Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.

Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.

Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.

Abstract: A propeller blade comprises a fibre reinforced blade structure spar having a blade retention section formed at one end thereof, and at least one metallic formation spray deposited onto said blade retention section.

Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.

Abstract: There are provided a liquid processing method, a liquid processing apparatus and a recording medium for liquid processing which can enhance the uniformity of the coating state of a processing liquid on a substrate. A coating unit includes a rotary holder for rotating a wafer, a nozzle for supplying a processing liquid onto a surface of the wafer, and a controller for controlling the position of the nozzle with respect to the wafer.

Abstract: The invention is an anchor point device for use with a bra support underwire comprising: a unitary interface sleeve comprising a distal paraboloid section with an underwire cavity passing therethrough; a cylindrical section extending from the distal paraboloid section, the cylindrical section having the underwire cavity terminating therein; a proximal paraboloid section extending from the cylindrical section; and an anchor tab, configured as a geometric shape, a threaded component, a ribbed component, or a reinforced thread, attached to the interface sleeve. The invention provides reduced kinetic friction and kinetic wear between support underwires and ultra thin tubular fabric casings.

Abstract: A developing apparatus includes a first cup module and a second cup module arranged to be spaced apart from each other in a transverse direction; a first developing solution nozzle configured to wait in a standby position between the first cup module and the second cup module; and a first moving mechanism configured to move the first developing solution nozzle between the standby position and a processing position in which the developing solution is supplied to the substrate, wherein the first developing solution nozzle includes an ejection hole configured to eject the developing solution to form a liquid puddle on a surface of the substrate, the first developing solution nozzle includes a contact portion formed smaller than the surface of the substrate and installed to face the surface of the substrate, and the first developing solution nozzle spreads the liquid puddle on the substrate.

Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, a liquid receiving part, and an upper nozzle. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down. While the chamber cover is in contact with the chamber body, a small sealed space is formed and some processings involving pressure reduction or pressurization are performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. On an outer side relative to the annular opening, positioned are a first cup part and a second cup part. A processing liquid spattering from a substrate is received by the first cup part or the second cup part. In the substrate processing apparatus, it is possible to perform various processings in the small chamber.

Abstract: An intelligent footwork device that provides a user with visual instruction and direction of each footwork activity. The visual instruction is provided by directional lights embedded into the footwork device. The target footwork activity is compared to the actual footwork activity and an evaluation score is provided to the user.

Abstract: Disclosed are a liquid processing apparatus and a liquid processing method that can advance a plurality of nozzle supporting arms into a processing chamber. The liquid processing apparatus includes a processing chamber, a nozzle configured to supply a fluid to a substrate held by a substrate holding unit, a nozzle supporting arm configured to support the nozzle, and an arm standby unit installed adjacent to the processing chamber and configured for the nozzle supporting arm retreating from the processing chamber to stand by. In the liquid processing apparatus, a plurality of nozzle supporting arms are installed and one nozzle supporting arm has a different height level from the other nozzle supporting arms.

Abstract: A gluing unit for applying adhesive to a succession of opening devices to be fitted to respective sealed packages of food products pourable into a tube of packaging material, the unit having a conveyor for feeding the opening devices along a path, and an adhesive dispenser located along the path, interacting with each opening device to apply adhesive to a portion of the opening device, and movable in a plane parallel to the path as well as crosswise to the plane.

Abstract: A plating apparatus 20 includes a substrate holding device 110 configured to hold and rotate the substrate 2; a first discharge device 30 configured to discharge a plating liquid toward the substrate 2 held on the substrate holding device 110; and a top plate 21 that is provided above the substrate 2 and has an opening 22. The first discharge device 30 includes a first discharge unit 33 configured to discharge the plating liquid toward the substrate 2, and the first discharge unit 33 is configured to be moved between a discharge position where the plating liquid is discharged and a standby position where the plating liquid is not discharged. Further, the first discharge unit 33 is configured to be overlapped with the opening 22 of the top plate 21 at the discharge position.

Abstract: A spray gun, which contains: a coating liquid nozzle configured to discharge a coating liquid from an outlet; and a flow channel forming member configured to surround an outer perimeter surface of the coating liquid nozzle to form an air flow channel, through which atomizing air passes, between the outer perimeter surface of the coating liquid nozzle and the flow channel forming member, wherein the spray gun is configured to atomize the coating liquid with the atomizing air to spray the atomized coating liquid to a coating target, wherein a gap T of the narrowest part of the air flow channel is 0.48 mm or smaller, and wherein a ratio T/L of the gap T to a distance L from the narrowest part to an apical surface at which the outlet of the coating liquid nozzle is open is 0.60 or greater.

Abstract: A drug coating apparatus (100) for coating an implant (206) with a drug is described. The drug coating apparatus (100) includes a holding unit (102) having a top collet (202-1) for holding the implant (206) from a top end of the implant (206), and a bottom collet (202-2) to hold the implant (206) from a bottom end of the implant (206). The drug coating apparatus (100) includes at least one rotary drive (115) coupled to the holding unit (102) for rotating the top collet (202-1), the bottom collet (202-2) and the implant (206), and includes a spraying unit (104) to spray-coat the drug on the implant (206).

Abstract: A painting system according to the embodiments includes a painting booth surrounded by a ceiling and a sidewall, a conveyor line that is arranged in the painting booth and conveys an object to be painted, and a painting robot that performs painting on the object. The painting robot includes a base portion fixed on the sidewall side in the painting booth, and an arm portion that is connected to the base portion and has a seven-axis configuration.

Abstract: A liquid treatment apparatus of continuously performing a plating process on multiple substrates includes a temperature controlling container for accommodating a plating liquid; a temperature controller for controlling a temperature of the plating liquid in the temperature controlling container; a holding unit for holding the substrates one by one at a preset position; a nozzle having a supply hole through which the temperature-controlled plating liquid in the temperature controlling container is discharged to a processing surface of the substrate; a pushing unit for pushing the temperature-controlled plating liquid in the temperature controlling container toward the supply hole of the nozzle; and a supply control unit for controlling a timing when the plating liquid is pushed by the pushing unit. The temperature controller controls the temperature of the plating liquid in the temperature controlling container based on the timing when the plating liquid is pushed by the pushing unit.

Abstract: A cylindrical coating nozzle having a flattened end is placed above a coating object being rotated. A coating solution is applied to a surface of the coating object by discharging the coating solution form a nozzle orifice at an end of the coating nozzle while moving the coating nozzle relative to the coating object in a direction intersecting a rotational direction of the coating object. The coating nozzle is formed with an angled notch at a part of the end thereof. A rotation control unit controls the rotation of the coating nozzle in a manner that the notch of the coating nozzle is positioned upstream from a position to feed the coating solution to the coating object being rotated.

Abstract: A wide slit nozzle having a slit as a discharge opening. The thickness of a lateral end part is set smaller than the thickness at a lateral center part. The thickness of the lateral center part is fixed. The thickness of the lateral end part changes linearly from opposite lateral ends of the lateral center part to the opposite lateral ends of the slit. Coating material is discharged from the slit while applied with pressure, so that the coating material is coated while expanded wider than the width of the slit. The coating material is discharged at 7 liter per minute, and a coating width of a first example is 100 mm, for example. A thickness increase of the overlapped part is +25% even when a width or an overlapped margin z of the overlapped part is 10 mm or 20 mm.

Abstract: According to one embodiment, a film forming system includes: a stage including a placement surface on which an object to be coated is placed; a rotating mechanism rotating the stage in a rotational direction along the placement surface; an application nozzle discharging a material onto the object placed on the stage for application; a moving mechanism relatively moving the stage and the application nozzle along the placement surface in a cross direction crossing the rotational direction; a controller performing a control to rotate the stage on which the object is placed through the rotating mechanism while relatively moving the stage and application nozzle along the placement surface in the cross direction through the moving mechanism and applying the material to the object on the stage through the application nozzle; and a cleaning apparatus cleaning the application nozzle.

Abstract: Embodiments of the invention include apparatus and methods for coating drug eluting medical devices. In an embodiment, the invention includes a coating apparatus including a coating application unit comprising a movement restriction structure; a fluid applicator; and an air nozzle. The apparatus can further include a rotation mechanism and an axial motion mechanism, the axial motion mechanism configured to cause movement of at least one of the coating application unit and the rotation mechanism with respect to one another. Other embodiments are also included herein.

Abstract: A valve seat assembly includes a gasket retainer comprising an outer wall, an inner wall, an upper face extending between the outer and inner walls, and a lower face extending between the outer and inner walls. The inner wall defines an insert receiving bore extending from the upper face inwardly toward the lower face to a recess that receives a gasket. A gasket is located in the recess. A retainer insert is located in the insert receiving bore that applies a compressive force to the gasket.

Abstract: A coating treatment apparatus includes: a rotating and holding part; a nozzle supplying a coating solution; a moving mechanism moving the nozzle; and a control unit that controls the rotating and holding part, the nozzle, and the moving mechanism to supply the coating solution onto a central portion of the substrate and rotate the substrate at a first rotation speed, then move a supply position of the coating solution from a central position toward an eccentric position of the substrate with the substrate being rotated at a second rotation speed lower than the first rotation speed while continuing supply of the coating solution, then stop the supply of the coating solution with the rotation speed of the substrate decreased to a third rotation speed lower than the second rotation speed, and then increase the rotation speed of the substrate to be higher than the third rotation speed.

Abstract: In a coating step, a substrate is rotated at a high speed, and in that state a resist solution is discharged from a first nozzle to a central portion of the substrate to apply the resist solution over the substrate. Subsequently, in a flattening step, the rotation of the substrate is decelerated and the substrate is rotated at a low speed to flatten the resist solution on the substrate. In this event, the discharge of the resist solution by the first nozzle in the coating step is performed until a middle of the flattening step, and when the discharge of the resist solution is finished in the flattening step, the first nozzle is moved to move a discharge position of the resist solution from the central portion of the substrate. According to the present invention, the resist solution can be applied uniformly within the substrate.

Abstract: A liquid dispensing apparatus is disclosed. In one embodiment, the apparatus includes i) a first moving unit configured to move in a first direction that is a movement direction of a patterning target object and ii) a second moving unit configured to move in a second direction crossing the first direction. The apparatus further includes a dispensing unit formed on the second moving unit; and a third moving unit formed between the first moving unit and the second moving unit and configured to rotate the second moving unit and the dispensing unit with respect to the first moving unit on a virtual plane that is substantially parallel to the first and second directions.

Abstract: Exemplary illustrations of a supply tube, e.g., for a painting system, such as for supplying compressed air to a turbine in a rotary atomizer or for supplying an atomizer with a fluid medium, such as paint or a rinsing agent, are disclosed. An exemplary supply tube may include an upstream tube section and a downstream tube section. The upstream tube section may have a larger inner cross-section than the downstream tube section. A painting robot is also disclosed, which includes an exemplary supply tube.

Abstract: A robot coating system (1) includes a robot moving unit (21) which makes a robot (11) having a coating gun (12) successively move to a plurality of planned coating positions, a readying pressure imparting unit (22) which drives a pump (13) of the coating gun before reaching the planned coating positions and imparts to the viscous material a predetermined readying pressure without coating the viscous material, a coating executing unit (23) which executes coating work of the viscous material by a predetermined flow rate over a predetermined coating time when the coating gun has reached a planned coating position, and a post-coating stopping unit (24) which continues the coating work to make the pump stop after the end of the work when executing the coating work and a stop command of the robot is issued.

Abstract: A plated film having a uniform film thickness is formed on a surface of a substrate. A semiconductor manufacturing apparatus includes: a holding mechanism for holding a substrate rotatably; a nozzle for supplying a processing solution for performing a plating process on a processing target surface of the substrate; a substrate rotating mechanism for rotating the substrate held by the holding mechanism in a direction along the processing target surface; a nozzle driving mechanism for moving the nozzle in a direction along the processing target surface at a position facing the processing target surface of the substrate held by the holding mechanism; and a control unit for controlling the supply of the processing solution by the nozzle and the movement of the nozzle by the nozzle driving mechanism.

Abstract: The interior of a straight pipe is clad using a plurality of welding heads. The pipe is carried on support rollers including drive components for rotating the pipe about its axis while holding it fixed against axial movement. There are four welding heads with two carried on a cantilevered support arm of a respective one of a first and a second carriage mounted outside the pipe at opposite ends of the pipe and each movable in a direction longitudinally of the axis of the pipe. The heads are located on the arm at a common angular position at bottom dead center to weld vertically downwardly. The pipe support includes a pair of drive rollers arranged with their axes parallel to the axis of the pipe and adjustable in spacing to change the height of the pipe on the rollers relative to the welding heads.

Abstract: The invention relates to a method of coating a surface (2) of a hollow body (1), said method comprising: a step of positioning said hollow body (1) on a support (7) designed to receive said hollow body (1); and a step of spraying at least one coating material onto said surface (2) of said hollow body (1) by means of a spray device (9), relative movement being imparted to said support (7) and to said spray device (9); said coating method being characterized in that said relative movement takes place at a velocity that varies as a function of the distance (d) between the spray device (9) and said surface (2). Coating machines.

Abstract: This spraygun (1) comprises a body (11) and, housed in a proximal part (11.1) of the body (11), a tank (10) extending along a main axis (X10). This spraygun also comprises atomizing means (5) in a distal part (11.2) of the body (11) comprising an atomizing member (51) designed to atomize the coating product generally in an atomizing direction (Y50). The atomizing direction (Y50) and the main axis (X10) of the tank are convergent.

Abstract: A device for cleaning and doping (lubrication) equipment for threads of the type used to join pipes to a pipe string, especially in connection with petroleum production, where cleaning fluid and dope (lubricant) are sprayed at the threads at relatively high pressure from at least one nozzle mounted in the rotatable make-up section of a power tong, and where at least one injection pump arranged to supply cleaning fluid or dope to the at least one nozzle is located in the rotatable make-up section.

Abstract: A system for drying a surface of a substrate is provided. The system for drying a surface of a substrate comprising: a rotary support; a first dispenser fluidly coupled to a source of liquid, the first dispenser positioned above the surface of the substrate so as to be capable of applying a film of the liquid to the surface of the substrate; a second dispenser fluidly coupled to a source of drying fluid with a supply line, the second dispenser positioned above the surface of the substrate so as to be capable of applying the drying fluid to the surface of the substrate; and a proportional valve operably coupled to the supply line between the second dispenser and the source of drying fluid, the proportional valve capable of being incrementally adjusted from a closed position to an open position.

Abstract: Provided are a substrate treating unit, and substrate treating apparatus and method using the same. Two nozzle arms are provided, and photoresist liquid nozzles and an organic solvent nozzle are installed in each of the nozzle arms. A temperature of a photoresist liquid flowing into the photoresist liquid nozzles and a temperature of an organic solvent flowing into the organic solvent nozzle are maintained by a temperature control fluid supplied through the same passage. Also, a waiting port in which a nozzle arm used in a process temporarily waits is provided. The organic solvent is provided to a photoresist liquid nozzle that is not used in a process and is not provided to a photoresist liquid nozzle used in the process.

Abstract: A system for painting a structure includes a motorized, wheeled vehicle that is movable along a surface and includes a frame and a lift structure coupled with the frame. The system also includes a support structure supported by the lift structure, and a table supported by the support structure. The table is translatable relative to the support structure. The system also includes a mount structure rotatably coupled with the table and a kit of parts that includes a spray head assembly configured for releasable attachment to the mount structure. The system further includes a paint reservoir and a pump, each being supported by one of the vehicle and the support structure.

Abstract: A painting system having a painting robot with a stationary base mounted to a wall of a paint booth in cantilever fashion. A stand is mounted to the stationary base and is rotatable around a first axis that is disposed substantially horizontal. A first arm is rotatably mounted to the stand around a second axis, and a second arm is rotatably mounted to the first arm around a third axis. The second arm is operable to rotate around the third axis 180 degrees relative to the first arm. An end effector is connected between the second arm and a painting tool. The end effector is operable to orient the painting tool.

Abstract: A wet processing apparatus for wet-processing substrates can suppress the reduction of throughput when some component part thereof becomes unserviceable. The wet processing apparatus includes a first nozzle unit and a second nozzle unit. When the wet processing apparatus operates in a normal mode, a substrate carrying mechanism is controlled so as to deliver substrates alternately to processing units of a first group and those of a second group so that the substrates are processed sequentially in order. When the processing units of the first group (the second group) are unserviceable due to the inoperativeness of the substrate holders, a processing liquid supply system or a nozzle support mechanism, the nozzle unit for the processing units of the second group (the first group) is moved to process substrates by the serviceable ones of the first group (the second group).

Abstract: A coating treatment method includes: a first step of discharging a coating solution from a nozzle to a central portion of a substrate while acceleratingly rotating the substrate, to apply the coating solution over the substrate; a second step of then decelerating the rotation of the substrate and continuously rotating the substrate; and a third step of then accelerating the rotation of the substrate to dry the coating solution on the substrate. In the first step, the acceleration of the rotation of the substrate is changed in the order of a first acceleration, a second acceleration higher than the first acceleration, and a third acceleration lower than the second acceleration to acceleratingly rotate the substrate at all times.

Abstract: A painting robot includes a fixing unit fixed to a sidewall of a painting booth; a swivel unit provided to swivel with respect to the fixing unit; an arm provided to the swivel unit; and a painting gun provided in a tip end portion of the arm. The fixing unit includes a fixing surface fixed to the sidewall of the painting booth; and a cable lead-in portion provided on the fixing surface to lead a cable into the painting robot therethrough.

Abstract: A non-contact edge coating apparatus applies coating material to an edge of a non-circular solar cell substrate without physical contact. The apparatus may include a rotatable substrate support configured to hold the substrate. The apparatus may further include an applicator configured to receive a coating material and apply the coating material to an edge of the substrate while the substrate is rotated without any portion of the applicator physically touching the edge of the substrate. The substrate support may be mechanically coupled to a cam, which contacts a follower mechanically coupled to the applicator. A variety of coating materials may be employed with the apparatus including hot melt ink and UV curable plating resist.

Abstract: A method of coating a first porous substrate with a thermoplastic material comprises the steps of: rotating the substrate about an axis of the substrate; and applying the material in a liquefied state onto the substrate, wherein the step of applying is performed from the outside of the substrate. According to another embodiment, a method of coating a porous substrate with a thermoplastic material comprises the steps of: connecting a first porous substrate to a rotator; rotating the substrate about an axis of the substrate; pumping the material in a liquefied state from a receptacle to an application head; and applying the material in a liquefied state onto the substrate, wherein the step of applying is performed from the outside of the substrate. In certain embodiments, the material coated on the substrate is used to help remove at least a portion of a filtercake.

Abstract: A gluing unit for applying adhesive to a succession of opening devices to be fitted to respective sealed packages of food products pourable into a tube of packaging material, the unit having a conveyor for feeding the opening devices along a path, and an adhesive dispenser located along the path, interacting with each opening device to apply adhesive to a portion of the opening device, and movable in a plane parallel to the path as well as crosswise to the plane.

Abstract: An orbiting scroll is fixed on a rotating table and rotated about a spiral center. A spray nozzle is positioned in the spiral center or at an outside end of the orbiting scroll and caused to discharge a coating toward a side face of a wrap portion. The spray nozzle is moved along a straight line in a radial direction while discharging the coating. When a spraying start position is set as the spiral center, a rotation angle speed of the orbiting scroll is gradually reduced in accordance with the movement of the spray nozzle. When the spraying start point is set as the outside end, the rotation angle speed of the orbiting scroll is gradually increased in accordance with the movement of the spray nozzle. As a result, the coating can be applied to the wrap portion side face evenly.

Abstract: A substrate is first rotated at a first rotation speed, and a resist solution is applied. Rotation of the substrate is decelerated to a second rotation speed lower than the first rotation speed so that the substrate is rotated at the low speed to smooth the resist solution on the substrate. Rotation of the substrate is then accelerated to a third rotation speed higher than the second rotation speed, and a solvent for the coating solution and/or a dry gas are/is supplied to the resist solution on the substrate. The solvent gas is supplied to a portion of the resist solution on the substrate thicker than a set thickness, and the dry gas is supplied to a portion of the coating solution on the substrate thinner than the set thickness. This thins the thicker portion of the resist solution and thickens the thinner portion to uniform the resist solution.

Abstract: An automatic inoculating system for depositing a sample on a substrate in a predetermined pattern. A turret is rotatable about a vertical axis, and an arm retained by the turret is pivotable about a horizontal axis. A stylus retained at a distal portion of the arm sucks up and dispenses the sample, such as by use of a pumping system in fluidic communication with the stylus. A support rotatably retains the substrate. The arm can be raised and lowered, such as by a cylinder on which the arm rests without a retaining mechanical connection therebetween. The arm can thus freely lift off the cylinder as when the stylus contacts the surface of the substrate. The sample can thus be deposited on the substrate in a predetermined pattern by a dispensing from the stylus in combination with rotation of the turret and the substrate and a pivoting of the arm.

Abstract: Disclosed is a silver thin film spread apparatus by means of deposition of nano metallic silver, the apparatus comprising: a treatment booth formed at one side with an inlet for inputting a substrate, and formed at the other side with an outlet for discharging the substrate; a transfer device formed at a lower side of the treatment booth for transferring the substrate; a spray device formed at an upper side of the treatment booth for spraying silver solution on a surface of the substrate; a moving device for linearly reciprocating the spray device; and a rotation device formed at the lower side of the treatment booth for rotating the substrate, whereby reflectivity can be enhanced by increasing film compactness and coating uniformity of thin film, where the substrate is rotated at a predetermined constant speed to allow the spray guns to linearly reciprocate and to allow the nano silver thin film to be uniformly spread and deposited on the surface of the substrate at a predetermined constant frequency.

Abstract: Provided is a developing apparatus configured to slim the resist pattern while reducing the number of developing modules. A room temperature developing liquid and a high temperature developing liquid to modify the surface layer of a resist pattern can be supplied from a common nozzle to a substrate disposed on a mount table. Although both developing liquids may be sequentially discharged by switching between the supply line for the room temperature developing liquid and the supply line for the high temperature developing liquid, it is also possible to join these supply lines for supplying the room temperature developing liquid from the former supply line, and then adjust the ratio of the flow rates between both supply lines, and then supply the mixed liquid of the developing liquids as a high temperature developing liquid.

Abstract: Various embodiments of methods and devices for coating stents are described herein.

Abstract: A film forming apparatus includes a processing chamber defined by walls, an application preparation room in which an applicator is temporary provided, a first carrier transporting the applicator from the application preparation room to the processing chamber, a stage on which a substrate is disposed and a maintenance part disposed adjacent to the application preparation room. A liquid is applied from the applicator onto the substrate to form a film on the substrate.

Abstract: In a coating step, a substrate is rotated at a high speed, and in that state a resist solution is discharged from a first nozzle to a central portion of the substrate to apply the resist solution over the substrate. Subsequently, in a flattening step, the rotation of the substrate is decelerated and the substrate is rotated at a low speed to flatten the resist solution on the substrate. In this event, the discharge of the resist solution by the first nozzle in the coating step is performed until a middle of the flattening step, and when the discharge of the resist solution is finished in the flattening step, the first nozzle is moved to move a discharge position of the resist solution from the central portion of the substrate. According to the present invention, the resist solution can be applied uniformly within the substrate.