Abstract: A semiconductor chip includes a logic circuit unit, at least one memory macro unit having a redundant memory cell which recovers a defect cell, electrode pad rows being arranged around the outside of the logic circuit unit and the memory macro unit, and the least one fuse unit group storing addresses of the defect cell and being arranged in a region along any edge of the semiconductor chip, and on the outside of the logic circuit unit, the memory macro unit and the electrode pad rows. Here, the logic circuit unit, the memory macro unit, the electrode pad rows and the fuse unit group are positioned on a semiconductor chip surface.

Abstract: A semiconductor device with laser-programmable fuses for repairing a memory defect found after production, in which guard rings and fuse patterns are designed to take up less chip space. The semiconductor device has a fuse pattern running parallel to the longitudinal axis of a rectangular guard ring, and patterns branching from the fuse pattern and drawn out of the guard ring in the direction perpendicular to that axis. The semiconductor device also has a plurality of memory cell arrays, each coupled to an I/O port for receiving and sending memory signals. One of those arrays is reserved as a redundant memory cell array for repair purposes. The device further has switch circuits for switching the connection between the I/O ports and memory cell arrays, selecting either default memory cell arrays of the I/O ports or their adjacent memory cell arrays, including the redundant memory cell array.

Abstract: An object of the present invention is to provide a semiconductor device including a fuse that can easily be blown by a laser beam and free from a problem of oxidation proceeding from a laser-beam blown portion. In order to accomplish this object, a semiconductor device formed on a substrate includes an interconnection line formed on the substrate and provided to structure a prescribed circuit and a fuse that is incorporated into the interconnection line and can be blown by a laser beam. The fuse and a connection portion electrically connected to the fuse at the interconnection line are formed from different metal materials.

Abstract: An integrated circuit package includes at least one one-time programmable element, such as a fuse, having a first and a second end separated by a programmable link. The first end of the one-time programmable element is coupled to a power supply voltage node in the package. The second end of the programmable element may be coupled to an external package connection (e.g., a package pin) and/or to an internal package node that connects to an input terminal of the integrated circuit die when the integrated circuit die is mounted in the package. The information programmed by the fuses may relate to speed or voltage ratings for a microprocessor.

Abstract: In a semiconductor device, an active region is formed in a semiconductor substrate separated by a plurality of isolation regions. A plurality of surface insulating films of different thickness are formed separately on the active region. A plurality of conductive films are formed on the respective insulating films. Then, one of the surface insulating film having smaller thickness is caused to break down to work as an electric fuse.

Abstract: Embodiments of the invention provide thermally actuatable switches and selectively configurable circuit boards which may employ such switches. A circuit board of one embodiment includes a substrate having board leads and a plurality of electrical connectors arranged adjacent a component site. Selectively configurable circuitry may be carried by the substrate and adapted to selectively couple selected ones of the electrical connectors to selected ones of the board leads. One or more trace may be associated with each of the electrical connectors and one or more of these traces may include a thermally actuatable switch that can be selectively closed. The thermally actuatable switch may comprise a gap between two conductive lengths of the conductive trace, an exposed switch surface, and a thermally responsive member that may wet the exposed switch surface when selectively heated above an activation temperature.

Abstract: A semiconductor device having at least one fuse and an alignment mark formed therein. An etch resistant layer over the surface of the fuse and alignment mark, which provides a uniform passivation thickness for use in conjunction with laser fuse deletion processes.

Abstract: A configuration of fuses in a semiconductor structure having Cu metallization planes is provided. The semiconductor structure has an Al metal layer on the topmost interconnect plane for providing Al bonding pads. The fuses are configured as Al fuses and, in the semiconductor structure having Cu metallization planes, are provided above the diffusion barrier of the topmost Cu metallization plane but below a passivation layer.

Abstract: A repair fuse element and method of construction are disclosed that eliminate or substantially reduce the disadvantages and problems associated with prior fuse elements. In one embodiment, the fuse element is constructed with a rectangular-shaped contact. The contact is made long enough so that it makes contact at each end with a metal layer, but design rule spacing is still maintained between the connections with the metal layer. The overlapping areas between the rectangular contact and the metal layers are asymmetrical. Alternatively, these overlapping areas are smaller than the design rule overlap requirements. In a second embodiment, a fuse element is constructed with a plurality of rectangular-shaped contacts. As a result, a current value that is significantly lower than conventional fuse current values, can be used to melt such a contact or blow the fuse.

Abstract: An integrated fuse has regions of different doping located within a fuse neck. The integrated fuse includes a polysilicon layer and a silicide layer. The polysilicon layer includes first and second regions having different types of dopants. In one example, the first region has an N-type dopant and the second region has a P-type dopant. The polysilicon layer can also include a third region in between the first and second regions, which also has a different dopant. During a fusing event, a distribution of temperature peaks around the regions of different dopants. By locating regions of different dopants within the fuse neck, agglomeration of the silicide layer starts reliably within the fuse neck (for example, at or near the center of the fuse neck) and proceeds toward the contact regions. An improved post fuse resistance distribution and an increased minimum resistance value in the post fuse resistance distribution is realized compared to conventional polysilicon fuses.

Abstract: A programmable element that has a first diode having an electrode and a first insulator disposed between the substrate and said electrode of said first device, said first insulator having a first value of a given characteristic, and an FET having an electrode and a second insulator disposed between the substrate and said electrode of said second device, said second insulator having a second value of said given characteristic that is different from said first value. The electrodes of the diode and the FET are coupled to one another, and a source of programming energy is coupled to the diode to cause it to permanently decrease in resistivity when programmed. The programmed state of the diode is indicated by a current in the FET, which is read by a sense latch. Thus a small resistance change in the diode translates to a large signal gain/change in the latch. This allows the diode to be programmed at lower voltages.

Abstract: A fuse structure and method for fabricating same are disclosed. The fuse structure is designed for opening by conventional laser energy application. The fuse structure is characterized by an absence of high stress areas in the surrounding substrate thereby resulting in higher fabrication yields due to lower occurrence of substrate fracturing or other damage occasioned by the opening of the fuse.

Abstract: A method and structure for a fuse structure comprises an insulator layer, a plurality of fuse electrodes extending through the insulator layer to an underlying wiring layer, an electroplated fuse element connected to the electrodes, and an interface wall. The fuse element is positioned external to the insulator, with a gap juxtaposed between the insulator and the fuse element. The interface wall further comprises a first side wall, a second side wall, and an inner wall, wherein the inner wall is disposed within the gap. The fuse electrodes are diametrically opposed to one another, and the fuse element is perpendicularly disposed above the fuse electrodes. The fuse element is either electroplatted, electroless plated, or is an ultra thin fuse.

Abstract: An IC chip has externally and selectively cuttable members F1-F3, which can be cut, or cut open, at more than one cuttable points C1 and C2. So long as at least one of the multiple cuttable points C1 and C2 remains cut open, the cuttable member works as a cut member. Thus, a cut member has an exceedingly small probability that it is short-circuited by particles in an ACF or by dust.

Abstract: Disclosed is a technique capable of enhancing the degree of freedom in the layout of a rerouting layer in a wafer level CSP in which defect repairing is performed by cutting a fuse. More specifically, after the defect repairing is performed by irradiating a laser beam to a fuse, an organic passivation layer (photo-sensitive polyimide layer) is filled in a fuse opening. Thereafter, a rerouting layer, a bump land, an uppermost wiring layer, and a solder bump are formed on the organic passivation layer. In the following steps of the defect repairing, the baking process to cure an elastomer layer and the uppermost protection layer is conducted at a temperature below 260° C. in order to prevent the variance of the refresh times of memory cells.

Abstract: An audio amplifier output stage layout technique achieves minimum cross coupling between audio amplifier channels. Regarding TDAA output stages, the typical TDAA includes two demodulation inductors per audio channel. The two pair of demodulation inductors associated with the TDAA are arranged to form an X-pattern to simultaneously minimize cross coupling between audio amplifier channels and reduce PCB layout size.

Abstract: A system to package high performance microelectronic devices, such as processors, responds to component transients. In one embodiment, the system includes a decoupling capacitor that is disposed between a Vcc electrical bump and a Vss electrical bump. The decoupling capacitor has Vcc and Vss terminals. The Vcc and Vss terminals share electrical pads with the Vcc electrical bump and the Vss electrical bump. A simple current loop is created that improves the power delivery for the system.

Abstract: A semiconductor chip including a bump projecting from a surface protective film thereof and a surface interconnection having a smaller height than the bump. The surface interconnection may project from the surface protective film or may be flush with the surface protective film. The surface interconnection may be connected to the bump. The bump may include a peripheral bump configured as surrounding a device formation region of the chip. The peripheral bump may be connected to the ground or a power source.

Abstract: An electronic device having stacked modules and method for producing it are described. Each module has a chip. Each chip is mounted on a stack intermediate plane. The stack intermediate planes of a stack have identical layouts, while chip select circuits which can be set irreversibly via contact areas are disposed on the chips, which chip select circuits enable an irreversible assignment of the contact areas to the stack intermediate planes.

Abstract: An alloy type thermal fuse is provided in which, although a fuse element essentially comprising an In-Sn alloy is used, the operation stability to a heat cycle can be satisfactorily assured, and, even when the amount of In is large, a process of drawing to the fuse element at a high yield can be ensured, and which has an operating temperature belonging to the range of 120 to 150° C.

Abstract: The present invention describes an apparatus and method for fabrication of a precision circuit elements. In particular, the circuit elements are fabricated as part of an integrated circuit assembly. The processing of the circuit elements is such to provide a nominal circuit element value close in value to the desired value. Additional trim circuit elements are joined to the nominal circuit element through links. The links are fusible links or antifuses. By selectively blowing the fusible links or fusing the antifuses, trim circuit elements are added or subtracted to personalize the value of the nominal circuit element. A capacitor is used in an illustrative example.

Abstract: Integrated circuitry fuse forming methods, integrated circuitry programming methods, and related integrated circuitry are described. In one implementation, a first layer comprising a first conductive material is formed over a substrate. A second layer comprising a second conductive material different from the first conductive material is formed over the first layer and in conductive connection therewith. A fuse area is formed by removing at least a portion of one of the first and second layers. In a preferred aspect, an assembly of layers comprising one layer disposed intermediate two conductive layers is provided. At least a portion of the one layer is removed from between the two layers to provide a void therebetween. In another aspect, programming circuitry is provided over a substrate upon which the assembly of layers is provided.

Abstract: Multiple conductive paths are provided in a circuit portion between a circuit element and a logic block, enabling repairing of defects in the conductive line coupling the circuit element and logic blocks without the use of fusing.

Abstract: A bipolar p-i-n diode has a first (1) and second (5) region of opposite conductivity type and an intermediate drift region (3) between the first and second regions. Trenched field relief regions (14) are arranged to deplete the intermediate drift region (3) when the diode is reverse biased, so permitting a higher doping (12) to be used for the intermediate drift region (3) for a given breakdown voltage. This improves both the turn-on and turn-off characteristics of the diode.

Abstract: A ball grid array type semiconductor package includes a semiconductor chip formed with bonding pads, an elastomer bonded to the semiconductor chip, a flexible wiring substrate bonded to the elastomer and formed with wirings connected at one end of the bonding pads of the semiconductor chip, a solder resist formed on the main surface of the flexible wiring substrate and solder bump electrodes connected to the other ends of the wirings. The elastomer is bonded to the flexible wiring substrate on the side of the tape, the solder resist is formed on the side of the wirings, and the solder bump electrodes are connected with the wirings by way of through holes formed in the solder resist.

Abstract: A hexagonal conductor path layout for power and ground distribution planes in a multi-layer VLSI device. The invention reduces crosstalk between switching devices in signal nets by reducing impedance in the distribution planes. Impedance is reduced by providing more direct line current paths and providing maximum path change angles of less than ninety degrees. Reduced impedance causes reduced coupling between current flows which share a common path and hence less crosstalk.

Abstract: On a circuit-board intended for constant-wire-length (CWL) bonding, one or more special “test” pairs of bonding pads are provided along with, in each case, a series of markings adjacent the pads. In use, the board is populated with CWL bonds (this includes the normal circuit-related RF bond-pads as well as the test bond-pads) and the test bonds are distorted so that the bond-wires in question lie aligned against the markings. The alignment position relative to the markings indicates whether the bond-wires for the whole board are of correct or incorrect length. Measurement may be either absolute, in which case the markings are associated with a scale indication, or relative, in which case one of the markings will usually be visibly distinguished from the rest in some way. Depending on the length determination, the bond-forming device (e.g.

Abstract: The present invention relates to an alignment mark structure for laser fusing. An alignment mark structure is formed which is comprised of image elements that are placed on different film layers in a semiconductor device. Alignment is accomplished by examining the difference in reflected energy of a laser beam as the beam traverses the alignment mark structure. By forming the alignment mark structure such that it has elements on different film layers, the reflected energy can be modulated to avoid the situation in which no difference in reflected energy is found, which would make the alignment mark invisible to the laser fusing tool. A method of applying the alignment mark structure is also disclosed.

Abstract: A set (50) of one or more laser pulses (52) is employed to remove passivation layer (44) over a conductive link (22). The link (22) can subsequently be removed by a different process such as chemical etching. The duration of the set (50) is preferably shorter than 1,000 ns; and the pulse width of each laser pulse (52) within the set (50) is preferably within a range of about 0.05 ps to 30 ns. The set (50) can be treated as a single “pulse” by conventional laser positioning systems (62) to perform on-the-fly material removal without stopping whenever the laser system (60) fires a set (50) of laser pulses (52) at each target area (51). Conventional wavelengths in the IR range or their harmonics in the green or UV range can be employed.

Abstract: A fuse used for redundancy function in a semiconductor device includes a pair of fuse terminals formed as a common layer with top interconnect lines by using a damascene technique, and a fuse element made of refractive metal and bridging the fuse terminals. The fuse element is formed as a common layer with the protective cover films covering the interconnect lines.

Abstract: A gap conductor structure for an integrated electronic circuit that may function as an electronic fuse device or as a low capacitance inter level signal line is integrated as part of the semi-conductor chip wiring. The gap conducting structure includes one or more air gap regions of predefined volume that fully or partially exposes a length of interlevel conductor layer in an IC. Alternately, the air gap region may wholly located within the dielectric region below a corresponding conductor and separated by insulator. When functioning as a fuse, the gap region acts to reduce thermal conductivity away from the exposed portion of the conductor enabling generation of higher heat currents in the conducting line with lower applied voltages sufficient to melt a part of the conducting line. The presence of gaps, and hence, the fuses, are scalable and may be tailored to the capacity of currents they must carry with the characteristics of the fuses defined by a circuit designer.

Abstract: Methods and apparatus for burn-in of integrated circuit (IC) dies at the wafer level. In one embodiment, a wafer is fabricated having an array of dies formed thereon wherein the dies are separated by scribe areas. Surrounding each die is one or more ring conductors which are electrically coupled to various circuits on the die via die bond pads. The wafer further includes a series of conductive pads located in an inactive region of the wafer. Electrically connecting the conductive pads to the ring conductors is a series of redundant scribe conductors. During burn-in, a burn-in indicating apparatus located on each die monitors burn-in parameters such as elapsed burn-in time. The indicating apparatus further records the elapsed burn-in time (or other parameter). The indicating apparatus may be subsequently interrogated to verify the burn-in time.

Abstract: A multi-chip device which includes a plurality of integrated circuit die disposed one over another. Each integrated circuit die includes one or a plurality of bond pads. One or a plurality of conductors are disposed to electrically couple the bond pads of vertically adjacent integrated circuit die. Each conductor is designed, calculated, specified and/or predetermined to have a length so as to behave as a segment in a multi-drop transmission line. The multi-drop transmission line may be terminated at one end or utilized in a flow-through approach. In one embodiment, an integrated circuit die may be horizontally offset with respect to a vertically adjacent integrated circuit die to expose the periphery region. In another embodiment, each integrated circuit die may be stacked and aligned in a vertical column. In this embodiment, a spacer such as a thermally conductive spacer is disposed between each integrated circuit die in the stack.

Abstract: In a semiconductor device having a fuse and an etching stopper film covering the fuse, an optical window exposing the etching stopper film and a contact hole exposing a conductor pattern are formed simultaneously. By applying a dry etching process further to the etching stopper film, an insulation film covering the fuse is exposed in the optical window.

Abstract: The semiconductor device includes a semiconductor substrate, an insulating layer on the semiconductor substrate wherein a groove is patterned to a predetermined depth in an upper surface of the insulating layer, a fuse layer at sidewalls and on a bottom of the groove, and a wire connected electrically to the fuse layer.

Abstract: A configuration for a laser fuse bank is disclosed wherein the available space is more efficiently used. Fuses of graduated width and variable configuration are placed so as to minimize the average distance between fuses and maximize fuse density. Alternatively, a common source is added to a standard laser fuse structure such that it intersects the fuses and the number of available fuses is doubled.

Abstract: A fuse link redundancy structure to implement redundant circuits within an integrated circuit has an insulating layer over a conductive layer of the fuse link is sufficiently thin and transparent to allow destruction of the conductive layer by an intense laser light. The redundancy structure has a fusible link formed of a layer of a conductive material deposited upon an insulating layer such as field oxide on the semiconductor substrate and connected between the redundant circuits and other circuits present on the integrated circuit. The layer of conductive material is either formed of a metal such as Aluminum or Tungsten, a heavily doped polycrystalline silicon, or an alloy of a metal such as Tungsten and a heavily doped polycrystalline silicon. A hard mask layer is placed upon the layer of conductive material during transistor processing to protect the layer of conductive material during formation of self-aligned sources and drains of transistors of the integrated circuit.

Abstract: A BGA package and a method for fabricating the package are provided. The package includes a semiconductor die, internal conductors wire bonded to bond pads on the die, external ball contacts attached to ball bonding pads formed on the conductors in a dense grid pattern, and an encapsulating resin encapsulating the die and conductors. The package is fabricated using a lead frame having lead fingers that form the conductors. The die is back bonded to a polymer tape placed across the lead fingers, and then wire bonded to bonding pads on the conductors. In addition, the encapsulating resin is molded to include openings for the ball contacts which are aligned with the ball bonding pads. An alternate embodiment BGA package includes a polymer substrate adhesively bonded to a face of the die. The polymer substrate includes conductors having beam leads aligned with an opening through the polymer substrate. The opening provides access for a bonding tool for bonding bumps on the beam leads to bond pads on the die.

Abstract: A semiconductor device having an array of dummy interconnections in a fuse window are proposed. The each dummy interconnection comprised of a fuse body scheduled to be blown away by laser beam, a fuse wiring extended up to the bottom of the fuse body from one side of the fuse window, and another fuse wiring extended up to the bottom of the fuse body form the another side of the fuse window. Contact plugs are disposed on terminal portions of the fuse wirings respectively, the terminal portions facing to each other having a predetermined gap between them. The bottom surfaces of both terminal portions of the fuse body are electrically connected with the facing terminal portions of the fuse wirings through the contact plugs, respectively. The length of the fuse body is set so as to have a length not shorter than the predetermined gap and not exceeding a diameter of laser beam to blow off the fuse body.

Abstract: An integrated fuse has regions of different doping located within a fuse neck. The integrated fuse includes a polysilicon layer and a silicide layer. The polysilicon layer includes first and second regions having different types of dopants. In one example, the first region has an N-type dopant and the second region has a P-type dopant. The polysilicon layer can also include a third region in between the first and second regions, which also has a different dopant. During a fusing event, a distribution of temperature peaks around the regions of different dopants. By locating regions of different dopants within the fuse neck, agglomeration of the silicide layer starts reliably within the fuse neck (for example, at or near the center of the fuse neck) and proceeds toward the contact regions. An improved post fuse resistance distribution and an increased minimum resistance value in the post fuse resistance distribution is realized compared to conventional polysilicon fuses.

Abstract: A semiconductor fuse is positioned between conductors for connecting wiring lines. The fuse comprises spacers positioned on adjacent ones of the conductors, and a fuse element positioned between the spacers and connected to the wiring lines. A space between the conductors comprises a first width comprising a smallest possible photolithographic width and the fuse element has a second width smaller than the first width.

Abstract: An integrated circuit has primary devices and redundant devices being selective substituted for the primary devices through at least one fuse. The fuse includes a first layer having at least one fuse link region, a second layer over the first layer and cavities in the second layer above the fuse link region.

Abstract: A severable horizontal portion of a fuse link is formed relative to a vertically configured structure in an IC to promote separation of the severable portion upon applying energy from a laser beam. The vertically configured structure may be a reduced vertical thickness of the severable portion, an elevated lower surface of the severable portion above adjoining portions of the fuse link, a protrusion which supports the severable portion at a height greater than a height of the adjoining portions of the fuse link, flowing the melted severable portion down sloped surfaces away from a break point, and a propellent material beneath the severable portion which explodes to ablate the severable portion.

Abstract: A semiconductor device of the present invention is provided with a first metal wire formed above a semiconductor substrate with an interlayer insulating film intervened, a fuse formed on interlayer insulating film so as to be spaced at a distance away from first metal wire, an insulating film which covers first metal wire and which has an opening above fuse, a second metal wire formed on insulating film, a first passivation film which covers second metal wire and fuse, and a second passivation film formed on first passivation film, made of a material different from that of first passivation film and having an opening above fuse.

Abstract: A semiconductor memory device includes a dielectric film, first and second wiring lines, a copper fuse section and an opening. The first and second wiring lines are provided in the dielectric film. The copper fuse section is provided in the dielectric film, and is connected to the first and second wiring lines. The opening is formed to the copper fuse section through the dielectric film. A laser beam is irradiated to the copper fuse section through the opening in an oxygen atmosphere.

Abstract: As the semiconductor chip is large-sized, highly integrated and speeded up, it becomes difficult to pack the semiconductor chip together with leads in a package. In view of this difficulty, there has been adopted the package structure called the “Lead-On-Chip” or “Chip-On-Lead” structure in which the semiconductor and the leads are stacked and packed. In the package of this structure, according to the present invention, the gap between the leading end portions of the inner leads and the semiconductor chip is made wider than that between the inner lead portions except the leading end portions and the semiconductor chip thereby to reduce the stray capacity, to improve the signal transmission rate and to reduce the electrical noises.

Abstract: A semiconductor device with a fuse box includes at least two gate electrodes 8, 9 and a fuse member 6. The two gate electrodes 8, 9 are formed on at least one insulating film 13 on a semiconductor substrate 100. The fuse member 6 is formed on the insulating film 13 on the semiconductor substrate 100. The two gate electrodes 8, 9 are electrically connected each other by the fuse member 6. In addition, the insulating film 13 and a field region 2 constituted by a semiconductor region are arranged adjacent to each other in a frame-like guard ring 1. The guard ring 1 is constituted by a semiconductor region formed on the semiconductor substrate 100.

Abstract: A semiconductor wiring structure positioned between plurality conductors, comprisies spacers positioned on adjacent ones of the conductors and at least one wiring element positioned between the spacers.

Abstract: A ball grid array type semiconductor package includes a semiconductor chip formed with bonding pads, an elastomer bonded to the semiconductor chip, a flexible wiring substrate bonded to the elastomer and formed with wirings connected at one end of the bonding pads of the semiconductor chip, a solder resist formed on the main surface of the flexible wiring substrate and solder bump electrodes connected to the other ends of the wirings. The elastomer is bonded to the flexible wiring substrate on the side of the tape, the solder resist is formed on the side of the wirings, and the solder bump electrodes are connected with the wirings by way of through holes formed in the solder resist.

Abstract: A chip mounting structure provides an adhesive conductor between a chip and a printed circuit board. The adhesive conductor includes an adhesive layer having viscoelasticity to cushion thermal shock caused due to a difference in the thermal expansive coefficients between mutually connected layers; and conductive wires for electrically connecting the layers by vertically penetrating the adhesive layer. The adhesive conductor in accordance with the present invention includes a plurality of conductive wires penetrating the adhesive layer having viscoelasticity in a half-hardened state, so that the chip and the printed circuit board can be physically attached and at the same time be electrically connected. Also, the flip chip structure is protected from the thermal shock caused due to the difference between the thermal expansive coefficients of the chip and the printed circuit board, so that products fabricated by adopting it can have a high reliability.