Abstract: Disclosed is a method for producing a resin film or a resin sheet comprising a step of cleaning resin pellets and a step of forming the resin film or the resin sheet by using the cleaned resin pellets. The step of cleaning the resin pellets comprises a step of introducing the resin pellets and water into a first tube body, and a step of conveying the resin pellets and the water toward a discharge opening in the first tube body, and cleaning the resin pellets by removing foreign matters from the surfaces of the resin pellets by water flow.

Abstract: A filtering device, allowing to provide an effective filtering without either requiring particular efforts to the user or imposing him or her to operate in excessively hard positions, comprises a filtering element comprised between a first and a second supporting surface, the distance between the supporting surfaces being adjustable, so as to compress the filtering element by moving the supporting surfaces the nearer the other, and actuating device apt to modify the distance of the supporting surfaces. The actuating device is selectively connectable to a surface of the supporting surfaces in a such way that the actuating device can alternatively move unrelated to motion of the surfaces so as to be placed in an operative configuration or move integral to the surface so as to modify the distance between the surfaces in order to compress the filtering element.

Abstract: Drying of wet workpiece, such as a magnetic recording media, following a wet clean process where the wet workpiece is displaced from a liquid volume into a gaseous volume at a pull speed that is dependent on the temperature of the gaseous volume.

Abstract: A method and apparatus 30 are provided for cleaning of bottle filling equipment 10 that has a plurality of elevated valves 18, each valve being in flow communication with filling liquid supply means 14. The method includes storing a manifold 32 that has a plurality of cleaning openings 42 in a configuration resembling that of the valves, in a position that allows clear visibility and access to the operation of the valves. The manifold 32 is lowered relative to the valves 18, so that it is below the valves and is positioned underneath the valves, with each cleaning opening 42 in flow communication with a valve. The valves 18 are rinsed with liquid flowing through the filling liquid supply 14, the valves and the manifold 32. Afterwards, the manifold 32 is removed from the valves 18 and returned to its stored position.

Abstract: The present invention refers to a concentrate for use in a cleaning and/or washing process comprising a) an alkyl glycoside having the general formula R1OGn whereby G is a saccharide residue and n is 1, 2, 3, 4 or 5 and R1 is an alkyl group or alkylene group having 1 to 20 carbon atoms, and b) a nonionic alkylene oxide adduct, wherein the concentrate has a pH value of less than 6.5, as well as to a solution obtained by diluting the concentrate and to a process of cleaning objects using the concentrate and/or solution.

Abstract: An apparatus and method are provided to remove matte-sticking adhered to an inner surface of an inclined rear jacket of an exhaust gas hood for collecting exhaust gas discharged during the converter operation in copper smelting. Scraping means 10a˜10f are each provided with a scraping part 20 for scraping off matte-sticking by moving slidably across the inner surface of the rear jacket 8 by driving means 11 from a sidewall of the exhaust gas hood to at least over the centerline L of the width of the rear jacket 8. The scraping means are arranged in pairs at both right and left sidewalls of the exhaust gas hood 6 in multiple levels along the inclination of the rear jacket 8, thereby allowing the matte-sticking adhered to the rear jacket 8 to be removed over almost its entire surface.

Abstract: An apparatus for supporting a work piece is provided. The apparatus includes outer support rails having support slots for supporting the work piece, the outer support rails disposed on opposing sides of the apparatus between opposing end members of the apparatus. Inner support rails extend between the opposing end members of the apparatus. An inner surface of each of the inner support rails has vertically disposed extensions extending therefrom. The vertically disposed extensions are aligned in pairs along a length of the inner support rails. A moveable device is disposed between the pairs of vertically disposed extensions. The moveable device is buoyantly moveable so that as the work piece is lifted, the moveable device follows. A method for cleaning a work piece is also included.

Abstract: A method of cleaning wafer cleaning includes: first a wafer stage for holding and rotating a wafer is provided. The wafer has a surface to be washed. A nozzle is positioned on the wafer for spraying a cleaning solution. The nozzle moves in non-uniform motion from a first given point to a second given point so as to make the time which the first given point is exposed to the cleaning solution equal to the time which the second given point is exposed to the cleaning solution. Furthermore, the nozzle moves faster when passing the center of the wafer and moves slower when passing the edge of the wafer.

Abstract: A transfer conveyor comprises a mechanical structure with wheels. A container for liquids is attached to the lower portion of the mechanical structure. The upper portion of the mechanical structure enables the transfer conveyor to move. The transfer conveyor has a reversible pumping system connected to a pumping line by a flexible conduit and is sealingly connected to the container by a rigid conduit. The transfer conveyor has a system for automatically washing the container and a system for automatically managing and controlling the pumping system and the automatic washing system in order to enable liquid transport as well as the filling, draining, and automatic washing of the container.

Abstract: A waterfall tank system is described for sheeting water onto a passing vehicle. The waterfall tank system includes a tank with a water supply inlet and a soap injector for injecting soap into the water flow to create a soap mix that is supplied to the tank. An air motor is included for providing air to an air manifold that is disposed within the tank. When air is introduced into the soap mix, bubbles are created. As the water, soap mix, and bubbles fill the tank, they fall from the tank via an overflow lip that creates a sheeting action, with the water, soap mix, and/or bubbles sheeting onto a vehicle passing below.

Abstract: Improved resistance to temperature-related degradation or deformation in a wafer-supporting chuck is provided by at least one shielding member that physically and/or thermally shields chuck components from effects of elevated temperature processing fluids.

Abstract: After the rinsing processing is completed, the rotation speed of the substrate is reduced from 600 rpm to 10 rpm to form a puddle-like DIW liquid film. After the supply of DIW is stopped, the control unit waits for a predetermined time (0.5 seconds) so that the film thickness t1 of the puddle-like liquid film becomes approximately uniform. Then, IPA is discharged to a central part of the surface of the substrate at a flow rate of 100 (mL/min) for instance. By the supply of IPA, DIW is replaced with IPA at the central part of the surface of the substrate to form a replaced region. Further, after three seconds of IPA supply, the rotation speed of the substrate is accelerated from 10 rpm to 300 rpm. This causes the replaced region to expand in a radial direction of the substrate so that the entire surface of the substrate is replaced with the low surface-tension solvent.

Abstract: After a water film is formed on a wafer front surface in a chamber, the water film is supplied sequentially with an oxidizing component of an oxidation gas, an organic acid component of an organic acid mist, an HF component of an HF gas, the organic acid mist, and the oxidizing component of the oxidation gas. As a result, the HF component and the organic acid component provide cleaning effect on the wafer surface, and a concentration of the cleaning components in the water film within a wafer surface can be even.

Abstract: A device is disclosed for cleaning dental trays at least partly filled with a molding material. The device has a container, a pump for placing a cleaning liquid under pressure, and a spray nozzle for spraying the pressurized cleaning liquid into the container. A method is also disclosed for cleaning dental trays at least partly filled with a molding material.

Abstract: Embodiments of the invention generally provide apparatus and method for detecting and controlling edge bevel removal of a semiconductor substrate. One embodiment of the present invention provides an apparatus for inspecting a rotating substrate. The apparatus comprises a substrate support configured to support the rotating substrate on a back side and rotate the substrate about a central axis, and a sensor positioned above the substrate support, the sensor being configured to inspect a front side of the rotating substrate while moving simultaneously radially across the substrate.

Abstract: Equipment for washing a carpet (M), the equipment (1) comprising in the same frame (10) the conveyor (3) for transferring the carpet (M) between the washing and drying units (4, 2) of the equipment, the control unit (5) for controlling the operation of the equipment, at least one washing unit (4) and at least one drying unit (2) located in the transport direction (K) after the washing unit/washing units, and means for receiving production goods to the equipment.

Abstract: A method for cleaning a gas turbine unit. The invention further relates to a nozzle for use in washing the gas turbine unit. The nozzle is arranged to atomize a wash liquid in the air stream in an air intake of the gas turbine unit and comprises a nozzle body comprising an intake end for intake of said wash liquid and outlet end for exit of said wash liquid. The nozzle further comprises a number of orifices that are connected to the outlet end and respective orifice is arranged at a suitable distance from a center axis of said nozzle body, whereby the local density of the injected wash liquid in a desired area can be increased with preserved droplet size and thereby the efficiency of the cleaning process can be significantly improved at the same time as the risk for damaging the components in the gas turbine unit is significantly reduced.

Abstract: The techniques described herein are directed to removing material that has attached to or preventing material from attaching to the surface of a piezoelectric cantilever. The material can be a target material, other, non-target, material that may be weakly bound or attached to the cantilever sensor, or the material may be a combination thereof. Accordingly, the cantilever sensor can be reused, in situ, without degraded detection performance of the cantilever sensor. The techniques may also be utilized to remove all material that has attached to a surface of the cantilever sensor which provides means for reusing the cantilever sensor.

Abstract: A wheel washing assembly contains a machine frame, a pendulum assembly pivotably supported on the machine frame, and two washing manifolds, including a first washing manifold and a second washing manifold, attached to the pendulum assembly. Each of the washing manifolds has a nozzle assembly for ejecting water at a wheel to be washed. The washing manifolds are pivotable between a start washing position and an end washing position by an automatic motion of the pendulum assembly. The washing manifolds further automatically track the wheels to be washes by a motion of one of the wheels.

Abstract: An aspect of the present invention provides a system and method for controlling a wafer cleaning system having a wafer carrier and a driving portion. The wafer carrier can move along a path in a first direction and a second direction. The driving portion can controllably move the wafer carrier in the first direction and the second direction. The control system includes a vibration sensor portion and a wafer carrier position controller. The vibration sensor portion can detect vibration of the wafer carrier and can output a vibration signal based on the detected vibration. The wafer carrier position controller can instruct the driving portion to modify motion of the wafer carrier based on the vibration signal to reduce the detected vibration.

Abstract: Process and system for removing printing in metallic packages used in drinks, food and other applications in general, comprising the removal of ink before the cure thereof, by means of spray with ink remover liquid and non abrasive friction. Preferably, said liquid is an alkaline aqueous solution, which is sprayed onto the package surface simultaneously with the friction thereof with a soft and non abrasive element. In a preferred embodiment, said friction results in the rotation of the package around the longitudinal axis thereof, which is mounted on a rotative support, and the soft non abrasive element in contact with the surface thereof keeps motionless.

Abstract: A method of cleaning at least a portion of an exposure system's substrate-holding member. The method involves using the substrate-holding member to hold a cleaning member having substantially the same external shape as a substrate processed with the exposure system. The outer diameter of the cleaning member is smaller than the outer diameter of the substrate processed with the exposure system, and as a result, when the substrate-holding member holds the cleaning member, a gap is provided from the outer diameter of the cleaning member to another member which surrounds the substrate when the substrate-holding member is used to hold a substrate. Liquid is supplied to a space over the gap in order to clean at least a portion of the substrate-holding member.

Abstract: The present invention relates to a material supply for a tablet pressing machine with a rotor, which comprises a matrix disc. The matrix disc includes a plurality of arranged matrices. The material supply is provided to supply material which is to be tabletted to the matrices formed in the matrix disc. A further subject of the invention is a tablet pressing machine which comprises a material supply according to the invention, and also a method for cleaning such a tablet pressing machine.

Abstract: A liquid processing method includes: placing a plate adjacently to at least one of surfaces of a target substrate, and supplying a process liquid into a gap between the plate and the target substrate, thereby forming a liquid film of the process liquid; subjecting the target substrate to a process using a state with the liquid film of the process liquid thus formed; and supplying a gas to the liquid film, thereby breaking the liquid film, after finishing the process.

Abstract: What is contemplated is a printing cylinder washer having a removable or portable drive assembly, or a series of portable drive assemblies of different lengths to accommodate different sizes of print rollers. The drive assemblies have a drive mechanism enabled by a dynamic flow of cleaning solution within the washer reservoir. What is also contemplated is the use of an elevation system, an agitation platform, under-immersion spray bars, an ultrasonic wave cleaning system, and a hatch or door equipped with a thermal breaker in conjunction with the hydro-driven portable drive assembly. What is also contemplated is a method of washing printing rollers within the above-described printing cylinder washer by aligning a nozzle with the drive assembly.

Abstract: A system and method of cleaning a substrate includes a megasonic chamber that includes a transducer and a substrate. The transducer is being oriented toward the substrate. A variable distance d separates the transducer and the substrate. The system also includes a dynamically adjustable RF generator that has an output coupled to the transducer.

Abstract: The presently disclosed embodiments relate generally to methods for the removal of coatings from an imaging member for use in electrostatographic, including digital, apparatuses. More particularly, the embodiments pertain to a method for removing at least one electrophotographic imaging layer from an electrophotographic imaging member using ultra-high pressure water.

Abstract: Disclosed is a polycrystalline silicon washing apparatus that sequentially immerses polycrystalline silicon into a plurality of acid baths each of which is filled with an acid to wash the polycrystalline silicon. The temperatures of the acids in the acid baths are set such that the temperature of the acid in a later acid bath of adjacent acid baths is equal to or lower than that of a former acid bath and the temperature of the acid in the last acid bath is lower than that of the acid in the first acid bath. Each of the acid baths is provided with a temperature adjusting unit that controls the temperature of the acid at a constant value.

Abstract: A cleaning method of cleaning a surface of a substrate that is processed by a developing process. The method includes pouring a cleaning liquid onto a central part of the substrate. A dry area that is not wetted with the cleaning liquid is created in a central part of the substrate by stopping pouring the cleaning liquid or by shifting a cleaning liquid pouring position to which the cleaning liquid is poured from the central part while the substrate holding device is rotating. The dry area is expanded outward from the central part of the substrate by rotating the substrate holding device at a rotating speed not lower than 1500 rpm without pouring the cleaning liquid onto the dry area. The cleaning liquid is poured onto an outer area contiguously surrounding the dry area on the surface of the substrate.

Abstract: A liquid processing apparatus comprises: a second housing 20; a first housing 10 capable of being brought into contact with the second housing 20; a holding part 1 configured to hold an object to be processed W; a rotation driving part 60 configured to rotate the object to be processed W held by the holding part 1; front-side process-liquid supply nozzles 51a and 52a configured to supply a process liquid onto a peripheral portion of a front surface of the object to be processed W held by the holding part 1; and a storage part 23 disposed on a side of a rear surface of the object to be processed W held by the holding part 1, the storage part 23 being configured to store the process liquid having been passed through the object to be processed W. The respective first housing 10 and the second housing 20 can be moved in one direction, so that the first housing 10 and the second housing 20 can be brought into contact with each other and separated apart from each other.

Abstract: Disclosed are an apparatus for etching or stripping a substrate of a liquid crystal display device and a method thereof. The present invention includes carrying out an etching or stripping process on substrates using an etchant in a first etchant tank, counting a number of the substrates etched or stripped using the etchant in the first etchant tank, checking readiness of a second etchant tank at a predetermined point in time before the counted number reaches a maximum substrate number set up previously for the etchant tanks, and carrying out the etching or stripping process on the substrates using an etchant in the second etchant tank when the second etchant tank is in readiness for use and the counted number reaches the maximum substrate number.

Abstract: A dishwasher in the form of a programmable machine, in particular a commercial dishwasher, having a pre-cleaning station, which is disposed outside a treatment chamber of the dishwasher, and having a waste water transfer system, by which washing liquid can be fed from a wash tank of the dishwasher as pre-cleaning liquid to the pre-cleaning station.

Abstract: Disclosed is a liquid processing apparatus and a liquid processing method, which can process an entire wafer at a sufficiently high temperature and can sufficiently suppress adhesion of particles on a surface of the wafer, when the peripheral portion of the wafer is processed. The liquid processing apparatus includes a holding part to hold the substrate, a rotation driving part to rotate the holding part, and a shield unit. The shield unit includes an opposed plate opposed to the substrate held by the holding part, a heating part to heat the substrate through the opposed plate, and a heated gas supplying part to supply heated gas to a surface of the substrate held by the holding part.

Abstract: A method of using a wash cylinder or chamber for a cleaning station to clean an object or a person's body part includes nozzles on the interior of the cylinder, the nozzles of one embodiment comprising an increasing roll angle providing a novel spray pattern. Additionally, embodiments of the invention include methods of using fluid guidance and conveyance structures, angled nozzles, sealing structures, finger guards, nozzle ribs, wash chamber seating mechanisms and drains, and nozzle inlays having a plurality of nozzles. Also disclosed are methods of washing an object or body part using a wash cylinder or chamber and methods of assembling a wash cylinder or chamber.

Abstract: Provided is a double-side coating apparatus which can uniformly coat both surfaces of a substrate to be processed with a coating solution and form uniform coating films on both the surfaces of the substrate to be processed. A double-side coating apparatus (1) includes a holding mechanism (3a) which holds a substrate (2) to be processed so that the thickness direction of the substrate (2) to be processed is a horizontal direction; a rotational driving mechanism which rotates the substrate (2) to be processed in a circumferential direction; a first coating solution nozzle (18a) which jets a coating solution onto one main surface (2a) of the substrate (2) to be processed; and a second coating solution nozzle which jets the coating solution onto the other main surface (2b) of the substrate (2) to be processed. The first coating solution nozzle (18a) and the second coating solution nozzle are symmetrically arranged with respect to a thickness center surface of the substrate (2) to be processed.

Abstract: A thin film removing device and a thin film removing method are capable of removing straight parts of a thin film formed on a square substrate from corners of the substrate, and of suppressing the formation of mists. An approach stage 20 having flat stage plates 23 capable of being disposed substantially flush with the surface of a substrate M mounted on a support table 22 is positioned close to the substrate M mounted on the support table 22. Removing nozzles 30 jet a solvent toward edge parts of the substrate M and suck a solution produced by dissolving part of the resist in the solvent while the removing nozzles 30 are moved along side edges of the substrate M and the approach stage 20 disposed close to the substrate M. Thus, the removing nozzles 30 jet the solvent uniformly over the edge parts and corners of the substrate M and suck the solution without changing modes of jetting the solvent and sucking the solution.

Abstract: The present invention provides a drive-through de-icing station for tractor-trailers and other over-the-road trucks, to be offered as a safety service at truck-stops, highway rest areas, truck weighing stations, and similar, high-traffic locales. The Vehicle Safety Stop is a drive-through station somewhat similar to a car-wash, where the operative de-icing agent would comprise hot steam or liquid de-icing agent. The operative area of the Vehicle Safety Stop measures approximately 15 feet in height, 12 feet in width, and 20 to 40 feet in length. The tractor-trailer or other truck simply pulls beneath an array of strategically placed steam-heads, the configuration of which provides a thorough steam bath for the vehicle, de-icing its top, sides, and undercarriage.

Abstract: Vibrators, each comprising an electric motor having an eccentric weight on its rotating shaft, are adhesively secured to the bottoms of the wastewater holding tanks of a recreational vehicle, to aid in flushing the tanks by dislodging solid debris from the inside walls and bottoms of the tanks and from the electrodes of the liquid level sensors in the tanks.

Abstract: An apparatus and method for removing debris from ophthalmic lens transfer tips during the manufacturing or the ophthalmic lenses.

Abstract: Several methods of removing contaminant particles from a surface of a substrate are disclosed herein. In one embodiment, the method includes directing an incompressible fluid spray onto a surface of a substrate to remove contaminant particles from the surface. In an embodiment, the surface of the substrate and the nozzle are both immersed in an incompressible fluid. The fluid can flow across the surface of the substrate to remove the contaminant particles from the area. The fluid spray can be positioned normal to the substrate surface, or can be positioned at an angle relative to the substrate surface.

Abstract: In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and substantially at the same, injection of a nitrogen gas from a gas nozzle to a center portion of the wafer W at a point at an adequate distance apart from the center of the wafer W is started. Next, while the pure-water nozzle is caused to scan toward the periphery of the wafer W, the gas nozzle is caused to scan toward the periphery of the wafer W in an area radially inward of the position of the pure-water nozzle after the gas nozzle passes the center of the wafer W.

Abstract: Disclosed is a cleaning apparatus capable of cleaning a holding unit of a holding member that holds a substrate. The cleaning apparatus is configured to prevent a cleaning liquid from adhering to a rear-end unit of the holding member where a drying is difficult to be done, while a cleaning process is performed by spraying the cleaning liquid to the holding unit. Also disclosed are a substrate processing system that incorporates the cleaning apparatus, a cleaning method based on the cleaning apparatus, a program to perform the cleaning method, and a storage medium to store the program. The cleaning apparatus is equipped with a cleaning unit that cleans the holding unit by spraying the cleaning liquid to the holding unit, and a cover unit that covers the rear-end unit by making a back-and-forth operation with respect to the holding member.

Abstract: Depending on the actual operating situation and the composition of the fuels used for driving the internal combustion engine, contamination of the moving blades, of the guide device and of the turbine casing parts occurs sooner or later in the exhaust gas turbine. According to the invention, a small quantity of cleaning fluid is fed continuously or cyclically into the exhaust gas flow of an exhaust gas turbine and is directed onto the components to be cleaned. The small quantity of cleaning fluid can be fed in with unchanged operation of the internal combustion engine, such that the exhaust gas turbine can be cleaned or kept clean within the entire operating range of the internal combustion engine. Fluctuations in the power output of the internal combustion engine on account of requisite cleaning of the exhaust gas turbine therefore do not occur. Furthermore, the formation of thermostress cracks in the critical turbine casing parts is largely avoided.

Abstract: Device for cleaning a gas turbine engine, and in particular an engine of turbofan type. The present invention further relates to a method for cleaning such an engine. The device comprises a plurality of nozzles arranged to atomize cleaning liquid in the air stream in an air inlet of the engine up-stream of a fan of the engine. According to the invention, a first nozzle is arranged at a position such that the cleaning liquid emanating from the first nozzle impinges the surfaces of the blades substantially on the pressure side; a second nozzle is arrange at a position such that the cleaning liquid emanating from the second nozzle impinges the surfaces of the blades substantially on the suction side; and a third nozzle is arranged at a position such that the cleaning liquid emanating from the third nozzle passes substantially between the blades and enters an inlet of the core engine.

Abstract: A paint roller cleaner comprises a rod removably receivable by a motorized drill. A fork extends from the rod and is configured for removable insertion into one end of a paint roller. High speed rotary motion can be imparted to the paint roller so that any paint and foreign matter present on the paint roller is quickly removed.

Abstract: The present invention resides in a washing device constructed by a conveyer of a carrying-in side arranged in a frame, a reservoir lower portion having plural rails for holding the work and an ultrasonic generator arranged in this frame, each reservoir upper portion united with this reservoir lower portion, a raising-lowering device for raising and lowering each reservoir upper portion, an arm mechanism for work conveyance, a moving device for controlling advancing and retreating movements of the arm mechanism, a movable device for controlling a swinging return of the arm mechanism, and a conveyer of a carrying-out side for conveying a processed work. The conveyer and the rail of each reservoir lower portion are approximately arranged on the same face. The work is horizontally moved through this conveyer and the rail and is washed and dried by utilizing the union of each reservoir lower portion and each reservoir upper portion.

Abstract: Disclosed is a substrate cleaning apparatus including a brush cleaning unit which cleans a substrate by making a roll brush in contact with a surface of the substrate, and a transporting unit which conveys the substrate. The roll brush includes a bristle. At least one of a diameter of the roll brush, stiffness of the bristle, and density of the bristle becomes larger from an end portion of the roll brush to a central portion thereof.

Abstract: In a substrate cleaning method and a substrate cleaning method according to the present invention, a brush 3 is brought into contact with a substrate W while rotating the same, and a cleaning position Sb of the brush 3 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. A process fluid formed of liquid droplets and a gas is sprayed by a two-fluid nozzle 5 onto the substrate W, and a cleaning position Sn of the two-fluid nozzle 5 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. During the movement of the cleaning position Sb of the brush 3 from the center part of the substrate W toward the peripheral part thereof, the cleaning position Sb of the two-fluid nozzle is positioned nearer to a center P0 than the cleaning position Sb of the brush 3. Since contaminations of the brush are prevented from adhering again to the wafer, it can be avoided that the wafer W is contaminated.

Abstract: A stage device for use in a vacuum includes a frame-shaped movable stage having a sample mounting surface, a fixed stage surrounded by the movable stage, an air bearing to float the movable stage by supplying gas to a gap between the stages, a pressure regulator to regulate a pressure of the gas, a differential pumping portion to prevent the gas from flowing outside the gap, and a controller. The controller moves the movable stage within a predetermined range under a pressure in the differential pumping portion set equal to that for movable stage in use when setting a floating height of the movable stage lower than that for movable stage in use, and under the pressure in the differential pumping portion set higher than that for movable stage in use when setting the floating height of the movable stage equal to that for movable stage in use.

Abstract: During the processing of substrates, the substrate surface may be subjected to a cleaning process using supercritical CO2. Surface matter may remain, for example, because it is only minimally soluble in the supercritical CO2. For example, an oxidation cleaning process causes the substrate structure to cleave at several points leaving smaller fragments of oxidized residue behind. This residue has only minimal solubility in supercritical CO2 due to the polar constituents resulting from oxidation. The method thus further includes processing the substrate with supercritical CO2 and a functionalizing agent that can react with the smaller fragments and/or other less soluble components. These functionalized components are rendered more soluble in supercritical CO2 and are more easily removed than their predecessors.