With Organic Treating Agent (e.g., Solvent, Surfactant, Or Reactant Yielding Soluble Product, Etc.) Patents (Class 134/22.14)
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Patent number: 6446642Abstract: A method is described for removing residue from a fluid deposited on the interior surface of an inkjet printhead after the printhead has contained or dispensed the fluid at least once. The method makes use of a reverse flushing technique optionally used in combination with sonication. A cleaning station for flushing an inkjet printhead with a wash fluid, rinse fluid, and/or inert gas is provided as well.Type: GrantFiled: November 22, 1999Date of Patent: September 10, 2002Assignee: Agilent Technologies, Inc.Inventors: Michael P. Caren, Carol T. Schembri
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Patent number: 6447616Abstract: Brass articles having leachable lead are contacted with an aqueous caustic solution having a pH of about 10 to about 14 that contains a chelating agent. During contact, the brass articles can be sonicated. The brass articles can be optionally pretreated by contacting them with an aqueous solution containing an organic carboxylic acid and an inorganic per-salt. The brass article can optionally further be post treated by contacting them with an aqueous solution containing thiourea.Type: GrantFiled: August 31, 2000Date of Patent: September 10, 2002Assignee: The Ford Meter Box CompanyInventors: Edward L. Cote, Andrew D. Wenzel
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Patent number: 6432210Abstract: Brass articles having leachable lead are contacted with an aqueous caustic solution having a pH of about 10 to about 14 that contains a chelating agent. During contact, the brass articles can be sonicated. The brass articles can be optionally pretreated by contacting them with an aqueous solution containing an organic carboxylic acid and an inorganic per-salt. The brass article can optionally further be post treated by contacting them with an aqueous solution containing sodium persulfate.Type: GrantFiled: February 28, 2001Date of Patent: August 13, 2002Assignee: The Ford Meter Box Company, Inc.Inventors: Edward L. Cote, Andrew D. Wenzel, Lance E. Agness
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Patent number: 6428628Abstract: A paint-removing method comprises the steps of putting dimethyl sulfoxide into a tank, raising the dimethyl sulfoxide at a temperature of approximately 35° C. to 189° C. in the tank; and soaking a member to be removed of paint into the dimethyl sulfoxide in the tank. The dimethyl sulfoxide is applying or blowing to a member to be removed of paint.Type: GrantFiled: August 22, 2000Date of Patent: August 6, 2002Inventor: Masao Umemoto
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Patent number: 6418946Abstract: An apparatus for cleaning dried photoresist from a photoresist dispensing nozzle. The tip of the photoresist dispensing nozzle is inserted through an opening in a nozzle base. A catch pan is positioned beneath the nozzle base. A solvent dispensing needle is inserted through an opening in the catch pan to face the photoresist dispensing nozzle tip and sprays solvent onto the photoresist dispensing nozzle tip. The catch pan collects the solvent and dissolved photoresist particles. The catch pan includes a drain for draining the solvent and the dissolved photoresist particles.Type: GrantFiled: January 5, 2001Date of Patent: July 16, 2002Assignee: Advanced Micro Devices, Inc.Inventors: Vincent L. Marinaro, Eric Kent, Ted Wakamiya
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Patent number: 6401731Abstract: The decontamination of PCB-containing transformers to obtain treated transformers containing less than 50 parts per million (ppm) polychlorinated biphenyls (PCB) can be achieved using a method wherein the transformer is initially drained of all PCBs; then the core/coil assembly is removed. The internal surfaces of the transformer are then cleaned using a solvent. Finally, a new core/coil assembly is installed. The method is simple and can be completed within a substantially shorter period of time than methods known in the art.Type: GrantFiled: January 19, 1999Date of Patent: June 11, 2002Inventor: William Robertson
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Publication number: 20020066465Abstract: The cleaning method described above is characterized by allowing a cleaning agent comprising an oxidizing agent, a chelating agent and a fluorine compound to flow on a surface of a material to be treated at a bigh speed to thereby clean the above surface. according to the present invention, deposits adhering firmly to a surface of a material to be treated can readily be removed without damaging the material to be treated.Type: ApplicationFiled: October 9, 2001Publication date: June 6, 2002Inventors: Hideto Gotoh, Takayuki Niuya, Hiroyuki Mori, Hiroshi Matsunaga, Fukusaburo Ishihara, Yoshiya Kimura, Ryuji Sotoaka, Takuya Goto, Tetsuo Aoyama, Kojiro Abe
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Patent number: 6397862Abstract: A method for cleaning garbage disposals comprises the steps of: mixing the starting materials in order to form an effervescent tablet; packaging the tablet in a moisture resistant pouch; placing the tablet in a garbage disposal unit; running warm water into the garbage disposal unit and turning on the garbage disposal for about 20 seconds; turning off the water and the garbage disposal, permitting the foam generated to maintain contact with all surfaces for about five minutes; and followed by rinsing away any left-over residue with generous amounts of water.Type: GrantFiled: September 7, 2001Date of Patent: June 4, 2002Inventors: Richard A. DeSenna, Hilton G. Dawson, Ryan Giffin Moore
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Patent number: 6394107Abstract: A method for cleaning a vapor reactor by applying a liquid cleaning agent comprising a fluorinated ketone having about 5 to about 10 carbon atoms and up to two hydrogen atoms is described. The fluorinated ketone has low global warming potential.Type: GrantFiled: April 24, 2001Date of Patent: May 28, 2002Assignee: 3M Innovative Properties CompanyInventors: Susrut Kesari, Jason M. Kehren, Richard M. Minday
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Patent number: 6391122Abstract: A novel cleaning-in-place process is described. The process is one which is segmented, and unused solution is pumped through more than two components of a machine targeted for cleaning, disinfecting or both. The process also results in superior cleaning in shorter cleaning cycles.Type: GrantFiled: November 23, 1999Date of Patent: May 21, 2002Assignee: Diversey Lever, Inc.Inventors: Robert Adolf Votteler, Maynard Joseph Riley
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Publication number: 20020056468Abstract: The invention relates to the use of organic carbonates having formula (I) 1Type: ApplicationFiled: December 31, 2001Publication date: May 16, 2002Applicant: ENICHEM S.p.A.Inventors: Franco Mizia, Franco Rivetti
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Patent number: 6380451Abstract: The specification discloses a method for cleaning an oligomerization reactor after making a higher olefin in the reactor. An olefin is reacted in the presence of a catalyst comprising an aluminum alkyl to form an olefin reaction product. For example, ethylene can be trimerized in the reaction to produce 1-hexene. The reaction also causes a co-product residue of the catalyst to form on the interior surface of the reactor. The interior surface of the reactor is then contacted with an alcohol under conditions effective to remove at least a substantial amount of the catalyst residue from the interior surface of the reactor. The catalyst-removing step can be carried out by combining an alcohol with the process medium used in the reactor. The combined medium can be used to remove both the accumulated polymer co-product and the accumulated catalyst residue from the reactor.Type: GrantFiled: December 29, 1999Date of Patent: April 30, 2002Assignee: Phillips Petroleum CompanyInventors: Bruce E. Kreischer, Warren M. Ewert, Ronald D. Knudsen
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Patent number: 6375831Abstract: A method of inhibiting and/or removing deposits from coke oven gas handling equipment is disclosed which comprises the addition of a treatment combination of a heterocyclic nitrogenous compound such as quinoline and 2-butoxyethanol to the flushing liquor used to cool coke oven effluent gases.Type: GrantFiled: February 1, 2000Date of Patent: April 23, 2002Assignee: BetzDearborn Inc.Inventors: Patrick J. Doyle, Terrence W. Mattioli, Gary S. Thundercliffe
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Patent number: 6375548Abstract: A chemical-mechanical polishing (CMP) method includes applying a solid abrasive material to a substrate, polishing the substrate, flocculating at least a portion of the abrasive material, and removing at least a majority portion of the flocculated portion from the substrate. Applying solid abrasive material can include applying a CMP slurry or a polishing pad comprising abrasive material. Such a method can further include applying a surfactant comprising material to the substrate to assist in effectuating flocculation of the abrasive material. Such surfactant comprising material may be cationic which includes, for example, a quaternary ammonium substituted salt. Also, for example, the surfactant comprising material may be applied during polishing, brush scrubbing, pressure spraying, or buffing.Type: GrantFiled: December 30, 1999Date of Patent: April 23, 2002Assignee: Micron Technology, Inc.Inventor: Michael T. Andreas
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Publication number: 20020043271Abstract: Brass articles having leachable lead are contacted with an aqueous caustic solution having a pH of about 10 to about 14 that contains a chelating agent. During contact, the brass articles can be sonicated. The brass articles can be optionally pretreated by contacting them with an aqueous solution containing an organic carboxylic acid and an inorganic per-salt. The brass article can optionally further be post treated by contacting them with an aqueous solution containing sodium persulfate.Type: ApplicationFiled: February 28, 2001Publication date: April 18, 2002Inventors: Edward L. Cote, Andrew D. Wenzel, Lance E. Agness
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Patent number: 6368422Abstract: Methods and compositions for dissolving adherent petroleum residues which occur in the production and processing of petroleum in which esters of the following formula are employed: R1—COO—(CnH2nO)x—R2 (I) which R1 is an alkyl group containing 6 to 22 carbon atoms or a (CH2)m—COOR4 group, R2 and R4 independently of one another represent an alkyl group containing 1 to 8 carbon atoms, n is the number 2 or 3 and m is a number of 1 to 6 and x is 0 or a number of 1 to 12.Type: GrantFiled: November 26, 1999Date of Patent: April 9, 2002Assignee: Henkel Kommanditgesellschaft auf AktienInventors: Wolfgang Breuer, Claus-Peter Herold
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Patent number: 6352081Abstract: The present invention is a method for removing deposited etch byproducts from surfaces of a semiconductor processing chamber after a copper etch process. The method of the invention comprises the following general steps: (a) an oxidation step, in which interior surfaces of the processing chamber are contacted with an oxidizing plasma; (b) a first non-plasma cleaning step, in which interior surfaces of the processing chamber are contacted with an H+hfac-comprising gas; and (c) a second cleaning step, in which interior surfaces of the processing chamber are contacted with a plasma containing reactive fluorine species, whereby at least a portion of the copper etch byproducts remaining after step (b) are volatilized into gaseous species, which are removed from the processing chamber. The method of the invention is preferably performed at a chamber wall temperature of at least 150° C.Type: GrantFiled: July 9, 1999Date of Patent: March 5, 2002Assignee: Applied Materials, Inc.Inventors: Danny Chien Lu, Allen Zhao, Peter Hsieh, Hong Shih, Li Xu, Yan Ye
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Patent number: 6345632Abstract: A method to chemically clean and immediately passivate a water distribution system to quickly form a passivation layer. The system may be a potable water system, a non-potable water system, a water well or a fire protection system such as a fire sprinkler system and may be treated with a biocide. A section of the system is isolated and chemically cleaned, then is immediately passivated using a high concentration of passivating agent. A passivating layer quickly forms, then the concentrated passivating agent is removed and a maintenance concentration of passivating agent is added. The cleaned and passivated section is restored to the system to provide improved water flow.Type: GrantFiled: February 28, 2000Date of Patent: February 12, 2002Assignee: H.E.R.C. Products IncorporatedInventors: Jerome H. Ludwig, Myron B. Shenkiryk
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Publication number: 20020007841Abstract: The disclosed invention relates to compositions having an alkylene carbonate and a primary hydroxyl functional capping agent for treating materials fouled with isocyanate. The invention also relates to decontamination of materials fouled with isocyanate, and to methods for decontamination of solvent fouled with isocyanate.Type: ApplicationFiled: January 18, 2001Publication date: January 24, 2002Inventor: James A. Yavorsky
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Patent number: 6306249Abstract: A nonionic surfactant having cyclic 1,3-dioxane and/or 1,3-dioxolane functionality which is irreversibly splittable by lowering the pH of its aqueous solution is useful in various processes requiring the removal of emulsified hydrophobic contaminants or other hydrophobic materials from an aqueous stream. After splitting of the surfactant into its component aldehyde and polyol, the hydrophobic components phase-separate and can be removed from the aqueous stream by routine means.Type: GrantFiled: February 24, 2000Date of Patent: October 23, 2001Assignee: Union Carbide Chemicals & Plastics Technology CorporationInventors: Denise Christine Galante, Richard Charles Hoy, Albert Ferris Joseph, Stephen Wayne King, Charles Arnold Smith, Cheryl Marie Wizda
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Patent number: 6296718Abstract: A method of stripping cured paint from reject painted production parts, aluminum and galvanized safe, comprising: a) adding a stripping composition to a strip tank, said stripping composition consisting an alkanolamine, a fatty acid and a surfactant; b) immersing said reject painted part in said strip tank containing said stripping composition; and c) heating said stripping composition to 300 degrees F. for approximately 1-hour, wherein cured paint is removed from said reject painted part with no attack on the base metal substrate.Type: GrantFiled: January 26, 2001Date of Patent: October 2, 2001Inventor: Samuel Lee Miles
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Patent number: 6296671Abstract: Polymethylgalacturonases belonging to family 28 of polysaccharide lyases and comprising the amino acid sequence of SEQ ID NO:1 or an amino acid sequence having at least 70% sequence identity with SEQ ID NO:1 show good performance in industrial processes such as laundering and textile processing.Type: GrantFiled: April 4, 2000Date of Patent: October 2, 2001Assignee: Novorymeo A/SInventors: Martin Schülein, Henrik Kristensen
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Patent number: 6294221Abstract: A non-aqueous rinsing medium is disclosed, and a process for using same as a rinsing agent in a process for spray-coating of mass-produced substrates (such as automobile bodies) with frequent changes between at least one aqueous and at least one non-aqueous coating agent inside a spray-coating chamber, wherein with at least each change of coating agent the installations to be rinsed are rinsed automatically with the non-aqueous rinsing medium consisting of (a) 20 to 35% by weight of one or more N-alkyl pyrrolidones, (b) 20 to 35% by weight of butyl acetate and/or isobutyl acetate, (c) 10 to 20% by weight of one or more glycol ethers, which are water-miscible without miscibility gap, (d) 5 to 15% by weight of ethanol, propanol and/or isopropanol, (e) 10 to 20% by weight of one or more aliphatic C4-C7-ketones, (f) 0 to 5% by weight of one or more organic solvents conventionally used in coating agents, and (g) 0 to 5% by weight of one or more auxiliary agents, whereby components (a), (c) and (d) compriseType: GrantFiled: March 8, 2000Date of Patent: September 25, 2001Assignee: E. I. du Pont de Nemours and CompanyInventors: Thomas May, Manfred Glahsl, Axel Paulsen, Hans-Joachim Mueller
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Patent number: 6283133Abstract: The present invention relates to a method for cleaning heavy hydrocarbon scale from a shell and tube heat exchanger or other such equipment incorporated in a device in a petroleum refining plant or the like that processes petroleum hydrocarbons as a raw material. A mixture of petroleum-derived hydrocarbon A which can dissolve the oil component of the heavy hydrocarbon scale and an oxygen-containing polar organic compound B that promotes dissolution and dispersion is employed as the organic cleaning solvent. As a result, the heavy hydrocarbon scale can be removed with surety within a short period of time at low cost.Type: GrantFiled: July 30, 1998Date of Patent: September 4, 2001Assignees: JGC Corporation, Mitsubishi Rayon Co., Ltd.Inventors: Akio Furuta, Masatoshi Yamada, Yuji Itoh, Satoshi Endoh, Takashi Saitoh
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Publication number: 20010015217Abstract: Disclosed is a method for decontaminating PCB-containing transformers to obtain treated transformers containing less than 50 parts per million (ppm) polychlorinated biphenyls (PCB). The transformer is initially drained of all PCBs, then the core/coil assembly is removed. The internal surfaces of the transformer are then cleaned using a solvent. Finally, a new core/coil assembly is installed. The method is simple and can be completed within a substantially shorter period of time than methods known in the art.Type: ApplicationFiled: January 19, 1999Publication date: August 23, 2001Inventor: WILLIAM ROBERTSON
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Patent number: 6254781Abstract: Ferrofluid coated particles resulting from a ferrofluid materials separation process are washed with a solvent which is the same material as the liquid carrier employed in the ferrofluid. The result is a “dirty” solvent which is a very weak ferrofluid. The dirty solvent is then filtered or centrifuged to remove dust particles and other impurities and then the solvent is recovered by distillation in a distillation unit. The solvent can then be reused in the materials reclamation process. The residue in the distillation unit is surfactant-coated particles of ferrofluid. This residue is mixed with either clean or unprocessed solvent in the right proportion and the slurry is passed through an attritor to convert it to a high grade ferrofluid. The ferrofluid can also be reused in the materials separation process.Type: GrantFiled: May 4, 2000Date of Patent: July 3, 2001Assignee: Ferrofluidics CorporationInventor: Kuldip Raj
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Patent number: 6241828Abstract: A method is disclosed for removing impurities from an elastomer intended for medical or pharmaceutical use, which includes a step of performing a first solvent extraction process on the elastomer by contacting the elastomer with a first extracting solvent in a non-supercritical state to substantially remove impurities from the elastomer, thereby leaving a residue of said first extracting solvent in the elastomer. The elastomer is there after subjected to a second solvent extraction process, by contacting the elastomer with a second extracting solvent, which is a supercritical fluid or a mixture of super critical fluids, in order to remove substantially reduce the concentration of the residue of the first extracting solvent remaining in the elastomer after the first solvent extraction process.Type: GrantFiled: September 25, 1998Date of Patent: June 5, 2001Assignee: Bespak, PLCInventor: Paul Barnes
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Patent number: 6238484Abstract: A reactive hot-melt adhesive coating machine capable of preventing a nozzle clogging by a simple construction is disclosed. A reactive hot-melt adhesive in a molten state supplied from an adhesive storage tank is fed to a spray means through an adhesive feeding passage. A cleaning fluid which is not curable reacting with moisture content in the ambient air is stored in a cleaning fluid storage tank. The cleaning fluid storage tank is connected to the adhesive feeding passage through a cleaning fluid feeding passage and a change-over valve. The change-over valve functions to disconnect the cleaning fluid feeding passage from the adhesive feeding passage when the reactive hot-melt adhesive is sprayed out of nozzles, and connect the cleaning fluid feeding passage to the adhesive feeding passage to discharge the cleaning fluid out of the nozzles when the nozzles are cleaned.Type: GrantFiled: October 28, 1998Date of Patent: May 29, 2001Assignee: ITW Dynatec Kabushiki KaishaInventor: Susumu Hasegawa
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Patent number: 6234183Abstract: A method and composition for removing deposits of heavy hydrocarbonaceous materials and finely divided inorganic particulate matter from wellbore and flowline surfaces using a composition containing an alkyl polyglycoside, an ethoxylated alcohol, a caustic and an alkyl alcohol.Type: GrantFiled: July 10, 2000Date of Patent: May 22, 2001Assignee: Atlantic Richfield CompanyInventors: Albert F. Chan, William Mark Bohon, David J. Blumer, Kieu T. Ly
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Patent number: 6231680Abstract: A method for cleaning a surface by flooding and thereby cleaning a surface contaminated with deposits with a mixture containing water, wood chippings, and optionally, polyaspartic acid or a derivative of a polyaspartic acid.Type: GrantFiled: February 16, 2000Date of Patent: May 15, 2001Assignee: Bayer AktiengesellschaftInventors: Manfred Gerlach, Bernhard Lehmann
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Patent number: 6224827Abstract: The invention relates to a water-free alcohol disinfectant capable of destroying spores. Preferably, the disinfectant also contains an additional chemical sterilization agent, e.g., hydrogen peroxide, in very low concentrations within the range of between 0.5 and 3.0 percent of the weight of the alcohol solution. The disinfectant is usable in industrial contexts for bacteriological cleaning of surfaces, for example, inner walls in pipelines, conduits, reaction vessels, and other process equipment, without corroding or chemically attacking the material in such surfaces.Type: GrantFiled: September 29, 1997Date of Patent: May 1, 2001Assignee: Tetra Laval Holdings & Finance S.A.Inventor: Fritz Lembke
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Patent number: 6216708Abstract: A direct liquid injection system and process which has on-line cleaning of the vaporizers without the need for shutting down the CVD process and thus eliminating down time is provided. The cleaning process includes the steps of providing at least one metalorganic precursor to a first vaporizer to produce a vapor containing the at least one precursor; transporting the vapor to a deposition chamber; periodically interrupting the supply of the at least one metalorganic precursor to the first vaporizer; providing the at least one metalorganic precursor to a second vaporizer to produce a vapor containing the at least one precursor; transporting the vapor to the deposition chamber; and during at least a portion of the time when the supply of the metalorganic precursor is interrupted to the first vaporizer, providing a cleaning fluid (either liquid solvent or cleaning gas plasma) to the first vaporizer, which fluid is effective to at least partially remove deposits of the metalorganic precursor.Type: GrantFiled: July 23, 1998Date of Patent: April 17, 2001Assignee: Micron Technology, Inc.Inventor: Vishnu Kumar Agarwal
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Patent number: 6209552Abstract: A method of emptying vessels containing dispersions, solutions or suspensions of polymers in which during the emptying process the liquid medium also used to take up the polymers into the dispersion, solution or suspension is passed into the space within the vessel that is not filled by the solution, dispersion or suspension, wherein the liquid medium used to take up the polymers into the dispersion, solution or suspension is introduced in vapor form.Type: GrantFiled: September 23, 1999Date of Patent: April 3, 2001Assignee: BASF AktiengesellschaftInventors: Johannes Dobbelaar, Gerd Rehmer, Wolfgang Hümmer, Reinhard Bächer
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Patent number: 6197738Abstract: A nontoxic sanitizing cleaner comprising an organic acid having a pH less than 3, a chelating agent, and a surfactant. The invention also contemplates a buffering agent in the cleaner. In a preferred embodiment, the sanitizing cleanser is in the form of a solution containing 94% citric acid, 4% EDTA, 1% sodium laurel sulfate, and 1% monosodium phosphate, by weight. The invention also contemplates using the nontoxic sanitizing cleaner in a cosmetic lotion, and in processes for cleaning and sanitizing food processing equipment.Type: GrantFiled: April 30, 1997Date of Patent: March 6, 2001Inventor: Robert R. Regutti
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Patent number: 6191086Abstract: Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound; (ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.Type: GrantFiled: December 15, 1999Date of Patent: February 20, 2001Assignee: Arch Specialty Chemicals, Inc.Inventors: Vincent G. Leon, Kenji Honda, Eugene F. Rothgery
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Patent number: 6173776Abstract: The use of high flash point, low vapor pressure compositions for injection into, and coating of, gas and oil wells and surrounding underground hydrocarbon bearing formations and processing equipment for the purpose of removing scale, paraffins, tars, and other viscous constituents. Treatment results in increased flow of gas and/or oil and decreased adhesion of soils and scale in all aspects of oil and gas recovery, including hydrocarbon bearing formations, casings, lines, and pumping equipment. The composition contains about 40 to 99 wt. % of a fatty acid alkyl ester blend and about 1 to 25 wt. % of at least one lower alkyl glycol ether.Type: GrantFiled: December 24, 1998Date of Patent: January 16, 2001Assignee: Nor Industries, Inc.Inventors: Harvey A. Furman, Kenneth R. Cioletti
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Patent number: 6170494Abstract: A storage apparatus for photoresist dispensing nozzles has solvent inlets positioned directly opposite the nozzles when the nozzles are in their home positions. Photoresist cleaning solvent is introduced through these inlets at periodic intervals and directly applied on the nozzles to keep them clean.Type: GrantFiled: February 22, 2000Date of Patent: January 9, 2001Assignee: Advanced Micro Devices, Inc.Inventors: Vincent L. Marinaro, Eric Kent, Ted Wakamiya