Plasma inducing plate for semiconductor deposition apparatus
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The plasma inducing plate may be made of a metal. The four holes on the top surface of the plate are screw holes that do not penetrate the plate.
The ornamental design which is claimed is shown in solid lines in the drawings.
Claims
The ornamental design for a plasma inducing plate for semiconductor deposition apparatus, as shown and described.
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- U.S. Appl. No. 29/322,630, filed Aug. 7, 2008, Aggarwal et al.
Type: Grant
Filed: Jan 16, 2009
Date of Patent: Dec 29, 2009
Assignee: ASM Genitech Korea Ltd. (Cheonan-Si)
Inventors: Jeong Ho Lee (Seoul), Sang Jin Jeong (Daejeon-si), Woo Chan Kim (Deajeon-si)
Primary Examiner: Selina Sikder
Attorney: Knobbe Martens Olson & Bear LLP
Application Number: 29/331,022