Abstract: An apparatus for treating waste comprises a gravity drop steam heating tower for heating the waste to the biological kill temperature using pressurized steam, a first feed member for feeding the waste to be sterilized to the gravity drop steam heating tower, and a vaporization system. The vaporization system includes a heating chamber for facilitating vaporization of liquids in the waste, a conveying member for conveying the waste from the lower end portion of the gravity drop steam heating tower into and through the heating chamber, and a vaporization chamber for receiving the waste from the heating chamber and for releasing vapor entrained in the waste into the vaporization chamber.

Abstract: An apparatus and method of supporting a large number of optical lenses having opposed lens surfaces and an outer peripheral area including a rotatable holder for supporting and retaining the lenses and a drive device coupled to the holder for rotatably driving the holder to centrifugally force a liquid from the surface of the lenses. The method includes positioning the lenses within the holder and retaining the rod lenses in a manner allowing all of the surfaces to be cleaned and dried without contacting the opposed lens surfaces to the holder, applying a liquid to the exposed surface of the lenses, and spinning the lenses at a high rate of speed to clean and dry them. To increase the effectiveness of the apparatus, the drive device can include ultrasonic transducers for ultrasonically cleaning the rod lenses while they are held within the holder.

Abstract: A megasonic cleaning method and a megasonic cleaning apparatus are provided. Microcavitation bubbles may be formed by applying an electromotive force to a cleaning solution using a megasonic energy in a separate room from an object to be cleaned. The microcavitation bubbles having a stable oscillation among the formed microcavitation bubbles may be moved to the object to be cleaned. A surface of the object to be cleaned may be cleaned using the microcavitation bubbles having the stable oscillation. Particles attached onto the surface of the object to be cleaned may be effectively removed while preventing pattern damage.

Abstract: A cleaning chamber is provided. The cleaning chamber includes a base portion housing a chuck and a lid affixed to the base portion. A support assembly is linked to the lid and the support assembly includes a top plate spaced apart from a bottom plate, the top plate has a plurality of openings defined therethrough and the bottom plate has a plurality of openings defined therethrough. The cleaning chamber includes a plurality of cups extending through corresponding pairs of the plurality of openings of the top plate and the bottom plate. The plurality of cups is configured to seal against a surface of a substrate, wherein each cup of the plurality of cups is independently supported by the bottom plate.

Abstract: Disclosed is to supply processing liquid having a predetermined flow rate and concentration to substrate processing units of a substrate processing apparatus with high accuracy. The substrate processing apparatus, which processes substrates in the substrate processing units using the processing liquid supplied from a processing liquid supply part, sequentially carries the substrates to the respective substrate processing units, and controls the processing start time such that if the flow rate of the processing liquid used in one of the substrate processing units is less than the control flow rate that is controllable at the processing liquid supply part, the substrates are carried to the plurality of substrate processing units until a flow rate of the processing liquid reaches the control flow rate that is controllable at the processing liquid supply part and then the processing liquid is used simultaneously in the plurality of the substrate processing units.

Abstract: A machine is presented for the cleaning of eyewear. The machine allows the manual or automatic cleaning of eyewear. Under both modes of operation, the eyewear is secured by a user to a support bracket inside a transparent, water-tight cylindrical wash chamber. When in manual mode, the user can direct the spray of wash fluid onto the eyewear by rotating the eyewear using a trackball. When used in automatic mode, the machine washes the eyewear during a preset washing cycle. For both modes, the washing cycle is followed by the drying cycle where a blower directs air onto the lenses for a set time period to blow off excess moisture. The drying cycle concludes with a blower venting the cylindrical wash chamber to remove residual moisture from the wash chamber and the eyewear. After the cleaning, the user removes the eyewear from the machine.

Abstract: Mat washing device, method of using the mat washing device, and method of washing mats. The mat washing device includes a system that may be transported on a flat bed trailer from one location to another. The mat washing device includes conveying systems, brush systems, rails systems and control mechanisms. The mat washing device may be used by placing mat, on edge, on a conveying system and conveying the mat to a first brushing system and a second brushing system. In one aspect the first brushing system includes a cable brush having a bolt secured at the end of a cable in order to beat or brush material from the mat when the cable brush is spun.

Abstract: A substrate processing apparatus and a substrate processing method are capable of restraining or preventing the generation of streaky particles on a substrate surface by excellent removal of a rinsing liquid therefrom. The substrate processing apparatus has a substrate inclining mechanism for inclining a substrate held by a substrate holding mechanism. After a rinsing liquid has been supplied onto a substrate to form a liquid mass, the substrate is inclined at a small angle by the substrate inclining mechanism. Then, the liquid mass is downwardly moved without being fragmented and then falls down without leaving minute droplets on the substrate top. Thereafter, the substrate is returned to a horizontal posture and then dried.

Abstract: A method for cleaning a diffusion barrier over a gate dielectric of a metal-gate transistor over a substrate is provided. The method includes cleaning the diffusion barrier with a first solution including at least one surfactant. The amount of the surfactant of the first solution is about a critical micelle concentration (CMC) or more. The diffusion barrier is cleaned with a second solution. The second solution has a physical force to remove particles over the diffusion barrier. The second solution is substantially free from interacting with the diffusion barrier.

Abstract: Disclosed is a substrate cleaning device provided with: a generation unit that generates ozone micro-nanobubble water; a nozzle header unit provided with a plurality of spray nozzles that spray the ozone micro-nanobubble water; and a substrate support unit that supports a substrate to be treated. The surface of the substrate supported by the substrate support unit is cleaned by spraying the ozone micro-nanobubble water from the plurality of spray nozzles onto the substrate.

Abstract: The invention relates to a method and a device for processing broken glass, to which residues of stickers adhere. According to the invention, an underlay is provided, for example, a closed drum or an open shell, having a delivery point and a discharge point for broken glass particles. In the area of the delivery point, the broken glass particles are set into motion to one another by means of movement of the underlay, whereby mutual friction of the particles occurs. A stream of broken glass particles which is freed of sticker residues travels to the discharge point. A gas stream is oriented opposite to the stream of broken glass particles, which conducts the separated residues of stickers with it, and which simultaneously dries the cleaned glass particles.

Abstract: The invention relates to a method and an apparatus for applying a fluid (32) to items (14) to be cleaned, which items are continuously or intermittently transported in the conveying direction (12) in an automatic cleaning machine, preferably an automatic pass-through dishwasher. At least two, preferably tubular, spray bodies (26.1, 26.2, 26.3, . . . 26.n) which are spaced apart from one another are arranged in at least one spray plane (22, 24) which is oriented parallel to the conveying direction (12) of the items (14) to be cleaned.

Abstract: An apparatus (1) to process used materials for input into a manufacturing process. The apparatus includes a housing (10) having a top surface (15) and providing a plurality of chambers arranged in descending order. A series of locations (20) are positioned under said top surface and through which used materials are to pass. Each said location being provided for receipt of a predetermined used material. A descending path (25) extends from each said location and provides for the transfer of used material from the respective location successively through the chambers. The chambers include a sensing chamber (30) downstream of said locations and having sensing means (35) operable to sense the composition of used material located within said sensing chamber. The sensing means being operable to activate an alarm if the used material has been placed by a user in an opening for receipt of a different material.

Abstract: Solar wafer clean systems, methods and apparatus capable of receiving wafer combs that have been treated with a wire-saw cutting device and providing final clean solar wafers while the wafers are on the beam (before or without any pre-cleaning) are disclosed. Embodiments of methods and apparatus produce clean solar wafers while attached to the beam without the need for a pre-clean step or tool. As such certain of the embodiments provide efficient and cost-effective cleaning of solar wafers on the beam that is also economically viable on a commercial scale.

Abstract: A substrate processing apparatus of a simplified structure, which is capable of decreasing an amount of a process liquid to be used, and of restraining change in temperature of the process liquid is provided. The substrate processing apparatus includes: a processing unit that holds one substrate and processes the substrate held by the processing unit; a processing bath capable of simultaneously accommodating a plurality of substrates, the processing bath storing a process liquid into which a substrate is immersed so as to be processed, the process liquid being circulatingly supplied to the processing bath; and a transfer unit that simultaneously transfers substrates whose number is less than the number of substrate that can be accommodated in the processing bath. The transfer unit transfers, at least, to the processing bath in which the process liquid is stored. A substrate is processed with the use of at least one of the processing unit and the processing bath.

Abstract: A method for rinsing crockery in a dishwashing machine is disclosed. The dishwashing machine includes a circulation pump, a water heater, an upper spray arm and a lower spray arm both alternatively fed by the circulation pump. The method includes the step of heating of the rinsing circulated water up to a maximum predetermined value. The method further includes the step of interrupting the feeding of the lower spray arm when a threshold water temperature is reached so that only the upper spray arm is fed by the circulated water.

Abstract: Methods and apparatuses for cleaning a surface of a substrate are presented. The method comprises positioning a substrate at a controllable distance from a piezoelectric transducer, supplying a cleaning liquid between the substrate and the transducer, applying an oscillating acoustic force to the cleaning liquid by actuating the transducer, and moving the transducer relative to the substrate. The method further comprises, while moving the transducer relative to the substrate, measuring a value that indicates a distance between a surface of the substrate and the transducer, comparing the measured value to a desired value, and adjusting the distance between the surface and the transducer so that the measured value is maintained substantially equal to the desired value. The measured value may be the distance between the surface of the substrate and the transducer or a phase shift between an alternating current and voltage applied to the transducer.

Abstract: Disclosed is a substrate cleaning method for prevent damage to a pattern formed on a substrate. The substrate cleaning method includes cleaning the substrate by striking cleaning particulates carried in a flow of dry air or inert gas against a surface of the substrate, and removing the cleaning particulates.

Abstract: A cleaning system and method of cleaning filters that removes the ash in the plugged regions is disclosed. The filter is subjected to vibrations, which serve to loosen trapped and packed retentate from the filter. The loosened retentate is then captured by a collection bin. The cleaning system can be integral with the intended application, such as within an automobile. In another embodiment, the cleaning system is a separate cleaning station, where the filter is removing from its intended application, cleaned, and then reinstalled.

Abstract: A method for removing the edge bead from a substrate by applying an impinging stream of a medium that is not a solvent for the material to be removed. The medium is applied to the periphery of the substrate with sufficient force to remove the material. Also an apparatus to perform the inventive method.

Abstract: Disclosed herein are a dryer and a method of controlling a cleaning operation thereof that are capable of supplying moisture into a drying chamber of the dryer to wet contaminants in the drying chamber and blowing air to the wetted contaminants to remove the contaminants. The method includes supplying moisture into a drying chamber to wet contaminants in the drying chamber and removing the contaminants wetted by the moisture.

Abstract: A stage device for use in a vacuum includes a frame-shaped movable stage having a sample mounting surface, a fixed stage surrounded by the movable stage, an air bearing to float the movable stage by supplying gas to a gap between the stages, a pressure regulator to regulate a pressure of the gas, a differential pumping portion to prevent the gas from flowing outside the gap, and a controller. The controller moves the movable stage within a predetermined range under a pressure in the differential pumping portion set equal to that for movable stage in use when setting a floating height of the movable stage lower than that for movable stage in use, and under the pressure in the differential pumping portion set higher than that for movable stage in use when setting the floating height of the movable stage equal to that for movable stage in use.

Abstract: A substrate treating apparatus for treating substrates with a treating liquid is disclosed. The apparatus includes a treating tank for storing the treating liquid, and treating the substrates as immersed in the treating liquid, a chamber surrounding the treating tank, a supply device for supplying an inert gas containing an organic solvent into the chamber, a lift mechanism vertically movable, while supporting the substrates, between a process position in the treating tank and a wait position above the treating tank and inside the chamber, a tank temperature control device for controlling temperature of the treating tank, a chamber temperature control device for controlling temperature of the chamber, and a control device for causing the tank temperature control device and the chamber temperature control device to perform heating treatment at least while the inert gas containing the organic solvent is supplied from the supply device.

Abstract: Various methods and apparatus for simultaneously cleaning two single-sided hard memory disks is provided. The two disks are placed in concentric contact merge orientation such that the outwardly facing surface of each disk, which has memory storage capabilities, may be simultaneously cleaned by equipment designed to clean one double-sided disk. Conversely, no effort is expended in cleaning the abutting inactive surfaces of the disks.

Abstract: Process for decontaminating, cleaning a solid organic substrate contaminated by solid radioactive particulate inorganic contaminants, in which: the said solid substrate is brought into contact with an extraction medium, devoid of water, comprising: dense pressurized CO2; at least one nonhalogenated surface-active compound chosen from block copolymers of poly(ethylene oxide) PEO and poly(propylene oxide) PPO, such as (EO)x-(PO)y diblock copolymers, (EO)x-(PO)y-(EO)x triblock copolymers and (PO)x-(EO)y-(PO)x, triblock copolymers, where x and y are integers from 2 to 80 with x other than y; and polydi(1 to 6C)alkylsiloxanes, such as polydimethylsiloxane (PDMS); and at least one complexing agent chosen from tributyl phosphate (TBP), crown ethers, tributylphosphine oxide, triphenylphosphine oxide and tri(n-octyl)phosphine oxide; the solid substrate and/or the extraction medium is/are subjected, simultaneously with the contacting operation, to a mechanical action.

Abstract: A head cleaning device includes: a cleaning liquid holding unit provided with a cleaning liquid holding surface inclined corresponding to the nozzle surface of an ink jet head obliquely disposed; movement unit moving a head with respect to the cleaning liquid holding unit; and a cleaning liquid supply unit that supplies cleaning liquid from the upper portion of inclination so as to slide down the inclination of a cleaning liquid holding surface while cleaning liquid forms a meniscus between the cleaning liquid holding surface and the nozzle surface, in a state where the cleaning liquid holding surface and the nozzle surface face each other, and includes cleaning liquid nozzles disposed so that a position of the outer edge on the downstream side of the head in a movement direction is located further to the upstream side than the center in a head movement direction of the cleaning liquid holding surface.

Abstract: Method and apparatus for removing residual material from sample wells of a multiwell plate. Wells located on a multiwell plate are placed in fluid communication with wash wells of a wash reservoir where cleaning fluid is provided to remove residual material from the sample wells of the multiwell plate.

Abstract: Disclosed are systems, devices and methodologies for handling wafers in wafer processing operations such as solvent and plasma cleaning. In an example situation, a wafer that has been separated from a support plate can be cleaned. The wafer still needs to be handled carefully during such a cleaning operation. Various devices and methodologies that facilitate efficient handling of wafers and wafer-cleaning operations are disclosed.

Abstract: Provided is a substrate processing method that prevents generation of watermarks on a substrate and can be performed at a low cost. The method controls the ambient humidity around the substrate depending on the kind of the chemical liquid, when the substrate is processed with the chemical liquid. The control of the humidity is performed at least in a drying step that dries the substrate W. In one embodiment, the ambient humidity around the substrate is controlled when a fluid containing IPA as a drying fluid is supplied to the substrate W after processing the substrate W with the chemical liquid.

Abstract: The pickling process designed for pickling electrical steel strip in a continuous fashion comprising immersing the strip in at least one pickling tub. The pickling tub contains a mixture of HCl, Fe2+, and Fe3+ and a low concentration of HF. Upon exiting the final pickling tub, the strip may be brushed or scrubbed to loosen any residual scale to form a clean strip.

Abstract: Provided is a lifting and drying device for cleaning substrates by immersing one or more disk-like substrates with a central hole into a cleaning liquid disposed in a cleaning tank and lifting and drying the substrates, the lifting and drying device including: a hanger mechanism that is inserted through the central hole of the substrates and supports a plurality of the substrates while being hung thereon; an elevation mechanism that elevates the hanger mechanism between a position where the substrates are immersed into the cleaning liquid inside the cleaning tank and a position where the substrates are lifted from the cleaning tank; and an ejection mechanism that is disposed in the cleaning tank and ejects the cleaning liquid from the downside of the hanger mechanism toward the substrate.

Abstract: The instant invention relates to compositions comprising a blend 1-chloro-3,3,3-trifluoropropene (HCFO-1233zd) and 1,1-dichloro-1-fluoroethane (HCFC 141b). In particular, the instant invention relates to blowing agents and foamable compositions containing at least such a blend, as well as solvents containing such a blend.

Abstract: A substrate processing method includes a cleaning processing step, a mixed organic solvent supplying step, and a fluorine organic solvent supplying step. The cleaning processing step is a step of cleaning a main surface of a substrate by supplying deionized water to the substrate. The mixed organic solvent supplying step is a step of supplying a fluid of a mixed organic solvent to the main surface of the substrate after the cleaning processing step. The fluid of the mixed organic solvent contains a fluid of a water-soluble organic solvent and a fluid of a fluorine organic solvent having a smaller surface tension than that of the deionized water and a lower water solubility than that of the fluid of the water-soluble organic solvent. The fluorine organic solvent supplying step is a step of supplying the fluid of the fluorine organic solvent to the main surface of the substrate without supplying the fluid of the water-soluble organic solvent after the mixed organic solvent supplying step.

Abstract: A substrate cleaning and drying apparatus includes a first substrate transfer unit operable to transfer a substrate in a horizontal direction at an upper part of a base frame, a second substrate transfer unit operable to receive the substrate from the first substrate transfer unit and transfer the substrate in a vertical direction, a third substrate transfer unit operable to receive the substrate from the second substrate transfer unit and transfer the substrate in a horizontal direction at a lower part of the base frame, and a substrate processing unit operable to receive the substrate from the third substrate transfer unit and perform a cleaning and drying process on the substrate to clean and dry the substrate. The second substrate transfer unit includes a plurality of first hand forks operable to support the substrate.

Abstract: A carrier for supporting a substrate during processing by a meniscus formed by upper and lower proximity heads is described. The carrier includes a frame having an opening sized for receiving a substrate and a plurality of support pins for supporting the substrate within the opening. The opening is slightly larger than the substrate such that a gap exists between the substrate and the opening. Means for reducing a size and frequency of entrance and/or exit marks on substrates is provided, the means aiding and encouraging liquid from the meniscus to evacuate the gap. A method for reducing the size and frequency of entrance and exit marks is also provided.

Abstract: A roller group for transporting a thin substrate (16) comprises an upper roller (12) fixed to an upper roller shaft (10) and a lower roller (18) fixed to a lower roller shaft (10), the upper and lower rollers rotating reversely at the same linear velocity in a clockwise direction and a counter-clockwise direction respectively to allow the thin substrate to move towards a certain direction. The upper roller includes a fixed roller and a plurality of elastic pieces secured on the fixed roller around its outer circumference surface. A method for performing a chemical treatment by using the above roller group for transporting a thin substrate comprises: using one or more sets of the roller groups to allow the thin substrate to continuously move towards one direction, so as to perform a continuous wet-chemical treatment to the thin substrate using a solution.

Abstract: Provided is a scanning arm which moves to collect pollutants on the surface of a semiconductor wafer, for use in a semiconductor wafer pollutant measurement apparatus, and a scanning device using the same. The scanning arm includes: an X-axis portion; a Z-axis portion which is perpendicularly installed with the X-axis portion so as to move forward and backward along the X-axis portion; and a Y-axis portion which is perpendicularly installed with the Z-axis portion so as to move up and down with respect to the Z-axis portion.

Abstract: The invention relates to the continuous cleaning of objects, in particular of semiconductor elements, using ultrasound, wherein the objects to be cleaned are arranged within a liquid. Furthermore, the present invention relates to an apparatus for carrying out the method according to the invention. A basic idea of the invention is that the surface of an object to be cleaned (2) in a tank (5) filled with liquid passes through at least one oscillation maximum that is emitted by at least one sound source (8a) being present in the tank (5). According to one embodiment, the sound source fields (8) that are positioned within the tank (5) are arranged inclined with respect to the transport direction (4).

Abstract: A method of substrate edge treatment includes forming a processing target film on a treatment target substrate, applying an energy line to a predetermined position on the processing target film to form a latent image on the processing target film, heating the treatment target substrate in which the latent image is formed on the processing target film, developing the processing target film after the heating, inspecting whether a residue is present at an edge of the treatment target substrate after the developing, and cleaning an end of the treatment target substrate to remove the residue at the edge of the treatment target substrate determined to be defective in the inspecting.

Abstract: A substrate is processed in a process chamber comprising a substrate support having a receiving surface for receiving a substrate so that a front surface of the substrate is exposed within the chamber. An energized process gas is used to process the front surface of the substrate. A peripheral edge of the backside surface of the substrate is cleaned by raising the substrate above the receiving surface of the substrate support to a raised position, and exposing the backside surface of the substrate to an energized cleaning gas.

Abstract: Methods and apparatus for removing particles from vials includes the use of a one sided pressure sensitive filament tape to remove external particles from vials. A roll of tape is juxtaposed relative to a line of vials moving along the production line. As each vial moves within the space between the tape the outside of the vial contacts the tape causing the particles to be removed and imbedded in the adhesive on the tape. A feed roll and a rewind roll provides for the tape to unwind while in contact with the outside of the vials and in conjunction with the movement of the vials along the production line. By causing the feed roll and the rewind roll to advance unused tape while in contact with the outside surface of the vials, the vials are caused to rotate at least 360 degrees while advancing down the line.

Abstract: A toothbrush holder (1) comprises a container (2) defining a hollow body so sized and shaped as to accommodate a toothbrush. At one end of the body there is an open mouth into which a toothbrush may be placed and a closing cap for sealing the holder so that sanitising liquid held within the holder does not leak in transit. A platform element or cupped shuttle (5) receives the teeth-cleansing bristles carrying head of a toothbrush the shuttle being manually urged towards the base end of the cylindrical body against a biasing spring (4) to immerse the bristles (B) thereof into an amount of sanitising liquid (8). A closing cap is optionally provided at the base end of the holder to facilitate draining, cleaning, assembly and disassembly of the holder. The or each cap may be threaded for engagement to the body of the holder or may be of the push fit and twist type.

Abstract: A method and a device for descaling a metal strip, in which the metal strip is guided in a direction of conveyance through at least one plasma descaling unit in which it is subjected to a plasma descaling. The metal strip is subjected to an automatically controlled cooling process in a cooling unit following the plasma descaling in the one or more plasma descaling units in such a way that it has a well-defined temperature downstream of the cooling unit.

Abstract: Conditioning an electrode is performed with a cleaning device for removing detrimental material from forming electrode surfaces of an electrohydrodynamic device or other ion flow generating device. A conditioning material is deposited on the electrode to at least partially mitigate erosion, corrosion, oxidations, dendrite formation on the electrode or ozone production. The conditioning material can be deposited by a wearable portion of one or more cleaning blocks or wipers. The cleaning blocks may have a composition selected to be hard enough to remove detrimental material under a selected pressure, while soft enough to be wearable to deposit a conditioning layer on the electrode surface. The conditioning material can be applied as a solid or liquid. The applied conditioning material can include at least one of silver, palladium, platinum, manganese, nickel, zirconium, titanium, tungsten, aluminum, oxides or alloys thereof, carbon, and organometallic materials that decompose under plasma conditions.

Abstract: The invention relates to a method and a device for cleaning the door of a coke oven, said door comprising a sealing edge and a membrane that is attached to the door panel of the coke oven. According to said method, cleaning tools comprising jet nozzles, which are supplied with a flow medium at high pressure, are situated and displaced back and forth in the region between the sealing edge and the door panel of the coke oven, in such a way that the interior surface of the membrane and the sealing edge are cleaned. The coke oven door is cleaned directly after the coke oven chamber is opened, by at least one jet nozzle element, which is supplied with compressed air and is displaced along the sealing edges. The jet nozzles are oriented in such a way that the air hits the surface to be cleaned at an acute angle.

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

Abstract: The present invention generally provides a batch substrate processing system for in-situ processing of a film stack used to form regions of a solar cell device. The batch processing system is configured to process an array of substrates positioned on a substrate carrier. The batch processing system includes a substrate transport interface that provides loading an unloading of the array of substrates in a production line environment. The substrate transport interface may include one or more of a substrate carrier cleaning module, a substrate carrier cooling module, and a substrate carrier buffer module.

Abstract: A method for performing preventative maintenance in a substrate processing system is described. The method includes diagnosing a level of contamination in a substrate processing system, scheduling a wet clean process when necessary, and scheduling a dry clean process when necessary. The dry clean process may include an ozone cleaning process.

Abstract: A method of cleaning a surface such as a driveway or a vertical wall which includes converting or retro-fitting a zero-turn radius (ZTR) or other type of mower to a cleaning apparatus. The conversion of the mower includes the steps of adding a water supply tank to the deck area of the mower and providing low pressure and high pressure flow lines. The low pressure flow lines are supplied via a low pressure pump. The high pressure flow lines are supplied by a separate high pressure pump unit. Plural solenoid valves are utilized in the method and system to control the flow of a cleaning solution for various method operations.

Abstract: The present disclosure provides a cleaning machine that submerges devices to be cleaned in a cleaning fluid and moves the devices in a reciprocating motion to provide cleaning agitation. In one embodiment, the reciprocating motion is driven by the inflation and deflation of an air bladder. Related methods of manufacturing and cleaning are also provided.