Abstract: A substrate plating apparatus forms an interconnection layer on an interconnection region composed of a fine groove and/or a fine hole defined in a substrate. The substrate plating apparatus includes a plating unit for forming a plated layer on a surface of the substrate including the interconnection region, a chemical mechanical polishing unit for chemically mechanically polishing the substrate to remove the plated layer from the surface of the substrate leaving a portion of the plated layer in the interconnection region, a cleaning unit for cleaning the substrate after the plated layer is formed or the substrate is chemically mechanically polished, a drying unit for drying the substrate after the substrate is cleaned, and a substrate transfer unit for transferring the substrate to and from each of the first plating unit, the first chemical mechanical polishing unit, the cleaning unit, and the drying unit.

Abstract: A semi-automated coating system for providing medical devices with antimicrobial coatings is disclosed. The semi-automated coating system extends the coating solution's usable life span by minimizing exposure to light, air and temperature extremes. Moreover, the disclosed semi-automated coating system minimizes operator and environmental exposure to the coating solutions. Methods disclose techniques for preparing coating solutions, setting up the coating system and operating the device. Moreover, the systems and methods described herein minimize operator intervention with the coating processes and provide superior product consistency.

Abstract: A slit nozzle includes a solution feeding mechanism having an elastic element and a plurality of piezoelectric devices and embedded in a side surface of a flow passage near a slit in the slit nozzle. Control is effected so that the piezoelectric devices are vibrated to cause the elastic element to produce traveling waves toward the slit. A resist solution serving as a processing solution is pumped by the traveling waves, thereby to be discharged through the slit toward a substrate. This provides a substrate processing apparatus capable of smoothly discharging the processing solution to accomplish high discharge accuracy.

Abstract: A method and apparatus for plating a substrate is provided, wherein fine pits formed in the substrate, such as fine channels for wiring, are filled with a copper, copper alloy, or other material with low electrical resistance. The method is performed on a wafer W having fine pits (10) to fill the fine pits with a metal (13) and includes performing a first plating process (11) by immersing the wafer in a first plating solution having a composition superior in throwing power; and performing a second plating process (12) by immersing the substrate in a second plating solution having a composition superior in leveling ability.

Abstract: A diptank applies coating solution to devices that are dipped therein. A reservoir tank contains a reservoir of coating solution. The diptank forms a coating solution overflow return that flows to the reservoir by means of a conduit and a self-adjusting return line. The self-adjusting return line comprises a plastic tubing with an upper portion, a central portion and a lower portion. The upper portion is coupled to the conduit. The tubing central portion is flexible and corrugated and arranged to extend and compress in its length. The lower portion is supported by an attached buoy that floats on the surface of the reservoir. The lower portion defines an outlet that discharges the coating solution overflow return to the reservoir. As a result, the coating solution overflow return is discharged to the reservoir at a fixed vertical distance or level with respect to the surface of the reservoir.

Abstract: The invention concerns the treatment of porous structures such as cross-linked foams, woven or nonwoven, to make them electrically conductive by depositing polymers. The device enables, in a chemical reactor, to perform the activating treatment directly through non-reeled off blocks or rolls of porous structures, the treating fluids of the successive steps being made to circulate inside said blocks or rolls, via a perforated rotary mandrel whereon they are pressed. Said device enables to activate efficiently the structures, which may be metal-coated or not, and are particularly designed to be used as electrodes for liquid effluent electrolysis, of detectors and traps of organic or biological molecules, electrode supports for electrochemical generators, catalyst supports, filtering media, acoustic insulants, electromagnetic, nuclear and antistatic protection structures, heat exchangers and the like.

Abstract: A wallpaper dispensing apparatus includes a tray with a ridge projecting from the bottom and extending transversely between the side walls to divide the tray into a forward pool section and a rearward trough section. A removable cover is attached to the forward pool section and includes a pair of depressions with guide surfaces on the bottom, spaced above the bottom of the tray to form a passageway between the cover and tray bottom. The cover has a rearward portion following a portion of the ridge, and a straight rearward edge extending transversely across the tray. An opening in the cover, extending from the forward edge permits the user to draw a strip of wallpaper from a roll located in the trough, through the passageway between the cover and tray, and out the forward end of the tray. Water in the pool portion wets the wallpaper as it is drawn from the dispensing apparatus.

Abstract: The current invention reveals equipment and the method to utilize it to reduce or eliminate seal deposition in equipment that uses inflatable seals where a solution can come into contact with the seal and leave a deposit. Typical of this process is the coating chamber used to prepare honeycomb substrate for catalytic converters. For catalytic converter coating, the invention sprays the solvent of the coating solution, typically water, in a flat fan spray across the coating chamber in a high pressure pulse in such a manner as to produce a thin film of water on the seal surface, and reflect from the seal surface to clean multiple seals within the chamber. The film of water removes deposits, interferes with further nucleation, and the wet seal forms a tighter seal with less pressure. Water is pulsed with a metering pump through rigid or semi-rigid tubing to fixed spray nozzles when the substrate is removed from the coating chamber. The pulse takes less than 1 second.

Abstract: A dispenser to dispense towels selectively treated with a fluid, includes a compartment having an open upper end and containing at least one dispensable towel therein. A removable cover is disposable on the compartment to form an enclosure with the compartment. A towel dispensing conduit extends through the cover to a top opening of the cover, the conduit defining a path through which the dispensable towel is extracted from the compartment and dispensed from the top opening of the cover. A fluid application assembly is associated with the removable cover. The fluid application assembly includes a fluid reservoir, oriented over the compartment when the cover is disposed on the compartment, and being configured to receive and store the fluid therein; and a fluid applicator, in fluid communication with the reservoir and being selectively operable by a user to selectively apply the fluid to the dispensable towel as the towel is dispensed from the dispenser.

Abstract: There is provided a plating apparatus and method which can control the temperature of a plating solution during plating more uniformly and easily form a uniform plated film on the to-be-plated surface of a workpiece, and which can simplify the device and decrease the footprint. The plating apparatus includes: a plating bath of a double bath structure (18) including an inner bath (14) for holding a plating solution and carrying out plating, and an outer bath (26) which surrounds the inner bath (14) and is in fluid communication therewith; and a heating device (30) disposed in the outer bath (26). The plating apparatus may further include means (32) for circulating or stirring the plating solution (12) in the plating bath (18).

Abstract: There is provided a plating apparatus which can keep a plating solution always in its optimal condition while minimizing, the amount of plating solution used, and which can easily form a uniform plated film on the plating surface of a workpiece. The plating apparatus includes: a plating solution supply system (70) for constantly circulating a plating solution while heating the plating solution in a circulation tank (80) provided with a heating apparatus (78a), and supplying a predetermined amount of plating solution to a plating treatment section (24) when carrying out plating treatment; a plating solution recovery system (72) for recovering the plating solution after the plating treatment in the plating treatment section (24), heating the plating solution and returning the heated plating solution to the circulation tank (80); and a plating solution replenishment system (74) for replenishing the circulation tank (80) with a fresh plating solution or a plating solution component.

Abstract: An apparatus including: a tank with a closed base end and an open top end, and adapted to contain a coating formulation; and a receiver member with at least a cone shape, where the base of the cone is attached to the interior and to the base end of the tank and adapted to receive an article for coating.

Abstract: A leaf coater, in which a constant quantity of a coating solution is supplied intermittently from a coating solution supply source through a predetermined coating solution quantity intermittent supply means and a coating solution applying means to a blank substrate, for coating blank substrates one by one with the coating solution, characterized in that a coating solution filtration means is provided in the coating solution flow pipeline from said coating solution supply source to the coating solution applying means, and the Young's modulus of the filter medium in the coating solution filtration means is not less than 200 MPa, while the pore size of the filter medium is in the range of 0.05 &mgr;m to 100 &mgr;m; and a method for producing coated substrates using said leaf coater.

Abstract: Device for filling multiple blind holes. The invention involves a device that permits the filling of blind holes in an effective and controlled manner. It is composed of a mobile body (1) in airtight contact with the surface (10) containing the hole openings. The body (1) contains two slots, the first (2) of which is kept airtight from the exterior of the device and from the second slot (5), is separate and parallel to the direction of travel of the device, and is larger than the largest opening. The first slot exposed to the openings while moving is connected to a vacuum chamber (3), while the second slot exposed to the openings is connected to a reservoir (6) containing the product (7) to be transferred.

Abstract: An automatic tissue processor for processing tissue samples for histological analysis. The tissue processor in one configuration includes a retort chamber, a wax storage chamber holding multiple wax containers, a reagent storage chamber holding multiple reagent containers, and a fluid transporting system including a rotary valve operated by a Maltese Cross gear, for selectively connecting the retort chamber with a particular wax or reagent container to supply wax or reagents to the retort chamber. Differential heating of the wax chamber is accommodated by multiple heating elements, with indirect heating of the rotary valve and the fluid transporting system. A computerized central control system for automatic monitoring and control of such tissue processor is advantageously arranged to execute a reagent management program, which enables the central control system to automatically manage reagent usage and replacement.

Abstract: An apparatus and process for coating a plurality of articles in batches, in particular for applying a biocompatible layer on articles adapted to come into contact with blood or body tissue, e.g. a coagulation-preventing substance so as to render the articles non-thrombogenic. A plurality of article-carrying plates (14) are stacked upon one another and have a plurality of communicating wells (18) for receiving therein a respective article to be coated. A base plate (12) defines with a bottom side of a lowermost of said article-carrying plates a distribution chamber (34) for receiving and evenly distributing a solution containing a substance to be applied to said articles. The solution is fed through the wells of the stacked plates (14) in parallel vertical flows.

Abstract: An apparatus for coating a photoreceptor substrate, such as a photoreceptor belt or a photoreceptor drum, consists of at least one photoreceptor coating fluid reservoir or diptank. The diptank defines an inlet at one end and a conduit with an orifice at the other end. The conduit includes at least one porous element such as a grid, screen or mesh arranged for suspending a plurality of layers of non-contaminating rounded objects, such as stainless steel or glass beads, in the bottom of the conduit. Photoreceptor coating solution supplied to the inlet is thereby forced to flow through the plurality of layers of beads prior to coating a photoreceptor substrate that is inserted through the orifice. As a result, the uniformity of the coating solution is improved as it coats the photoreceptor substrate, thereby reducing coating defects in the finished photoreceptor belt or drum.

Abstract: Plating apparatus and plating method that can plate more uniformly on a processing surface of a workpiece are provided. The plating apparatus is comprised of a plating solution bathe which is provided with a first electrode held in a state soaked in a plating solution; a workpiece holding mechanism which holds a workpiece to contact its processing surface to the plating solution; and a contact member, disposed in the workpiece holding mechanism, that electrically contacts with the circumferential edge of the workpiece so to form a conductive layer on the workpiece surface as a second electrode. The contact member is divided along the circumferential direction of the workpiece with which they are electrically contacted. Thus, even if the contact resistance between each section of the contact member with the workpiece is variable, it is possible to adjust the plating electric current for each section of the contact member.

Abstract: Apparatus and method for applying liquid coating to pellets in a flowing feed stream are provided. An incoming bulk material feed is conditioned to produce a ribbon-like agglomerated flow pattern, and the bulk material is passed through a first spray section which coats an exposed surface of the pellets flowing therethrough. The flow direction is reversed in a second spray station, which operates to expose an opposite surface of the pellets, such that the second spray section coats substantially the remainder of the outer surface of the pellets.

Abstract: A machine for impregnating a die cast metal part with liquid impregnant comprises an impregnation chamber having liquid impregnant in a lower portion, an opening for ingress and egress of the parts being defined in a side wall of the chamber above the liquid impregnant, a door for sealing the opening, a part holder in the chamber and an elevator for positioning parts above the liquid impregnant during evacuation of the chamber and then immersing the parts in the liquid impregnant during subsequent pressurization of the chamber.

Abstract: A coating apparatus having a fluid circulating system wherein the fluid ascending in a dipping container overflows an overflow edge disposed at the top of the dipping container into an overflow-fluid receiving container and returns from the bottom of the overflow-fluid receiving container into the dipping container, wherein the dipping container has a depth of ⅓ to ⅔ of the internal diameter thereof. When the dipping container is too deep, the powder or the like tends to be compressed tightly in the upper part of the dipping container, often impeding efficient insertion of a substrate, but the coating apparatus according to the present invention, the dimension thereof being specified as above, keeps favorable fluidity of the powder or the like.

Abstract: A method and apparatus for applying a fluid preservative to wood or wood products has a work tank for maintaining a predetermined concentration of preservative in the fluid. The work tank is equipped with a heater to keep the temperature of the fluid and the preservative in the work tank at a predetermined level. Hot fluid and preservative is drawn under a vacuum, initially from the work tank. On filling a pressure vessel, a pressure pump then supplies the preservative and fluid mixture under pressure to the pressure vessel in which the wood or wood product is being treated. As the treatment process depletes the preservative in the fluid, through absorption in the wood, the depleted fluid is circulated back to the work tank where it is heated and more preservative is added to restore the concentration of preservative in the fluid to a desired level. The fluid, replenished with preservative, is then pumped into the pressure vessel.

Abstract: A diptank applies coating solution to devices that are dipped therein. A reservoir tank contains a reservoir of coating solution. The diptank forms a coating solution overflow return that flows to the reservoir by means of a conduit and a self-adjusting return line. The self-adjusting return line comprises a plastic tubing with an upper portion, a central portion and a lower portion. The upper portion is coupled to the conduit. The tubing central portion is flexible and corrugated and arranged to extend and compress in its length. The lower portion is supported by an attached buoy that floats on the surface of the reservoir. The lower portion defines an outlet that discharges the coating solution overflow return to the reservoir. As a result, the coating solution overflow return is discharged to the reservoir at a fixed vertical distance or level with respect to the surface of the reservoir.

Abstract: A workpiece is processed uniformly, e.g., a uniform plated film is formed on a workpiece, by a processing liquid, e.g., a plating solution, which is maintained in an optimum state while minimizing the amount of the processing liquid to be used. An apparatus for processing the workpiece has a plurality of solution supply tanks 50a, 50b for individually holding a plurality of solutions, respectively, to be mixed into a processing liquid 54 while managing the temperatures of the solutions, a plurality of mixing tanks 52a, 52b for mixing the solutions individually supplied from the solution supply tanks 50a, 50b into the processing liquid 54 while managing the temperatures of the solutions, and a processing bath 56 for introducing the processing liquid 54 therein and processing the workpiece, e.g., a substrate W, by bringing the workpiece into contact with the processing liquid 54 while managing the temperature of the processing liquid 54.

Abstract: A semi-automated coating system for providing medical devices with antimicrobial coatings is disclosed. The semi-automated coating system extends the coating solution's usable life span by minimizing exposure to light, air and temperature extremes. Moreover, the disclosed semi-automated coating system minimizes operator and environmental exposure to the coating solutions. Methods disclose techniques for preparing coating solutions, setting up the coating system and operating the device. Moreover, the systems and methods described herein minimize operator intervention with the coating processes and provide superior product consistency.

Abstract: An apparatus (1) for applying a slurry to a substrate (2). The apparatus includes a delivery drum (4) incorporating a delivery surface (5) disposed to support a layer of slurry. A spattering roller (8) is positioned closely adjacent the delivery drum and is rotatable so as to spatter the slurry from the delivery surface onto the substrate. Regulation means selectively vary or interrupt the flow of slurry from the delivery surface onto the substrate.

Abstract: A plating apparatus continuously plates a surface of a substrate with metal and performs its supplementary process in one housing unit. The plating apparatus comprises a cassette stage for placing a substrate cassette thereon, a pre-treatment unit for pre-treating a surface of a substrate, and a plating unit for plating a surface of the substrate pre-treated in the pre-treatment unit. The plating apparatus further comprises a first substrate stage disposed between the cassette stage and the pre-treatment unit, a cleaning and drying unit disposed between the cassette stage and the first substrate stage, a first transfer device, and a second transfer device. The first transfer device transfers a substrate between the substrate cassette, the cleaning and drying unit, and the first substrate stage. The second transfer device transfers a substrate between the first substrate stage, the pre-treatment unit, and the plating unit.

Abstract: During the deposition of a catalytic component on a carrier, the position of the liquid level of a slurry containing the catalytic component is controlled with high accuracy and the adhesion of the slurry to the lateral face of the carrier is prevented. In the deposition of the liquid substance on the carrier by the introduction of the liquid substance into the carrier from the bottom face thereof, the liquid level near the top face of the carrier is detected by an image-processing sensor.

Abstract: An apparatus, to be used when an open end of a hollow substrate contacts a coating solution to define a solution free interior portion of the substrate, for controlling the level of the coating solution relative to the substrate interior, the apparatus including: a gas container capable of changing in volume; a channel connecting the gas container to the solution free interior portion of the substrate to allow gas flow in either direction between the gas container and the solution free interior portion; and pressure means for exerting a changeable, continuous pressure on the gas container that automatically exerts an increasingly greater pressure on the gas container as the gas container expands in volume and that automatically exerts a decreasingly lesser pressure on the gas container as the gas container decreases in volume.

Abstract: A compliance mechanism (10) is disclosed for maintaining a fluid applicator (47) in contact with the surface of object (71) for fluid application. The compliance mechanism includes an L-shaped bracket (15) having a first leg (17) and a second leg (19), each leg having a tab. A first dual acting fluid operated cylinder (32) is slidably positioned on the first leg (17) of the L-shaped bracket (15). First cylinder (32) has a piston rod that advances during fluid actuation of the first cylinder. A second dual acting fluid operated cylinder (35) is slidably positioned on the second leg (19) of the L-shaped bracket (15). The second cylinder (35) has piston rod that advances during fluid actuation of the second cylinder (35). A fluid applicator (47) is on first cylinder (32) for applying fluid to object (71). The first cylinder (32) allows fluid applicator (47) to move relative to the object in a second direction whereby fluid applicator (47) is maintained in contact with object (71) during fluid application.

Abstract: The invention relates to a device to be used in processing of a surface of metal object to be processed which surface is essentially continuously in onwards motion. According to the invention a processing agent (1) is to be directed to the surface (5) to be processed by nozzles (6) in at least one position so that at most 70 per cent of the surface (5) to be processed is under processing in one position of directing processing agent (1).

Abstract: A leaf coater, in which a constant quantity of a coating solution is supplied intermittently from a coating solution supply source through a predetermined coating solution quantity intermittent supply and a coating solution applier to a blank substrate, for coating blank substrates one by one with the coating solution, characterized in that a coating solution filtration is provided in the coating solution flow pipeline from the coating solution supply source to the coating solution applier, and the Young's modulus of the filter medium in the coating solution filtration is not less than 200 MPa, while the pore size of the filter medium is in the range of 0.05 &mgr;m to 100 &mgr;m; and a method for producing coated substrates using the leaf coater.

Abstract: It is desired to remove matter on a fluid surface of a tank. The tank defines a circular tank orifice comprising a tank orifice rim, the tank orifice rim containing a fluid surface of a fluid, the fluid overflowing the tank orifice rim to form a fluid overflow, the fluid surface defining a fluid surface center. The matter is removed by discharging from near the tank orifice rim a plurality (n) of jets of the fluid towards the fluid surface center. Any matter on the fluid surface is thereby urged toward the tank orifice rim and eventually removed from the fluid surface by the fluid overflow. In one application, the tank comprises a dip tank and the fluid comprises photoreceptor coating solution or components thereof such as solvents, additives, or both.

Abstract: Denture baths comprise an outer container for containing an aqueous composition; means for supporting a denture in the container, which means allow the denture to be immersed in the aqueous composition; and an aqueous composition. The aqueous composition comprises a polymeric coating agent having a surface tension in 0.1% aqueous solution of less than 37 mNm−1 and a weight average molecular weight of 1,000 or greater. In addition, the denture baths comprise a means for passing the denture through an interface of the aqueous composition with the surrounding air, the means being selected from means for draining the composition from a position beneath the denture and means for lifting the denture through the interface.

Abstract: During the deposition of a catalytic component on a carrier, the position of the liquid level of a slurry containing the catalytic component is controlled with high accuracy and the adhesion of the slurry to the lateral face of the carrier is prevented. In the deposition of the liquid substance on the carrier by the introduction of the liquid substance into the carrier from the bottom face thereof, a water-detecting sensor detects the liquid level near the top face of the carrier.

Abstract: A fluid treatment device and method for treating moving substrates with fluid as the substrates move through the device at a relatively high rate of travel. Fluid injection in combination with the application of vibration energy (e.g., ultrasonic) results in enhanced fluid treatment of the substrates. In one embodiment, a bifurcated horn is utilized in combination with fluid injector members having pluralities of rows of spaced injector ports, the injectors being strategically positioned relative to the vibrational source. In one example, the device and method may be used for enhanced penetration by dye materials of ceramic substrate surfaces to detect adverse surface conditions (e.g., cracks) and thus potentially defective product.

Abstract: A method and apparatus for the electroplating deposition of a metal onto a semiconductor wafer surface (29), including vibrationally scrubbing the wafer surface (29) during an electroplating process. At least one transducer (32) is mounted to a wall (33) of an electroplating tool chamber (22). The transducer (32) intermittently delivers sonic energy pulses lasting for one to two seconds to the electroplating solution during the electroplating process.

Abstract: A processing container (610) for providing a flow of a processing fluid during immersion processing of at least one surface of a microelectronic workpiece is set forth. The processing container comprises a principal fluid flow chamber (505) providing a flow of processing fluid to at least one surface of the workpiece and a plurality of nozzles (535) disposed to provide a flow of processing fluid to the principal fluid flow chamber. The plurality of nozzles are arranged and directed to provide vertical and radial fluid flow components that combine to generate a substantially uniform normal flow component radially across the surface of the workpiece. An exemplary apparatus using such a processing container is also set forth that is particularly adapted to carry out an electroplating process.

Abstract: An apparatus for coating a photoreceptor substrate, such as a photoreceptor belt or a photoreceptor drum, consists of at least one photoreceptor coating fluid reservoir or diptank. The diptank defines an inlet at one end and a conduit with an orifice at the other end. The conduit includes at least one porous element such as a grid, screen or mesh arranged for suspending a plurality of layers of non-contaminating rounded objects, such as stainless steel or glass beads, in the bottom of the conduit. Photoreceptor coating solution supplied to the inlet is thereby forced to flow through the plurality of layers of beads prior to coating a photoreceptor substrate that is inserted through the orifice. As a result, the uniformity of the coating solution is improved as it coats the photoreceptor substrate, thereby reducing coating defects in the finished photoreceptor belt or drum.

Abstract: The present invention provides a method for producing a semiconductor substrate which comprises the steps of growing a first semiconductor layer on a substrate in liquid phase at a properly controlled temperature for eliminating defects and growing a second semiconductor layer on the first semiconductor layer in liquid phase at a higher temperature; a solar cell produced by a method comprising a step of anodizing the surface of the first and second layer side of the semiconductor substrate produced by the liquid-phase growth method; a liquid-phase growth apparatus comprising means for storing a melt, means for changing the temperature of the stored melt, and means for bringing an oxygen-containing substrate into contact with the melt, wherein a substrate is brought into contact with the melt at a temperature so as to suppress the stacking faults contained in the semiconductor layer grown on the surface of the substrate.

Abstract: A method for producing coated strands of metal includes guiding a metal strand through the bottom of a vessel filled with a molten mass of the same or different composition as the metal strip, wherein the residence time of the metal strand is selected as a function of at least one of the molten bath level, the casting speed, the metal strand thickness, and the preheating temperature of the metal strand such that the deposited molten mass on the metal strand has a desired thickness of several times the initial thickness of the metal strand. After exiting from the molten bath, the metal strand with a layer crystallized thereon is subjected to a smoothing path carried out when the surface temperature of the strand crystallized thereon is smaller than the solidus temperature of the molten bath, so that at least the surface of the layer crystallized thereon is solidified. The crystallized layer is applied with a thickness which exceeds the desired final thickness of the coated strand.

Abstract: An apparatus including: a tank with a closed base end and an open top end, and adapted to contain a coating formulation; and a receiver member with at least a cone shape, where the base of the cone is attached to the interior and to the base end of the tank and adapted to receive an article for coating.

Abstract: An apparatus including: (a) a vessel for a solution having a bottom end and an open top end, and defining a vertical axis perpendicular to the bottom end; (b) an insert device having a bottom surface and a top surface and nested within the vessel, wherein the insert device defines a passageway dimensioned for a substrate which is parallel to the vertical axis and extending through the insert device, and wherein the insert device also defines at least one bypass channel extending through the insert to allow solution within the vessel to flow to the top surface of the insert device; and (c) an overflow container positioned adjacent the vessel to catch solution runoff from the top surface of the insert device.

Abstract: The invention relates to a method for manufacturing a hot-dip plated metal strip comprising the steps of: introducing a metal strip into a molten metal bath of plating metal to adhere the molten metal onto the surface of the metal strip; taking out the metal strip, after turning the running direction of the metal strip, from the molten metal bath without applying external force from outside the surface of the metal strip; adjusting the plating weight of the molten metal adhered onto the metal strip; and controlling the shape of the metal strip using magnetic force in non-contact state directly before or after the step of adjusting the coating weight. The invention prevents adhesion of dross to the metal strip without degrading the productivity, and thus manufactures a high quality hot-dip plated metal strip.

Abstract: Novel features in dip coating apparatus are disclosed which improve the quality of coatings and reduce the cost of the process. These disclosures include modifications to the slide assembly, dip tank design, automatic dip-tank lids, substrate gripping, process control parameters and design of racks to process and store substrates. Also disclosed are sensors and mechanisms to consistently coat the same substrate area.

Abstract: The present invention relates to an electroless plating apparatus which can reduce the amount of a plating liquid to be used, maintain a stable plating process, be downsized, reduce an apparatus cost, form a film having a uniform thickness over an entire surface, and prevent a plating liquid from being deteriorated due to a temperature rise. The present invention comprises a holding apparatus for holding a substrate with a surface, to be plated, facing upward, a plating liquid holding mechanism for sealing a periphery of the surface, to be plated, of the substrate held by the holding apparatus, an electroless plating treatment liquid supply apparatus for supplying an electroless plating liquid to the surface, to be plated, of the substrate sealed by the plating liquid holding mechanism to allow the supplied electroless plating liquid to be stored on the substrate, and a heating apparatus provided below the substrate.

Abstract: A coating apparatus is configured to coat a moving strip of material with liquid coating material. The apparatus includes a liquid coating material supply unit and a coater for dispensing liquid coating material onto the moving strip of material. A recycler is provided for returning liquid coating material dispensed from the coater to a position in the coating apparatus upstream of the coater.

Abstract: A uniform coating of radar-absorbing material (RAM) is produced on small or intricate parts by suspending the part in a vessel, slowing filling the vessel with RAM slurry without turbulence from the bottom up, subsequently draining the slurry slowly without turbulence to leave a coating of RAM on the part, and repeating the process until a coating of sufficient thickness is obtained.

Abstract: An apparatus for etching a glass substrate 30 includes a first bath 13 containing an etchant, at least one porous panel having a plurality of jet holes 16 in the first bath, the porous panel containing the etchant to jet the etchant against the glass substrate, a container 20 storing the etchant, and a pump 24 supplying the etchant from the container to the porous panel, the pump being connected to the container and the porous panel.

Abstract: A method and apparatus is disclosed for sequential processing of integrated circuits, particularly for conductively passivating a contact pad with a material which resists formation of resistive oxides. In particular, a tank is divided into three compartments, each holding a different solution: a lower compartment and two upper compartments divided by a barrier, which extends across and partway down the tank. The solutions have different densities and therefore separate into different layers. In the illustrated embodiment, integrated circuits with patterned contact pads are passed through one of the upper compartments, in which oxide is removed from the contact pads. Continuing downward into the lower compartment and laterally beneath the barrier, a protective layer is selectively formed on the insulating layer surrounding the contact pads. As the integrated circuits are moved upwardly into the second upper compartment, a conducting monomer selectively forms on the contact pads prior to any exposure to air.