Abstract: Certain embodiments provide an exhaust gas treatment device, comprising a scrubber unit having a vessel and a sprayer spraying water into the vessel, a first pipe through which a first gas discharged from an external apparatus and containing a non-water-soluble organic solvent is supplied to the vessel, and a second pipe through which a second gas containing a water-soluble organic solvent is supplied to the vessel through the first pipe or directly. In the vessel, the water-soluble organic solvent and the non-water-soluble organic solvent are adsorbed and removed from a mixed gas composed of the first gas and the second gas by the water sprayed from the sprayer. The mixed gas is discharged from the vessel through a third pipe.

Abstract: Herein disclosed is a device and a method for liquid treatment of a disc-like article comprising rotating a disc-like article, dispensing liquid onto the disc-like article when rotated, collecting liquid, which is flung off the disc-like article when rotated, providing a plate arranged parallel to the disc-like article and facing the disc-like article when rotated, and directing gas parallel to the plate across the plate.

Abstract: An autoclave for the sterilization of clinical dental instruments is described, of the type comprising a sterilization chamber (1) equipped with a series of appliance fittings (4) for the inflow and outflow of fluids, and apt to contain a load of instruments onto which to carry through a sterilization cycle, characterized in that said appliance fittings (4) are gathered on at least one connection body or partition (3), with which a reducing container (7) is quickly able to be engaged and disengaged, which container has a volume apt to contain at least one instrument to be sterilized, the inner volume of such container (7) communicating with said appliance fittings (4) and said container (7) being apt to be entirely contained within said sterilization chamber (1). The small-volume container for said autoclave is further described, as well as a full treatment system employing said container.

Abstract: A substrate processing system that enables foreign matter adhered to a rear surface or a periphery of a substrate to be completely removed. A substrate processing apparatus performs predetermined processing on the substrate. A substrate cleaning apparatus cleans the substrate at least one of before and after the predetermined processing. A jetting apparatus jets a cleaning substance in two phases of a gas phase and a liquid phase and a high-temperature gas towards the rear surface or the periphery of the substrate.

Abstract: A laparoscopic lens cleaner which is suitable for maintaining the lens of a laparoscope in a clean, dry condition during a laparoscopic surgical procedure is disclosed. An illustrative embodiment of the laparoscopic lens cleaner includes an elongated cleaner sheath having a sheath interior, a fluid conduit provided in the cleaner sheath, a fluid discharge nozzle provided in the sheath interior and communicating with the fluid conduit, a gas conduit provided in the cleaner sheath and a gas discharge nozzle provided in the sheath interior and communicating with the gas conduit.

Abstract: An object of the present is to uniform particle diameters and speeds of liquid droplets in a two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid droplets with gas so as to clean a substrate. The two-fluid nozzle for cleaning substrates has a gas supply passage for supplying gas, a liquid supply passage for supplying liquid, and a lead-out passage for leading out internally-formed liquid droplets, wherein an injection port for injecting liquid droplets to the outside is formed at the front end of the lead-out passage, and wherein a cross-sectional area Sb of the injection port is formed smaller than a cross-sectional area Sa of the lead-out passage, and a cross sectional area Sc of an exit of the gas supply passage is formed smaller than the cross-sectional area Sa of the lead-out passage.

Abstract: A substrate cleaning device and a substrate cleaning method reduces liquid drops remaining on a substrate to prevent the irregular heating of the substrate by a heating process due to liquid drops or water marks remaining on the substrate. A cleaning liquid is poured through a cleaning liquid pouring nozzle onto the surface of a substrate such that a region onto which the cleaning liquid is poured moves from a central part toward the circumference of the substrate. A gas is jetted radially outward at a region on the surface of the substrate behind a region onto which the cleaning liquid is poured with respect to the rotating direction of the substrate. The gas forces a liquid film of the cleaning liquid flowing on the surface of the substrate to flow in a circumferential direction and a radially outward direction.

Abstract: This invention concerns a washing machine, particularly for washing out the cages and tanks used in animal laboratories, comprising a wash chamber into which a load of the items to be washed can be inserted and equipped with multiple nozzles and a water collection reservoir situated in the floor of the wash chamber. It is characterised by the fact that it comprises a single hydraulic circuit suitable for carrying out, using the system of supplying water to the load, the entire wash and rinse cycles, without the need for two separate wash and rinse circuits. The object of this invention is also the washing method carried out by this machine.

Abstract: In particular a porous substrate (FS) like a fabric. Process to clean a substrate, comprising a step of subjecting the substrate to an air-water spray (SPR), generated using a spraying means (N) comprising an air passage (OPA) and a water passage (OPW), wherein air is greater than 90% by volume of the spray, the air velocity is greater than 80 m/s and wherein said air passage does not coaxially surround said water passage. Device to clean soiled fabric (FS) comprising a feed water container (CW) and an air compressor (AC) in fluid communication with a spray nozzle (N) comprising an air passage and a water passage, said device being capable of generating an air pressure in the range of 1 to 3 bar (absolute) and an air velocity greater than 80 m/s at the exit of said nozzle; and the air is greater than 90% volume of said spray, and wherein said air passage does not coaxially surround said water passage. An external mix spray nozzle is especially preferred in the device.

Abstract: A laparoscopic lens cleaner which is suitable for maintaining the lens of a laparoscope in a clean, dry condition during a laparoscopic surgical procedure is disclosed. An illustrative embodiment of the laparoscopic lens cleaner includes an elongated cleaner sheath having a sheath interior, a fluid conduit provided in the cleaner sheath, a fluid discharge nozzle provided in the sheath interior and communicating with the fluid conduit, a gas conduit provided in the cleaner sheath and a gas discharge nozzle provided in the sheath interior and communicating with the gas conduit.

Abstract: A method of dispensing a first solid product and a second solid product with a solid product dispenser includes placing the first solid product in a product housing of the dispenser and placing the second solid product in the product housing on top of the first solid product, the first and second solid products being different products. A portion of the first solid product is dispensed during each cycle of the dispenser until the first solid product has been partially depleted to a size small enough to allow the second solid product to also be dispensed, then a portion of the first solid product and a portion of the second solid product are dispensed during each cycle of the dispenser until the first solid product has been completely depleted, and then a portion of the second solid product is dispensed during each cycle of the dispenser.

Abstract: A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.

Abstract: In one embodiment, an apparatus of treating a surface of a semiconductor substrate comprises a substrate holding and rotating unit, first to fourth supplying units, and a removing unit. A substrate holding and rotating unit holds a semiconductor substrate, having a convex pattern formed on its surface, and rotates the semiconductor substrate. A first supplying unit supplies a chemical onto the surface of the semiconductor substrate in order to clean the semiconductor substrate. A second supplying unit supplies pure water to the surface of the semiconductor substrate in order to rinse the semiconductor substrate. A third supplying unit supplies a water repellent agent to the surface of the semiconductor substrate in order to form a water repellent protective film onto the surface of the convex pattern. A fourth supplying unit supplies alcohol, which is diluted with pure water, or acid water to the surface of the semiconductor substrate in order to rinse the semiconductor substrate.

Abstract: A facility for cleaning substrates such as semiconductor wafers includes a loading/unloading part, an aligning part where wafers are repositioned from a horizontal state to a vertical state, a cleaning part performing etchant-treating, rinsing, and drying processes for wafers and having a plurality of process chamber stacked, and an interface part where a transfer bath is disposed to transfer wafers between the process chambers. When the wafers are transferred between the process chamber, the transfer bath is filled with deionized water (DI water) to prevent their exposure to the air. Wafers drawn out of the loading/unlading part are repositioned from a horizontal state to a vertical state and are transferred to a first process chamber being one of the process chambers to be subjected to a part of processes.

Abstract: An on-board optical sensor apparatus includes an optical sensor, an optical sensor cover, and a controller. The optical sensor has a lens. The optical sensor cover includes a holder and a washer nozzle. The holder holds the optical sensor. The washer nozzle performs a washing operation to wash a lens surface of the lens of the optical sensor or a glass surface of a cover glass located facing the lens by spraying a washer fluid, supplied from a washer fluid tank, onto the lens surface or the glass surface. The controller controls the washing operation of the washer nozzle.

Abstract: Disclosed are an apparatus for etching or stripping a substrate of a liquid crystal display device and a method thereof. The present invention includes carrying out an etching or stripping process on substrates using an etchant in a first etchant tank, counting a number of the substrates etched or stripped using the etchant in the first etchant tank, checking readiness of a second etchant tank at a predetermined point in time before the counted number reaches a maximum substrate number set up previously for the etchant tanks, and carrying out the etching or stripping process on the substrates using an etchant in the second etchant tank when the second etchant tank is in readiness for use and the counted number reaches the maximum substrate number.

Abstract: A cleaning/drying apparatus including a vapor area where vapor of an organic solvent inside the cleaning/drying apparatus is generated, an ejecting part configured to eject the organic solvent onto a cleaning/drying target, a first detecting part configured to determine whether the temperature of the cleaning/drying target is a first temperature equivalent to a temperature of the vapor in the vapor area, a second detecting part configured to determine whether the temperature of the cleaning/drying target is a second temperature enabling the organic solvent to condense on a surface of the cleaning/drying target, and a cleaning/drying control part configured to drive the ejecting part to eject the organic solvent when the first detecting part detects that the temperature of the cleaning/drying target is the first temperature and stop the ejection when the second detecting part detects that the temperature of the cleaning/drying target is the second temperature.

Abstract: A substrate holder is defined to support a substrate. A rotating mechanism is defined to rotate the substrate holder. An applicator is defined to extend over the substrate holder to dispense a cleaning material onto a surface of the substrate when present on the substrate holder. The applicator is defined to apply a downward force to the cleaning material on the surface of the substrate. In one embodiment the cleaning material is gelatinous.

Abstract: In the dishwasher, a washing water distribution pipe on which washing nozzles are installed is arranged within a washing chamber, and is connected removably to a first connecting pipe that communicates with the outlet side of a washing pump. In the same way, a rinsing water distribution pipe on which rinsing nozzles are installed is arranged within the washing chamber, and is connected removably to a second connecting pipe that communicates with the outlet side of a rinsing pump. These connections are made within a washing water tank in the bottom of the washing chamber, therefore the washing water distribution pipe and the rinsing water distribution pipe can be easily installed and removed from the washing chamber. Moreover, the washing water distribution pipe and the rinsing water distribution pipe are unitized, so handling is extremely easy.

Abstract: A mist generating device includes a mist generation vibrator, and a sealed vessel accommodating therein a fluid and provided at a side of a vibrating surface of the mist generation vibrator. A wall portion which constitutes a part of the sealed vessel and faces the mist generation vibrator has a thin film membrane and a mist of liquid outside the sealed vessel is generated by ultrasonic vibration transmitted from the mist generation vibrator via the fluid in the sealed vessel and the thin film membrane.

Abstract: An apparatus for etching a substrate includes (a) a nozzle system including at least one nozzle through which acid solution containing at least hydrofluoric acid is sprayed onto the substrate, (b) a mover which moves at least one of the nozzle system and the substrate relative to the other in a predetermined direction in such a condition that the substrate and the nozzle system face each other, (c) a filter system which filters off particles out of the acid solution having been sprayed onto the substrate, and (d) a circulation system which circulates the acid solution having been sprayed onto the substrate, to the filter system, and further, to the nozzle system from the filter system.

Abstract: An apparatus for cleaning substrates includes a substrate support that is configured to support a plurality of substrates horizontally as spaced regularly one above the other, a rotating device for rotating the substrate support and a liquid supply system for dispensing cleaning liquid onto the substrates. The substrate support has a base plate and support rods extending upright on the base plate. The support rods include fixed rods and at least one movable rod. The movable rods is movable between an open position to provide a passage that allows the substrates to be placed between the support rods, and a closed position at which the substrates are held by and between the support rods. Once the substrates are supported in this way, the substrates are rotated. Then, the cleaning liquid, such as a chemical solution(s) followed by a rinsing liquid, is dispensed onto all of the substrates as the substrates are being rotated.

Abstract: A system, apparatus and method for processing flat articles, such as semiconductor wafers, with acoustical energy. In a cleaning process, the inventive system, apparatus and method can remove particles from both sides of a wafer more efficiently and effectively. In one aspect, the invention is a system for processing flat articles comprising: a first dispenser for applying a liquid to a first surface of a flat article; a second dispenser for applying liquid to a second surface of a flat article; a first transducer assembly positioned so as to transmit acoustical energy to the first surface of the flat article; and a second transducer assembly positioned so as to transmit acoustical energy to the second surface of the flat article.

Abstract: A reactor for washing sand contaminated with hydrocarbons comprises a vessel having an aperture in a bottom portion thereof. A steam cleaning device is located near a top of the vessel for receiving contaminated sand and cleaning the contaminated sand as it is introduced into the vessel. A rinsing device is positioned below the steam cleaning device for rinsing the sand with water. A sand conveying device comprising an air injection device is positioned in the bottom portion of the vessel for urging sand out of the aperture using compressed air, such that the sand is partially dewatered as the sand is urged out of the aperture.

Abstract: With the waste container washing system described herein, the waste container can be moved into a washing compartment of the washing vehicle for washing thereof; in a first washing phase, the waste container can be exposed to a plurality of water jets of grey water pumped from a grey water reservoir; and in a second washing phase, the waste container can be exposed to a plurality of clean water pumped from a clean water reservoir. The water used in the first and/or second washing phase can be collected and stored in the grey water reservoir. Other improvements, such as a double-action pump for the two phases, a filtering system for grey water, a container movement system and path, and methods are also described.

Abstract: An object is to smoothly clean a nozzle portion of a beverage dispenser, the beverage dispenser discharges and supplies beverage ingredients from beverage supplying nozzles, and comprises a cleaning device to clean the beverage supplying nozzles, and this cleaning device executes a cleaning operation including: a steam jetting step of jetting high-temperature steam to the beverage supplying nozzles; a water jetting step of jetting water or hot water to the beverage supplying nozzles; and a drying step of drying the surfaces of the beverage supplying nozzles.

Abstract: A dishwasher having a liquid spraying system operable in a first mode to spray a focused stream of liquid within the wash chamber, and operable in a second mode to spray a diffused stream of liquid within the wash chamber.

Abstract: A system and method for low temperature hydration of food soils allows for hydration of food soils between washing cycles in a dishwasher. A user selects a hydration button to actuate a hydration cycle between dishwashing cycles. During the hydration cycle, a plurality of atomizers are periodically actuated in accordance with a desired amount of hydration selected by the user. Water is supplied from a dedicated water supply line to the atomizers, preferably without being heated, and is distributed throughout a dishwasher chamber utilizing spray nozzles or fans associated with the atomizers. The hydration cycle ends when deactivated, or when a dishwashing cycle is initiated.

Abstract: A method is provided for reducing the amount of film fragments discharged into a processing liquid circulation system during removal of films from wafers, thereby reducing the frequency of filter cleaning or filter replacement. The method includes exposing a wafer containing a film formed thereon in a process chamber of a substrate processing system to a processing liquid, where the wafer is not rotated or is rotated at a first speed and the processing liquid is discharged from the process chamber to a processing liquid circulation system. Subsequently, exposure of the wafer to the processing liquid is discontinued and the wafer is rotated at a second speed greater than the first speed to centrifugally remove fragments of the film from the wafer. Next, the wafer is exposed to the same or a different processing liquid and the processing liquid is discharged from the process chamber to a processing liquid drain.

Abstract: Disclosed is a system and method to monitor and count particles removed from a component. The particle monitoring system includes a jet spray device, a snow generator, a particle collection device, and a particle counter. The jet spray device includes an outlet that is disposed locally relative to the component. The snow generator is operable to generate cleaning snow comprising a stream of ice particles, wherein the cleaning snow is emitted from the outlet of the jet spray device onto the component to cause the ejection of particles from the component. The particle collection device includes a collector that is disposed locally around the component to collect particles ejected from the component. The particle counter is coupled to, and in fluid communication with, the particle collection device. The particle counter is operable to detect and count particles ejected from the component.

Abstract: A ware rinse and/or dishwashing device includes an enclosure with a support adapted to support a dish tray in a working chamber. A rotatable rinse arm assembly is disposed in the enclosure below the support. The rinse arm assembly has a plurality of non-linear arms disposed for rotation about a common rotational axis. Each of the arms has at least two of the nozzles mounted thereon. The nozzles are disposed so that water sprayed therefrom during a period of time of a plurality of revolutions of the rinse arms has a coverage variation of not more than 25%. The two nozzles on each arm may be an inner nozzle disposed proximate the revolution axis and an outer nozzle disposed distal therefrom.

Abstract: There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while moving the nozzle and substrate with respect to each other in one direction, wherein a length of a direction crossing at right angles to the direction of the first discharge region is equal to or more than a maximum diameter or longest side of the substrate, the nozzle continuously spouts a first gas to the substrate from a first jet region, and the length of a direction crossing at right angles to the direction of the first jet region is equal to or more than the maximum diameter or longest side of the substrate.

Abstract: An apparatus to clean a continuously running conveyor belt for a machine to produce or refine paper, cardboard or other layers of fibrous material including a cleaning device and at least one supplementary device. The cleaning device is configured to dispense at least one cleansing stream to the conveyor belt in at least one cleaning stage. The supplementary device is configured to dispense a chemically active medium and/or a physically active medium in a preparation process. The preparation process is configured to support and/or enhance the cleaning effectiveness and conditioning of a surface of the conveyor belt for a cleaning process.

Abstract: Accurate coating and developing having high intrasurface uniformity is achieved by suppressing the influence of components of a resist that may be eluted while a substrate coated with the resist is processed by immersion exposure. A coating unit coats a surface of a substrate with a resist. then, a first cleaning means including a cleaning nozzle cleans the substrate and then the substrate is subjected to an exposure process. Since only a small amount of components of the resist dissolves in a transparent liquid layer formed on the substrate for exposure, an exposure process can form lines in accurate line-widths. Consequently, a resist pattern of lines having accurate line-widths having high intrasurface uniformity can be formed on the substrate by developing the exposed resist.

Abstract: In a method for cleaning wafers using ultra-dilute acids, the wafers are placed into a rotor in a process chamber. As the rotor spins, the wafers are with de-ionized water and ultra-dilute hydrofluoric acid. Ozone gas is introduced into the process chamber. The wafers are then sprayed with an ultra-dilute solution of hydrochloric acid. Ozone gas is purged from the chamber. The wafers are then rinsed and dried. The ultra-dilute acids may be used in water to acid concentrations on the order of about 1000-2400:1.

Abstract: The apparatus for cleaning surfaces of the present invention such as for cleaning solar collectors preferably alternates different fluids and gas decompression to create a cleansing fluid evacuation to clean outdoor solid surfaces. The method of the present invention utilizes alternating fluids in order to avoid mineral deposits contaminating the collector. The apparatus of the present invention is a tool to achieve the ends of the method. The apparatus preferably uses copper piping and turbulence to regulate water flow and to create the high velocity fluid evacuation that achieves the ends of the method invention. The use of a constant pressure pump and turbulence inducing fibers allows passive regulation of pressure that is equalized across a plurality of sprayers to deliver an even amount of high velocity fluid from each sprayer. Sonication accelerates cleaning, rinsing or snow/ice removal.

Abstract: Provided is an apparatus for controlling a washing flow of a dishwasher that can perform an upper washing, a lower washing, an alternate washing of upper and lower sides, and a concurrent washing of upper and lower sides for effective washing.

Abstract: A cleaning method highly effectively cleans a surface of a semiconductor wafer by removing a dissolution product, produced when a surface of a semiconductor wafer is processed by a developing process that develops an exposed film formed on the semiconductor wafer by wetting the exposed film with a developer, from the surface of the semiconductor wafer. A cleaning liquid is poured through a cleaning liquid pouring nozzle onto a central part of a rotating wafer processed by a developing process to spread the cleaning liquid in a film over the surface of the wafer. Then, the cleaning liquid pouring nozzle is shifted to create a dry area in a central part of the wafer and the wafer is rotated at 1500 rpm to expand the dry area.

Abstract: A warewasher for washing wares includes a housing defining an internal space with at least one spray zone for washing wares. A liquid delivery system provides a spray of liquid within the spray zone. A tank includes an inlet that is connected to a hot water source for filling the tank with hot water. The liquid delivery system receives water from the tank. An exhaust vents heated air from the housing. A final rinse system is connected to a cold water source. A heat recovery system is located between the final rinse system and the cold water source. The heat recovery system transfers heat from the exhaust air to the cold water provided from the cold water source. A valve associated with the hot water source selectively supplements the water exiting the heat recovery system with hot water from the hot water source.

Abstract: A method and apparatus for cleaning a workpiece are disclosed. A gas and cleaning solution are supplied to an atomizing nozzle which atomizes the cleaning solution and sprays the top surface of a workpiece with an atomized spray. A liquid having a controlled gas content is flowed to the top surface of the workpiece from a rinse nozzle. Megasonic energy is applied from the backside of the workpiece.

Abstract: A cleaning apparatus for a semiconductor wafer includes: a gas jet device including a gas nozzle which jets a first gas onto the surface of a semiconductor wafer to thin the thickness of a stagnant layer on the surface of the semiconductor wafer; and a two-fluid jet device including a two-fluid nozzle which jets droplet mist onto a region where thickness of the stagnant layer of the semiconductor wafer is thinned, the droplet mist being mixed two-fluid of a liquid and a second gas.

Abstract: A substrate (W) is held and rotated in its horizontal position on a spin base (10). A processing liquid can be supplied from a processing liquid lower nozzle 15 to the lower surface of the substrate (W). The upper surface of the substrate (W) is covered with an atmosphere blocking plate (30). A splash guard (50) is disposed so as to circumscribe the substrate (W). A guard (52) is curved such that the vertical cross section of a recovery port (52f) of the splash guard (50) is of substantially U-shape opening to the center of the splash guard (50), so that the maximum internal diameter part of the recovery port (52f) is brought near a guard (53). The space between the internal wall surface of the recovery port (52f) and the substrate (W) is increased to thereby suppress the bounce of the processing liquid flying spattering from the substrate (W) in rotation.

Abstract: A wafer cleaning apparatus used for cleaning a first uncleaned surface of a wafer is provided. The wafer cleaning apparatus includes a case, a spin device, a cover, at least one first spray bar, and at least one exhaust device. The spin device is disposed in the case and used for carrying the wafer and spinning perpendicularly to the ground. The cover is disposed in the case and used for covering the spin device. The first spray bar is disposed at one side of the spin device and used for spraying a volatile cleaning solution onto the first uncleaned surface of the wafer, in which the sprayed volatile cleaning solution is of a bar shape. The exhaust device is disposed on the sidewall of the case.

Abstract: A dishwasher is provided. The dishwasher includes a tub, a steam generator, and a connecting passage. The tub stores dishes. The steam generator generates steam to be supplied into the tub. The connecting passage connects a discharging end of the steam generator to an inside of the tub.

Abstract: A chandelier cleaning apparatus includes a tent-like enclosure made of a transparent plastic. In a first embodiment, the enclosure includes a main body having a flat top panel and a flat, imperforate bottom panel. A central aperture is formed in the top panel and a zipper extends from the central aperture to an outer periphery of the top panel so that the central opening is enlarged when the zipper is open. The chandelier passes through the central aperture when the zipper is open and is enclosed within the enclosure when the zipper is closed. A mist of hot water is sprayed onto the chandelier with a wand that extends though a small opening in the enclosure. The time required to clean a typical chandelier drops from hours to minutes, no chemicals are used, and the chandelier is touched only by the hot mist.

Abstract: A dish washer for commercial use is provided. The dishwasher according to current application is used for restaurants, hospital, school and military camp, etc. The dish washer of the current application has an auxiliary rinsing water pipe that is embedded inside of a washing water pipe. The rinsing water supplied to the washing water pipe drives the remaining soapy washing water out of an upper washing water impellor just after the washing step is finished. In rinsing step, rinsing water is supplied to an upper rinsing impellor via main rinsing water pipe. Rinsing water is sprayed to the bottom of the washing water impellor to remove the residual soapy washing water droplets. The dish washer of the current application removes a chance of contamination of dishes and cups by soapy washing water drops after washing is finished.

Abstract: A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The rotary movement has a center of rotation and an edge of rotation. The second liquid is directed from the center of rotation to the edge of rotation using a nozzle. A dry zone is created on the substrate as the position of the spray moves from the center of rotation to the edge of rotation. As a result, the first liquid and the second liquid are removed from the surface of the substrate.

Abstract: A dishwasher is provided that includes a washing space in which the soiled articles can be positioned for cleaning and an operating device that operates during the cleaning operation and is arranged in an opening in a bounding face of the washing space and/or of a container which can be positioned in the washing space. A spray device for spraying cleaning fluid is integrated into the washing space in the operating device.

Abstract: Systems and methods for treating workpieces are described. One embodiment relates to a deflux system including at least one array of nozzles, the nozzles adapted to transmit a fluid outward therefrom. The nozzles are moveable relative to one another, so that a distance between adjacent nozzles can be varied. The nozzles are individually adjustable with respect to an angle of spray emitted therefrom during operation. The system also includes a controller adapted to send a signal to each of the nozzles to transmit the fluid therethrough at a desired angle at a desired time. Other embodiments are described and claimed.

Abstract: Provided is a single type substrate treating apparatus and a cleaning method the substrate treating apparatus. A cleaning process is periodically performed on a substrate support member after a series of repeated substrate treating processes is performed to remove contaminants remaining on the substrate support member and minimize thermal deformation of the substrate support member due to a high temperature chemical solution.