Abstract: According to an embodiment, a support module is provided for supporting a substrate. The support module may include a chuck and a vertical stage. The chuck may include multiple chuck segments that are independently movable. When the substrate is positioned on the chuck, different chuck segments are positioned under different areas of the substrate. The vertical stage may include multiple piezoelectric motors. Each piezoelectric motor may be configured to perform nanometric scale elevation and lowering movements. The multiple piezoelectric motors may be configured to independently move the multiple chuck segments.

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

Abstract: A hitch assist system and method are provided herein. A device is configured to detect a hitch coupler of a trailer and a controller is in communication with the device. The controller is configured to generate a boundary area projecting from the hitch coupler, define a vehicle backup path toward the trailer if a tow hitch of the vehicle is located inside the boundary area, and determine a steering angle for steering the vehicle along the vehicle backup path.

Abstract: Methods and apparatus for deep microscopic super resolution imaging use two independent and variable focal planes. Movements of fiducial markers imaged using one focal plane are monitored and used to provide real-time or near real-time correction for sample drift. A second focal plane may be used to collect light for super-resolution imaging of a sample. A prototype embodiment has produced low drift when imaging many microns deeper than the fiducial markers.

Abstract: An apparatus comprises a radiotherapy delivery apparatus having a radiation source for emitting a beam of radiation and wherein the source is rotatable around an axis intersecting the beam through a range of at least x degrees, an imaging device, and a control unit controlling the source and imaging device. The apparatus further comprises a treatment planning computer receiving a first image of a patient, and parameters defining the operations of the radiotherapy delivery apparatus. Parameters include an available range of rotation for the source, x-e, where e>0. The treatment planning computer generates a treatment plan for the patient based on the received image and parameters. The control unit determines a patient position using the imaging device, determines a rotation r of the patient around the axis relative to the first image, and compensates for the rotation by offsetting the source by a rotation, r, when r<e.

Abstract: A charged particle beam writing apparatus includes an enlarged pattern forming circuitry to form an enlarged pattern by enlarging a figure pattern to be written, depending on a shift number which is defined by the number of writing positions shifted in the x or y direction in plural writing positions where multiple writing is performed while shifting the position, a reduced pattern forming circuitry to form a reduced pattern by reducing the figure pattern, depending on the shift number, and an irradiation coefficient calculation circuitry to calculate an irradiation coefficient for modulating a dose of a charged particle beam irradiating each of small regions, using the enlarged and reduced patterns.

Abstract: A forklift truck includes a two-dimensional rangefinder, a mover device, a calculator, and a determiner. The two-dimensional rangefinder emits a measurement wave in a downwardly inclined direction from above and toward a first load and measures a distance to a measurement point located on a surface of the first load. The mover device moves the two-dimensional rangefinder. The calculator calculates a longitudinal distance between the emitting source and the measurement point. The determiner determines that the first load is in a condition in which there is a level difference between a front part and a rear part of an upper surface of the first load, and the front part is higher than the rear part, when a variation in the longitudinal distance that is generated in response to a displacement of the two-dimensional rangefinder moved by the mover device exceeds an upper limit of a specified threshold range.

Abstract: A method for calibrating light is adapted to a 3D object generating apparatus including a housing, an optical-transparent component, and a laser light generator. The housing has an accommodating space and an opening communicating with the accommodating space. The optical transparent component is arranged on the opening, and the laser light generator is arranged within the accommodating space. The method includes the following steps: providing a first photodetector and a controller, the controller is electrically connected to the first photodetector and the laser light generator; using the controller to drive the laser light generator to generate the light and perform a scanning procedure; and stopping the scanning procedure when the first photodetector detects the light generated by the laser light generator, and then performing a 3D object generating procedure in the working region by moving the laser light generator with a preset distance.

Abstract: A method for target measurement is provided which comprises designing a reflection-symmetric target and measuring overlays of the target along at least one reflection symmetry direction of the target. Also, a tool calibration method comprising calibrating a scatterometry measurement tool with respect to a reflection symmetry of a reflection symmetric target. Further provided are methods of measuring scatterometry overlay using first order and zeroth order scatterometry measurements of a reflection-symmetric scatterometry targets. Also, a scatterometry target comprising a reflection-symmetric target having two cells in each of at least two measurement directions, wherein respective cells have different offsets along one measurement direction and similar offsets along other measurement directions. Further, a scatterometry measurement system comprising a reflection symmetric illumination and calibrated to measure reflection symmetric targets.

Abstract: A method produces a multilayer element with a substrate and at least one conductor structure connected in an areal manner to the substrate, which has first regions of electrically conductive material, which is present in accordance with a prescribed pattern, while electrically non-conductive second regions lie between the first regions.

Abstract: A sample positioning method that can easily and quickly position a target observation area of a sample, which is disposed on a sample stage in a sample chamber of a charged particle beam apparatus, into a field of view of a first charged particle beam.

Abstract: A method and an apparatus for use in processing a wafer are disclosed. In an embodiment the method includes providing a wafer on a receptacle, shining a light at an edge of the wafer and based on light that passed the edge of the wafer, processing the wafer on the receptacle.

Abstract: Systems, methods, and devices are disclosed for inspecting a manufacturing component. Devices include a centering device configured to modify a position of an ultrasonic probe assembly relative to a manufacturing component to bisect an angle associated with the manufacturing component. Devices may also include a surface sensing device configured to sense a curvature associated with the manufacturing component. Devices may further include a plurality of sensors configured to measure a first displacement value associated with the centering device and a second displacement value associated with the surface sensing device. The devices may include a control circuit configured to determine a position adjustment value based on at least one of the first displacement value and the second displacement value. The devices may also include an actuator configured to modify a position of an ultrasonic transducer based, at least in part, on the position adjustment value.

Abstract: A marker light is a device that provides referential pivoting and precision boundary marking required for parking or docking articulate vehicles during poor visibility conditions. The marker consists of 12 primary features, an upper shell housing, a sealed circular window for white light passage, a sealed slotted window for laser light passage, internal reinforcement, a white up light, a laser beam transform lens, a laser beam source, a rechargeable battery pack, a recharging port, a wiring harness, a lower base plate, and an on/off switch. The up light pinpoints substantially the optimum pivot location during the parking or docking process. The developed laser plane—resulting from the laser beam passing through the transform lens—enables two marking orientations for the driver from one continuous laser impingement curve. From a top view perspective, orientation 1 marks parallel on the ground for aligning the trailer while orientation 2 marks perpendicular to the vertical dock wall.

Abstract: A hitch assist system for a vehicle comprises a camera mounted to view a reverse path of a vehicle, an input device connected for the hitch assist system, and a controller. The controller includes instructions for detecting a trailer proximate to a vehicle with the camera, determining a vehicle hitch ball location, determining a trailer hitch location, and calculating a vehicle path from an initial position to a final position. The vehicle hitch ball is laterally aligned with the trailer hitch in the final position. The controller also includes instructions for calculating the steering and braking maneuvers necessary to move the vehicle along the path to the final position and sending instructions to a vehicle steering system and a vehicle brake system to perform the calculated maneuvers.

Abstract: The present disclosure relates to HIF-2? inhibitors and methods of making and using them for treating cancer. Certain compounds were potent in HIF-2? scintillation proximity assay, luciferase assay, and VEGF ELISA assay, and led to tumor size reduction and regression in 786-O xenograft bearing mice in vivo.

Abstract: A method of fabricating a semiconductor device includes forming a metal film including Cu on a substrate, forming a protective film on the metal film, forming a hard mask including TaOx, where x is 2.0 to 2.5, on the protective film, forming a hard mask pattern by patterning the hard mask, and forming a metal wiring by patterning the metal film, using the hard mask pattern as an etching mask.

Abstract: Methods for aligning a pair of calibrated lasers of a laser additive manufacturing system in an overlap region in which the pair of calibrated lasers selectively operate are provided. Respective first and second plurality of layers of a test structure are formed in the overlap region of the pair of calibrated lasers solely using a first calibrated laser of the pair of calibrated lasers and then solely using a second calibrated laser of the pair of calibrated lasers. The test structure forming creates an outer surface of the test structure corresponding to the overlap region. A dimension(s) of an offset step(s) created between the first plurality of layers and the second plurality of lasers in the outer surface of the test structure is/are measured. The lasers are aligned by applying the dimension(s) of the offset step(s) as an alignment correction(s) to at least one of the pair of calibrated lasers.

Abstract: An irradiation device using ionizing radiation, particularly for radiation therapy and/or radiation biology, simultaneously includes: at least one unit (MER) for emitting ionizing radiation; at least one dose-monitoring unit (MCD); at least one unit for detecting an ionizing radiation dose (MDD); and at least one monitoring and control system (SCC). The units (MER, MDD, MCD) and the system (SCC) are also intelligently interconnected therebetween so as to engage with one another and form an intelligent monitoring and adjustment loop, such as to controllably, precisely and desirably produce strong doses of ionizing radiation of at least 0.01 Gy, having a precision within at least one 1? Gy but preferably 1 n Gy, in strong dose rates up to 1000 Gy/s with power within a range of 1 to 50 Me V in very brief time intervals of at least 0.1 ?s, preferably 1 ms.

Abstract: The present disclosure generally relates to a method and apparatus for processing a web-based substrate. As the substrate travels between rollers, the substrate may be stretched and thus distorted. Once the substrate reaches the roller, the substrate distortion is fixed. By adjusting the processing parameters, the distorted substrate is processed without correcting the distortion.

Abstract: A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.

Abstract: The invention relates to a device (1) for detecting the position of the face (2) of a person, in particular of a motor vehicle driver, wherein said device includes: a thermal sensor (4) configured for determining the heat generated from a target area (6) likely to be occupied by a person, in the form of a dot (10) matrix (8), each dot (10) in said matrix (8) representing the heat generated by a portion of said target area (6), processing means for analyzing a value acquired through a physical quantity for the dots (10) of said matrix (8) in order to detect at least one piece of adjustment information (12) that is representative of the position of said face (2) within said target area (6). The invention also relates to a corresponding detection method and display, in particular a head-up display, provided with said device.

Abstract: An electron microscope sample holder that includes at least one capillary having a sufficient inner diameter to act as a catheter pathway that allows objects that can be accommodated within the at least one capillary to be replaced or swapped with other objects. The sample holder having at least one capillary allows the user to insert and remove temporary fluidic pathways, sensors or other tools without the need to dissemble the holder.

Abstract: A method of manufacturing a reticle, the method including preparing a substrate, determining position data of a pattern to be formed on the substrate, and setting a primary exposure condition to form the pattern; performing a primary exposure simulation regarding the substrate based on the position data of the pattern and the primary exposure condition; calculating a primary deformation rate of the substrate, which is generated in the primary exposure simulation; correcting the position data of the pattern based on the primary deformation rate of the substrate to provide a corrected position data of the pattern; and exposing the substrate under the primary exposure condition based on the corrected position data of the pattern.

Abstract: A contact position of a probe needle with respect to electrode pads 71 to 75 of a semiconductor device is inspected in advance when performing an inspection by a prober on the semiconductor device formed on a wafer W placed on a stage 11. A reticle 31 on which shapes 61 to 65 indicating positions of the probe needles are formed is placed instead of the probe needles at a position where the probe needles are arranged. The semiconductor device formed on the wafer W is imaged by the imaging unit 33 through the reticle 31. A positional relationship between the shapes formed on the reticle 31 and the electrode pads 71 to 75 is analyzed from the image. When necessary, a position of the stage 11 is adjusted such that centers of the shapes 61 to 65 and centers of the electrode pad 71 to 75 are coincident.

Abstract: A multi-layer charged particle beam characterization system is disclosed, and method for using the same. A typical embodiment includes a plurality of two-sided metal plates, arranged as a stack, each metal plate having an electrical contact tab extending from at least one common edge of the metal plate, and a plurality of insulator films disposed between adjacent metal plates, each insulator film is sized to match its corresponding metal plate. The tabs are coupled to a printed circuit board and connected to an external electrical connector to register a number of metal plates and insulator layers through which a charged particle beam has penetrated.

Abstract: A display substrate and a display device including the display substrate are provided. The display substrate includes an alignment mark in an alignment region of the display substrate; and a blocking structure in a preset region around the alignment mark, wherein the blocking structure is arranged to block residual particles carried by a rubbing roller during rubbing.

Abstract: A medical device is controlled as a function of a position of a control element projected onto a projection surface, wherein a geometric property of the projected control element is adjusted to the surface structure. The adjustment is accomplished by means of a transformation of projection data, the projection data corresponding to the control element that is to be projected. The optical projection of the control element is based on the transformed projection data. Such an adjustment and transformation are made possible by determining the surface structure of the projection surface. The control system has an image processor both for determining the surface structure and for transforming the projection data. The control system additionally has a projector for optically projecting the control element and a control unit for controlling the medical device based on the first position of the projected control element.

Abstract: A multi-layer overlay target for use in imaging based metrology is disclosed. The overlay target includes a plurality of target structures including three or more target structures, each target structure including a set of two or more pattern elements, wherein the target structures are configured to share a common center of symmetry upon alignment of the target structures, each target structure being invariant to N degree rotation about the common center of symmetry, wherein N is equal to or greater than 180 degrees, wherein each of the two or more pattern elements has an individual center of symmetry, wherein each of the two or more pattern elements of each target structure is invariant to M degree rotation about the individual center of symmetry, wherein M is equal to or greater than 180 degrees.

Abstract: Various embodiments disclose systems and methods for tracking regions (e.g., tumor locations) within living organisms. Some embodiments provide real-time, highly accurate, low latency measurements of tumor location even as the tumor moves with internal body motions. Such measurements may be suitable for closed-loop radiation delivery applications where radiation therapy may be continuously guided to the tumor site even as the tumor moves. Particularly, the system may dynamically identify planned to actual fiducial correspondences by iterating through the possible assignment permutations. A successful permutation may be recorded and used to orient the patient during follow up treatment sessions.

Abstract: A device for positioning a mask relative to the surface of a wafer with a view to the exposure of the wafer, which includes (i) first positioning structure suitable for holding and moving the mask and the wafer in relation to each other; (ii) imaging structure suitable for producing at least one image of the mask and of the surface of the wafer according to at least one field of view, so as to image positioning marks of the mask and of the wafer simultaneously in the field of view; and (iii) at least one optical distance sensor suitable for producing a distance measurement between the surface of the wafer and the mask in the field(s) of view, with a measurement beam which passes at least partially through the imaging structure.

Abstract: A scanning electron microscopy system includes an electron beam source, a sample stage that includes a first alignment feature, an electron-optical column that includes electron-optical elements that include a lens having a second alignment feature, and an alignment plate having a third alignment feature. The system additionally includes a reference target, and a detector assembly. The electron-optical elements configurable to simultaneously focus on a substrate and the reference target. The system also includes a controller communicatively coupled to at least one or more portions of the electron-optical column and the sample stage, to make adjustments in order to align the electron beam to at least one of the first set of alignment features, the second set of alignment features, the third set of alignment features, the reference target or the substrate. The controller also makes adjustments to simultaneously focus the electron beam at a first and second high resolution plane.

Abstract: A system, a method, and a non-transitory computer readable storage medium for controlling an ion implanter are disclosed herein. The system includes a sample module and a control module. The sample module is configured to generate a summarized value from process data of the ion implanter, and the process data correspond to a control parameter. The control module is configured to tune a control parameter, and the control module performs an ion implantation by releasing tools of the ion implanter in accordance with the control parameter when the summarized value meets a predetermined stability requirement.

Abstract: A sensor comprising a light component in support of a light source operable to direct a beam of light onto an imaging device having an image sensor, such as a CCD or CMOS or N-type metal-oxide-semiconductor (NMOS or Live MOS) sensor. The sensor can also comprise an imaging device positioned proximate to the light component and operable to receive the beam of light, and to convert this into an electric signal, wherein the light component and the imaging device are movable relative to one another, and wherein relative movement of the light component and the imaging device is determinable in multiple degrees of freedom. The sensor can also comprise a light deflecting module designed to deflect light from a light component onto the imaging device. The light sources and the resulting beams of light therefrom can comprise a number of different types, orientations, configurations to facilitate different measurable and determinable degrees of freedom by the sensor.

Abstract: Methods, devices and systems for targeted, maskless modification of material on or in a substrate using charged particle beams. Electrostatically-deflected charged particle beam columns can be targeted in direct dependence on the design layout database to perform direct and knock-on ion implantation, producing patterned material modifications with selected chemical and 3D-structural profiles. The number of required process steps is reduced, reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Local gas and photon injectors and detectors are local to corresponding individual columns, and support superior, highly-configurable process execution and control. Targeted implantation can be used to prepare the substrate for patterned blanket etch; patterned ALD can be used to prepare the substrate for patterned blanket deposition; neither process requiring photomasks or resist.

Abstract: Methods, devices and systems for targeted, maskless modification of material on or in a substrate using charged particle beams. Electrostatically-deflected charged particle beam columns can be targeted in direct dependence on the design layout database to perform direct and knock-on ion implantation, producing patterned material modifications with selected chemical and 3D-structural profiles. The number of required process steps is reduced, reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Local gas and photon injectors and detectors are local to corresponding individual columns, and support superior, highly-configurable process execution and control. Targeted implantation can be used to prepare the substrate for patterned blanket etch; patterned ALD can be used to prepare the substrate for patterned blanket deposition; neither process requiring photomasks or resist.

Abstract: In the present invention, a charged particle beam device has a charged particle source (1), a first condenser lens (4) arranged downstream from the charged particle source (1), an aperture (5) arranged downstream from the first condenser lens (4), and a second condenser lens (6) arranged downstream from the aperture (5), wherein, when a sample (12) is to be irradiated at a second charged particle beam amount which is greater than a first charged particle beam amount, the first and second condenser lenses are controlled such that a charged particle beam is formed downstream from the aperture (5), and such that the focal point of the second condenser lens does not vary between the first charged particle beam amount and the second charged particle beam amount.

Abstract: Reticle and methods for forming a device or reticle are presented. A reticle is provided with a device pattern and a first monitoring pattern. The first monitoring pattern includes a plurality of first test cells having a first test cell area and a first test pattern. The first test cells have different first pitch ratios to an anchor pitch and the first test pattern fills the first test cell area of a first test cell. A wafer with a resist layer is exposed with a lithographic system using the reticle. The resist is developed to form a patterned resist layer on the wafer and the wafer is processed using the patterned resist layer.

Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

Abstract: An exposure apparatus includes: a projection optical system; an adjusting unit configured to adjust imaging characteristics of the projection optical system; and a controller configured to divide the plurality of shot regions into groups based on data of a shift in the pattern of each shot region and an order of the exposure, determine setting amounts of the imaging characteristics for each group, and control the adjusting unit to set the imaging characteristics to the setting amounts for each group. The setting amount is common to a plurality of shot regions in the group and varies among the groups. The controller performs the division such that the shot regions belonging to the same group have a sequential exposure order and all values of the shift in the shot regions belonging to the same group fall within a predetermined range.

Abstract: Methods are provided for bonding substrates together using alignment structures and solder reflow techniques which achieve self-alignment in three dimensions, as well as semiconductor structures that are formed using such methods. A first alignment structure is formed on a bonding surface of a first substrate, which includes an alignment trench formed in the bonding surface of the first substrate. A second alignment structure is formed on a bonding surface of a second substrate, which includes a bonding pad with solder formed on the bonding pad. The first and second substrates are placed together with the solder of the second alignment structure in contact with the first alignment structure. A solder reflow process causes the solder to melt and flow into the alignment trench while pulling on the bonding pad to cause the second substrate to move into alignment with the first substrate in each of X, Y, and Z directions.

Abstract: A collimation system for a medical apparatus includes a collimation component having a laser emitting device, at least one photographing device, and a computing device. The laser emitting device is configured to the emit a laser beam to irradiate on a landmark on a body surface of a patient, the at least one photographing device is configured to take a photograph of a laser irradiation spot, and the computing device is configured to obtain a position of the laser irradiation spot by performing computation on images obtained by the at least one photographing device. The system further includes a moving component provided on the medical apparatus and configured to move to a target position for performing diagnosis or treatment. The medical apparatus automatically is configured to locate the moving component based on the position of the irradiation spot obtained from the computation.

Abstract: Disclosed is an apparatus and a method for diagnosing lesions. More specifically, the present invention relates to an apparatus and a method for diagnosing lesions capable of precisely diagnosing lesions such as breast cancer by digital breast tomosynthesis (DBT). The present invention enables the improvement of lesion diagnosis accuracy and early diagnosis rates.

Abstract: A method of measuring beam positions of multi charged particle beams includes acquiring a number of multi charged particle beams needed for the measurement reproducibility of a current amount to be within the range of an allowable value. The method further includes setting measurement points depending on a desired dimensional accuracy value in an irradiation region irradiated by the whole of the multi charged particle beams, and setting, for each of a plurality of measurement points, a beam region, including a measurement point of measurement points irradiated by a plurality of beams whose number is the number of beams needed for the measurement reproducibility in the multi charged particle beams. Further, the method includes measuring, for each of a plurality of measurement points, the position of a measurement point concerned in a plurality of measurement points by using a plurality of beams of a corresponding beam region.

Abstract: The invention relates to a system (100) for automating adjustment or adaptation of devices (141-143) such as light, computer programs and positioning of devices used during patient examination. The patient examination is performed by use of a scanner system where the patient is lying on a bed (102) which can be moved into a scanner zone of the scanner where the scanning can be performed and away from the scanner zone. The automated control is achieved by detecting the position of the bed and using the detected position for adjusting or adapting the state, i.e. the function or working of one or more devices (141-143).

Abstract: Multiple reference fiducials are formed on a sample on a sample for charged particle beam facilities processing of the sample. As one fiducial is degraded by the charged particle beam, a second fiducial is used to create one or more additional fiducials.

Abstract: The present invention relates to photoinduced alignment apparatus, comprising a plurality of supporting bases used to support substrates; an exposure device exposing the substrates on the supporting base; a driving mechanism driving the exposure device to move, so that the exposure device passes through the substrates on the plurality of the supporting bases, successively; and a loading and unloading device used to load and unload a substrate on a supporting base beyond the irradiation range of the exposure device.

Abstract: A marking machine for sections of vessels, including: a marking device and a gantry. The gantry includes rail wheels, horizontal beams, and upright columns. The horizontal beams include an upper beam, middle beams, and lower beams. The marking device is disposed on the upper beam of the gantry. The marking device includes a trolley and a marking arm. The trolley hangs on the upper beam. The marking arm includes a plumbing arm, a swing arm, a first universal joint, a second universal joint, a first Z-shaped steering knuckle, a second Z-shaped steering knuckle, a telescopic arm, and a penholder. The plumbing arm is fixedly connected to the lower part of the trolley. The first universal joint is disposed on the plumbing arm. The first Z-shaped steering knuckle is connected to the first universal joint.

Abstract: A machining fixture contains: a base, a plurality of positioning blocks, and a workpiece holder. The base includes a first connecting face on which plural fixing slots are arranged, and each fixing slot has a threaded hole. Each positioning block includes an affix portion and a fixation portion having two symmetrical contacting faces and two flexible portions. Each positioning block further includes a mounting hole or blind aperture defined on a middle section thereof and passing through the affix portion from the fixation portion. A screw bolt is screwed with the threaded hole of each fixing slot via the a mounting hole or blind aperture, and the affix portion of each positioning block enters into and contacts with each fixing slot of the base. The workpiece holder includes a second connecting face on which plural locating slots are arranged.

Abstract: A vibration control apparatus is provided that controls the vibration of a first object supported by a base, the apparatus including: a first control system including a first compensator for outputting a first operation signal representing an input to a first driving unit based on a first detection signal output by a first detector; a second control system including a second compensator for outputting a second operation signal representing an input to a second driving unit based on a second detection signal output by a second detector; and a third control system including a third compensator for outputting a third operation signal representing an input to the first driving unit based on a signal relating to the second control system so as to compensate the vibration of the base.