Abstract: The invention relates to a system and a method for the hot-dip galvanization of motor-vehicle components, preferably for mass-production hot-dip galvanization of a plurality of identical or similar motor-vehicle components, in particular in batches, preferably for batch galvanization, especially preferably for high-precision hot-dip galvanization.

Abstract: A method of manufacturing a semiconductor device includes forming an interlayer insulating film over a main surface of a semiconductor substrate, forming a first conductive film pattern for a first pad and a second conductive film pattern for a second pad over the interlayer insulating film, forming an insulating film over the interlayer insulating film such that the insulating film covers the first and the second conductive film patterns, forming a first opening portion for the first pad, the first opening portion exposing a portion of the first conductive film pattern, and a second opening portion for the second pad, the second opening portion exposing a portion of the second conductive film pattern, in the insulating film, and forming a first plated layer by plating over the portion of the first conductive film pattern exposed in the first opening portion, and a second plated layer.

Abstract: A system for coating an interior surface of a heat exchanger includes a tank for storing the coating solution, a pump, a source line for supplying the coating solution to the heat exchanger, and a return line for returning the remainder of the coating solution to the tank. The system can include a pre-treatment line for supplying a pre-treatment solution to the heat exchanger and a water line for supplying water to the heat exchanger. An air compressor can be coupled to the heat exchanger to force the coating solution, the pre-treatment solution, or the water from the heat exchanger.

Abstract: Embodiments of this technology may include an apparatus for drying tissue. The apparatus may include human donor tissue placed in contact with and between at least two layers of backing material. This tissue and backing layer may then be restrained by two plates. This tissue may be amniotic tissue. The backing layer may include woven or nonwoven material. This backing layer may be wetted with a saline solution. At least one of the plates of the tissue drying apparatus may be perforated. The tissue assembly along with the plates may then be placed inside a chamber configured to receive the plates and tissue assembly. The chamber may be configured so that gas can be forced into the chamber with the gas flow going around the plates and the tissue assembly.

Abstract: An additive manufacturing machine includes a heated gas circulation system for regulating the temperature of additive powder throughout a powder bed and parts formed therein. The additive manufacturing machine includes a build platform defining a plurality of perforations and a heated gas supply that provides a flow of heated air into a distribution manifold and through the plurality of perforations and the powder bed to minimize temperature gradients within the powder bed which might otherwise result in distortion, thermal stresses, or cracking in the finished part.

Abstract: Molds including 3D printed components can be used to cast objects. A model of the object can be separated into multiple components, with each component not having non-printable overhang structures, thus allowing the components to be directly printed without support structures. Shell models and shell molds, e.g., molds with hollow interior, can be used for cost effectiveness. The surface of the printed object can be smoothened, for example, by solvent vapor (such as acetone for plastic), by sanding, or by a smooth coating. The object can be combinatorially cast.

Abstract: A substrate liquid treatment method in one embodiment includes, storing a phosphoric acid solution in a processing bath provided in a liquid treatment unit, and immersing a substrate into the stored phosphoric acid solution to process the substrate, draining a phosphoric acid solution at a first drainage flow rate from the liquid treatment unit, and supplying a phosphoric acid solution to the liquid treatment unit, in a first time period in which the substrate is immersed in the phosphoric acid solution in the processing bath, and draining a phosphoric acid solution at a second drainage flow rate different from the first drainage flow rate, from the liquid treatment unit, and supplying a phosphoric acid solution to the liquid treatment unit, in a second time period in which the substrate is immersed in the phosphoric acid solution in the processing bath.

Abstract: Provided is a semiconductor-manufacturing apparatus that forms a plated film having a highly homogeneous thickness on a target surface of a semiconductor wafer through electroless plating. A semiconductor-manufacturing apparatus forms plated films on target surfaces of a plurality of wafers held by a carrier capable of holding the wafers. The semiconductor-manufacturing apparatus includes the following: a rectification mechanism including a rectification plate having a plurality of through-holes, the rectification mechanism being held by the carrier in such a manner that the rectification plate faces the target surface of each wafer; a bath in which a chemical solution for forming each plated film is stored, and in which the carrier, holding the plurality of wafers and the rectification mechanism, is immersed in the chemical solution; and a driver configured to shake the carrier as immersed in the bath with a relative positional relationship between each wafer and the through-holes kept constant.

Abstract: The present disclosure provides three-dimensional (3D) printing methods, apparatuses, and systems using, inter alia, a controller that regulates formation of at least one 3D object (e.g., in real time during the 3D printing); and a non-transitory computer-readable medium facilitating the same. For example, a controller that regulates a deformation of at least a portion of the 3D object. The control may be in situ control. The control may be real-time control during the 3D printing process. For example, the control may be during a physical-attribute pulse. The present disclosure provides various methods, apparatuses, systems and software for estimating the fundamental length scale of a melt pool, and for various tools that increase the accuracy of the 3D printing.

Abstract: A method, non-transitory computer readable medium and apparatus for forming an image on a three dimensional (3D) object are disclosed. For example, the method includes, detecting the 3D object that is formed from a first material is positioned on a movable bed, providing a bed of a powder of a second material on the movable bed around the 3D object, vibrating the bed of powder to provide a level surface of the powder, sintering a portion of the bed of the powder onto the 3D object, moving the 3D object and repeating the providing, the vibrating, the sintering and the moving to form the image onto the 3D object.

Abstract: A method and a device for coating a metal strip with a coating material that is still liquid at first. During the coating, the coated metal strip runs through a roller pair. One of the rollers of the roller pair can be adjusted toward the other as a correction roller in order to eliminate a possible curvature of the metal strip. Then the metal strip runs through a blow-off apparatus for blowing off surplus coating. In order to prevent an uneven thickness distribution of the coating on the metal strip even when the correction roller of the roller pair has been adjusted, the actual position of the metal strip is controlled to a specified setpoint center position in the slot of the blow-off apparatus by an appropriate movement of the blow-off apparatus.

Abstract: An inline coating system has an introduction chamber comprising an introduction gate, a first buffer chamber which connects to the introduction chamber and which can be separated from the introduction chamber by means of a first sluice gate and other components. The first buffer chamber has a gap sluice device with at least one slit diaphragm, and when the first insertion gate is opened or closed, a pressure gradient within the first buffer chamber is adjusted between the pressure in the region of the second insertion gate and the pressure in the region of the first insertion gate.

Abstract: A system having a hand tool battery, a hand tool case which has at least one inductive charge receiving area which is provided for storing a hand tool battery which is inserted into the inductive charge receiving area at least partially in close proximity to at least one wall of the hand tool case, and having at least one latent heat storage unit which is provided for influencing at least a temperature of the at least one hand tool battery.

Abstract: Disclosed is an embedding cassette for biopsy to embed tissue received in an embedding mold provided with a space to receive the tissue when the embedding cassette is combined with the embedding mold, including a body provided with a space communicating with the receipt space of the combined embedding mold so that an injected paraffin solution may coagulate therein during embedding of the tissue and at least one paraffin barrier groove formed at the edge of the lower surface of the body, and, when the embedding cassette is combined with the embedding mold and embedding of the tissue is carried out, the injected paraffin solution flows into the at least one paraffin barrier groove and forms a barrier and, thereby, leakage of the paraffin solution between the embedding cassette and embedding mold is prevented.

Abstract: A galvannealed steel sheet having a galvanized layer on a surface thereof is provided, having a composition which contains C: 0.10% to 0.35%, Si: 0.3% to 3.0%, Mn: 0.5% to 3.0%, P: 0.001% to 0.10%, Al: 0.01% to 3.00%, and S: 0.200% or less on a mass basis, the remainder being Fe and incidental impurities. The steel sheet has a SiC/SiO2 ratio of more than 0.20, the SiC/SiO2 ratio being a ratio of SiC amount to SiO2 amount at a depth of 1 ?m or less in the steel sheet from an interface between the steel sheet and the galvanized layer, and Fe in the galvanized layer constitutes 8% to 13% by mass.

Abstract: A partitioning apparatus for a washer/dryer combination includes a plurality of arch sections, a plurality of longitudinal couplers, a plurality of flanges attached to or formed on each of the plurality of longitudinal couplers, and a locking means for affixing the plurality of longitudinal couplers to a drum of the washer/dryer combination. The plurality of arch sections form a cylindrical body and the partitioning apparatus divides the drum of the washer/dryer combination into a cylindrical space and a plurality of arch spaces.

Abstract: A method for correction of thermal defects using tomographic scanning for additive manufacturing is provided. The method may include forming a portion of an object using an additive manufacturing system based on an intended three-dimensional (3D) model of the object that is in an additive manufacturing system format. The portion of the object is scanned using a tomographic scanner to obtain a model of the portion of the object in a tomographic scanner format. The model is converted from the tomographic scanner format into the additive manufacturing system format to obtain a converted tomographic model; and the converted tomographic model is compared to the intended 3D model to identify a defect in the portion of the object. A modified 3D model may be generated of the object correcting the intended 3D model to address the defect of the portion of the object.

Abstract: A plating apparatus can perform a plating process on an entire surface of a substrate uniformly. A plating apparatus 20 includes a substrate holding/rotating device 110 configured to hold and rotate a substrate 2; a discharging device 21 configured to discharge a plating liquid toward the substrate 2 held on the substrate holding/rotating device 110; and a controller 160 configured to control the substrate holding/rotating device 110 and the discharging device 21. Further, the discharging device 21 includes a first nozzle 40 having a multiple number of discharge openings 41 arranged in a radial direction of the substrate 2 or having a discharge opening 42 extended in the radial direction of the substrate 2; and a second nozzle 45 having a discharge opening 46 configured to be positioned closer to a central portion of the substrate 2 than the discharge opening of the first nozzle 40.

Abstract: Mineral samples for use in analytical instruments are created by a system that greatly reduces the sample preparation time and facilitates automation. For example, in some implementations, rather than grinding to expose the interior of mineral particles in sample plug containing mineral particles in an epoxy compound, the sample plug is sliced with a saw, which more rapidly provides in many applications a sufficiently smooth surface on the exposed particle surfaces for observation. Rather than slowly mixing a slow curing epoxy to avoid introducing bubbles into the sample plug, some implementations use a fast settle fixative and a mechanical mixture that avoid bubbles.

Abstract: A wave solder machine includes a pre-heating station, a wave soldering station, and a conveyor to transport substrates through a tunnel passing through the pre-heating station and the wave soldering station. The tunnel has a substantially oxygen-free environment. The pre-heating station includes a pre-heater including a support frame assembly, and a heater assembly supported by the support frame assembly. The heater assembly is slidably coupled to the support frame assembly between an operational position and a non-operational position. The pre-heater further includes a seal disposed between the heater assembly and the support frame assembly. The seal provides a gas-tight seal when the heater assembly is in the operational position to prevent atmosphere from entering the tunnel thereby preserving the substantially oxygen-free environment within the tunnel.

Abstract: A welding method, including: forming a molten solder in a solder bath, forming a dynamic flow of the molten solder from the solder bath, and contacting an object to be welded with the dynamic flow of the molten solder and conducting welding. The surface of the molten solder includes a reduction layer. The oxygen content of the molten solder is below 10 ppm.

Abstract: A gas feed element for feeding gas into a dust-like loose material having a high permissible differential pressure in respect of the thickness of the gas feed element and a high operating temperature range is provided. The gas feed element has a support plate having openings and is arranged on the side of the filter material facing the gas flow and on the side of the filter material facing away from the gas flow. The gas feed element permits rapid pressurization of a pressure vessel containing a stock of coal dust. Particular configurations of the filter material are provided by metallic filtration mesh with or without support mesh, sintered metal and sintered polymer, in each case having a filter fineness of from 5 ?m to 1000 ?m.

Abstract: A fluidizing plate is provided. The fluidizing plate generates a fluidization layer accommodating a dustlike bulk material, having a high operating temperature range and high permissible differential pressure relative to the thickness of the fluidizing plate, a support plate which carries the filter material and has through holes. Particular designs of the filter material feature metallic filtration fabric with or without support fabric, sintered metal, and sintered plastic, in each case with a filter fineness of 5 ?m to 1000 ?m. Particular designs of the fluidizing plate feature the disposition of a central through hole for the shaft of a stirrer mechanism, and an opening for the emptying of the fluidization vessel.

Abstract: A flow regulating member of a hot dip coating tank which is able to suppress stir-up of bottom dross, characterized by being provided with flow regulating member horizontal plates which are respectively arranged horizontally from below two side end parts of a sink roll, which is arranged inside of a coating tank in a rotatable manner, toward outside directions of the sink roll and side members which are arranged at positions separated from the two ends of the sink roll, which extend upward from the end parts of the respective horizontal plates, and in which large numbers of dispersion holes are formed, the side members having an aperture ratio of 20 to 80%, and the dispersion holes having a hole diameter of 5 to 50 mm.

Abstract: A die head is disclosed comprises: a feed slot which is positioned downstream of the moving direction of the substrate and continuously feed the coating solution; a gas suction slot which is positioned upstream of the moving direction of the substrate and suctions a gas so as to create vacuum in the vicinity of the upstream edge of the bead with respect to the moving direction of the substrate; and a gas ejection slot which is positioned between the feed slot and gas suction slot and ejects a gas so as to prevent inflow of the coating solution into the gas suction slot.

Abstract: A method of internally restoring a pipe preferably includes the steps of isolating a leaking pipe from a system of pipes; drying an interior of a leaking pipe; measuring the airflow through the leak; cleaning the interior of the leaking pipe; presealing a leak with a leak sealing media, measuring the leak flow rate after the pre-sealing; applying an internal protective coating process; and pressure testing the leaking pipe for leaks. The pipe restoration method preferably uses a control box, a media injection system, an air compressor and a coating dispensing system at an inlet of the leaking pipe. The pipe restoration method preferably uses a coating overflow receiver, a muffler and a dust collector at an exit of the leaking pipe. After the treatments, the leaking pipe becomes a restored pipe. The restored pipe is pressure tested for leaks at a working pressure rating of the pipe.

Abstract: A reactor assembly having vertically adjustable flow cells is provided. The vertically adjustable flow cells include passageways for distributing a fluid to a reaction region isolated below a bottom surface of corresponding flow cells. The adjustable flow cells enable another dimension of variability for combinatorial processing. Thus, additional data may be gathered for effects on process parameter variations, material variations, process sequence variations, etc., for semiconductor processing operations.

Abstract: A device for wet-chemical treatment of substrates includes: an accommodation device for a substrate and a process medium, the substrate having a treatment side in operative connection with the process medium; a fluid guidance element, having a specified surface texture, housed in the accommodation device, the specified surface texture being configured to provide a guidance of the process medium along the specified surface texture, the specified surface texture being positioned lying opposite and at a predetermined fixed recess at a distance from the treatment side of the substrate; and the process medium being moved in the intervening space between the specified surface texture of the fluid guidance element and the treatment side of the substrate.

Abstract: A method of recycling a solution, the method including: filtering a solution used in chemical bath deposition; reinflowing the filtered solution to a bath; and inflowing an alkali solution to the bath to maintain a concentration of an alkaline material in the filtered solution in a range of about 1.0 M to about 3.5 M, is disclosed. A solar cell formed by the method and a deposition apparatus are also disclosed. By the method of recycling a solution, a solar cell including a buffer layer formed with a solution which has been used multiple times may be formed to have an efficiency almost the same as that of a solar cell including a buffer layer formed with a solution provided for the first time before filtering.

Abstract: A coating machine for coating fiber yarns includes: a yarn supply device; a coating device including a tank, a drum rotatably disposed in the tank, and at least one annular groove formed circumferentially in an outer surface of the drum; a thickness adjuster disposed downstream of the coating device and including an adjuster support and at least one adjusting die mounted movably to the adjuster support, the adjusting die having a through hole, the through hole having an upstream inlet end and a downstream outlet end and being tapered from the upstream inlet end to the downstream outlet end; a shape-setting device disposed downstream of the thickness adjuster and having a heating unit controllable to operate at a predetermined temperature; a cooling device disposed downstream of the shape-setting device; and a yarn pick-up device disposed downstream of the cooling device.

Abstract: A system and method for photo-grafting a coating polymer onto the surface of a medical device are provided. The system comprises a plurality of stations including a novel grafting station. The system and method of the invention are both time- and resource-efficient. The system includes several stations, each station including a dipping tank. The system allows for the automated, semi-automated, or manual dipping of medical devices into the dipping tanks in a specified order, as desired, wherein at least one of the stations is a grafting station for photo-grafting the coating polymer onto the surface of the medical device. The system is modular, which allows for modification of the process as required, depending on the needs of the user. The system may comprise stations for incorporating an antimicrobial agent into the coating, and/or for rendering the coating lubricious.

Abstract: A method for removing material from surfaces of at least a portion of at least one recess or at least one aperture extending into a surface of a substrate includes pressurizing fluid so as to cause the fluid to flow into the at least one recess or the at least one aperture. The fluid may be pressurized by generating a pressure differential across the substrate, which causes the fluid to flow into or through the at least one aperture or recess. Apparatus for pressurizing fluid so as to cause it to flow into or through recesses or apertures in a substrate are also disclosed.

Abstract: Apparatuses and methods for synthesizing nanoscale materials are provided, including semiconductor nanowires. Precursor solutions include mixed reagent precursor solutions of metal and chalcogenide precursors and a catalyst, where such solutions are liquid at room temperature. The precursor solutions are mixed by dividing a solution flow into multiple paths and converging the paths to form a uniform solution. A thermally controlled reactor receives the uniform solution to form semiconductor nanowires. Various electronic, optical, and sensory devices may employ the semiconductor nanowires described herein, for example.

Abstract: The invention relates to a device for applying preferably liquid flavorings (15), in particular menthol, to a medium (16), wherein flavoring (15) is supplyable from a (storage or processing) container (10) to an applicator unit (14) via at least one conduit (11, 13). The invention is characterized in that the applicator unit (14) has a controllable valve for the application of flavoring (15) to the medium (16).

Abstract: A device is provided for depositing a treatment substance on the surface of a moving thread. The device comprises a tank configured to contain a liquid solution of the substance that is used to deposit the substance on the surface of the thread. The device also includes at least one nozzle having a nozzle inlet configured to receive said solution. The at least one nozzle is directed to spray the received solution towards the thread with a spray velocity in a form of jets, and the jets converge on the thread to adjust a thickness of the solution remaining on the thread by removing excess liquid entrained by the thread. The device further includes a pump that is coupled to the nozzle inlet and a treatment apparatus. The pump is configured to regulate the spray velocity according to a run speed of the thread.

Abstract: A liquid application apparatus applies a liquid to an objective region. The apparatus includes a trap having an opening from which the liquid linearly appears, a feeder to feed the liquid to the trap, and an operation unit to position the trap on the objective region and bring the linearly appeared liquid at the trap into contact with the objective region, thereby linearly applying the liquid to the objective region. The apparatus is capable of linearly applying the liquid in a uniform thickness to the objective region.

Abstract: A flow regulating member of a hot dip coating tank which can suppress stir-up of bottom dross, characterized by being provided with horizontal plates which are respectively arranged horizontally from below two side end parts of a sink roll, which is arranged inside of a coating tank in a rotatable manner, toward outside directions of the sink roll and louvers which are arranged above from the end parts of the respective horizontal plates at positions separated from the two ends of the sink roll and which have flow direction changing members which are slanted so that their heights become gradually higher toward the wall surface sides of the coating tank.

Abstract: A camera is used to take an image of an end surface of a honeycomb structure gripped by a hand. Based on the image, an initial rotation angle of the honeycomb structure around a vertical axis at a reference position where the image has been taken is recognized. An arm turning section is driven to convey the honeycomb structure gripped by the hand from the reference position to above a plugging mask. A rotation angle required to adjust the rotation angle of the honeycomb structure on the plugging mask to a desired final rotation angle is acquired based on the initial rotation angle recognized at the reference position and a rotation angle of the honeycomb structure around the vertical axis associated with the driving of the arm turning section from the reference position to above the plugging mask. The honeycomb structure is rotated based on the required rotation angle.

Abstract: In a viscous liquid feed nozzle having a nozzle body provided with a thin and long hole with a front end serving as a feed port, a lubricative plated layer is provided by immersing the liquid feed nozzle in a plating tank containing a lubricative plating solution and forming, by electroless plating, the lubricative plated layer at least on the inside and outside of the feed port.

Abstract: A dipping bath according to the present disclosure includes a body to hold a slurry for dip coating, an inlet installed to flow the slurry from an outside of the body to an inside, and an outlet installed to discharge the slurry from the inside of the body to the outside, and one end of the inlet placed inside the body may be disposed facing a side surface of the body at a distance and may be tilted to a predetermined angle in a direction toward a bottom surface of the body. According to the present disclosure, adjustment of an incidence angle of the slurry flowing into the bath through the inlet may increase a flow rate of the slurry toward the bottom surface, as well as allowing a uniform distribution of solids contained in the slurry circulating through the bath.

Abstract: Systems, method and devices for applying a fluid composite to a carrier sheet are presented herein. An aspect of this disclosure is directed to a fluid-administering apparatus for applying a fluid composite, such as resins, epoxies, and adhesives, to a carrier sheet, such as a cloth tape. The apparatus includes a support frame with a container buttress, and a container removably received within the container buttress of the support frame. The container has a basin for holding the fluid composite, a lid covering the basin, and first and second scraping surfaces for scraping the carrier sheet. The container also has first and second slots, each of which is defined through a respective opposing side of the container. The carrier sheet passes through the first slot, traverses down into the basin through the fluid composite, slides over the first scraping surface then under the second scraping surface, and passes out through the second slot.

Abstract: A deposition apparatus and a method for recycling a solution. The deposition apparatus includes a bath in which a solution used in a chemical bath deposition (CBD) method is filled, a tank in which the solution used in the CBD method is temporarily stored, and a filter unit for filtering the solution stored in the tank to be reused in the CBD method again. Thus, when a buffer layer is formed by the CBD method, the number of times of reusing the solution for forming the buffer layer may be increased.

Abstract: An open-bottomed reactor cell for wet processing of substrates can be configured to confine a process liquid to an area under the cell (processing the “internal site”), or alternatively to exclude the process liquid from most of the area under the cell (processing the “external site”) without physical contact between the cell and substrate. A slight underpressure or overpressure maintained inside the main cavity of the cell causes the liquid to form a meniscus in the narrow gap between the cell and substrate rather than flowing outside the desired process area. An area under a peripheral channel outside the main cavity of the cell is shared by both the internal site and the external side, allowing the entire substrate to be processed.

Abstract: A dispensing apparatus includes a dispensing unit having a main body, a channel through the main body, and a plurality of nozzles connected to the main body, the plurality of nozzles being configured to dispense fluid flowing in the channel, a gap sensor unit configured to determine size of gaps between adjacent nozzles in the dispensing unit, and a thermal expansion adjusting unit configured to thermally expand or contract the main body of the dispensing unit to adjust the gap size between adjacent nozzles to a predetermined size, based on the gap size determined by the gap sensor unit.

Abstract: A pre-treatment process surface preparation of workpieces for subsequent nickel coating is provided including a thermal process to remove residue, grit blasting for surface roughening, such as with garnet, and rust avoidance by submergence in hot ammonia. Use of expensive tank materials for electroless nickel coating are avoided through the provision of replaceable liners optionally protected from the subject workpieces using movable wall panels. Further, tank heating is effectively provided using industrial hot water heaters and an indirect water/nickel solution heat exchanger, obviating the need for risky and regulated heat sources. In a final option, a fluoropolymer sealer is provided over the nickel coating.

Abstract: A film formation system and a film formation method are disclosed. The film formation method includes the following steps performed in the film formation system that includes a container containing liquid, a liquid draining device for draining the liquid, a ring-shaped component installed in the container, and a carrying component installed in the liquid in the container for carrying at least a substrate: enabling the carrying component in the liquid and enabling the ring-shaped component to float on the liquid; when a film layer that is composed of nano-spheres is formed on the liquid, locating the film layer in a ring of the ring-shaped component; and removing the liquid, allowing the film layer to move downward in accordance with the ring-shaped component and be formed on the substrate, thereby preventing the nano-spheres from contacting an inner wall of the container and bursting, through the installation of the ring-shaped component.

Abstract: The present invention provides an apparatus for producing an electrophotographic photosensitive member that has a coating machine for dipping plural members to be coated in a coating liquid in a coating bath and then lifting up the coated members to form a coating film on the surface of each of the plural members to be coated and a transport holding member for holding and transporting the members to be coated, and has plural stretching hoods which can individually cover each side of the plural members to be coated and can extend in association with the movement of the plural members to be coated to individually cover each side of the plural members to be coated when the coating machine is lifting up the plural members to be coated, wherein the plural stretching hoods are linked with each other at the lower parts of the hoods.

Abstract: An apparatus and process for depositing slurry upon a moving forming web. The apparatus includes a pivotally mounted headbox for depositing slurry from the inner bottom surface of the headbox down an inclined spillway as a continuous curtain onto a moving web. The headbox is mounted transverse to the direction of travel of the moving web. The headbox also has vertical edge boards, including a headbox back edge board and two opposed headbox side edgeboards, on three respective sides of the headbox to prevent slurry from spilling over the sides and back of the headbox. The headbox is supplied with slurry from a slurry mixer by a feed line mounted on a reciprocating trolley which moves, transverse to the direction of travel of the moving web, back and forth along the length of the headbox.

Abstract: A capsule forming apparatus comprising a plurality of outputs configured to output capsule materials, a tank for housing a first capsule material and being configured to supply the first capsule material to the outputs and at least one conduit being configured to convey a second capsule material to the outputs. A method for forming capsules is also described.

Abstract: The invention concerns a method for fabricating a substrate in semiconductor material characterized in that it comprises the steps of: starting from a donor substrate in a first semiconductor material at an initial temperature, contacting a surface of the donor substrate with a bath of a second semiconductor material held in the liquid state at a temperature higher than the initial temperature, the second semiconductor material being chosen so that its melting point is equal to or lower than the melting point of the first semiconductor material, solidifying the bath material on the surface to thicken the donor substrate with a solidified layer. The invention also concerns a device for implementing the method.