Abstract: A method is provided in one example embodiment and includes communicating content to a content receiver, where a first portion of the content has a first drop priority. The method also includes determining a buffer status for a buffer at the content receiver, and adjusting the first drop priority to a second drop priority for a second portion of the content based on the buffer status. In more particular embodiments, the second drop priority can be higher than the first drop priority of the first portion of the content if the buffer is full or above a threshold. Also, the second drop priority can be lower than the first drop priority of the first portion of the content if content in the buffer has not started to render.

Abstract: An exposure apparatus which transfers a pattern formed on a mask onto a photosensitive substrate placed in proximity to the mask, the apparatus including an illumination optical device which illuminates the mask with an energy beam, a mask holding device which holds a periphery area of a pattern area of the mask from above, and makes a force at least within a plane parallel to a predetermined plane act on the mask and a substrate holding device which moves along the predetermined plane holding the substrate.

Abstract: A control system that includes deflection sensors which can control clamping forces applied by electrostatic chucks, and related methods are disclosed. By using a sensor to determine a deflection of a workpiece supported by an electrostatic chuck, a control system may use the deflection measured to control a clamping force applied to the workpiece by the electrostatic chuck. The control system applies a clamping voltage to the electrostatic chuck so that the clamping force reaches and maintains a target clamping force. In this manner, the clamping force may secure the workpiece to the electrostatic chuck to enable manufacturing operations to be performed while preventing workpiece damage resulting from unnecessary higher values of the clamping force.

Abstract: System and method to align a substrate under a shadow mask. A substrate holder has alignment mechanism, such as rollers, that is made to abut against an alignment straight edge. The substrate is then aligned with respect to the straight edge and is chucked to the substrate holder. The substrate holder is then transported into a vacuum processing chamber, wherein it is made to abut against a mask straight edge to which the shadow mask is attached and aligned to. Since the substrate was aligned to an alignment straight edge, and since the mask is aligned to the mask straight edge that is precisely aligned to the alignment straight edge, the substrate is perfectly aligned to the mask.

Abstract: A method for testing a plurality of pressure sensors on a device wafer includes placing a diaphragm of one of the pressure sensors on the device wafer in proximity to a nozzle of a test system. A pneumatic pressure stimulus is applied to the diaphragm via an outlet of the nozzle and a cavity pressure is measured within a cavity associated with the pressure sensor in response to application of the pneumatic pressure stimulus. The pneumatic pressure stimulus within the cavity corresponds to the pressure applied to the diaphragm. Methodology is executed to test the strength and/or stiffness of the diaphragm. Additionally, the methodology and test system can be utilized to determine an individual calibration factor for each pressure sensor on the device wafer.

Abstract: A method for measuring and calibrating a centroid of a coarse stage of a photolithography tool by means of measuring an offset of the centroid relative to a midpoint of the coarse stage is disclosed.

Abstract: A system for performing sample probing. The system including an topography microscope configured to receive three-dimensional coordinates for a sample based on at least three fiducial marks; receive the sample mounted in a holder; and navigate to at least a location on the sample based on the at least three fiducial marks and the three-dimensional coordinates.

Abstract: According to one aspect, a sparse optical system is provided. The sparse optical system includes optical segments, an optical source module to generate beams of light, a collimating module to direct the beams of light towards two adjacent optical segments, a detector to receive a reflection of the beams of light from the optical segments, and a processor. The processor instructs the optical source module to generate a first beam of light, determines a first measurement of an alignment of the two adjacent segments based on the reflection of the first beam, adjusts a position of an optical segment based on the first measurement, instructs the optical source module to generate a second beam of light, and determines a second measurement of the alignment of the two segments based on the reflection of the second beam.

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use patterns generated using the Hadamard transform as alignment and registration marks (Hadamard targets) for multiple-column charged particle beam lithography and inspection tools. Further, superior substrate alignment and layer-to-layer pattern registration accuracy can be achieved using Hadamard targets patterned in edge-proximal portions of the substrate that are typically stripped bare of resist prior to lithography, in addition to Hadamard targets patterned in inner substrate portions. High-order Hadamard targets can also be patterned and imaged to obtain superior column performance metrics for applications such as super-rapid beam calibration DOE, column matching, and column performance tracking. Superior alignment and registration, and column parameter optimization, allow significant yield gains.

Abstract: An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention, a scanning electron microscope including a deflector which deflects a scanning position of an electron beam, and a sample stage for loading a sample thereon, is proposed. The scanning electron microscope includes a control device which controls the deflector or the sample stage in such a way that before scanning a beam on a measurement target pattern, a lower layer pattern situated in a lower layer of the measurement target pattern undergoes beam irradiation on another pattern situated in the lower layer.

Abstract: Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.

Abstract: Inspection equipment frequency transforms a mirror electron image with respect to position coordinates, calculates a value of a frequency plane origin or a value at a vicinity of the frequency plane origin as a first measurement value, and calculates a second measurement value by totalizing values of image intensities in a certain area, the image intensities having been obtained through normalization by the origin value or origin-vicinity value and the frequency transform. The inspection equipment automatically controls the voltage of a wafer holder based on the first and second measurement values.

Abstract: The technology disclosed relates to methods and systems that can be used to reduce visible artifacts know as mura. In particular, it relates to producing alignment marks by physically modifying appearance of a layer of exposure or radiation sensitive material on a workpiece, then using those alignment marks or transferred direct or inverted images of those marks to realign a writing coordinate system between exposure writing passes, following physical movement of the workpiece within the writing system. The physical modifications described include mechanically pressing a mark into the layer, using a laser to ash or ablate the layer, or applying an ink or other substance to the surface of the laser.

Abstract: A sputtering apparatus comprises a chamber configured to contain at least one sputter target and at least one substrate to be coated. The chamber has at least one adjustable shielding member defining an adjustable aperture. The member is positioned between the at least one sputter target and the at least one substrate. The aperture is adjustable in at least one of the group consisting of area and shape.

Abstract: A measurement jig is attached to a target member in a form of a blade edge and is used for measuring a position of the target point in combination with a total station. The measurement jig includes a prism mirror that reflects a projected light from the total station, and an attachment member for attaching the prism mirror to the blade edge, in which a mirror center of the prism mirror is aligned with the target point.

Abstract: Systems and methods for assisting in coupling a vehicle and a trailer include at least one sensing device disposed on the vehicle. A first coupling is coupled the vehicle and a second coupling is coupled to the trailer. A controller in communication with the at least one sensing device is configured to identify a spatial location of the first coupling. The controller is also configured to determine a spatial location of the second coupling using data from the at least one sensing device. The controller may also calculate a path between the spatial location of the first coupling and the spatial location of the second coupling and convey the path for facilitating movement of the first coupling toward the second coupling.

Abstract: When an energy of a particle beam to be emitted from an accelerator is set for every slice group including two or more adjacent slices and an attenuation amount is set for each slice in the slice group, the energy to be emitted from the accelerator is set, for every slice group, higher than an energy corresponding to the slice at a deepest location in that slice group so that a transmissive plate has a predetermined thickness for the slice at the deepest location; and, with respect to a thickness of the transmissive plate to be set for every slice group, the thickness set for the slice group at a deep location is larger than or equal to the thickness set for the slice group at a shallow location, and the thickness set for the slice group at a deepest location is thicker than the thickness set for the slice group at a shallowest location.

Abstract: The invention relates to a trailer coupling for motor vehicles, comprising a coupling ball carrier which can be mounted on a vehicle body and a coupling ball with a ball body which has a ball surface extending between a ball attachment and an upper end surface of the ball body, with which the ball surface comprises a sensor zone for recognizing a body located close to or on the coupling ball, several detection locations different from one another are located in the sensor zone, a sensor unit arranged stationarily in the ball body beneath the ball surface is associated with each detection location and each sensor unit is designed such that it detects a body present in a close-proximity area above the ball surface at the respective detection location.

Abstract: A nanoporous polymeric membrane is obtained by bombing a polymer film by means of high energy focused heavy ion beams and subsequently performing chemical etching to remove the portions of the polymer film in the zones degraded by the ion bombing, in such a manner to obtain pores passing through the polymer film. The heavy ion bombing is performed after interposing between the source of ions and the polymer film, adjacent to the film, an amplitude mask having an ordered arrangement of nanopores and having sufficient thickness to prevent the passage of the heavy ions that are not directed through the pores of said amplitude mask, in such a manner to obtain in the polymer fill an ordered arrangement of nanopores having an aspect-ratio at least exceeding 10 and preferably exceeding 100.

Abstract: A cross-section processing observation apparatus includes an ion beam control unit which controls a charged particle beam generation-focusing portion and a deflector, and a DAC which converts an input digital signal into an analog signal which is to be input to the deflector. A field-of-view setting portion sets a value of a field of view of a charged particle beam where the scanning performed by the deflector is performed on the basis of a set value of a slice amount, and the field-of-view setting portion is configured to set a value of one-nth of the slice amount, where n is a first natural number, as an input digital value “1” of the digital/analog converter and to set a value obtained by multiplying said value set as the input digital value “1” by a second natural number as a value of the field of view.

Abstract: The invention is directed to a laser adjustment device, a laser adjustment system and a laser adjustment method for an infrared thermometer. The laser adjustment device of the present invention includes a first adjustment seat and a second adjustment seat. The first adjustment seat includes a base, a fixing portion, a first adjustment portion, a second adjustment portion, and a first pivot portion. The second adjustment seat includes a connecting portion, a receiving portion and a second pivot portion. The first adjustment seat is pivoted about the first pivoting portion via the first adjustment portion, a first elastic member, and a first adjustment member. The second adjustment seat is pivoted about the second pivot portion via the second adjustment portion, a second elastic member, and a second adjustment member.

Abstract: A linear motor including a stator including electrical coils; a runner including permanent magnets; and a back iron device, wherein the runner is arranged between the stator and the back iron device and offset from the stator and the back iron device, wherein the runner is moveable relative to the stator and the back iron device; wherein the permanent magnets are arranged in a section of the runner which section is provided between the stator and the back iron device, wherein the runner is gas supported relative to the stator and/or relative to the back iron device through a gas pressure bearing, wherein the runner is provided with inner channels which are in fluid connection with a pressurized gas supply device and wherein the gas outlet nozzles are in fluid connection with an interior of the channels, wherein the gas pressure bearing includes at least a first bearing surface.

Abstract: Methods and systems for detection of selected defects in relatively noisy inspection data are provided. One method includes applying a spatial filter algorithm to inspection data acquired across an area on a substrate to determine a first portion of the inspection data that has a higher probability of being a selected type of defect than a second portion of the inspection data. The selected type of defect includes a non-point defect. The inspection data is generated by combining two or more raw inspection data corresponding to substantially the same locations on the substrate. The method also includes generating a two-dimensional map illustrating the first portion of the inspection data. The method further includes searching the two-dimensional map for an event that has spatial characteristics that approximately match spatial characteristics of the selected type of defect and determining if the event corresponds to a defect having the selected type.

Abstract: The present invention provides a defect detection apparatus for detecting a defect even on a uniformly continuous background pattern, a method used in the apparatus, and a computer program for making a computer execute processing in the method. A defect size is set and stored, and an instruction to a first direction in which a background pattern is uniformly continuous is accepted. A reduced image reduced in the first direction using an image reduction ratio according to the defect size is generated. A filter processing is executed in the first direction for removing a defect, and the reduced image that is subjected to the filter processing is enlarged in the first direction with an image enlargement ratio corresponding to the reciprocal of the reduction ratio to generate a first enlarged image. A difference image is generated by calculating a difference between the multi-valued image and the first enlarged image.

Abstract: A reflector for use in a reflex mode detection device, said reflector being positioned in alignment with a detector and including a reflective region for reflecting a light beam to send the light beam back towards the detector, a signalling interface configured to indicate a state of alignment of the reflective region of the reflector with respect to an emitter, a detector configured to detect the presence of the light beam against the reflector, interpretation circuitry configured to control the signalling interface to indicate the state of alignment, and a power supply having autonomous electric power and configured to supply electric power to the signalling interface and the interpretation circuitry.

Abstract: An electron beam exposure apparatus includes an electron beam source, a stage, and an error detection device. The electron beam source radiates a first electron beam corresponding to first input data and a second electron beam corresponding to second input data. The stage includes a mask on which the first electron beam is radiated. The stage may be configured to move the mask. The error detection device detects an error of the second electron beam and outputs error detection information.

Abstract: A device for aligning a first surface of a first substrate with a second surface of a second substrate as the first and the second surfaces move toward each other across a gap. The device is comprised of: a first retaining system for retaining the first substrate on a first retaining surface; a second retaining system for retaining the second substrate on a second retaining surface; approach means for causing the first surface to approach the second surface in one direction of translation (T) toward an end position; and means for reducing a wedge error between the first and second surfaces during the approach of the first surface to the second surface including an in situ measurement during the approach of the substrates.

Abstract: A multi charged particle beam writing apparatus includes a dose calculation unit to calculate a first dose resolving the resist of the target object, for a first beam of the multiple beams, corresponding to a pattern forming region, in which a pattern is arranged, and to calculate a second dose not resolving the resist, for a second beam of the multiple beams, corresponding to a no-pattern forming region, which surrounds the whole perimeter of the pattern and in which no pattern is arranged, and a deflection control unit to control a plural blankers so that a dose of the first beam is to be the first dose calculated and a dose of the second beam is to be the second dose calculated.

Abstract: Wireless communication apparatus (WAP) which comprises means of receiving data streams such as Access Stratum User Plane (AS UP), Access Stratum Control Plane (AS CP), and Non-Access Stratum Control Plane (NAS CP), each at least partly requiring a cryptographic processing operation, a cryptographic module comprising a cryptoprocessor, and management means configured to deliver at least some of the data streams to the crypto-processor according to an order of priority defined from the data types and cryptographic processing types assigned to each data stream.

Abstract: An electron beam drift detection device and a method for detecting electron beam drift are provided in which the method includes placing a predetermined characteristic identification pattern on a surface of a workpiece; emitting an electron beam, and focusing and deflecting the electron beam such that the focused and deflected electron beam scans the surface of the workpiece and the characteristic identification pattern; detecting backscattered electrons and secondary electrons; and receiving detection signals and performing an image process on the detection signals to obtain an electronic image of the characteristic identification pattern, and measuring a drift degree by comparing the electronic image with the predetermined shape of the characteristic identification pattern.

Abstract: Treatment planning methods are provided that determine the variability of relative biological effectiveness (RBE) along a beam line and calculate, among other things, what intensity of hadron beam such as a proton or a carbon ion beam should be applied to achieve a desired biological dose at treatment site of a patient afflicted with a medical condition. Typically, three or four RBE values at three or four corresponding spacially-dispersed intervals along the beam line are calculated. In one embodiment, two RBE values for the spread-out Bragg peak (SOBP) region of the treatment site; one for the proximal section and one for the declining distal section is calculated. A third and different RBE value may be determined for the distal edge region of the SOBP. A fourth value may also be calculated for a pre-SOBP region.

Abstract: Apparatus for performing electron radiation therapy on a breast cancer patient preferably includes an intraoperative electron radiation therapy machine, an intraoperative electron radiation therapy collimator tube connected to the intraoperative electron radiation therapy machine, and a plurality of filters made of a material having substantially the same density as human breast tissue for placement between the machine and the patient to change the energy of a monoenergetic beam after the beam has left the machine, allowing a filter to be chosen to reduce the energy traveling through the tube to a desired amount of energy to treat the patient.

Abstract: The invention relates to a device (10; 10a;10b; 10c; 50) for checking pharmaceutical products (1), in particular hard gelatin capsules, by means of at least one radiation source (30; 60) preferably embodied as an X-ray source, and a conveying device which conveys the products (1) in a clocked manner in a radiation area (31) of the radiation source (30; 60). The radiation emitted by the radiation source (30; 60) penetrating the products (1) preferably perpendicular to the longitudinal axes thereof (2), and the radiation is captured on the side of the products (1) opposite the radiation source (30) by means of at least one sensor element (35) which is coupled to an evaluation device (36). The invention is characterized in that the conveyor device is embodied as a conveyor wheel (15; 15a; 51) which can rotate in a stepped manner about an axis (12; 52), and the products (1) are arranged, while being conveyed in the radiation area (31), in receiving areas (28; 37; 56) of the conveyor wheel (15; 5a; 51).

Abstract: The invention relates to a method for determining a distance between charged particle beamlets in a multi-beamlet exposure apparatus. The apparatus is provided with a sensor comprising a converter element for converting charged particle energy into light and a light sensitive detector provided with a two-dimensional pattern of beamlet blocking and non-blocking regions. The method comprises scanning a first beamlet over the pattern, receiving light generated by the converter element, and converting the received light into a first signal. Then the two-dimensional pattern and the first beamlet are moved relatively with respect to each other over a predetermined distance. Subsequently, the method comprises scanning a second beamlet over the pattern, receiving light generated by the converter element, and converting the received light into a second signal. Finally, the distance between the first beamlet and second beamlet is determined based on the first signal, the second signal and the predetermined distance.

Abstract: Disclosed are an apparatus, system, and method for scanning a substrate or other workpiece through a gas-cluster ion beam (GCIB), or any other type of ion beam. The workpiece scanning apparatus is configured to receive and hold a substrate for irradiation by the GCIB and to scan it through the GCIB in two directions using two movements: a reciprocating fast-scan movement, and a slow-scan movement. The slow-scan movement is actuated using a servo motor and a belt drive system, the belt drive system being configured to reduce the failure rate of the workpiece scanning apparatus. The apparatus further includes shields and other features for reducing process contamination resulting from scattering of the GCIB from the scanning apparatus.

Abstract: Disclosed are methods and systems for guiding emissions to a target. The methods and systems utilize, in part, Markerless Tracking software to detect a beam of energy, such as a laser, toward a target such as a tissue that is the subject of a medical procedure.

Abstract: An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (<100 nm thick) TEM lamellae. A novel sample structure and a novel use of a milling pattern allow the creation of S/TEM samples as thin as 50 nm without significant bowing or warping. Preferred embodiments of the present invention provide methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis.

Abstract: A patient alignment system for a radiation therapy system. The alignment system includes multiple external measurement devices which obtain position measurements of components of the radiation therapy system which are movable and/or are subject to flex or other positional variations. The alignment system employs the external measurements to provide corrective positioning feedback to more precisely register the patient and align them with a radiation beam. The alignment system can be provided as an integral part of a radiation therapy system or can be added as an upgrade to existing radiation therapy systems.

Abstract: The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.

Abstract: A reticle including exposure monitoring keys. The reticle includes an exposure region that is to be exposed to light during an exposure process, and a non-exposure region surrounding the exposure region and not to be exposed to the light. The exposure monitoring keys are disposed across a boundary between the exposure region and the non-exposure region.

Abstract: A method and apparatus for aligning a laser beam coincident with a charged particle beam. The invention described provides a method for aligning the laser beam through the center of an objective lens and ultimately targeting the eucentric point of a multi-beam system. The apparatus takes advantage of components of the laser beam alignment system being positioned within and outside of the vacuum chamber of the charged particle system.

Abstract: A radiation therapy device controller identifies a pixel on a straight line connecting a ray source and a sensor array, and calculates a luminance update amount candidate value for each identified pixel based on a ratio of a change amount for the pixel on the straight line indicating the living body to a sum of change amounts from a luminance value of a pixel corresponding to a correlated computed tomography image correlated with a computed tomography image of an update target of a luminance value of the identified pixel. Also, the control device calculates a luminance update amount of each identified pixel using the luminance update amount candidate value of each identified pixel calculated for a plurality of rotation angles, and updates the luminance value of each corresponding pixel of the computed tomography image of the update target using the luminance update amount of each identified pixel.

Abstract: The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.

Abstract: The present invention relates to devices with which, for example, narrow surfaces of preferably plate-like workpieces can be provided with a coating material. The device includes a laser for outputting a lease beam to a lase bean emitter, wherein the laser beam is directed onto the coating material or onto the workpiece in such a manner that the laser beam forms a plane of reference with solder on the surface of the coating material or the workpiece.

Abstract: The invention relates to a charged particle system provided with a support and positioning structure for supporting and positioning a target on a table, the support and positioning structure comprising a first member and a second member and at least one motor so as to move the first member relative to the second member, wherein a shield is present to shield at least one charged particle beam from electromagnetic fields generated by said at least one motor, the support and positioning structure further comprising a spring mechanically coupling the first member and the second member for at least partially bearing the weight of the first member, table and target.

Abstract: An X-ray facility has at least one x-ray emitter, an x-ray detector and an isocenter arranged along a central beam path between the x-ray emitter and the x-ray detector. The x-ray emitter and the x-ray detector are arranged on separate support arms. At least one rotary device is provided on each support arm, by way of which the x-ray emitter or the x-ray detector can be rotated about an axis of rotation intersecting the isocenter and not corresponding to the central beam. Wherein the axes of rotation match rotary devices assigned to one another on different support arms.

Abstract: A particle beam therapy system comprising a treatment table, a treatment table control unit and an irradiation control unit configured to output an instruction for controlling the treatment table control unit, an accelerator and a scanning electromagnet, wherein after the treatment table control unit controls the treatment table so as for a patient isocenter which is reference position of an affected area of a patient to move to a position of an irradiation isocenter which is set at a position which is closer to an irradiation nozzle than an equipment isocenter which is reference of positional relation of the irradiation nozzle and the treatment table, the irradiation control unit outputs an instruction for irradiating the patient with a particle beam.

Abstract: A particle beam system includes a charged particle beam source, a beam blanking module connectable to a data network, a focusing lens, a first beam deflection module connectable to the data network, a calculation module configured to determine a deflection time; and an encoding module.

Abstract: A scanning transmission electron microscope for imaging a specimen includes an electron beam source to generate an electron beam. Beam optics are provided to converge the electron beam. A stage is provided to hold a specimen in the path of the electron beam. A beam scanner scans the electron beam across the specimen. A controller may define one or more scanning areas corresponding to locations of the specimen, and control one or more of the beam scanner and stage to selectively scan the electron beam in the scanning areas. A detector is provided to detect electrons transmitted through the specimen to generate an image. The controller may generate a sub-image for each of the scanning areas, and stitch together the sub-images for the scanning areas to generate a stitched-together image. The controller may also analyze the stitched-together image to determine information regarding the specimen.

Abstract: A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement device measures the position of the position measurement mark formed on the lower surface of a lower lid, thereby measuring the position of the lower lid. The relative displacement of the reticle and lower lid is known when the position of the reticle and the position of the lower lid are known. Therefore, when the lower lid having the reticle loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid is determined by taking this displacement into account. As a result, the reticle can be correctly set in the exposure device.