
    Date of Patent: April 18, 2017
    Assignee: National Chiao Tung University
    Inventors: Chi-Shen Lee, Ping-Wen Tsai, Ho-Chen Hsieh, Yun-Sheng Chen, Yuan-Chia Chang, Sheng-Feng Weng
  • Patent number: 9627466
    Abstract: A display panel is disclosed, which comprises: a first substrate; a first metal line disposed on the first substrate and having a first surface and a first side connecting to the first surface, wherein the first side has a concave shape; and a sealant unit covering the first surface and the first side.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: April 18, 2017
    Assignee: INNOLUX CORPORATION
    Inventors: Yun-Sheng Chen, Ming-Chien Sun
  • Publication number: 20160365405
    Abstract: A display device comprising: a substrate with a display region and a border region; a first metal layer disposed on the substrate; a first insulating layer disposed on the first metal layer and having a first contact via on the border region; a second metal layer disposed on the first insulating layer and in the first contact via to electrically connect to the first metal layer; a second insulating layer disposed on the second metal layer; a first electrode layer disposed on the second insulating layer and having a first opening; a third insulating layer disposed on the first electrode layer and has a second opening on the border region; and a second electrode layer disposed on the third insulating layer and in the second opening to electrically connect to the first electrode layer, wherein the first contact via corresponds to the first opening, is disclosed.
    Type: Application
    Filed: May 16, 2016
    Publication date: December 15, 2016
    Inventors: Yun-Sheng CHEN, Hsia-Ching CHU, Ming-Chien SUN
  • Publication number: 20160307923
    Abstract: A display device is disclosed, which comprises: a first substrate; a first metal layer disposed on a surface of the first substrate; a first insulating layer disposed on the first metal layer; a second insulating layer disposed on the first insulating layer; and a second metal layer covering a part of the second insulating layer and comprising a connecting region, wherein the first metal layer and the second metal layer are electrically connected to each other in the connecting region, wherein the second metal layer corresponding to the connecting region comprises a sidewall region and a non-sidewall region, a first thickness of the sidewall region corresponding to the second insulating layer along a direction parallel to the surface of the first substrate is smaller than a second thickness of the non-sidewall region along a direction perpendicular to the surface of the first substrate.
    Type: Application
    Filed: June 27, 2016
    Publication date: October 20, 2016
    Inventors: Kuang-Pin CHAO, Yun-Sheng CHEN, Ming-Chien SUN
  • Publication number: 20160293688
    Abstract: A display panel is disclosed, which comprises: a first substrate; a first metal line disposed on the first substrate and having a first surface and a first side connecting to the first surface, wherein the first side has a concave shape; and a sealant unit covering the first surface and the first side.
    Type: Application
    Filed: July 24, 2015
    Publication date: October 6, 2016
    Inventors: Yun-Sheng CHEN, Ming-Chien SUN
  • Publication number: 20160220984
    Abstract: The present invention provides a catalyst for producing hydrogen and a preparing method thereof. The method includes the steps of adding a first metal source, a second metal source, a third metal source and a cerium source into a first organic solvent containing a surfactant to form a colloidal mixture, wherein a metal of the first metal source is a Group IIIB metal; a metal of the second metal source is selected from the group consisting of alkali metals, alkaline earth metals and Group IIIB metals, and a metal of the third metal source is a transition metal; calcining the colloidal mixture to form a metal solid solution; and allowing the metal solid solution to be carried on a carrier to obtain the catalyst. When the catalyst of the present invention is used for an ethanol oxidation reformation, the reaction temperature of the ethanol oxidation reformation can be significantly decreased.
    Type: Application
    Filed: September 11, 2015
    Publication date: August 4, 2016
    Inventors: Chi-Shen Lee, Ping-Wen Tsai, Ho-Chen Hsieh, Yun-Sheng Chen, Yuan-Chia Chang, Sheng-Feng Weng
  • Patent number: 9406737
    Abstract: A display device is disclosed, which comprises: a first substrate; a first insulating layer disposed on the first substrate; a second insulating layer disposed on the first insulating layer; and a patterned metal layer disposed on the second insulating layer and comprising plural conductive lines, wherein an opening region is located between two adjacent conductive lines to expose the second insulating layer, and a thickness of the second insulating layer under the conductive lines of the patterned metal layer is larger than that exposed from the opening region.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: August 2, 2016
    Assignee: INNOLUX CORPORATION
    Inventors: Kuang-Pin Chao, Yun-Sheng Chen, Ming-Chien Sun
  • Publication number: 20150325634
    Abstract: A display device is disclosed, which comprises: a first substrate; a first insulating layer disposed on the first substrate; a second insulating layer disposed on the first insulating layer; and a patterned metal layer disposed on the second insulating layer and comprising plural conductive lines, wherein an opening region is located between two adjacent conductive lines to expose the second insulating layer, and a thickness of the second insulating layer under the conductive lines of the patterned metal layer is larger than that exposed from the opening region.
    Type: Application
    Filed: December 16, 2014
    Publication date: November 12, 2015
    Inventors: Kuang-Pin CHAO, Yun-Sheng CHEN, Ming-Chien SUN
  • Patent number: 9079165
    Abstract: The instant disclosure relates to a preparation method of ethanol reforming catalyst, comprising the following steps. The first step is mixing a first metal precursor, a second metal precursor, and a third metal precursor with an organic medium to form a mixture. The next step is adding a surfactant to the mixture, and then allowing resting for 3 to 7 days to form a colloidal gel. The next step is calcining the colloidal gel for 1 to 5 hours in a first temperature region of 350° C. to 550° C., and then calcining the colloidal gel for 1 to 5 hours in a second temperature region of 800° C. to 1000° C. to form an ethanol reforming catalyst. The instant disclosure further provides an ethanol reforming catalyst composition.
    Type: Grant
    Filed: April 29, 2013
    Date of Patent: July 14, 2015
    Assignee: NATIONAL CHIAO TUNG UNIVERSITY
    Inventors: Chi-Shen Lee, Sheng-Feng Weng, Yun-Sheng Chen, Yun-Hsin Wang
  • Patent number: 8904871
    Abstract: The present disclosure relates to methods and systems relating to temperature dependent photoacoustic imaging are provided. In such methods and systems, a tissue sample may be exposed to thermal energy and electromagnetic radiation to generate an acoustic signal, which may be detected. The amplitude of the acoustic signal may be determined and correlated with a tissue property, such as the presence or absence of macrophages or foam cells.
    Type: Grant
    Filed: July 25, 2011
    Date of Patent: December 9, 2014
    Assignee: Board of Regents, The University of Texas System
    Inventors: Stanislav Emelianov, Bo Wang, Jignesh Shah, Konstantin Sokolov, Jimmy Su, Yun-Sheng Chen, Wolfgang Frey
  • Patent number: 8839672
    Abstract: Methods of combined ultrasound and photoacoustic imaging are provided. In some embodiments, the methods may be used to determine the location or positioning of a metal object in a sample. In other embodiments, the methods may be used to determine the composition of a sample surrounding a metal object. Other methods are also provided.
    Type: Grant
    Filed: October 19, 2011
    Date of Patent: September 23, 2014
    Assignee: Board of Regents, The University of Texas System
    Inventors: Stanislav Emelianov, Jimmy Su, Bo Wang, Andrei Karpiouk, Yun-Sheng Chen, Wolfgang Frey, Richard Bouchard, Kimberly Homan
  • Publication number: 20140213440
    Abstract: The instant disclosure relates to a preparation method of ethanol reforming catalyst, comprising the following steps. The first step is mixing a first metal precursor, a second metal precursor, and a third metal precursor with an organic medium to form a mixture. The next step is adding a surfactant to the mixture, and then allowing resting for 3 to 7 days to form a colloidal gel. The next step is calcining the colloidal gel for 1 to 5 hours in a first temperature region of 350° C. to 550° C., and then calcining the colloidal gel for 1 to 5 hours in a second temperature region of 800° C. to 1000° C. to form an ethanol reforming catalyst. The instant disclosure further provides an ethanol reforming catalyst composition.
    Type: Application
    Filed: April 29, 2013
    Publication date: July 31, 2014
    Applicant: NATIONAL CHIAO TUNG UNIVERSITY
    Inventors: CHI-SHEN LEE, SHENG-FENG WENG, YUN-SHENG CHEN, YUN-HSIN WANG
  • Publication number: 20140157901
    Abstract: Methods of combined ultrasound and photoacoustic imaging are provided. In some embodiments, the methods may be used to determine the location or positioning of a metal object in a sample. In other embodiments, the methods may be used to determine the composition of a sample surrounding a metal object. Other methods are also provided.
    Type: Application
    Filed: February 12, 2014
    Publication date: June 12, 2014
    Inventors: Stanislav Emelianov, Jimmy Su, Bo Wang, Andrei Karpiouk, Yun-Sheng Chen, Wolfgang Frey, Richard Bouchard, Kimberly Homan
  • Publication number: 20120253180
    Abstract: Methods of combined ultrasound and photoacoustic imaging are provided. In some embodiments, the methods may be used to determine the location or positioning of a metal object in a sample. In other embodiments, the methods may be used to determine the composition of a sample surrounding a metal object. Other methods are also provided.
    Type: Application
    Filed: October 19, 2011
    Publication date: October 4, 2012
    Inventors: Stanislav Emelianov, Jimmy Su, Bo Wang, Andrei Karpiouk, Yun-Sheng Chen, Wolfgang Frey, Richard Bouchard, Kimberly Homan
  • Publication number: 20120125107
    Abstract: Methods and systems relating to temperature dependent photoacoustic imaging are provided.
    Type: Application
    Filed: July 25, 2011
    Publication date: May 24, 2012
    Inventors: Stanislav Emelianov, Bo Wang, Jignesh Shah, Konstantin Sokolov, Jimmy Su, Yun-Sheng Chen, Wolfgang Frey
  • Patent number: 7851282
    Abstract: Methods of forming thin film devices with different electrical characteristics on a substrate comprising a driver circuit region and a pixel region. A first and a second polysilicon pattern layers are formed on the driving circuit region and the pixel region of the substrate, respectively. A first ion implantation is performed on the second polysilicon pattern layer using a masking layer covering the first polysilicon pattern layer as an implant mask, such that the first polysilicon pattern layer has an impurity concentration different from the second polysilicon pattern layer. After removal of the masking layer, a gate dielectric layer and a gate are successively formed on each of the first and second polysilicon pattern layers and a source/drain region is subsequently formed in each of the first and second polysilicon pattern layers to define a channel region therein.
    Type: Grant
    Filed: February 9, 2010
    Date of Patent: December 14, 2010
    Assignee: AU Optronics Corp.
    Inventors: Wei-Pang Huang, Chun-Huai Li, Yun-Sheng Chen
  • Publication number: 20100136730
    Abstract: Methods of forming thin film devices with different electrical characteristics on a substrate comprising a driver circuit region and a pixel region. A first and a second polysilicon pattern layers are formed on the driving circuit region and the pixel region of the substrate, respectively. A first ion implantation is performed on the second polysilicon pattern layer using a masking layer covering the first polysilicon pattern layer as an implant mask, such that the first polysilicon pattern layer has an impurity concentration different from the second polysilicon pattern layer. After removal of the masking layer, a gate dielectric layer and a gate are successively formed on each of the first and second polysilicon pattern layers and a source/drain region is subsequently formed in each of the first and second polysilicon pattern layers to define a channel region therein.
    Type: Application
    Filed: February 9, 2010
    Publication date: June 3, 2010
    Applicant: AU OPTRONICS CORP.
    Inventors: Wei-Pang Huang, Chun-Huai Li, Yun-Sheng Chen
  • Patent number: 7696029
    Abstract: Methods of forming thin film devices with different electrical characteristics on a substrate comprising a driver circuit region and a pixel region. A first and a second polysilicon pattern layers are formed on the driving circuit region and the pixel region of the substrate, respectively. A first ion implantation is performed on the second polysilicon pattern layer using a masking layer covering the first polysilicon pattern layer as an implant mask, such that the first polysilicon pattern layer has an impurity concentration different from the second polysilicon pattern layer. After removal of the masking layer, a gate dielectric layer and a gate are successively formed on each of the first and second polysilicon pattern layers and a source/drain region is subsequently formed in each of the first and second polysilicon pattern layers to define a channel region therein.
    Type: Grant
    Filed: June 11, 2007
    Date of Patent: April 13, 2010
    Assignee: Au Optronics Corp.
    Inventors: Wei-Pang Huang, Chun-Huai Li, Yun-Sheng Chen
  • Patent number: 7459956
    Abstract: A method and system is disclosed for device trimming. A device trimming system comprises at least one reference device to be trimmed having a reference electrical parameter, at least one trimming device to be coupled with the reference device for forming a trimmed reference device providing an altered reference electrical parameter based on a combination of the reference device and the trimming device, and at least one electrical fuse based control module for controlling whether the trimming device is to be coupled with the reference device based on a state of the electrical fuse.
    Type: Grant
    Filed: February 10, 2005
    Date of Patent: December 2, 2008
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shine Chien Chung, Yun-Sheng Chen
  • Patent number: 7385820
    Abstract: A heat dissipation module for removing heat from a heat generating component, includes a block, a heat pipe and a fin unit. The block includes a first surface and a second surface. One end of the heat pipe is thermally attached to the fin unit, and the other end of the heat pipe is thermally attached to the first surface of the block. A groove is defined in the second surface of the block for fittingly receiving the heat generating component therein.
    Type: Grant
    Filed: November 30, 2006
    Date of Patent: June 10, 2008
    Assignee: Foxconn Technology Co., Ltd.
    Inventor: Yun-Sheng Chen